JPH03183601A - Production of oxide superconducting film - Google Patents

Production of oxide superconducting film

Info

Publication number
JPH03183601A
JPH03183601A JP1317618A JP31761889A JPH03183601A JP H03183601 A JPH03183601 A JP H03183601A JP 1317618 A JP1317618 A JP 1317618A JP 31761889 A JP31761889 A JP 31761889A JP H03183601 A JPH03183601 A JP H03183601A
Authority
JP
Japan
Prior art keywords
film
superconducting
crystal
single crystal
mgo
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1317618A
Other languages
Japanese (ja)
Inventor
Yasuhiro Nagai
靖浩 永井
浩二 ▲つる▼
Koji Tsuru
Yasuhiro Koshimoto
越本 泰弘
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NTT Inc
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP1317618A priority Critical patent/JPH03183601A/en
Publication of JPH03183601A publication Critical patent/JPH03183601A/en
Pending legal-status Critical Current

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Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E40/00Technologies for an efficient electrical power generation, transmission or distribution
    • Y02E40/60Superconducting electric elements or equipment; Power systems integrating superconducting elements or equipment

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  • Inorganic Compounds Of Heavy Metals (AREA)
  • Superconductors And Manufacturing Methods Therefor (AREA)
  • Oxygen, Ozone, And Oxides In General (AREA)

Abstract

PURPOSE:To obtain a high performance superconducting device utilizing the advantages of an oxide superconducting film by forming an oxide superconducting film on an MgO (110) single crystal substrate, coating the surface of the film with an MgO (110) single crystal and carrying out heat treatment. CONSTITUTION:A thin Bi-Sr-Ca-Cu oxide film 2 is deposited on a mirror pol ished MgO (110) single crystal substrate 1 by a vapor growth method or other method. The surface of the film 2 is coated with a mirror polished MgO (110) single crystal sheet 3 and heat treatment is carried out in an oxygen atmosphere. After this heat treatment, the sheet 3 is removed. The film 2 is converted into an oxide superconducting film for a superconducting device.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は小型にして超高感度、超高速、高効率な超伝導
デバイスの基本構成要素である酸化物超伝導膜の製造方
法に関するものである。
[Detailed Description of the Invention] [Field of Industrial Application] The present invention relates to a method for manufacturing an oxide superconducting film, which is a basic component of a compact, ultra-sensitive, ultra-high speed, and highly efficient superconducting device. be.

(従来の技術) 超伝導性を利用したデバイスには、(1)キャビティ、
フィルタ等に代表される超伝導高周波部品、(2)SQ
υI[)等に代表される超伝導センサー、等がある。例
えば、フィルタ、コイルなどの2次元的な薄膜デバイス
では面内等方向な超伝導特性が要求され、同時に信号線
接続領域では厚さ方向にも同等の超伝導特性が望ましい
。また、超伝導センサーに用いられるトンネル接合領域
では厚さ方向に長いコヒーレンス長が要求される。第5
図はBi25r2Ca2Cu30x超伝導膜における結
晶の単位格子と結晶方位の関係を示した図である。酸化
物超伝導膜は金属系超伝導膜に比べ、臨界温度は著しく
高いという利点を有するものの、第5図のような層状構
造をとるため結晶方位によってその超伝導特性は大きく
異なるという問題がある。例えば、層面内(a、b軸方
向)はコヒーレンス長も33−4nと長く超伝導電流も
流れやすい、反面、層に鉛直方向(C軸方向)は0.2
−0.5nmと短く超伝導電流も流れにくい。そのため
、面内等方法が要求される薄膜デバイスでは膜厚方向を
C軸とする結晶配向膜(C軸配向膜と称する)がベース
となるが、信号線接続、並びにトンネル接合等を考慮す
れば、膜厚方向をa、b軸とする微少な結晶が一定の割
合で混在し、膜面内並びに膜厚方向にも等方向な電気的
特性を有する酸化物超伝導膜が望ましい。従って、超伝
導薄膜デバイスを製造する上で結晶配向を制御できる酸
化物超伝導膜の製造方法が重要となる。
(Conventional technology) Devices using superconductivity include (1) cavities;
Superconducting high frequency components such as filters, (2) SQ
There are superconducting sensors such as υI[). For example, two-dimensional thin film devices such as filters and coils are required to have superconducting properties in the same direction in the plane, and at the same time, it is desirable to have equivalent superconducting properties in the thickness direction in the signal line connection region. Furthermore, a tunnel junction region used in a superconducting sensor requires a long coherence length in the thickness direction. Fifth
The figure shows the relationship between the crystal unit cell and crystal orientation in a Bi25r2Ca2Cu30x superconducting film. Although oxide superconducting films have the advantage of having a significantly higher critical temperature than metal-based superconducting films, they have the problem that their superconducting properties vary greatly depending on the crystal orientation because they have a layered structure as shown in Figure 5. . For example, the coherence length within the layer plane (a, b axis direction) is as long as 33-4n, allowing superconducting current to flow easily, but on the other hand, the coherence length in the layer perpendicular direction (c axis direction) is 0.2
It is short at -0.5 nm, making it difficult for superconducting current to flow. Therefore, thin film devices that require an in-plane method are based on a crystal oriented film (referred to as a C-axis oriented film) with the C-axis in the film thickness direction, but when considering signal line connections and tunnel junctions, It is desirable to have an oxide superconducting film in which fine crystals with a- and b-axes in the film thickness direction coexist at a certain ratio and have electrical properties that are isodirectional both in the film plane and in the film thickness direction. Therefore, in manufacturing superconducting thin film devices, it is important to have a method for manufacturing oxide superconducting films that allows control of crystal orientation.

超伝導デバイスを構成する酸化物超伝導膜の製造方法に
は、真空蒸着、スパッタリング法に代表される物理的気
相成長、並びにMO−CVD法に代表される化学分解を
利用した化学的気相成長方法がある。また、これらの方
法により成長させた酸化物膜の超伝導特性を発現させる
ためには、(1)成長させた膜を堆積後に熱処理する方
法、(2)基板温度を上げながら成長させることによっ
て熱処理無しに超伝導特性を発現させる方法、がある。
Methods for manufacturing oxide superconducting films that constitute superconducting devices include physical vapor phase growth represented by vacuum evaporation and sputtering methods, and chemical vapor phase growth using chemical decomposition represented by MO-CVD method. There is a way to grow. In order to develop superconducting properties in oxide films grown by these methods, there are two methods: (1) heat-treating the grown film after deposition; (2) heat-treating the grown film by growing it while increasing the substrate temperature. There is a method of developing superconducting properties without the use of superconducting materials.

現在、結晶配向を制御するためには、主に基板温度を上
げながら膜を成長させる方法が取られており、配向性の
制御には基板材料とその結晶面方位、並びに基板温度が
重要である。この方法は高周波信号領域で誘電損失が大
きい5rTi03単結晶基板とY−Ba−Cu−0系超
伝導膜の組合せでは有効である。しかし、誘電損失は小
さいもののY−Ba−Cu−0やB 1−3r−Ca−
Cu−0系超伝導膜に対して格子整合性が悪いMgO単
結晶基板には適用出来ないという問題があった。また、
基板温度を上げながら膜成長させる結晶配向制御方法は
、エピタキシャルに近い膜成長であるため、膜厚方向を
a軸、あるいはb@とじた配向膜では膜面内の特定方向
がC軸となり、強い異方性が膜面内に生じる。これによ
り、薄膜デバイスに要求される面内等方性が保証出来な
いという問題があった。一方、堆積後の熱処理では特殊
なアニール[特願平1−2067261を行うことによ
り、MgO車結晶基板上に極めて強いC軸配向のB1−
5r−Ca−Cu−0系超伝導膜が得られるものの、C
軸以外の配向制御は困難であるという問題があった。
Currently, the main method used to control crystal orientation is to grow a film while increasing the substrate temperature, and the substrate material, its crystal plane orientation, and substrate temperature are important for controlling orientation. . This method is effective in the combination of a 5rTi03 single crystal substrate, which has a large dielectric loss in the high frequency signal region, and a Y-Ba-Cu-0 based superconducting film. However, although the dielectric loss is small, Y-Ba-Cu-0 and B1-3r-Ca-
There was a problem in that it could not be applied to an MgO single crystal substrate, which has poor lattice matching with a Cu-0 based superconducting film. Also,
The crystal orientation control method of growing a film while increasing the substrate temperature is close to epitaxial film growth, so in an oriented film where the film thickness direction is the a-axis or b@, a specific direction in the film plane becomes the c-axis, and the strong Anisotropy occurs within the membrane plane. This has caused a problem in that in-plane isotropy required for thin film devices cannot be guaranteed. On the other hand, in the post-deposition heat treatment, a special annealing process [Japanese Patent Application No. 1-2067261] is performed to form a B1-
Although a 5r-Ca-Cu-0 based superconducting film can be obtained, C
There was a problem in that orientation control other than the axis was difficult.

(発明が解決しようとする課題) 以上のようじ、結晶方位によって特性の異なる酸化物超
伝導膜を主な構成要素とする超伝導薄膜デバイスは2次
元デバイスであるため、面内等方性を保証できる超伝導
膜、即ちC軸配向膜がベースとなる。さらに、デバイス
部品の信号線接続領域やトンネル接合領域では膜厚方向
にも面内とほぼ同程度の超伝導特性が要求される。従っ
て、これらの領域に比べ十分に小さく、同時に膜厚方向
にa軸、あるいはb軸を含む結晶を一定の割合で含んだ
C軸配向膜が望ましい。従来、Y−Ba−Cu−0系超
伝導膜では5rTi(hの面方位と基板温度によって配
向制御が行われてきたが、B 1−5r−Ca−Cu−
0系超伝導膜とMgO基板の組合せでは制御できないと
いう問題があった。
(Problems to be Solved by the Invention) As described above, since superconducting thin film devices whose main components are oxide superconducting films whose properties differ depending on crystal orientation are two-dimensional devices, in-plane isotropy is guaranteed. The base is a superconducting film that can be formed, that is, a C-axis oriented film. Furthermore, in the signal line connection region and tunnel junction region of device components, superconducting properties are required to be approximately the same in the film thickness direction as in the in-plane direction. Therefore, it is desirable to have a C-axis oriented film which is sufficiently smaller than these regions and which also contains a certain proportion of crystals including the a-axis or the b-axis in the film thickness direction. Conventionally, in Y-Ba-Cu-0 based superconducting films, the orientation has been controlled by the surface orientation of 5rTi(h) and the substrate temperature, but
There was a problem that the combination of the 0-based superconducting film and the MgO substrate could not be controlled.

本発明は、酸化物超伝導膜を基本要素とする超伝導デバ
イスにおいて、面内並びに膜厚方向にも等方向な超伝導
特性を有する酸化物超伝導膜を実現することによって、
酸化物超伝導膜の利点を損なうことなく高性能な超伝導
デバイスを実現・提供することを目的とする。
The present invention provides a superconducting device having an oxide superconducting film as a basic element, by realizing an oxide superconducting film having isodirectional superconducting properties both in the plane and in the thickness direction.
The aim is to realize and provide high-performance superconducting devices without sacrificing the advantages of oxide superconducting films.

〔課題を解決するための手段〕[Means to solve the problem]

本発明はMgO単結晶の(110)結晶面上にBi、S
r。
The present invention provides Bi, S on the (110) crystal plane of MgO single crystal.
r.

Ca、Cu,Oから成る酸化物膜を堆積させ、その表面
をMgO単結晶の(100)結晶面で被覆しつつ熱処理
することによって、該酸化物膜に超伝導性を付与するこ
とを特徴とする。
It is characterized by imparting superconductivity to the oxide film by depositing an oxide film consisting of Ca, Cu, and O, and heat-treating the surface of the film while covering it with a (100) crystal plane of an MgO single crystal. do.

(作 用) 本発明においては、超伝導デバイスを構成するB 1−
5r−(:a−Cu−0系酸化物膜をMg0(110)
単結晶基板上に形威し、その表面をMgO(100)単
結晶で被覆しながら熱処理することにより、膜厚方向を
C軸とする結晶と膜厚方向をa、b軸とする結晶とを一
定の割合で混在させることを主要な特徴とする。従来の
技術では、高性能超伝導デバイスに必要な面内、並びに
膜厚方向に等方的な超伝導特性を得ること、即ちB1−
5r−Ca−Cu−0系超伝導膜の結晶配向制御は困難
であった。本発明では、膜厚方向をC軸とする結晶と膜
厚方向をa、b軸とする結晶とを一定の割合で混在でき
るため、面内、並びに膜厚方向に等方的な超伝導特性が
得られることが従来の技術とは大きく異なる。
(Function) In the present invention, B 1- which constitutes a superconducting device
5r-(:a-Cu-0 based oxide film with Mg0(110)
By forming a crystal on a single crystal substrate and heat-treating the surface while covering it with an MgO (100) single crystal, a crystal with the C axis in the film thickness direction and a crystal with the a and b axes in the film thickness direction can be formed. The main feature is that they are mixed at a certain ratio. With conventional technology, it is difficult to obtain isotropic superconducting properties in the plane and in the film thickness direction, which are necessary for high-performance superconducting devices, that is, B1-
It has been difficult to control the crystal orientation of 5r-Ca-Cu-0 based superconducting films. In the present invention, since crystals with the C axis in the film thickness direction and crystals with the a and b axes in the film thickness direction can coexist at a certain ratio, superconducting properties are isotropic in the plane and in the film thickness direction. This method is significantly different from conventional technology in that it provides the following.

〔実施例〕〔Example〕

第1図は本発明の実施例を示す。第1図(a)はMg0
(110)基板にll 1−5r−Ca−Cu−0系の
膜を堆積させた断面図、第1図(b)はB 1−5r−
Ca−Cu−0系膜の最表面をMg0(100)単結晶
板で被覆した状態の断面図である。1はMgo(no)
基板、2はスパッタ等の気相成長法で形成した[1i−
5「−Ca−Cu−0系酸化物膜、3は熱処理時に使用
する表面被覆用MgO(100)単結晶板である。第1
図(a)のように、鏡面研磨したMgO(110)単結
晶基板1の上に、気相成長法等により酸化物薄膜2を堆
積させる。次に、第1図(b)のように、酸化物薄膜の
最表面を鏡面研磨したMgO(100)単結晶板3で被
覆し酸素雰囲気下で熱処理を行う。熱処理後、被覆した
MgO(100)単結晶板を除去することにより、超伝
導デバイス用の酸化物超伝導膜とする。
FIG. 1 shows an embodiment of the invention. Figure 1(a) shows Mg0
(110) A cross-sectional view of a ll 1-5r-Ca-Cu-0-based film deposited on a substrate, FIG. 1(b) is a B 1-5r-
FIG. 2 is a cross-sectional view of a state in which the outermost surface of a Ca-Cu-0-based film is covered with a Mg0 (100) single crystal plate. 1 is Mgo (no)
The substrate 2 was formed by a vapor phase growth method such as sputtering [1i-
5 "-Ca-Cu-0 series oxide film, 3 is a MgO (100) single crystal plate for surface coating used during heat treatment. 1st
As shown in Figure (a), an oxide thin film 2 is deposited on a mirror-polished MgO (110) single crystal substrate 1 by vapor phase growth or the like. Next, as shown in FIG. 1(b), the outermost surface of the oxide thin film is coated with a mirror-polished MgO (100) single crystal plate 3 and heat-treated in an oxygen atmosphere. After the heat treatment, the coated MgO (100) single crystal plate is removed to obtain an oxide superconducting film for a superconducting device.

第2図は上記のようにして形成したB1−5r−Ca−
Cu−0系酸化物超伝導膜表面の模式図である。4は平
板の鉛直方向をC軸とする平板状結晶、5は平板状結晶
が立った状態の4−5μm長の針状結晶である。第1図
で説明した方法でB1−5r−Ca−f:u−0系酸化
物膜を形成することにより、平板状結晶4と多くの針状
結晶5が混在した膜状態を実現できる。
Figure 2 shows the B1-5r-Ca-
FIG. 2 is a schematic diagram of the surface of a Cu-0-based oxide superconducting film. 4 is a flat crystal whose C axis is in the vertical direction of the flat plate, and 5 is a needle crystal with a length of 4 to 5 μm in which the flat crystal stands upright. By forming the B1-5r-Ca-f:u-0 based oxide film by the method described in FIG. 1, a film state in which the tabular crystals 4 and many needle-like crystals 5 are mixed can be realized.

MgO(1001単結晶基板上にB 1−5r−Ca−
Cu−0系の膜を堆積させ、MgO(100)単結晶板
で被覆し熱処理した場合、平板状結晶4のみから構成さ
れた超伝導膜が得られる。MgO(110)!−結晶板
で被覆し熱処理した場合、平板状結晶4に加えて小数の
針状結晶5が混在する。一方、Mg0(110)単結晶
基板上にB1−5r−Ca−Cu−0系の膜を堆積させ
、MgO(100)単結晶板で被覆し熱処理した場合、
並びに被覆を行わない熱処理の場合には、平板状結晶4
に加え小数の針状結晶5が混在する。なかでも、針状結
晶5の割合を増すには、Mg0(110)単結晶基板上
にB 1−5r−f;a−Cu−0系の膜を堆積させ、
Mg0(100)!#結晶板で被覆し熱処理する方法が
最も効果的であった。
MgO (B 1-5r-Ca- on 1001 single crystal substrate
When a Cu-0 based film is deposited, covered with an MgO (100) single crystal plate, and heat treated, a superconducting film composed only of the tabular crystals 4 is obtained. MgO(110)! - When coated with a crystal plate and heat-treated, a small number of needle-like crystals 5 are present in addition to the plate-like crystals 4. On the other hand, when a B1-5r-Ca-Cu-0-based film is deposited on a Mg0 (110) single crystal substrate, coated with an MgO (100) single crystal plate, and heat treated,
and in the case of heat treatment without coating, tabular crystals 4
In addition, a small number of needle-like crystals 5 are mixed. Among them, in order to increase the proportion of needle-like crystals 5, a B 1-5r-f;a-Cu-0-based film is deposited on a Mg0 (110) single crystal substrate,
Mg0(100)! #The method of coating with a crystal plate and heat treatment was the most effective.

第3図に一例として、Mg0(110)単結晶基板上に
堆積させ、その後熱処理したBi25r2CaCu20
x膜のX線回折パターンを示す。(a)はMgO(10
0)単結晶板で被覆し熱処理した膜、(b)はMgO(
110)11結晶板て被覆熱処理した膜、(c)は表面
被覆を行わずに熱処理した膜のX線回折パターンである
As an example, Fig. 3 shows Bi25r2CaCu20 deposited on a Mg0 (110) single crystal substrate and then heat treated.
Figure 3 shows the X-ray diffraction pattern of the x film. (a) is MgO(10
0) Film coated with a single crystal plate and heat treated, (b) is MgO (
110) 11 is an X-ray diffraction pattern of a film coated with a crystal plate and heat-treated. (c) is an X-ray diffraction pattern of a film heat-treated without surface coating.

すべての試料はほぼ1μmの膜厚である。(a)。All samples have a film thickness of approximately 1 μm. (a).

(b)、および(C)とともに典型的なC軸配向の回折
パターンを示しているが、被覆熱処理を行うことにより
C軸配向性はより強調される。ここで、MgO(too
)単結晶板で被覆し熱処理したBi25r2CaCu2
0x膜[第3図(a)]では、典型的なC軸配向パター
ンに加えて強い(2200) X線回折ピークが混在し
ている。即ち、平板状結晶が立った状態の針状結晶5は
(2200)結晶面より構成されており、このことは針
状結晶が膜厚方向にa、b軸を含む配向結晶であること
を意味している。
Although (b) and (C) show typical diffraction patterns with C-axis orientation, the C-axis orientation is further emphasized by performing the coating heat treatment. Here, MgO(too
) Bi25r2CaCu2 coated with a single crystal plate and heat treated
In the 0x film [FIG. 3(a)], a strong (2200) X-ray diffraction peak is present in addition to the typical C-axis orientation pattern. That is, the needle crystal 5 in which the flat plate crystal stands up is composed of (2200) crystal planes, which means that the needle crystal is an oriented crystal that includes the a and b axes in the film thickness direction. are doing.

本発明は、Bi25r2CaCu20.以外のB 1−
5r−Ca−Cu−0系超伝導酸化膜にも適用できる。
The present invention is based on Bi25r2CaCu20. B other than 1-
It can also be applied to 5r-Ca-Cu-0 based superconducting oxide films.

本発明を用いてB 1−5r−Ca−Cu−0膜を形成
することにより実現できる配向結晶を第4図に模式的に
示す。6はMg0(110)単結晶基板、7はa、b軸
配向に相当する結晶、8はC軸配向に相当する結晶であ
る。
FIG. 4 schematically shows oriented crystals that can be realized by forming a B 1-5r-Ca-Cu-0 film using the present invention. 6 is an Mg0 (110) single crystal substrate, 7 is a crystal corresponding to a- and b-axis orientation, and 8 is a crystal corresponding to C-axis orientation.

以上のように、Mg0(110)単結晶基板上にB1−
5r−Ca−Cu−0系膜を堆積し、MgO(100)
結晶板で被覆し熱処理を行うことにより、C軸配向した
平板状結晶と、a、b軸配向した多数の針状結晶が混在
した酸化物超伝導膜を実現できる。従って、C軸配向結
晶によって面内等方法を確保でき、しかも多数のa、b
 @配向結晶によって十数μm以上の大きさを有する信
号線接続、並びにトンネル接合領域における膜厚方向の
超伝導特性も面内の特性に近づけることができ、酸化物
超伝導膜の長所を損なうことなく高性能な超伝導デバイ
スを実現できるという特徴がある。
As described above, B1-
Deposit 5r-Ca-Cu-0 based film, MgO(100)
By covering with a crystal plate and performing heat treatment, it is possible to realize an oxide superconducting film in which a C-axis oriented flat crystal and a large number of a- and b-axis oriented needle-like crystals coexist. Therefore, the C-axis oriented crystal can ensure the in-plane method, and moreover, a large number of a, b
By using @-oriented crystals, the superconducting properties in the film thickness direction in the signal line connection having a size of more than 10-odd μm and in the tunnel junction region can be made closer to the in-plane properties, without compromising the advantages of oxide superconducting films. It is characterized by the ability to realize high-performance superconducting devices without any problems.

〔発明の効果〕〔Effect of the invention〕

以上説明したように、本発明による熱処理を行うことに
よって、超伝導デバイスの基本構成要素である酸化物超
伝導膜の配向性を制御することができ、それにより、膜
面内、並びに膜厚方向にも等方向な超伝導特性を保証で
きる。従って、酸化物超伝導膜の長所を活かした高性能
な超伝導デバイスが可能となるという利点がある。
As explained above, by performing the heat treatment according to the present invention, it is possible to control the orientation of the oxide superconducting film, which is a basic component of superconducting devices. It is also possible to guarantee isotropic superconducting properties. Therefore, there is an advantage that a high-performance superconducting device that takes advantage of the advantages of an oxide superconducting film is possible.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の詳細な説明する図、 第2図は本発明によって形成した超伝導膜表面の模式図
、 第3図はBi25r2CaCu20.膜の熱処理後のX
線回折パターン、 第4図はMg0(110)基板上に成長した超伝導結晶
の模式図、 第5図はBi25r2Ca2Cu、、OX超伝導膜にお
ける結晶の単位格子と結晶方位の関係を示す図である。 ・・・Mg0(lto)単結晶基板、 ・−Bi−5r−Ca−Cu−0系酸化物薄膜、・・・
表面被覆用単結晶板、 ・・・平板状結晶、 ・・・針状結晶、 ・・・Mg0(110)基板の最表面、・・・a、b 
@配向結晶、 ・・・C軸配向結晶。
FIG. 1 is a diagram explaining the present invention in detail. FIG. 2 is a schematic diagram of the surface of a superconducting film formed according to the present invention. FIG. X after heat treatment of membrane
Line diffraction pattern. Figure 4 is a schematic diagram of a superconducting crystal grown on a Mg0 (110) substrate. Figure 5 is a diagram showing the relationship between the crystal unit cell and crystal orientation in a Bi25r2Ca2Cu, OX superconducting film. . ...Mg0 (lto) single crystal substrate, -Bi-5r-Ca-Cu-0 based oxide thin film,...
Single crystal plate for surface coating, ... tabular crystal, ... needle-like crystal, ... outermost surface of Mg0 (110) substrate, ... a, b
@oriented crystal, ... C-axis oriented crystal.

Claims (1)

【特許請求の範囲】[Claims] 1)MgO単結晶の(110)結晶面上にBi,Sr,
Ca,Cu,Oから成る酸化物膜を堆積させ、その表面
をMgO単結晶の(100)結晶面で被覆しつつ熱処理
することによって、該酸化物膜に超伝導性を付与するこ
とを特徴とする酸化物超伝導膜の製造方法。
1) Bi, Sr,
It is characterized by imparting superconductivity to the oxide film by depositing an oxide film consisting of Ca, Cu, and O, and heat-treating the surface while covering the (100) crystal plane of MgO single crystal. A method for producing an oxide superconducting film.
JP1317618A 1989-12-08 1989-12-08 Production of oxide superconducting film Pending JPH03183601A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1317618A JPH03183601A (en) 1989-12-08 1989-12-08 Production of oxide superconducting film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1317618A JPH03183601A (en) 1989-12-08 1989-12-08 Production of oxide superconducting film

Publications (1)

Publication Number Publication Date
JPH03183601A true JPH03183601A (en) 1991-08-09

Family

ID=18090192

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1317618A Pending JPH03183601A (en) 1989-12-08 1989-12-08 Production of oxide superconducting film

Country Status (1)

Country Link
JP (1) JPH03183601A (en)

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