JPS58190814A - アモルフアスシリコンカ−バイドの製造方法 - Google Patents

アモルフアスシリコンカ−バイドの製造方法

Info

Publication number
JPS58190814A
JPS58190814A JP58044690A JP4469083A JPS58190814A JP S58190814 A JPS58190814 A JP S58190814A JP 58044690 A JP58044690 A JP 58044690A JP 4469083 A JP4469083 A JP 4469083A JP S58190814 A JPS58190814 A JP S58190814A
Authority
JP
Japan
Prior art keywords
amorphous silicon
type
substrate
silane
silicon carbide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58044690A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0315335B2 (fr
Inventor
Yoshihiro Hamakawa
圭弘 浜川
Yoshihisa Owada
善久 太和田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kanegafuchi Chemical Industry Co Ltd
Original Assignee
Kanegafuchi Chemical Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kanegafuchi Chemical Industry Co Ltd filed Critical Kanegafuchi Chemical Industry Co Ltd
Priority to JP58044690A priority Critical patent/JPS58190814A/ja
Publication of JPS58190814A publication Critical patent/JPS58190814A/ja
Publication of JPH0315335B2 publication Critical patent/JPH0315335B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/32—Carbides
    • C23C16/325—Silicon carbide

Landscapes

  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Carbon And Carbon Compounds (AREA)
  • Photovoltaic Devices (AREA)
JP58044690A 1983-03-16 1983-03-16 アモルフアスシリコンカ−バイドの製造方法 Granted JPS58190814A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58044690A JPS58190814A (ja) 1983-03-16 1983-03-16 アモルフアスシリコンカ−バイドの製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58044690A JPS58190814A (ja) 1983-03-16 1983-03-16 アモルフアスシリコンカ−バイドの製造方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP55181150A Division JPS57104276A (en) 1980-02-04 1980-12-19 Amorphous silicon thin film photoelectric element

Publications (2)

Publication Number Publication Date
JPS58190814A true JPS58190814A (ja) 1983-11-07
JPH0315335B2 JPH0315335B2 (fr) 1991-02-28

Family

ID=12698413

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58044690A Granted JPS58190814A (ja) 1983-03-16 1983-03-16 アモルフアスシリコンカ−バイドの製造方法

Country Status (1)

Country Link
JP (1) JPS58190814A (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61252625A (ja) * 1985-05-01 1986-11-10 Komatsu Ltd アモルフアスシリコンｐｉｎダイオ−ドの製造法
JPH0611676U (ja) * 1992-04-30 1994-02-15 敬二 石井 家庭用ハム切断具

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4109271A (en) * 1977-05-27 1978-08-22 Rca Corporation Amorphous silicon-amorphous silicon carbide photovoltaic device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4109271A (en) * 1977-05-27 1978-08-22 Rca Corporation Amorphous silicon-amorphous silicon carbide photovoltaic device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61252625A (ja) * 1985-05-01 1986-11-10 Komatsu Ltd アモルフアスシリコンｐｉｎダイオ−ドの製造法
JPH0611676U (ja) * 1992-04-30 1994-02-15 敬二 石井 家庭用ハム切断具

Also Published As

Publication number Publication date
JPH0315335B2 (fr) 1991-02-28

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