JPH0244826B2 - - Google Patents

Info

Publication number
JPH0244826B2
JPH0244826B2 JP62011338A JP1133887A JPH0244826B2 JP H0244826 B2 JPH0244826 B2 JP H0244826B2 JP 62011338 A JP62011338 A JP 62011338A JP 1133887 A JP1133887 A JP 1133887A JP H0244826 B2 JPH0244826 B2 JP H0244826B2
Authority
JP
Japan
Prior art keywords
compound
benzene
group
film
diethynylbenzene
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP62011338A
Other languages
English (en)
Japanese (ja)
Other versions
JPS63179843A (ja
Inventor
Yukihiro Ikeda
Masaru Ozaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP62011338A priority Critical patent/JPS63179843A/ja
Publication of JPS63179843A publication Critical patent/JPS63179843A/ja
Publication of JPH0244826B2 publication Critical patent/JPH0244826B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0755—Non-macromolecular compounds containing Si-O, Si-C or Si-N bonds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
JP62011338A 1987-01-22 1987-01-22 ジエチニルベンゼン誘導体化合物 Granted JPS63179843A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62011338A JPS63179843A (ja) 1987-01-22 1987-01-22 ジエチニルベンゼン誘導体化合物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62011338A JPS63179843A (ja) 1987-01-22 1987-01-22 ジエチニルベンゼン誘導体化合物

Publications (2)

Publication Number Publication Date
JPS63179843A JPS63179843A (ja) 1988-07-23
JPH0244826B2 true JPH0244826B2 (de) 1990-10-05

Family

ID=11775246

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62011338A Granted JPS63179843A (ja) 1987-01-22 1987-01-22 ジエチニルベンゼン誘導体化合物

Country Status (1)

Country Link
JP (1) JPS63179843A (de)

Also Published As

Publication number Publication date
JPS63179843A (ja) 1988-07-23

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term