JPH0263301B2 - - Google Patents

Info

Publication number
JPH0263301B2
JPH0263301B2 JP59195908A JP19590884A JPH0263301B2 JP H0263301 B2 JPH0263301 B2 JP H0263301B2 JP 59195908 A JP59195908 A JP 59195908A JP 19590884 A JP19590884 A JP 19590884A JP H0263301 B2 JPH0263301 B2 JP H0263301B2
Authority
JP
Japan
Prior art keywords
solder
substrate
pads
wettable
melting point
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59195908A
Other languages
English (en)
Other versions
JPS60119737A (ja
Inventor
Neiru Rakuritsutsu Maaku
Orudonetsu Joze
Josefu Chubiora Piitaa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of JPS60119737A publication Critical patent/JPS60119737A/ja
Publication of JPH0263301B2 publication Critical patent/JPH0263301B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/30Assembling printed circuits with electric components, e.g. with resistors
    • H05K3/32Assembling printed circuits with electric components, e.g. with resistors electrically connecting electric components or wires to printed circuits
    • H05K3/34Assembling printed circuits with electric components, e.g. with resistors electrically connecting electric components or wires to printed circuits by soldering
    • H05K3/341Surface mounted components
    • H05K3/3431Leadless components
    • H05K3/3436Leadless components having an array of bottom contacts, e.g. pad grid array or ball grid array components
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/01Manufacture or treatment
    • H10W70/05Manufacture or treatment of insulating or insulated package substrates, or of interposers, or of redistribution layers
    • H10W70/093Connecting or disconnecting other interconnections thereto or therefrom, e.g. connecting bond wires or bumps
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/01Manufacture or treatment
    • H10W72/012Manufacture or treatment of bump connectors, dummy bumps or thermal bumps
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00Package configurations
    • H10W90/701Package configurations characterised by the relative positions of pads or connectors relative to package parts
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/09Shape and layout
    • H05K2201/09209Shape and layout details of conductors
    • H05K2201/09654Shape and layout details of conductors covering at least two types of conductors provided for in H05K2201/09218 - H05K2201/095
    • H05K2201/09781Dummy conductors, i.e. not used for normal transport of current; Dummy electrodes of components
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/10Details of components or other objects attached to or integrated in a printed circuit board
    • H05K2201/10227Other objects, e.g. metallic pieces
    • H05K2201/10234Metallic balls
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/20Details of printed circuits not provided for in H05K2201/01 - H05K2201/10
    • H05K2201/2036Permanent spacer or stand-off in a printed circuit or printed circuit assembly
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/04Soldering or other types of metallurgic bonding
    • H05K2203/0465Shape of solder, e.g. differing from spherical shape, different shapes due to different solder pads
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/071Connecting or disconnecting
    • H10W72/072Connecting or disconnecting of bump connectors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/071Connecting or disconnecting
    • H10W72/072Connecting or disconnecting of bump connectors
    • H10W72/07221Aligning
    • H10W72/07227Aligning involving guiding structures, e.g. spacers or supporting members
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/071Connecting or disconnecting
    • H10W72/072Connecting or disconnecting of bump connectors
    • H10W72/07231Techniques
    • H10W72/07236Soldering or alloying
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/071Connecting or disconnecting
    • H10W72/072Connecting or disconnecting of bump connectors
    • H10W72/07251Connecting or disconnecting of bump connectors characterised by changes in properties of the bump connectors during connecting
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/071Connecting or disconnecting
    • H10W72/072Connecting or disconnecting of bump connectors
    • H10W72/07251Connecting or disconnecting of bump connectors characterised by changes in properties of the bump connectors during connecting
    • H10W72/07253Connecting or disconnecting of bump connectors characterised by changes in properties of the bump connectors during connecting changes in shapes
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/20Bump connectors, e.g. solder bumps or copper pillars; Dummy bumps; Thermal bumps
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/20Bump connectors, e.g. solder bumps or copper pillars; Dummy bumps; Thermal bumps
    • H10W72/221Structures or relative sizes
    • H10W72/227Multiple bumps having different sizes
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/20Bump connectors, e.g. solder bumps or copper pillars; Dummy bumps; Thermal bumps
    • H10W72/231Shapes
    • H10W72/237Multiple bump connectors having different shapes
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/20Bump connectors, e.g. solder bumps or copper pillars; Dummy bumps; Thermal bumps
    • H10W72/241Dispositions, e.g. layouts
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/20Bump connectors, e.g. solder bumps or copper pillars; Dummy bumps; Thermal bumps
    • H10W72/251Materials
    • H10W72/252Materials comprising solid metals or solid metalloids, e.g. PbSn, Ag or Cu
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/20Bump connectors, e.g. solder bumps or copper pillars; Dummy bumps; Thermal bumps
    • H10W72/281Auxiliary members
    • H10W72/285Alignment aids, e.g. alignment marks
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/20Bump connectors, e.g. solder bumps or copper pillars; Dummy bumps; Thermal bumps
    • H10W72/29Bond pads specially adapted therefor
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/90Bond pads, in general
    • H10W72/921Structures or relative sizes of bond pads
    • H10W72/926Multiple bond pads having different sizes
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00Package configurations
    • H10W90/701Package configurations characterised by the relative positions of pads or connectors relative to package parts
    • H10W90/721Package configurations characterised by the relative positions of pads or connectors relative to package parts of bump connectors
    • H10W90/724Package configurations characterised by the relative positions of pads or connectors relative to package parts of bump connectors between a chip and a stacked insulating package substrate, interposer or RDL
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Wire Bonding (AREA)
  • Electric Connection Of Electric Components To Printed Circuits (AREA)

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は超小型(マイクロミニアチユア)構成
素子を支持板又は基板に半田接続する方法に関す
るものであり、さらに具体的には良好な抵抗対横
方向ストレス比を与えるように縦方向に伸びた接
続体(ジヨイント)を形成するための方法に関す
る。
本発明は基板に対して半導体デバイスをフエイ
スダウン又はフリツプチツプ式にボンデイングす
ることに関係があり、半導体デバイスと支持基板
との間の複数の電気的接続を極めて小さくしかも
密接した半田相互接続よつて行なうことを可能に
する。
[従来技術] 米国特許第3401126号及び第3429040号は半導体
チツプを支持体にフエイスダウン・ボンデイング
するための「コントロールド・コラプス(つぶ
し)接続」方法を開示している。これらの米国特
許に開示されている事項は半導体チツプの接点領
域及びチツプ支持体の導体上の半田接続可能領域
に金属性半田のパツドを形成することである。チ
ツプ支持体の半田接続可能領域は半田づけ不能の
障壁で囲まれているので、支持体領域及び半導体
デバイス接点領域上の半田が溶融して合体したと
き、表面張力により半導体チツプは支持体の上方
に浮遊する。
集積回路半導体デバイスの技術進歩に伴い個々
の能動素子及び受動素子の寸法が極めて小さくな
り、しかも1つのデバイス中の素子の数が著しく
増加するに至つた。このため、I/O端子の数が
増加してデバイスの寸法が著しく大きくなる結果
を生じた。この傾向は今後も続き、端子の密度及
び全体的な数に対して次第に高度の要請が出て来
るであろう。半田接続の利点はI/O端子をデバ
イスの上側表面の実質的に全体に亘つて分散配置
できることである。これは全表面の有効利用を可
能にし、エリア・ボンデイングとして知られてい
る。
集積回路デバイスは半導体デバイスの材料、即
ちシリコンの膨張係数とは異なつた膨張係数を有
する材料で作られた支持基板上に装着されるのが
普通である。使用中にデバイスの構成素子が必然
的に熱を発生し、その熱は半田ボンドを介して移
動するのでデバイス及び支持基板の両方に温度変
動を生じさせる。デバイス及び基板は膨張係数の
相異に起因して、温度変動と共に異なつた量だけ
膨張及び収縮する。これは半田端子にストレスを
生じさせる。動作中に半田ボンドに生じるストレ
スは、(1)温度変動の大きさ、(2)中立点からの距
離、(3)デバイス及び基板の膨張係数の差に正比例
し、半田ボンドの高さ、即ちデバイスと支持基板
との間の間隔に反比例する。事態の厳しさは、実
装密度を一層高めるニーズに順応するため半田端
子の直径が益々小さくなり、全体的な高さも又低
下する事実によつて更に増大する。
今までよりも高密度の端子を有する更に大きい
デバイスを組込む将来の用途に対しても半田端子
の利用を続けるための考えうる解決策として、半
田端子を細長くすればよいことが、米国特許第
3811186号、第3486223号、3921285号及びIBM
TDBの1973年8月号第767頁、1976年9月号第
1178頁、1980年7月号第575頁に開示されている。
高さを同一にした場合、砂時計状(上下間の中間
部がくびれた形状)の半田端子の方が円筒状又は
ビヤ樽状の端子よりもストレス耐力の点で優れて
いることがわかつた。
この現象はIBM Journal of Research and
Development 1969年5月号、Vol.13、No.3、第
261頁に説明されている。
[発明が解決しようとする問題点] 上述の文献に開示された細長い半田端子を作る
ための方法は実際的でない。即ちそれらに開示さ
れた方法は製造工程を実行する作業者の技巧及び
個人的な能力に存在する点で個人的職人芸を必要
とする。従つて一般的な再現性がなく製造産業上
利用することができなかつた。
[問題点を解決するための手段] 本発明は集積回路半導体デバイスと支持基板と
の間に背高の細長い半田端子を形成するための新
規な方法を提案する。本発明の方法で形成される
背高の(細長い)半田接続体はデバイス及び基板
の温度変動によつて生じるストレスに耐えること
ができる。
本発明の問題解決手段は、背高の半田端子を形
成するため、(1)半導体デバイスと支持基板との間
に予定の垂直間隔を維持するための手段を配設
し、(2)基板又はデバイス上の各半田ウエツタブ
ル・パツドに対して半田柱体を形成して付着さ
せ、(3)半田ウエツタブル・パツド上に半田マウン
トを有する半導体デバイスを、半田マウントを有
する支持基板上に位置合わせした状態で位置づけ
し、デバイスと基板との間の距離を垂直間隔維持
手段で橋渡しし、予定の間隔を維持した状態に組
合わせた後加熱して半田接続丘及び半田柱体をリ
フロすることにより複数個の砂時計状細長接続体
を形成するステツプを含む。
[実施例] 第1図のステツプ1はデバイスをボンドできる
代表的な基板10を示す。セラミツクの基板10
上には1組の半田ウエツタブル・パツド12が載
置されている。それらのパツドはピン(図示せ
ず)付のパツドと他の関連デバイスとを相互接続
する内部的に冶金形成されたものでも、上面に冶
金処理で形成されたものでもよい。図を簡潔にす
るため唯一組のパツドだけを図示する。実際は沢
山のデバイスに接続するための多数組のパツドを
持つことができる。冶金形成されたパツドは表面
に置いても、又はもしも望むなら表面及び内部に
置いてもよい。基板10は一般的な形式の基板を
図示したもので本発明の要部を構成するものでは
ない。一般に基板10は、それにボンドされるべ
き半導体デバイスを形成するために使用された材
料、即ちシリコンの膨張係数とは異なつた膨張係
数を通常有するセラミツク材料で形成される。
ステツプ2は相対的に高い融点を有する適当な
半田合金で形成された半田柱体16がボンドされ
た例えばシリコン製の仮基板14を示す。半田柱
体の代表例は純粋のPb又はPb含有率の極めて高
い半田で形成される。半田柱体16は融点が327
℃程度の材料にすべきである。各半田柱体16の
上部表面上に低融点金属の層18がある。その層
の代表例は400乃至600Åの範囲の厚さと240℃程
度の融点を有する錫である。半田柱体16は基板
10上のパツド形状に相当する形状の適当な穴あ
きマスクを仮基板14上に載置し、その上に半田
合金を適当な所望の深さ、代表的には0.05乃至
0.1mmの深さまで蒸着することによつて形成され
る。低融点の層18は引続いて柱体16の上面に
蒸着により付着される。ステツプ3で示すように
柱体16を有する仮基板14を反転して、パツド
12の表面と層18とが接触するように基板10
の上面に載置する。そのような組立体を層18の
融ける温度まで加熱した後冷却して半田柱体16
をパツド12と融合させることにより、半田柱体
16は基板10へ移される。その後仮基板14を
除去するとステツプ4で示すような構造体が出来
る。基板10上にボンドされるべき集積回路半導
体デバイス20をステツプ5で示す。デバイス2
0は基板10上の半田パツド12の形状と合致す
る形状に配列された複数の半田接続丘22を有す
る。各半田接続丘22は半田ウエツタブル・パツ
ド構造体21とその上面に半田リフロされた丘と
より成る。図示の通りデバイス20の周辺部分は
半田接続丘22の領域よりも外方へ延びている。
デバイス20は普通のものであつて、多数の能動
素子及び受動素子を含んでいる。デバイス20の
周辺部分にはパツド21と一緒に形成されるのが
普通である半田ウエツタブル・パツド24が設け
られている。このパツド24は半導体デバイスと
基板との間の予定の垂直間隔を維持するための手
段の基礎を構成するので、任意の適した個数だけ
設けてよい。一般的にはデバイス構造体当り最少
3パツドが必要であるが、もしも必要ならばそれ
以上設けてもよい。間隔を維持するための手段が
次のステツプ6に示すように組立てられる。パツ
ド24にかぶさる開口28を有するマスク26が
デバイス20の上面に載置される。半田の薄層3
0が通常の蒸着方法によつてパツド24の上面に
蒸着される。基板とデバイスの所望間隔に近い直
径を有する金属球32を開口28内に入れて、層
30を融かすように加熱した後冷却して金属球3
2をデバイス20に接合する。金属球32は任意
の金属製のものでよいが、銅製でその表面にニツ
ケル被覆した上に金を被覆したものが望ましい。
金属球32の直径は0.13mm程度が普通である。マ
スク26を取除いた後に組立体を反転し、ステツ
プ7に示すようにパツド12上に半田柱体16を
有する基板10上の定位置に載置する。図示の通
り金属球32はデバイスと基板との間に所望の間
隔を維持する台座(スタンド・オフ)となり、デ
バイス上の各I/Oパツドは半田接続丘22を半
田柱体16と接触して基板上の対応するパツドと
接続される。次にその組立体を半田柱体16及び
半田接続丘22の材料が融ける温度まで加熱する
と、デバイスのパツドと基板のパツドとの間に背
高の細長い砂時計の形の半田接続体38が形成さ
れる。半田柱体16及び半田接続丘22の半田の
総量は、砂時計形の接続体を形成するためパツド
間の間隔を考慮して計算される。
次に第2図は本発明の第2の実施例である第2
のステツプ順序を示す。この実施例の基板10は
第1の実施例で説明されたような任意の適当な支
持体でよい。基体10は例えばMLC基板のよう
な非焼結セラミツク基板であつてもよい。開口4
2を有するマスク40を基板10の上面に載置
し、台座を形成すべき所望の場所に開口42を位
置づけする。適当な展剤(ビークル)と混合した
金属粒子、望ましくはモリブデン、タンタル、又
はタングステンのような耐火性材料より成る金属
ペーストを開口41に詰込んで台座42,44を
形成する。詰込み作業に続いてマスク40を取除
き、組立体を焼結することによりペースト中の展
剤、可塑剤等及び(もしも基板が予め焼結されて
いないならば)グリーン・セラミツク基板10中
のバインダを追出す。焼結後の台座42,44の
高さは基板上に配置されるべきデバイスと基板1
0との間の所望の間隔に相当する。焼結に起因す
る収縮はマスク40の厚さを増すことにより調節
される。仮基板14に付着された第2図に示す半
田柱体16は第1図の実施例で説明したのと同じ
要領で作られる。仮基板14の半田柱体16をパ
ツド12上に載置し、半田柱体16をパツド12
に融着するように加熱し、然る後仮基板14を除
去してステツプ3に示す構造体を残留させる。ス
テツプ4に示すように、半田接続丘22の設けら
れた半導体デバイスを、その半田接続丘22と半
田柱体16が接触するように且つデバイスの周囲
部分が台座42,44に接するように、基板上に
載置する。組立体は次に半田素子をリフローする
ため加熱してステツプ5に示すように、半田接続
体38が引伸ばされて砂時計形の外観を持つ構造
体を形成する。
最初の実施例10において例示した基体へ付着さ
れた球状の台座はもしも望むなら基板10上に装
着されたパツドへ接着するように変えてもよい。
そればかりか、デバイス又は基板上の何れかの台
座の位置も個々の実施態様に合わせて変更可能で
ある。更に、もしも必要な接続を基板及び半導体
デバイスに作ることが可能ならば、台座それ自身
をI/O端子又は接地端子として利用することが
可能である。
[発明の効果] 本発明によれば量産方式で製造可能な再現性あ
る背高半田接続体を形成することができ個人的な
技巧依存性から脱脚できる。本発明の方法で形成
される背高半田接続体はデバイス及び基板の温度
変動によつて生じるストレスに耐えることができ
る。
【図面の簡単な説明】
第1図は本発明の第1の実施例における製造過
程を示す図、第2図は本発明の第2の実施例にお
ける製造過程を示す図である。 10……基板、12……半田ウエツタブル・パ
ツド、14……仮基板、16……半田柱体、18
……低融点金属層、20……集積回路半導体デバ
イス、21……パツド、22……半田接続丘、2
4……パツド、26……マスク、28……開口、
30……半田薄層、32……金属球、38……砂
時計状の半田接続体。

Claims (1)

  1. 【特許請求の範囲】 1 半導体デバイスの複数個の半田ウエツタブル
    I/Oパツドに設けた半田接続丘を、夫々対応す
    る支持基板の複数個の半田ウエツタブル・パツド
    に電気的に接続するための背高半田接続体を形成
    する方法であつて、 第3の素子である仮基板を用意して、上記支持
    基板の半田ウエツタブル・パツドに対応する上記
    仮基板上の位置に半田柱体を形成し、 上記半田柱体の上部表面上に、それよりも相対
    的に低融点の金属薄層を付着し、 上記半田柱体の上部表面上の低融点の金属薄層
    が、上記支持基板上の半田ウエツタブル・パツド
    と接触するように上記仮基板を上記支持基板上に
    載置し、 上記低融点の金属層が溶融する温度まで過熱
    し、冷却した後、上記仮基板を除去し、 上記半導体デバイスと上記支持基板との間に、
    上記半田柱体の融点では変形しない材料製で、且
    つ上記半田ウエツタブル・パツドの横幅よりも大
    なる高さを有する垂直間隔維持手段を配設し、 上記半田接続丘を有する上記半導体デバイス
    を、上記半田接続丘が上記支持基板のパツドに形
    成された上記半田柱体に整合して接触するように
    且つ上記垂直間隔維持手段が上記半導体デバイス
    と支持基体との間にはさまれるように、上記支持
    基板体上に載置して成る組立体を形成し、 上記垂直間隔維持手段によつて決められる間隔
    を維持した状態で上記組立体を加熱して上記半田
    接続丘及び半田柱体をリフロすることにより複数
    個の砂時計状の背高半田接続体を形成する方法。 2 上記半田ウエツタブル・パツドの横幅に対す
    る背高半田接続体の高さの比が1以上であること
    を特徴とする特許請求の範囲第1項記載の背高半
    田接続体を形成する方法。
JP59195908A 1983-11-25 1984-09-20 背高半田接続体を形成する方法 Granted JPS60119737A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US555264 1983-11-25
US06/555,264 US4545610A (en) 1983-11-25 1983-11-25 Method for forming elongated solder connections between a semiconductor device and a supporting substrate

Publications (2)

Publication Number Publication Date
JPS60119737A JPS60119737A (ja) 1985-06-27
JPH0263301B2 true JPH0263301B2 (ja) 1990-12-27

Family

ID=24216611

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59195908A Granted JPS60119737A (ja) 1983-11-25 1984-09-20 背高半田接続体を形成する方法

Country Status (4)

Country Link
US (1) US4545610A (ja)
EP (1) EP0147576B1 (ja)
JP (1) JPS60119737A (ja)
DE (1) DE3478729D1 (ja)

Families Citing this family (250)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4604644A (en) * 1985-01-28 1986-08-05 International Business Machines Corporation Solder interconnection structure for joining semiconductor devices to substrates that have improved fatigue life, and process for making
US4661375A (en) * 1985-04-22 1987-04-28 At&T Technologies, Inc. Method for increasing the height of solder bumps
JPS61260648A (ja) * 1985-05-15 1986-11-18 Matsushita Electric Ind Co Ltd 半導体装置の実装方法
JPS629642A (ja) * 1985-07-05 1987-01-17 Matsushita Electric Ind Co Ltd 半導体装置の製造方法
GB8522429D0 (en) * 1985-09-10 1985-10-16 Plessey Co Plc Alignment for hybrid device
US5917707A (en) * 1993-11-16 1999-06-29 Formfactor, Inc. Flexible contact structure with an electrically conductive shell
US5476211A (en) * 1993-11-16 1995-12-19 Form Factor, Inc. Method of manufacturing electrical contacts, using a sacrificial member
US4695861A (en) * 1985-10-21 1987-09-22 Honeywell Inc. Backside mosaic photoconductive infrared detector array
JPS6284973U (ja) * 1985-11-19 1987-05-30
US4807021A (en) * 1986-03-10 1989-02-21 Kabushiki Kaisha Toshiba Semiconductor device having stacking structure
EP0248566A3 (en) * 1986-05-30 1990-01-31 AT&T Corp. Process for controlling solder joint geometry when surface mounting a leadless integrated circuit package on a substrate
GB2194387A (en) * 1986-08-20 1988-03-02 Plessey Co Plc Bonding integrated circuit devices
EP0262580B1 (en) * 1986-09-25 1993-11-24 Kabushiki Kaisha Toshiba Method of electrically bonding two objects
DE3785720T2 (de) * 1986-09-25 1993-08-12 Toshiba Kawasaki Kk Verfahren zum herstellen eines filmtraegers.
US4760948A (en) * 1986-12-23 1988-08-02 Rca Corporation Leadless chip carrier assembly and method
US5170931A (en) * 1987-03-11 1992-12-15 International Business Machines Corporation Method and apparatus for mounting a flexible film semiconductor chip carrier on a circuitized substrate
US4845542A (en) * 1987-03-19 1989-07-04 Unisys Corporation Interconnect for layered integrated circuit assembly
US4831724A (en) * 1987-08-04 1989-05-23 Western Digital Corporation Apparatus and method for aligning surface mountable electronic components on printed circuit board pads
US4912545A (en) * 1987-09-16 1990-03-27 Irvine Sensors Corporation Bonding of aligned conductive bumps on adjacent surfaces
US4803450A (en) * 1987-12-14 1989-02-07 General Electric Company Multilayer circuit board fabricated from silicon
US4980753A (en) * 1988-11-21 1990-12-25 Honeywell Inc. Low-cost high-performance semiconductor chip package
US5208186A (en) * 1989-02-09 1993-05-04 National Semiconductor Corporation Process for reflow bonding of bumps in IC devices
US4935627A (en) * 1989-03-13 1990-06-19 Honeywell Inc. Electrical interconnection apparatus for achieving precise alignment of hybrid components
GB2236217A (en) * 1989-08-23 1991-03-27 Itt Ind Ltd Improvement relating to electrical connectors
US5834799A (en) * 1989-08-28 1998-11-10 Lsi Logic Optically transmissive preformed planar structures
US5504035A (en) * 1989-08-28 1996-04-02 Lsi Logic Corporation Process for solder ball interconnecting a semiconductor device to a substrate using a noble metal foil embedded interposer substrate
US5168346A (en) * 1989-08-28 1992-12-01 Lsi Logic Corporation Method and apparatus for isolation of flux materials in flip-chip manufacturing
US5299730A (en) * 1989-08-28 1994-04-05 Lsi Logic Corporation Method and apparatus for isolation of flux materials in flip-chip manufacturing
JP2805245B2 (ja) * 1989-08-28 1998-09-30 エルエスアイ ロジック コーポレーション フリップチップ構造
US5489804A (en) * 1989-08-28 1996-02-06 Lsi Logic Corporation Flexible preformed planar structures for interposing between a chip and a substrate
US5175612A (en) * 1989-12-19 1992-12-29 Lsi Logic Corporation Heat sink for semiconductor device assembly
CA2034703A1 (en) * 1990-01-23 1991-07-24 Masanori Nishiguchi Substrate for packaging a semiconductor device
US5056216A (en) * 1990-01-26 1991-10-15 Sri International Method of forming a plurality of solder connections
US6471115B1 (en) 1990-02-19 2002-10-29 Hitachi, Ltd. Process for manufacturing electronic circuit devices
US6227436B1 (en) 1990-02-19 2001-05-08 Hitachi, Ltd. Method of fabricating an electronic circuit device and apparatus for performing the method
US5130779A (en) * 1990-06-19 1992-07-14 International Business Machines Corporation Solder mass having conductive encapsulating arrangement
US5251806A (en) * 1990-06-19 1993-10-12 International Business Machines Corporation Method of forming dual height solder interconnections
US5060844A (en) * 1990-07-18 1991-10-29 International Business Machines Corporation Interconnection structure and test method
US5011066A (en) * 1990-07-27 1991-04-30 Motorola, Inc. Enhanced collapse solder interconnection
ZA915965B (en) * 1990-07-30 1992-04-29 South Africa Ind Dev Corp Attaching integrated circuits to circuit boards
US5399903A (en) * 1990-08-15 1995-03-21 Lsi Logic Corporation Semiconductor device having an universal die size inner lead layout
FR2666173A1 (fr) * 1990-08-21 1992-02-28 Thomson Csf Structure hybride d'interconnexion de circuits integres et procede de fabrication.
US5057969A (en) * 1990-09-07 1991-10-15 International Business Machines Corporation Thin film electronic device
US5258330A (en) * 1990-09-24 1993-11-02 Tessera, Inc. Semiconductor chip assemblies with fan-in leads
US5679977A (en) * 1990-09-24 1997-10-21 Tessera, Inc. Semiconductor chip assemblies, methods of making same and components for same
US5148265A (en) 1990-09-24 1992-09-15 Ist Associates, Inc. Semiconductor chip assemblies with fan-in leads
US7198969B1 (en) 1990-09-24 2007-04-03 Tessera, Inc. Semiconductor chip assemblies, methods of making same and components for same
US5148266A (en) * 1990-09-24 1992-09-15 Ist Associates, Inc. Semiconductor chip assemblies having interposer and flexible lead
JPH04170811A (ja) * 1990-11-05 1992-06-18 Fujitsu Ltd 弾性表面波デバイス
US5233504A (en) * 1990-12-06 1993-08-03 Motorola, Inc. Noncollapsing multisolder interconnection
US5154341A (en) * 1990-12-06 1992-10-13 Motorola Inc. Noncollapsing multisolder interconnection
US5220200A (en) * 1990-12-10 1993-06-15 Delco Electronics Corporation Provision of substrate pillars to maintain chip standoff
US5157480A (en) * 1991-02-06 1992-10-20 Motorola, Inc. Semiconductor device having dual electrical contact sites
US5148968A (en) * 1991-02-11 1992-09-22 Motorola, Inc. Solder bump stretch device
US5266520A (en) * 1991-02-11 1993-11-30 International Business Machines Corporation Electronic packaging with varying height connectors
KR920022482A (ko) * 1991-05-09 1992-12-19 가나이 쯔도무 전자부품 탑재모듈
US5194137A (en) * 1991-08-05 1993-03-16 Motorola Inc. Solder plate reflow method for forming solder-bumped terminals
US5160409A (en) * 1991-08-05 1992-11-03 Motorola, Inc. Solder plate reflow method for forming a solder bump on a circuit trace intersection
US5203075A (en) * 1991-08-12 1993-04-20 Inernational Business Machines Method of bonding flexible circuit to cicuitized substrate to provide electrical connection therebetween using different solders
US5133495A (en) * 1991-08-12 1992-07-28 International Business Machines Corporation Method of bonding flexible circuit to circuitized substrate to provide electrical connection therebetween
US5249098A (en) * 1991-08-22 1993-09-28 Lsi Logic Corporation Semiconductor device package with solder bump electrical connections on an external surface of the package
JP2555811B2 (ja) * 1991-09-10 1996-11-20 富士通株式会社 半導体チップのフリップチップ接合方法
CA2077161A1 (en) * 1991-09-13 1993-03-14 Thomas W. Fitzgerald Method of establishing soldered connections
US5186383A (en) * 1991-10-02 1993-02-16 Motorola, Inc. Method for forming solder bump interconnections to a solder-plated circuit trace
CA2128534C (en) * 1992-01-28 2003-01-07 Anthony David Welbourn Alignment of integrated optical components
US5338208A (en) * 1992-02-04 1994-08-16 International Business Machines Corporation High density electronic connector and method of assembly
US5434750A (en) * 1992-02-07 1995-07-18 Lsi Logic Corporation Partially-molded, PCB chip carrier package for certain non-square die shapes
JP3215424B2 (ja) * 1992-03-24 2001-10-09 ユニシス・コーポレイション 微細自己整合特性を有する集積回路モジュール
US5269453A (en) * 1992-04-02 1993-12-14 Motorola, Inc. Low temperature method for forming solder bump interconnections to a plated circuit trace
US5324892A (en) * 1992-08-07 1994-06-28 International Business Machines Corporation Method of fabricating an electronic interconnection
US5334804A (en) * 1992-11-17 1994-08-02 Fujitsu Limited Wire interconnect structures for connecting an integrated circuit to a substrate
JP2716336B2 (ja) * 1993-03-10 1998-02-18 日本電気株式会社 集積回路装置
US5329423A (en) * 1993-04-13 1994-07-12 Scholz Kenneth D Compressive bump-and-socket interconnection scheme for integrated circuits
US5767580A (en) * 1993-04-30 1998-06-16 Lsi Logic Corporation Systems having shaped, self-aligning micro-bump structures
US5616206A (en) * 1993-06-15 1997-04-01 Ricoh Company, Ltd. Method for arranging conductive particles on electrodes of substrate
US5438477A (en) * 1993-08-12 1995-08-01 Lsi Logic Corporation Die-attach technique for flip-chip style mounting of semiconductor dies
JP3194553B2 (ja) * 1993-08-13 2001-07-30 富士通株式会社 半導体装置の製造方法
US5388327A (en) * 1993-09-15 1995-02-14 Lsi Logic Corporation Fabrication of a dissolvable film carrier containing conductive bump contacts for placement on a semiconductor device package
US5591941A (en) * 1993-10-28 1997-01-07 International Business Machines Corporation Solder ball interconnected assembly
US7084656B1 (en) 1993-11-16 2006-08-01 Formfactor, Inc. Probe for semiconductor devices
US20020053734A1 (en) 1993-11-16 2002-05-09 Formfactor, Inc. Probe card assembly and kit, and methods of making same
US5820014A (en) 1993-11-16 1998-10-13 Form Factor, Inc. Solder preforms
US7200930B2 (en) 1994-11-15 2007-04-10 Formfactor, Inc. Probe for semiconductor devices
US7073254B2 (en) * 1993-11-16 2006-07-11 Formfactor, Inc. Method for mounting a plurality of spring contact elements
US5471011A (en) * 1994-05-26 1995-11-28 Ak Technology, Inc. Homogeneous thermoplastic semi-conductor chip carrier package
US5466635A (en) * 1994-06-02 1995-11-14 Lsi Logic Corporation Process for making an interconnect bump for flip-chip integrated circuit including integral standoff and hourglass shaped solder coating
US5700715A (en) * 1994-06-14 1997-12-23 Lsi Logic Corporation Process for mounting a semiconductor device to a circuit substrate
US5657206A (en) * 1994-06-23 1997-08-12 Cubic Memory, Inc. Conductive epoxy flip-chip package and method
US6848173B2 (en) 1994-07-07 2005-02-01 Tessera, Inc. Microelectric packages having deformed bonded leads and methods therefor
US6486003B1 (en) * 1996-12-13 2002-11-26 Tessera, Inc. Expandable interposer for a microelectronic package and method therefor
US5539153A (en) * 1994-08-08 1996-07-23 Hewlett-Packard Company Method of bumping substrates by contained paste deposition
US5567648A (en) * 1994-08-29 1996-10-22 Motorola, Inc. Process for providing interconnect bumps on a bonding pad by application of a sheet of conductive discs
US5542174A (en) * 1994-09-15 1996-08-06 Intel Corporation Method and apparatus for forming solder balls and solder columns
US5915170A (en) * 1994-09-20 1999-06-22 Tessera, Inc. Multiple part compliant interface for packaging of a semiconductor chip and method therefor
US5726861A (en) * 1995-01-03 1998-03-10 Ostrem; Fred E. Surface mount component height control
US5665989A (en) * 1995-01-03 1997-09-09 Lsi Logic Programmable microsystems in silicon
US5573171A (en) * 1995-02-16 1996-11-12 Trw Inc. Method of thin film patterning by reflow
US6388203B1 (en) 1995-04-04 2002-05-14 Unitive International Limited Controlled-shaped solder reservoirs for increasing the volume of solder bumps, and structures formed thereby
KR100425750B1 (ko) 1995-04-05 2004-07-16 유나이티브 인터내셔널 리미티드 마이크로일렉트로닉 기판용 솔더범프구조체
US5874782A (en) * 1995-08-24 1999-02-23 International Business Machines Corporation Wafer with elevated contact structures
US5770889A (en) * 1995-12-29 1998-06-23 Lsi Logic Corporation Systems having advanced pre-formed planar structures
US5994152A (en) 1996-02-21 1999-11-30 Formfactor, Inc. Fabricating interconnects and tips using sacrificial substrates
US8033838B2 (en) 1996-02-21 2011-10-11 Formfactor, Inc. Microelectronic contact structure
US6030856A (en) 1996-06-10 2000-02-29 Tessera, Inc. Bondable compliant pads for packaging of a semiconductor chip and method therefor
US6395991B1 (en) * 1996-07-29 2002-05-28 International Business Machines Corporation Column grid array substrate attachment with heat sink stress relief
JPH1070153A (ja) * 1996-08-26 1998-03-10 Hitachi Ltd 電子部品の接続方法
US5829668A (en) * 1996-09-03 1998-11-03 Motorola Corporation Method for forming solder bumps on bond pads
JP3553300B2 (ja) * 1996-12-02 2004-08-11 富士通株式会社 半導体装置の製造方法及び半導体装置の実装方法
US6686015B2 (en) 1996-12-13 2004-02-03 Tessera, Inc. Transferable resilient element for packaging of a semiconductor chip and method therefor
US5937276A (en) 1996-12-13 1999-08-10 Tessera, Inc. Bonding lead structure with enhanced encapsulation
US5957370A (en) * 1997-01-10 1999-09-28 Integrated Device Technology, Inc. Plating process for fine pitch die in wafer form
US6330967B1 (en) 1997-03-13 2001-12-18 International Business Machines Corporation Process to produce a high temperature interconnection
US5859474A (en) * 1997-04-23 1999-01-12 Lsi Logic Corporation Reflow ball grid array assembly
US7288471B2 (en) * 1997-05-27 2007-10-30 Mackay John Bumping electronic components using transfer substrates
US6293456B1 (en) 1997-05-27 2001-09-25 Spheretek, Llc Methods for forming solder balls on substrates
US7842599B2 (en) * 1997-05-27 2010-11-30 Wstp, Llc Bumping electronic components using transfer substrates
US7007833B2 (en) 1997-05-27 2006-03-07 Mackay John Forming solder balls on substrates
US7819301B2 (en) * 1997-05-27 2010-10-26 Wstp, Llc Bumping electronic components using transfer substrates
US6609652B2 (en) 1997-05-27 2003-08-26 Spheretek, Llc Ball bumping substrates, particuarly wafers
US7654432B2 (en) 1997-05-27 2010-02-02 Wstp, Llc Forming solder balls on substrates
US6195268B1 (en) * 1997-06-09 2001-02-27 Floyd K. Eide Stacking layers containing enclosed IC chips
US6096576A (en) * 1997-09-02 2000-08-01 Silicon Light Machines Method of producing an electrical interface to an integrated circuit device having high density I/O count
US6335222B1 (en) * 1997-09-18 2002-01-01 Tessera, Inc. Microelectronic packages with solder interconnections
US6324069B1 (en) * 1997-10-29 2001-11-27 Hestia Technologies, Inc. Chip package with molded underfill
US6495083B2 (en) 1997-10-29 2002-12-17 Hestia Technologies, Inc. Method of underfilling an integrated circuit chip
US5984164A (en) * 1997-10-31 1999-11-16 Micron Technology, Inc. Method of using an electrically conductive elevation shaping tool
US6059173A (en) 1998-03-05 2000-05-09 International Business Machines Corporation Micro grid array solder interconnection structure for second level packaging joining a module and printed circuit board
US5923955A (en) * 1998-05-28 1999-07-13 Xerox Corporation Fine flip chip interconnection
US6070782A (en) * 1998-07-09 2000-06-06 International Business Machines Corporation Socketable bump grid array shaped-solder on copper spheres
US6872984B1 (en) 1998-07-29 2005-03-29 Silicon Light Machines Corporation Method of sealing a hermetic lid to a semiconductor die at an angle
US6303986B1 (en) 1998-07-29 2001-10-16 Silicon Light Machines Method of and apparatus for sealing an hermetic lid to a semiconductor die
US6713238B1 (en) 1998-10-09 2004-03-30 Stephen Y. Chou Microscale patterning and articles formed thereby
AU1444800A (en) * 1998-10-09 2000-05-01 Trustees Of Princeton University, The Microscale patterning and articles formed thereby
US6177729B1 (en) 1999-04-03 2001-01-23 International Business Machines Corporation Rolling ball connector
SE523164C2 (sv) * 1999-05-17 2004-03-30 Ericsson Telefon Ab L M Monteringsarrangemang för halvledarelement med lödkulor för inriktning till mottagande yta
US6274474B1 (en) 1999-10-25 2001-08-14 International Business Machines Corporation Method of forming BGA interconnections having mixed solder profiles
US6410861B1 (en) * 1999-12-03 2002-06-25 Motorola, Inc. Low profile interconnect structure
US6956878B1 (en) 2000-02-07 2005-10-18 Silicon Light Machines Corporation Method and apparatus for reducing laser speckle using polarization averaging
DE60108413T2 (de) 2000-11-10 2005-06-02 Unitive Electronics, Inc. Verfahren zum positionieren von komponenten mit hilfe flüssiger antriebsmittel und strukturen hierfür
US6863209B2 (en) 2000-12-15 2005-03-08 Unitivie International Limited Low temperature methods of bonding components
US7177081B2 (en) 2001-03-08 2007-02-13 Silicon Light Machines Corporation High contrast grating light valve type device
US6707591B2 (en) 2001-04-10 2004-03-16 Silicon Light Machines Angled illumination for a single order light modulator based projection system
US20030087477A1 (en) * 2001-05-02 2003-05-08 Tomohiro Kawashima Repairable flip clip semiconductor device with excellent packaging reliability and method of manufacturing same
US6865346B1 (en) 2001-06-05 2005-03-08 Silicon Light Machines Corporation Fiber optic transceiver
KR100443504B1 (ko) * 2001-06-12 2004-08-09 주식회사 하이닉스반도체 볼 그리드 어레이 패키지 구조 및 그 제조방법
US6683375B2 (en) 2001-06-15 2004-01-27 Fairchild Semiconductor Corporation Semiconductor die including conductive columns
US6782205B2 (en) 2001-06-25 2004-08-24 Silicon Light Machines Method and apparatus for dynamic equalization in wavelength division multiplexing
US6747781B2 (en) 2001-06-25 2004-06-08 Silicon Light Machines, Inc. Method, apparatus, and diffuser for reducing laser speckle
US6829092B2 (en) 2001-08-15 2004-12-07 Silicon Light Machines, Inc. Blazed grating light valve
US6930364B2 (en) 2001-09-13 2005-08-16 Silicon Light Machines Corporation Microelectronic mechanical system and methods
US6956995B1 (en) 2001-11-09 2005-10-18 Silicon Light Machines Corporation Optical communication arrangement
US6813162B2 (en) * 2001-11-16 2004-11-02 Hewlett-Packard Development Company, L.P. Method and apparatus for supporting circuit component having solder column array interconnects using interposed support shims
US6809937B2 (en) * 2001-11-16 2004-10-26 Hewlett-Packard Development Company, L.P. Method and apparatus for shock and vibration isolation of a circuit component
US6710264B2 (en) * 2001-11-16 2004-03-23 Hewlett-Packard Development Company, L.P. Method and apparatus for supporting a circuit component having solder column interconnects using external support
US6541710B1 (en) * 2001-11-16 2003-04-01 Hewlett-Packard Company Method and apparatus of supporting circuit component having a solder column array using interspersed rigid columns
US6800238B1 (en) 2002-01-15 2004-10-05 Silicon Light Machines, Inc. Method for domain patterning in low coercive field ferroelectrics
US6908845B2 (en) * 2002-03-28 2005-06-21 Intel Corporation Integrated circuit die and an electronic assembly having a three-dimensional interconnection scheme
US20030183943A1 (en) * 2002-03-28 2003-10-02 Swan Johanna M. Integrated circuit die and an electronic assembly having a three-dimensional interconnection scheme
US6848177B2 (en) 2002-03-28 2005-02-01 Intel Corporation Integrated circuit die and an electronic assembly having a three-dimensional interconnection scheme
US6600661B1 (en) 2002-04-08 2003-07-29 Hewlett-Packard Development Company, L.P. Method and apparatus for supporting a circuit component
US6767751B2 (en) 2002-05-28 2004-07-27 Silicon Light Machines, Inc. Integrated driver process flow
US6728023B1 (en) 2002-05-28 2004-04-27 Silicon Light Machines Optical device arrays with optimized image resolution
US7054515B1 (en) 2002-05-30 2006-05-30 Silicon Light Machines Corporation Diffractive light modulator-based dynamic equalizer with integrated spectral monitor
US6822797B1 (en) 2002-05-31 2004-11-23 Silicon Light Machines, Inc. Light modulator structure for producing high-contrast operation using zero-order light
WO2004001837A2 (en) 2002-06-25 2003-12-31 Unitive International Limited Methods of forming electronic structures including conductive shunt layers and related structures
US7531898B2 (en) 2002-06-25 2009-05-12 Unitive International Limited Non-Circular via holes for bumping pads and related structures
US7547623B2 (en) 2002-06-25 2009-06-16 Unitive International Limited Methods of forming lead free solder bumps
US6829258B1 (en) 2002-06-26 2004-12-07 Silicon Light Machines, Inc. Rapidly tunable external cavity laser
US6714337B1 (en) 2002-06-28 2004-03-30 Silicon Light Machines Method and device for modulating a light beam and having an improved gamma response
US6908201B2 (en) 2002-06-28 2005-06-21 Silicon Light Machines Corporation Micro-support structures
US6813059B2 (en) 2002-06-28 2004-11-02 Silicon Light Machines, Inc. Reduced formation of asperities in contact micro-structures
US7057795B2 (en) 2002-08-20 2006-06-06 Silicon Light Machines Corporation Micro-structures with individually addressable ribbon pairs
US6801354B1 (en) 2002-08-20 2004-10-05 Silicon Light Machines, Inc. 2-D diffraction grating for substantially eliminating polarization dependent losses
US6712480B1 (en) 2002-09-27 2004-03-30 Silicon Light Machines Controlled curvature of stressed micro-structures
US6928207B1 (en) 2002-12-12 2005-08-09 Silicon Light Machines Corporation Apparatus for selectively blocking WDM channels
US6987600B1 (en) 2002-12-17 2006-01-17 Silicon Light Machines Corporation Arbitrary phase profile for better equalization in dynamic gain equalizer
US7057819B1 (en) 2002-12-17 2006-06-06 Silicon Light Machines Corporation High contrast tilting ribbon blazed grating
US6953956B2 (en) * 2002-12-18 2005-10-11 Easic Corporation Semiconductor device having borderless logic array and flexible I/O
US6934070B1 (en) 2002-12-18 2005-08-23 Silicon Light Machines Corporation Chirped optical MEM device
US6927891B1 (en) 2002-12-23 2005-08-09 Silicon Light Machines Corporation Tilt-able grating plane for improved crosstalk in 1×N blaze switches
US7068372B1 (en) 2003-01-28 2006-06-27 Silicon Light Machines Corporation MEMS interferometer-based reconfigurable optical add-and-drop multiplexor
US20040147169A1 (en) 2003-01-28 2004-07-29 Allison Jeffrey W. Power connector with safety feature
US7286764B1 (en) 2003-02-03 2007-10-23 Silicon Light Machines Corporation Reconfigurable modulator-based optical add-and-drop multiplexer
US6947613B1 (en) 2003-02-11 2005-09-20 Silicon Light Machines Corporation Wavelength selective switch and equalizer
US6922272B1 (en) 2003-02-14 2005-07-26 Silicon Light Machines Corporation Method and apparatus for leveling thermal stress variations in multi-layer MEMS devices
TWI225899B (en) 2003-02-18 2005-01-01 Unitive Semiconductor Taiwan C Etching solution and method for manufacturing conductive bump using the etching solution to selectively remove barrier layer
US7391973B1 (en) 2003-02-28 2008-06-24 Silicon Light Machines Corporation Two-stage gain equalizer
US6806997B1 (en) 2003-02-28 2004-10-19 Silicon Light Machines, Inc. Patterned diffractive light modulator ribbon for PDL reduction
US7027202B1 (en) 2003-02-28 2006-04-11 Silicon Light Machines Corp Silicon substrate as a light modulator sacrificial layer
US6829077B1 (en) 2003-02-28 2004-12-07 Silicon Light Machines, Inc. Diffractive light modulator with dynamically rotatable diffraction plane
US6922273B1 (en) 2003-02-28 2005-07-26 Silicon Light Machines Corporation PDL mitigation structure for diffractive MEMS and gratings
US7042611B1 (en) 2003-03-03 2006-05-09 Silicon Light Machines Corporation Pre-deflected bias ribbons
US7239023B2 (en) * 2003-09-24 2007-07-03 Tai-Saw Technology Co., Ltd. Package assembly for electronic device
US7049216B2 (en) * 2003-10-14 2006-05-23 Unitive International Limited Methods of providing solder structures for out plane connections
US6890795B1 (en) * 2003-12-30 2005-05-10 Agency For Science, Technology And Research Wafer level super stretch solder
US7458839B2 (en) 2006-02-21 2008-12-02 Fci Americas Technology, Inc. Electrical connectors having power contacts with alignment and/or restraining features
EP1702389B1 (en) 2003-12-31 2020-12-09 Amphenol FCI Asia Pte. Ltd. Electrical power contacts and connectors comprising same
US7095105B2 (en) * 2004-03-23 2006-08-22 Texas Instruments Incorporated Vertically stacked semiconductor device
US7358174B2 (en) 2004-04-13 2008-04-15 Amkor Technology, Inc. Methods of forming solder bumps on exposed metal pads
US7214104B2 (en) 2004-09-14 2007-05-08 Fci Americas Technology, Inc. Ball grid array connector
US7476108B2 (en) 2004-12-22 2009-01-13 Fci Americas Technology, Inc. Electrical power connectors with cooling features
US7226296B2 (en) * 2004-12-23 2007-06-05 Fci Americas Technology, Inc. Ball grid array contacts with spring action
US7384289B2 (en) 2005-01-31 2008-06-10 Fci Americas Technology, Inc. Surface-mount connector
US7303427B2 (en) 2005-04-05 2007-12-04 Fci Americas Technology, Inc. Electrical connector with air-circulation features
US7160757B2 (en) * 2005-04-25 2007-01-09 Intel Corporation Gap control between interposer and substrate in electronic assemblies
US20070040565A1 (en) * 2005-08-19 2007-02-22 National University of Singapore, Agency For Science, Technology and Research Compliant probes and test methodology for fine pitch wafer level devices and interconnects
US7745301B2 (en) * 2005-08-22 2010-06-29 Terapede, Llc Methods and apparatus for high-density chip connectivity
US8957511B2 (en) * 2005-08-22 2015-02-17 Madhukar B. Vora Apparatus and methods for high-density chip connectivity
US20070045807A1 (en) * 2005-09-01 2007-03-01 Micron Technology, Inc. Microelectronic devices and methods for manufacturing microelectronic devices
US7674701B2 (en) 2006-02-08 2010-03-09 Amkor Technology, Inc. Methods of forming metal layers using multi-layer lift-off patterns
US7932615B2 (en) 2006-02-08 2011-04-26 Amkor Technology, Inc. Electronic devices including solder bumps on compliant dielectric layers
US20080036100A1 (en) * 2006-05-17 2008-02-14 Tessera, Inc. Solder elements with columnar structures and methods of making the same
US7425145B2 (en) 2006-05-26 2008-09-16 Fci Americas Technology, Inc. Connectors and contacts for transmitting electrical power
US7726982B2 (en) 2006-06-15 2010-06-01 Fci Americas Technology, Inc. Electrical connectors with air-circulation features
TWI346826B (en) * 2006-10-26 2011-08-11 Taiwan Tft Lcd Ass Bonding structure and method of fabricating the same
US7641500B2 (en) 2007-04-04 2010-01-05 Fci Americas Technology, Inc. Power cable connector system
US7905731B2 (en) 2007-05-21 2011-03-15 Fci Americas Technology, Inc. Electrical connector with stress-distribution features
US7762857B2 (en) 2007-10-01 2010-07-27 Fci Americas Technology, Inc. Power connectors with contact-retention features
US8062051B2 (en) 2008-07-29 2011-11-22 Fci Americas Technology Llc Electrical communication system having latching and strain relief features
USD608293S1 (en) 2009-01-16 2010-01-19 Fci Americas Technology, Inc. Vertical electrical connector
USD664096S1 (en) 2009-01-16 2012-07-24 Fci Americas Technology Llc Vertical electrical connector
USD610548S1 (en) 2009-01-16 2010-02-23 Fci Americas Technology, Inc. Right-angle electrical connector
USD606496S1 (en) 2009-01-16 2009-12-22 Fci Americas Technology, Inc. Right-angle electrical connector
USD606497S1 (en) 2009-01-16 2009-12-22 Fci Americas Technology, Inc. Vertical electrical connector
USD640637S1 (en) * 2009-01-16 2011-06-28 Fci Americas Technology Llc Vertical electrical connector
USD619099S1 (en) 2009-01-30 2010-07-06 Fci Americas Technology, Inc. Electrical connector
US8323049B2 (en) 2009-01-30 2012-12-04 Fci Americas Technology Llc Electrical connector having power contacts
US8366485B2 (en) 2009-03-19 2013-02-05 Fci Americas Technology Llc Electrical connector having ribbed ground plate
USD618180S1 (en) 2009-04-03 2010-06-22 Fci Americas Technology, Inc. Asymmetrical electrical connector
USD618181S1 (en) 2009-04-03 2010-06-22 Fci Americas Technology, Inc. Asymmetrical electrical connector
US8296940B2 (en) * 2010-04-19 2012-10-30 General Electric Company Method of forming a micro pin hybrid interconnect array
KR101712043B1 (ko) * 2010-10-14 2017-03-03 삼성전자주식회사 적층 반도체 패키지, 상기 적층 반도체 패키지를 포함하는 반도체 장치 및 상기 적층 반도체 패키지의 제조 방법
US20120267779A1 (en) * 2011-04-25 2012-10-25 Mediatek Inc. Semiconductor package
US10096540B2 (en) * 2011-05-13 2018-10-09 STATS ChipPAC Pte. Ltd. Semiconductor device and method of forming dummy pillars between semiconductor die and substrate for maintaining standoff distance
EP2624034A1 (en) 2012-01-31 2013-08-07 Fci Dismountable optical coupling device
US9257778B2 (en) 2012-04-13 2016-02-09 Fci Americas Technology High speed electrical connector
USD718253S1 (en) 2012-04-13 2014-11-25 Fci Americas Technology Llc Electrical cable connector
USD727268S1 (en) 2012-04-13 2015-04-21 Fci Americas Technology Llc Vertical electrical connector
US8944831B2 (en) 2012-04-13 2015-02-03 Fci Americas Technology Llc Electrical connector having ribbed ground plate with engagement members
USD727852S1 (en) 2012-04-13 2015-04-28 Fci Americas Technology Llc Ground shield for a right angle electrical connector
US9543703B2 (en) 2012-07-11 2017-01-10 Fci Americas Technology Llc Electrical connector with reduced stack height
USD751507S1 (en) 2012-07-11 2016-03-15 Fci Americas Technology Llc Electrical connector
US8970035B2 (en) 2012-08-31 2015-03-03 Taiwan Semiconductor Manufacturing Company, Ltd. Bump structures for semiconductor package
US8941236B2 (en) 2012-09-28 2015-01-27 Intel Corporation Using collapse limiter structures between elements to reduce solder bump bridging
USD745852S1 (en) 2013-01-25 2015-12-22 Fci Americas Technology Llc Electrical connector
USD720698S1 (en) 2013-03-15 2015-01-06 Fci Americas Technology Llc Electrical cable connector
US20190206821A1 (en) * 2017-12-29 2019-07-04 Intel Corporation Substrate assembly with spacer element
TWI736859B (zh) * 2019-03-18 2021-08-21 矽品精密工業股份有限公司 電子封裝件及其製法
DE102021103360A1 (de) * 2021-02-05 2022-08-11 Few Fahrzeugelektrik Werk Gmbh & Co. Kg Verfahren zur Herstellung einer Vorverzinnungsanordnung und derartige Vorverzinnungsanordnung
CN113745169B (zh) * 2021-07-23 2023-10-24 中国电子科技集团公司第二十九研究所 多腔槽ltcc基板与封装盒体焊接结构及方法

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3401126A (en) * 1965-06-18 1968-09-10 Ibm Method of rendering noble metal conductive composition non-wettable by solder
US3429040A (en) * 1965-06-18 1969-02-25 Ibm Method of joining a component to a substrate
US3458925A (en) * 1966-01-20 1969-08-05 Ibm Method of forming solder mounds on substrates
US3486223A (en) * 1967-04-27 1969-12-30 Philco Ford Corp Solder bonding
US3621565A (en) * 1969-06-12 1971-11-23 Nasa Fabrication of single-crystal film semiconductor devices
US3871015A (en) * 1969-08-14 1975-03-11 Ibm Flip chip module with non-uniform connector joints
US3591839A (en) * 1969-08-27 1971-07-06 Siliconix Inc Micro-electronic circuit with novel hermetic sealing structure and method of manufacture
US3811186A (en) * 1972-12-11 1974-05-21 Ibm Method of aligning and attaching circuit devices on a substrate
US3997963A (en) * 1973-06-29 1976-12-21 Ibm Corporation Novel beam-lead integrated circuit structure and method for making the same including automatic registration of beam-leads with corresponding dielectric substrate leads
US3921285A (en) * 1974-07-15 1975-11-25 Ibm Method for joining microminiature components to a carrying structure
FR2378354A1 (fr) * 1977-01-19 1978-08-18 Alsthom Atlantique Procede de fabrication de semiconducteurs de puissance a contacts presses
NL7704770A (nl) * 1977-05-02 1978-11-06 Philips Nv Werkwijze voor het aanbrengen van afstandstukjes op een isolerend substraat.
JPS5678356U (ja) * 1979-11-12 1981-06-25
JPS58157146A (ja) * 1982-03-12 1983-09-19 Fujitsu Ltd 半導体装置
FR2612617B1 (fr) * 1987-03-16 1992-07-10 Bergounhon Rene Four pour deshydrater pulverulents, sables et granulats

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EP0147576A1 (en) 1985-07-10

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