JPH0315335B2 - - Google Patents

Info

Publication number
JPH0315335B2
JPH0315335B2 JP58044690A JP4469083A JPH0315335B2 JP H0315335 B2 JPH0315335 B2 JP H0315335B2 JP 58044690 A JP58044690 A JP 58044690A JP 4469083 A JP4469083 A JP 4469083A JP H0315335 B2 JPH0315335 B2 JP H0315335B2
Authority
JP
Japan
Prior art keywords
amorphous silicon
type
silicon carbide
silane
forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58044690A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58190814A (ja
Inventor
Yoshihiro Hamakawa
Yoshihisa Oowada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kanegafuchi Chemical Industry Co Ltd
Original Assignee
Kanegafuchi Chemical Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kanegafuchi Chemical Industry Co Ltd filed Critical Kanegafuchi Chemical Industry Co Ltd
Priority to JP58044690A priority Critical patent/JPS58190814A/ja
Publication of JPS58190814A publication Critical patent/JPS58190814A/ja
Publication of JPH0315335B2 publication Critical patent/JPH0315335B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/32—Carbides
    • C23C16/325—Silicon carbide

Landscapes

  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Carbon And Carbon Compounds (AREA)
  • Photovoltaic Devices (AREA)
JP58044690A 1983-03-16 1983-03-16 アモルフアスシリコンカ−バイドの製造方法 Granted JPS58190814A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58044690A JPS58190814A (ja) 1983-03-16 1983-03-16 アモルフアスシリコンカ−バイドの製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58044690A JPS58190814A (ja) 1983-03-16 1983-03-16 アモルフアスシリコンカ−バイドの製造方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP55181150A Division JPS57104276A (en) 1980-02-04 1980-12-19 Amorphous silicon thin film photoelectric element

Publications (2)

Publication Number Publication Date
JPS58190814A JPS58190814A (ja) 1983-11-07
JPH0315335B2 true JPH0315335B2 (fr) 1991-02-28

Family

ID=12698413

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58044690A Granted JPS58190814A (ja) 1983-03-16 1983-03-16 アモルフアスシリコンカ−バイドの製造方法

Country Status (1)

Country Link
JP (1) JPS58190814A (fr)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2628034B2 (ja) * 1985-05-01 1997-07-09 株式会社小松製作所 アモルファスシリコンｐｉｎダイオードの製造法
JPH0611676U (ja) * 1992-04-30 1994-02-15 敬二 石井 家庭用ハム切断具

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4109271A (en) * 1977-05-27 1978-08-22 Rca Corporation Amorphous silicon-amorphous silicon carbide photovoltaic device

Also Published As

Publication number Publication date
JPS58190814A (ja) 1983-11-07

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