JPH0433772B2 - - Google Patents

Info

Publication number
JPH0433772B2
JPH0433772B2 JP1134087A JP1134087A JPH0433772B2 JP H0433772 B2 JPH0433772 B2 JP H0433772B2 JP 1134087 A JP1134087 A JP 1134087A JP 1134087 A JP1134087 A JP 1134087A JP H0433772 B2 JPH0433772 B2 JP H0433772B2
Authority
JP
Japan
Prior art keywords
group
diethynylbenzene
benzene
ppm
proton
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1134087A
Other languages
English (en)
Japanese (ja)
Other versions
JPS63179836A (ja
Inventor
Yukihiro Ikeda
Masaru Ozaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP1134087A priority Critical patent/JPS63179836A/ja
Publication of JPS63179836A publication Critical patent/JPS63179836A/ja
Publication of JPH0433772B2 publication Critical patent/JPH0433772B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0755—Non-macromolecular compounds containing Si-O, Si-C or Si-N bonds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
JP1134087A 1987-01-22 1987-01-22 ジエチニルベンゼン誘導体 Granted JPS63179836A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1134087A JPS63179836A (ja) 1987-01-22 1987-01-22 ジエチニルベンゼン誘導体

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1134087A JPS63179836A (ja) 1987-01-22 1987-01-22 ジエチニルベンゼン誘導体

Publications (2)

Publication Number Publication Date
JPS63179836A JPS63179836A (ja) 1988-07-23
JPH0433772B2 true JPH0433772B2 (de) 1992-06-04

Family

ID=11775301

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1134087A Granted JPS63179836A (ja) 1987-01-22 1987-01-22 ジエチニルベンゼン誘導体

Country Status (1)

Country Link
JP (1) JPS63179836A (de)

Also Published As

Publication number Publication date
JPS63179836A (ja) 1988-07-23

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term