JPH0248536B2 - - Google Patents

Info

Publication number
JPH0248536B2
JPH0248536B2 JP63250739A JP25073988A JPH0248536B2 JP H0248536 B2 JPH0248536 B2 JP H0248536B2 JP 63250739 A JP63250739 A JP 63250739A JP 25073988 A JP25073988 A JP 25073988A JP H0248536 B2 JPH0248536 B2 JP H0248536B2
Authority
JP
Japan
Prior art keywords
carbon atoms
formula
group
oalk
substituted
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP63250739A
Other languages
English (en)
Other versions
JPH01139554A (ja
Inventor
Fuerudaa Ruisu
Kiruhimeiyaa Rudorufu
Hisuraa Rinarudo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Novartis AG
Original Assignee
Ciba Geigy AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Geigy AG filed Critical Ciba Geigy AG
Publication of JPH01139554A publication Critical patent/JPH01139554A/ja
Publication of JPH0248536B2 publication Critical patent/JPH0248536B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
    • C07D295/04—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms
    • C07D295/10—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms
    • C07D295/104—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms with the ring nitrogen atoms and the doubly bound oxygen or sulfur atoms attached to the same carbon chain, which is not interrupted by carbocyclic rings
    • C07D295/108—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms with the ring nitrogen atoms and the doubly bound oxygen or sulfur atoms attached to the same carbon chain, which is not interrupted by carbocyclic rings to an acyclic saturated chain
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C49/00—Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
    • C07C49/587—Unsaturated compounds containing a keto groups being part of a ring
    • C07C49/703—Unsaturated compounds containing a keto groups being part of a ring containing hydroxy groups
    • C07C49/747—Unsaturated compounds containing a keto groups being part of a ring containing hydroxy groups containing six-membered aromatic rings
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C49/00—Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
    • C07C49/76—Ketones containing a keto group bound to a six-membered aromatic ring
    • C07C49/82—Ketones containing a keto group bound to a six-membered aromatic ring containing hydroxy groups
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C49/00—Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
    • C07C49/76—Ketones containing a keto group bound to a six-membered aromatic ring
    • C07C49/82—Ketones containing a keto group bound to a six-membered aromatic ring containing hydroxy groups
    • C07C49/83—Ketones containing a keto group bound to a six-membered aromatic ring containing hydroxy groups polycyclic
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C49/00—Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
    • C07C49/76—Ketones containing a keto group bound to a six-membered aromatic ring
    • C07C49/84—Ketones containing a keto group bound to a six-membered aromatic ring containing ether groups, groups, groups, or groups
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D303/00—Compounds containing three-membered rings having one oxygen atom as the only ring hetero atom
    • C07D303/02—Compounds containing oxirane rings
    • C07D303/12—Compounds containing oxirane rings with hydrocarbon radicals, substituted by singly or doubly bound oxygen atoms
    • C07D303/32—Compounds containing oxirane rings with hydrocarbon radicals, substituted by singly or doubly bound oxygen atoms by aldehydo- or ketonic radicals
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D333/00—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
    • C07D333/02—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings
    • C07D333/04—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom
    • C07D333/06—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to the ring carbon atoms
    • C07D333/22—Radicals substituted by doubly bound hetero atoms, or by two hetero atoms other than halogen singly bound to the same carbon atom
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/04—Oxygen-containing compounds
    • C08K5/07—Aldehydes; Ketones
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/117—Free radical
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y10S430/121—Nitrogen in heterocyclic ring
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/122—Sulfur compound containing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Polymerisation Methods In General (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Paints Or Removers (AREA)

Description

【発明の詳細な説明】
本発明は、α−位においてアミノ基によつて置
換された新規芳香−脂肪族ケトンに関する。該化
合物は不飽和化合物の光重合開始剤として有用で
ある。 新規な化合物は、次式 （式中、 ArはOH、alk、−Oalk、−Ｏフエニル、もしく
は−Salkにより置換されたフエニル基を表わし、 R1およびR2は独立して炭素原子数１ないし８
のアルキル基を表わすかまたはR1およびR2は一
緒になつて−（CH2）5−を表わし、そして R4およびR5は独立して炭素原子数１ないし12
のアルキル基を表わすかもしくは−Oalkにより
置換された炭素原子数２ないし４のアルキル基を
表わすか、または R4およびR5は一緒になつてペンタメチレン基
を表わすかもしくは−０−、−NH−、もしくは
−Nalk−によつて中断されたテトラメチレン基
を表わし、 alkは炭素原子数１ないし４のアルキル基を表
わす。）で表わされる化合物である。 式で表わされる化合物は、次の反応段階によ
り芳香−脂肪族ケトンから製造することができ
る。 次の方法により単一の段階を逐行することもで
きる。 段階Ａ−臭素化 当該ケトンを不活性溶媒中、好ましくは四塩化
炭素中に溶解し、そして臭素１モルを室温にて滴
下する。次いで溶解したHBrを除去するために
窒素を導入する。最後に溶媒を蒸留で除去する。
ブロモケトンの精製は必要とされない。 段階Ｂ−エポキシド中間体の製造 ブロモケトンをメタノール中に溶解しそしてメ
タノール中のナトリウムメトキシド１モル溶液を
還流温度にて滴下する。次いでメタノールを蒸留
で除きそして残留物を氷水中に注入しそしてエー
テルで抽出する。エーテル性溶液を水で洗浄し、
Na2SO4上で乾燥しそして濃縮する。残渣は再結
晶または真空蒸留により精製することができる。
しかし、次の段階で使用するためには精製は何ら
必要とされない。 段階Ｃ−α−アミノケトンの製造 原料エポキシドを、溶媒を用いずにまたは少量
のトルエンもしくはキシレンを添加して１モルの
第二アミンで処理し、そして100−200℃にて約10
ないし20時間の間反応させる。低沸点アミン、例
えばジメチルアミンまたはジエチルアミンを使用
する場合、反応をオートクレーブ中で行う。反応
混合物をベンゼンで希釈しそして希塩酸で抽出す
る。その酸性水溶液をNaOHでアルカリ性にし
そしてエーテルで抽出する。エーテル性溶液を水
で洗浄し、Na2SO4上で乾燥しそして濃縮する。
粗生成物を蒸留、結晶化またはAl2O3カラムでの
クロマトグラフイーにより精製する。 以下のα−アミノケトンは、これら反応段階に
よつて合成されたものである。
【表】
【表】
【表】
【表】
【表】
【表】
【表】 式で表わされる化合物はエチレン性不飽和化
合物の光重合開始として使用することができる。
その不飽和化合物は、例えばアクリル酸もしくは
メタアクリル酸のモノーもしくはポリエステル、
ビニルエステル、アリルエステルまたは不飽和ポ
リエステル樹脂であつてよい。かかる不飽和化合
物の混合物は光重合性組成物としてよく使用され
る。かかる光重合性組成物は、一般に薄層中に、
例えば塗料層または印刷インク層中に使用され
る。工業的用途において光硬化の速度は重要な要
素でありそれは主に光開始剤の活性に依存する。
式で表わされる化合物は、次の試験において示
されるように高い重合活性を有する。 試験例 次の成分からなる混合物を製造した。 エポキシアクリレート（エベクリル（Ebecryl）
608、ベルギー国UCB社製） 69部 オリゴマートリスアクリレート（OTA480、
UCB社製） 30部 シリコーンジアクリレート（エベクリル
（Ebecryl）350、UCB社製） １部 光開始剤 ２部 （部は全て重量部を表わす。） 混合物をガラス板上に50μｍの厚さにナイフで
塗布する。試料を80ワツトの電球を２個備えた
PPG装置（紫外線照射装置）中で照射する。試
料が照射装置を通過した後、フイルムのふき取り
を堅牢度を紙ハンカチでこすることにより試験し
た。通過速度を上昇させそして耐ふき取り性フイ
ルムを得るための最大速度を求めた。それを第３
表に示す。
【表】
【表】 表３に示すように式で表わされる化合物の光
硬化活性は市販の光開始剤Vicure30（Stanffer
Corpの製品）またはIrgacure651（チバーガイキ
ーAGの製品）のそれに比して顕著により高い。

Claims (1)

  1. 【特許請求の範囲】 １ 次式 （式中、 ArはOH、alk、−Oalk、−Ｏフエニル、もしく
    は−Salkにより置換されたフエニル基を表わし、 R1およびR2は独立して炭素原子数１ないし８
    のアルキル基を表わすかまたはR1およびR2は一
    緒になつて−（CH2）5−を表わし、そして R4およびR5は独立して炭素原子数１ないし12
    のアルキル基を表わすかもしくは−Oalkにより
    置換された炭素原子数２ないし４のアルキル基を
    表わすか、または R4およびR5は一緒になつてペンタメチレン基
    を表わすかもしくは−Ｏ−、−NH−、もしくは
    −Nalk−によつて中断されたテトラメチレン基
    を表わし、 alkは炭素原子数１ないし４のアルキル基を表
    わす。）で表わされる化合物。
JP63250739A 1977-12-22 1988-10-04 芳香族α−アミノケトン Granted JPH01139554A (ja)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
CH1588477 1977-12-22
CH15884/77 1977-12-22
CH251878 1978-03-08
CH2518/78 1978-03-08
CH972378 1978-09-18
CH9723/78-1 1978-09-18

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP16090978A Division JPS5499185A (en) 1977-12-22 1978-12-22 Photopolymerization initiator and photopolymerizable composition

Publications (2)

Publication Number Publication Date
JPH01139554A JPH01139554A (ja) 1989-06-01
JPH0248536B2 true JPH0248536B2 (ja) 1990-10-25

Family

ID=27173751

Family Applications (3)

Application Number Title Priority Date Filing Date
JP16090978A Granted JPS5499185A (en) 1977-12-22 1978-12-22 Photopolymerization initiator and photopolymerizable composition
JP63250739A Granted JPH01139554A (ja) 1977-12-22 1988-10-04 芳香族α−アミノケトン
JP1061101A Granted JPH01308404A (ja) 1977-12-22 1989-03-15 光重合開始剤

Family Applications Before (1)

Application Number Title Priority Date Filing Date
JP16090978A Granted JPS5499185A (en) 1977-12-22 1978-12-22 Photopolymerization initiator and photopolymerizable composition

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP1061101A Granted JPH01308404A (ja) 1977-12-22 1989-03-15 光重合開始剤

Country Status (15)

Country Link
US (4) US4318791A (ja)
EP (1) EP0003002B1 (ja)
JP (3) JPS5499185A (ja)
AR (1) AR226169A1 (ja)
AT (1) AT369392B (ja)
AU (1) AU529495B2 (ja)
BR (1) BR7808406A (ja)
CA (1) CA1234242A (ja)
DD (1) DD141320A5 (ja)
DK (1) DK157083C (ja)
FI (1) FI64169C (ja)
GR (1) GR71655B (ja)
HU (1) HU181680B (ja)
PL (1) PL117576B1 (ja)
SU (1) SU948300A3 (ja)

Families Citing this family (334)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2722264C2 (de) * 1977-05-17 1984-06-28 Merck Patent Gmbh, 6100 Darmstadt Verwendung von substituierten Oxyalkylphenonen als Photosensibilisatoren
DE3107087A1 (de) * 1980-02-29 1981-12-24 CIBA-GEIGY AG, 4002 Basel "photopolymerisierbare gemische und verfahren zur photopolymerisation von kationisch polymerisierbaren verbindungen"
DE3008411A1 (de) * 1980-03-05 1981-09-10 Merck Patent Gmbh, 6100 Darmstadt Neue aromatisch-aliphatische ketone, ihre verwendung als photoinitiatoren sowie photopolymerisierbare systeme enthaltend solche ketone
US4368253A (en) * 1981-01-28 1983-01-11 Ciba-Geigy Corporation Image formation process
DE3203096A1 (de) * 1982-01-30 1983-08-04 Merck Patent Gmbh, 6100 Darmstadt Verwendung von hydroxyalkylphenonen als initiatoren fuer die strahlungshaertung waessriger prepolymerdispersionen
EP0088050B1 (de) * 1982-02-26 1986-09-03 Ciba-Geigy Ag Photohärtbare gefärbte Massen
US4504372A (en) * 1982-03-12 1985-03-12 Ciba-Geigy Corporation Acid-curable composition containing a masked curing catalyst, and a process for its preparation
DE3360384D1 (en) * 1982-05-07 1985-08-14 Ciba Geigy Ag Process for the preparation of 1-hydroxyketones
DE3367033D1 (en) * 1982-06-15 1986-11-20 Ciba Geigy Ag Process for the photopolymerisation of unsaturated compounds
US4518676A (en) * 1982-09-18 1985-05-21 Ciba Geigy Corporation Photopolymerizable compositions containing diaryliodosyl salts
EP0108037B1 (de) * 1982-10-01 1989-06-07 Ciba-Geigy Ag Propiophenonderivate als Photoinitiatoren für die Photopolymerisation
US4649062A (en) * 1983-01-05 1987-03-10 Ciba-Geigy Corporation Ultraviolet radiation curable vehicle for ceramic colors, composition and method
EP0117233B1 (de) * 1983-02-18 1987-08-26 Ciba-Geigy Ag Photohärtbare gefärbte Massen
US4524221A (en) * 1983-02-22 1985-06-18 Minnesota Mining And Manufacturing Company Process for the production of acyloins
EP0117578A3 (en) * 1983-02-23 1985-01-30 Shionogi & Co., Ltd. Azole-substituted alcohol derivatives
US4563438A (en) * 1983-05-06 1986-01-07 Ciba Geigy Corporation Liquid mixture of photoinitiators
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Also Published As

Publication number Publication date
DD141320A5 (de) 1980-04-23
AU4277578A (en) 1979-06-28
AT369392B (de) 1982-12-27
FI64169B (fi) 1983-06-30
PL212042A1 (pl) 1979-09-10
DK157083C (da) 1990-03-19
EP0003002B1 (de) 1984-06-13
JPH0134242B2 (ja) 1989-07-18
FI783919A7 (fi) 1979-06-23
JPH01308404A (ja) 1989-12-13
DK576278A (da) 1979-06-23
EP0003002A2 (de) 1979-07-11
CA1234242A (en) 1988-03-15
EP0003002A3 (en) 1980-01-09
US4308400A (en) 1981-12-29
SU948300A3 (ru) 1982-07-30
GR71655B (ja) 1983-06-20
JPH01139554A (ja) 1989-06-01
PL117576B1 (en) 1981-08-31
AU529495B2 (en) 1983-06-09
US4318791A (en) 1982-03-09
BR7808406A (pt) 1980-05-20
JPH0257081B2 (ja) 1990-12-04
US4321118A (en) 1982-03-23
AR226169A1 (es) 1982-06-15
HU181680B (en) 1983-11-28
JPS5499185A (en) 1979-08-04
ATA917678A (de) 1982-05-15
FI64169C (fi) 1983-10-10
US4315807A (en) 1982-02-16
DK157083B (da) 1989-11-06

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