JPH03183794A - stripe plating equipment - Google Patents
stripe plating equipmentInfo
- Publication number
- JPH03183794A JPH03183794A JP32090389A JP32090389A JPH03183794A JP H03183794 A JPH03183794 A JP H03183794A JP 32090389 A JP32090389 A JP 32090389A JP 32090389 A JP32090389 A JP 32090389A JP H03183794 A JPH03183794 A JP H03183794A
- Authority
- JP
- Japan
- Prior art keywords
- negative pressure
- plating
- plating solution
- soln
- plated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000007747 plating Methods 0.000 title claims abstract description 103
- 238000002347 injection Methods 0.000 claims abstract description 16
- 239000007924 injection Substances 0.000 claims abstract description 16
- 239000000243 solution Substances 0.000 claims description 58
- 238000005192 partition Methods 0.000 claims description 3
- 238000005507 spraying Methods 0.000 claims description 3
- 239000007921 spray Substances 0.000 claims 2
- 230000000873 masking effect Effects 0.000 abstract description 13
- 238000011084 recovery Methods 0.000 abstract description 3
- 238000001514 detection method Methods 0.000 abstract 1
- 239000000463 material Substances 0.000 description 10
- 239000007788 liquid Substances 0.000 description 7
- 230000007547 defect Effects 0.000 description 5
- 230000002159 abnormal effect Effects 0.000 description 3
- 239000010405 anode material Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 238000011109 contamination Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000010970 precious metal Substances 0.000 description 2
- 229910000679 solder Inorganic materials 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 230000003311 flocculating effect Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 230000008595 infiltration Effects 0.000 description 1
- 238000001764 infiltration Methods 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
Landscapes
- Electroplating Methods And Accessories (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明は、めっき液噴射方式によるストライプめっき条
の製造装置の改良に間し゛、とくに被めっき条に変形部
があったり接続部の段差があるような場合に当該変形部
や段差部よりのめっき液の漏洩流出を防止可能に構成し
てなるストライプめっき装置に関するものである。[Detailed Description of the Invention] [Industrial Application Field] The present invention is directed to improving an apparatus for producing stripe plated strips using a plating solution injection method, especially when the strip to be plated has a deformed part or a step at a connecting part. The present invention relates to a stripe plating apparatus configured to prevent leakage of plating solution from the deformed portion or step portion in certain cases.
[従来の技術]
IC用のリードフレームなど電子部品材料には高い信頼
性が要求され、その接合面や電気的接点などには金など
の高価な貴金属等のめっきを施したり、IC#を載やワ
イヤボンディングを容易にするための半田めっきをした
りしておくのが通常である。[Prior art] Electronic component materials such as lead frames for ICs are required to have high reliability, and their bonding surfaces and electrical contacts are plated with expensive precious metals such as gold, or IC# is mounted on them. It is usual to apply solder plating to facilitate wire bonding.
ストライプめっきは、そのような貴金属あるいは半田等
を必要最小限の範囲にめっきし、材料の節減と併せて原
価の低減を図るべく開発されたものである。Stripe plating was developed to plate such precious metals, solder, etc. to the minimum necessary range, and to save materials and reduce costs.
上記従来のストライプめっきは、被めっき条の被めっき
面だけを残して他の表面をすべてレジスト剤やマスキン
グテープなどでめっき液の浸入を遮断し、これをめっき
液中に浸漬して、被めっき面に電解液を撹拌噴射してめ
っきするのが一般的であった。In the conventional stripe plating described above, only the surface to be plated of the strip to be plated is left, all other surfaces are blocked from infiltration of the plating solution with a resist agent or masking tape, and then this is immersed in the plating solution. It was common to plate the surface by stirring and spraying an electrolyte onto the surface.
しかし、このような従来方法においては被めっき面以外
をマスキングテープによりマスクするため、めっき面の
広さに比べて多くのマスキングテープが必要となり、割
高になることは避けられない上、めっき液の持出しが多
く、また、被めっき面以外をすべてマスキングしたもの
をめつき槽内やガイドロールを通過させると、通過の除
液めっき条のスリット端部のパリなどによって破れを生
ずることがあり、そのため破れ部分からめつき液が浸透
して置換めっきを起し、外観不良の原因となることがあ
った。However, in this conventional method, since areas other than the surface to be plated are masked with masking tape, a large amount of masking tape is required compared to the size of the plating surface, which is unavoidably expensive. If a large amount of material is carried out, and if all surfaces other than the surface to be plated are masked are passed through the plating tank or guide rolls, breakage may occur due to cracks at the slit ends of the liquid removal plating strips. Plating solution penetrated through the torn area and caused displacement plating, which could lead to poor appearance.
そこで発明者らは先に第3および4図に示すようなめっ
き装置を提案した。Therefore, the inventors previously proposed a plating apparatus as shown in FIGS. 3 and 4.
すなわち、被めつき条20を広巾面を垂直に維持して長
手方向に摺動走行させ、被めっき面21を残してマスキ
ングテープ22により別途マスキング工程で最少限に部
分マスキングしておき、めっき液槽4内に貯溜されてい
るめっき液2をポンプ5により図中矢印のように強制循
環せしめ、−時的に補助槽6に貯溜したのち、加圧され
ためっき液をノズル3から前記被めっき面21に噴射す
る。ノズル3の外周には前記被めっき条のマスキングテ
ープ22で区分されている被めっき面21の巾より幾分
広い間隔を有するかあるいはその内径寸法がマスキング
テープ22に十分後する開口面を形成する外套1が設け
られており、この外套1とノズル3との間あるいは液槽
4への入口には回収ロアが形成されていて、めっき液槽
4の上部において吸引ポンプ8により排気し、めっき液
槽4内が負圧にされることにより前記被めっき面21に
噴射されためっき液は前記回収ロアによって吸引され、
当該余剰のめっき液2はめっき液槽4に吸引回収される
。補助槽6は、前記めっき液の噴射のための加圧の安定
化と陽極材10の設置のために設けられたものであり、
加圧されためつき液2が補助4116内に一時的に加圧
状態で貯溜され、ノズル3を介して噴射されるものであ
る。That is, the plating strip 20 is slid in the longitudinal direction while keeping the wide surface vertical, and the plating surface 21 is left and is partially masked to the minimum in a separate masking process using masking tape 22, and then the plating solution is applied. The plating solution 2 stored in the tank 4 is forced to circulate as shown by the arrow in the figure using the pump 5, and is temporarily stored in the auxiliary tank 6, after which the pressurized plating solution is passed through the nozzle 3 onto the plated surface. Inject onto surface 21. On the outer periphery of the nozzle 3, an opening surface is formed which has an interval somewhat wider than the width of the surface to be plated 21 divided by the masking tape 22 of the strip to be plated, or whose inner diameter is sufficiently behind the masking tape 22. A mantle 1 is provided, and a collection lower is formed between the mantle 1 and the nozzle 3 or at the entrance to the liquid tank 4, and is evacuated by a suction pump 8 at the upper part of the plating liquid tank 4 to remove the plating liquid. By creating a negative pressure in the tank 4, the plating solution sprayed onto the surface to be plated 21 is sucked by the recovery lower,
The surplus plating solution 2 is sucked and collected into the plating solution tank 4. The auxiliary tank 6 is provided for stabilizing the pressure for spraying the plating solution and for installing the anode material 10,
The pressurized flocculating liquid 2 is temporarily stored in a pressurized state in the auxiliary 4116 and is injected through the nozzle 3.
なお、第3図は補助m6をめっき液槽4の外部に設置し
、開閉119を1m開閉能に構成することで陽極材10
の設置交換を容易化した例を示したものであり、第4図
はめっき液槽4内に隔壁11を設けることによりめっき
液槽4内の負圧化させる空間が狭くなるようにして、吸
引ポンプ8の吸引容量を小さくしても必要な負圧を十分
得られるように構成した例を示したものである。In addition, in FIG. 3, the anode material 10 is installed by installing the auxiliary m6 outside the plating solution tank 4 and configuring the opening/closing 119 to have a 1 m opening/closing ability.
Fig. 4 shows an example in which a partition wall 11 is provided in the plating solution tank 4 to narrow the space where negative pressure is created in the plating solution tank 4, and the suction This example shows an example in which a sufficient negative pressure can be obtained even if the suction capacity of the pump 8 is reduced.
[発明が解決しようとする課題]
上記既提案の装置によりすぐれたストライプめっきを行
なうことができ、すでに実用化されて好評を得ているが
、素材である被めっき条は有限長のコイルとして供給さ
れるものであり、連続作業を行なう場合には条体を順次
接続しながら作業を行なう必要がある。この場合、接続
部を突合せあるいは重ね合せにより如何はど上手に接続
しても微小な凹凸や曲がりの形成は避けられない。[Problem to be solved by the invention] The previously proposed apparatus described above can perform excellent stripe plating and has already been put into practical use and has been well received, but the material to be plated is supplied as a finite length coil. Therefore, when performing continuous work, it is necessary to connect the strips one after another. In this case, no matter how well the connecting portions are connected by abutting or overlapping, the formation of minute irregularities and bends is unavoidable.
さらにまた、薄物条材の場合、圧延あるいはその後の工
程において、例えば第2図に示したような局部的な変形
部20Aの発生を皆無とすることは不可能で゛あり、種
々な原因によってこのような変形部20Aが発生してい
る。Furthermore, in the case of thin strip materials, it is impossible to completely eliminate the occurrence of local deformations 20A as shown in FIG. Such a deformed portion 20A is generated.
このように平面状態でない接続部あるいは上記局部的な
変形部2OAが存在した状態のまま上述しためっき液の
噴射部を通過させれば、定常状態でめっき液が噴射され
かつ吸引作用が行なわれている被めっき面に突然異常部
が進入する結果となり、めっき液の噴射・吸引のバラン
スがくずれ、その結果、負圧が不十分となって、接続部
や変形部によって形成された間隙部からめっき液が外部
に流出するおそれがあり、作業環境の汚染あるいは非め
っき部分の表面における汚染が生じ、不良の発生あるい
は一時的な作業の停止といった問題が起る。If the above-mentioned plating solution injection section is passed through the above-mentioned plating solution injection section while the non-planar connection section or the above-mentioned locally deformed section 2OA exists, the plating solution will be injected in a steady state and a suction action will be performed. As a result, the abnormal part suddenly enters the surface to be plated, which upsets the balance between injection and suction of the plating solution.As a result, the negative pressure becomes insufficient, and the plating is removed from the gap formed by the connection or deformed part. There is a risk that the liquid may leak outside, contaminating the working environment or contaminating the surface of non-plated parts, resulting in problems such as defects or temporary stoppage of work.
本発明の目的は、上記したような従来技術の問題点を解
消し、被めっき条材に変形部があったり接a!部の段差
があるような場合においても当該変形部や段差部よりの
めっき作業中におけるめっき液の漏洩流出を防止可能に
構成してなる新規なストライプめっき装置を提供しよう
とするものである。An object of the present invention is to solve the problems of the prior art as described above, and to solve the problem that the strip material to be plated has a deformed part or a contact point. It is an object of the present invention to provide a novel stripe plating apparatus which is configured to be able to prevent leakage of plating solution from the deformed portions or stepped portions during plating work even when there is a step difference in the portion.
[課題を解決するための手段]
本発明は、めっき液構内のめっき液をめっき面に向って
噴射するノズルと該ノズルの周囲を区画してめっき開口
面を形成する外套と、めっき梢の内部を負圧とし噴射し
ためっき液をめっき槽内に回収せしめるための吸引手段
とを有し、前記外套の開口面に被めっき条を摺動走行さ
せて被めっき面にめっきをする装置において、前記めっ
き液の吸引空間内の負圧を検知可能な負圧センサを設け
、当該負圧センサとめっき液供給側とを自動的に連動制
御可能に構成し、吸引空間内の負圧が所定値より変動し
た場合には供給ンプの動作を低下ないし停止せしめるな
どしてめっき液の噴射を制御する一方、所定負圧に吸引
空間の負圧が復帰した際には供給ポンプ等の動作を自動
的に復帰再開させるなどしてノズルよりのめつき液の噴
射を正常動作に復帰可能に構成してなるものである。[Means for Solving the Problems] The present invention includes a nozzle for injecting a plating solution in a plating solution yard toward a plating surface, a jacket that partitions the periphery of the nozzle to form a plating opening surface, and an interior of a plating top. and a suction means for collecting the injected plating solution into the plating tank by applying a negative pressure to the plating tank, and plating the surface to be plated by sliding the strip to be plated on the opening surface of the mantle. A negative pressure sensor capable of detecting the negative pressure in the plating solution suction space is provided, and the negative pressure sensor and the plating solution supply side are configured to be automatically controlled in conjunction with each other, so that the negative pressure in the suction space is lower than a predetermined value. If the pressure fluctuates, the plating solution injection is controlled by reducing or stopping the operation of the supply pump, and when the negative pressure in the suction space returns to the predetermined negative pressure, the operation of the supply pump etc. is automatically controlled. The structure is such that the jetting of the plating liquid from the nozzle can be restored to normal operation by restarting the nozzle.
[作用]
めっき液噴射面に被めっき材の変形部や段差部が到来す
れば、これまでの平面状態が突然変化し、被めっき材の
走行移動面とめっき装置の接触端縁面との間に予期しな
い間隙が生ずる。[Function] When a deformed part or a stepped part of the material to be plated arrives at the plating solution injection surface, the previous planar state suddenly changes, and the gap between the traveling surface of the material to be plated and the contact edge surface of the plating equipment changes. Unexpected gaps appear between the lines.
この間隙の発生によって、その間隙より空気を吸引する
結果となり、それまで所定負圧状態にあった吸引空間の
負圧が変動し不十分なものとなる。The generation of this gap results in suction of air through the gap, and the negative pressure in the suction space, which had been in a predetermined negative pressure state, fluctuates and becomes insufficient.
この変動した負圧を負圧センサにより迅速に検知し、こ
れと自動1#Ifll可能に連動させである例えば供給
ポンプの動作を当該負圧の変動に応じて自動的に低下あ
るいは停止させ得るようにしてあれば、前記した負圧不
十分のために間隙よりめっき液が流出するのを十分に防
止することができる。そして、そのような被めっき条の
異常部が通過し、再び被めっき材の平面部が摺動走行を
始めれば、吸引ポンプによる負圧は再び所定の低常圧に
戻るから、負圧センサにそれを検知させ再度めっき噴射
を定常状態に復帰させればよい。This fluctuating negative pressure can be quickly detected by a negative pressure sensor and automatically linked to the negative pressure sensor. For example, the operation of the supply pump can be automatically reduced or stopped according to the negative pressure fluctuation. By doing so, it is possible to sufficiently prevent the plating solution from flowing out from the gap due to the insufficient negative pressure described above. When such an abnormal part of the strip to be plated passes and the flat part of the material to be plated starts sliding again, the negative pressure caused by the suction pump returns to the predetermined low normal pressure, so the negative pressure sensor It is sufficient to detect this and return the plating injection to a steady state again.
これにより、めっき液の流出による不良発生あるいは作
業環境の汚染などはいずれも自動的に解消され、常に安
定した長尺ストライプめっき製品を得ることができる。As a result, defects caused by leakage of the plating solution and contamination of the working environment are automatically eliminated, and stable long stripe plated products can be obtained at all times.
[実施例] 以下に、本発明について実施例図面を参照し説明する。[Example] The present invention will be described below with reference to the drawings.
第1図は、本発明に係るめっき装置を用いてストライプ
めっきを行なっている様子を示す説明断面図であり、第
2図は第1図の外套開口めっき面近傍の拡大部分説明図
である。FIG. 1 is an explanatory cross-sectional view showing how stripe plating is performed using the plating apparatus according to the present invention, and FIG. 2 is an enlarged partial explanatory view of the vicinity of the plating surface of the mantle opening in FIG. 1.
第1および2図において、第3および4図において説明
した符号と同一符号は同一構成を示すものである。In FIGS. 1 and 2, the same reference numerals as those explained in FIGS. 3 and 4 indicate the same configurations.
20は前記第3および4図同様に広巾面を垂直に維持し
て長手方向に走行する被めっき条、22は被めっき面2
1を残して最少限に部分マスキングしているマスキング
テープであり、別途マスキング工程で部分マスキングさ
れるものである。Reference numeral 20 denotes a plated strip running in the longitudinal direction while maintaining the wide surface vertically as in FIGS. 3 and 4, and 22 denotes the plated surface 2.
This is a masking tape that is partially masked to a minimum except for 1, and is partially masked in a separate masking process.
めっき液槽4内に貯溜されているめっき液2を供給ポン
プ5により図中矢印のように強制循環せしめ、−時的に
補助槽6に貯溜したのち、加圧されためっき液がノズル
3から前記被めっき而21に噴射される。The plating solution 2 stored in the plating solution tank 4 is forced to circulate as shown by the arrow in the figure by the supply pump 5, and after temporarily being stored in the auxiliary tank 6, the pressurized plating solution is supplied from the nozzle 3. It is sprayed onto the plated material 21.
ノズル3の外周には前記従来例同様被めっき条のマスキ
ングテープ22で区分されている被めっき而21の巾よ
り幾分広い間隔を有するがあるいはその内径寸法がマス
キングテープ22に十分接する開口面IAを形成する外
套1が設けられており、その下方には噴射後のめっき液
を吸引流路7aを通じ回収する回収ロアがめつき液槽4
に連通して形成されており、めっき液槽4の上部におい
て吸引ポンプ8により排気し、めっき液槽4内が負圧に
されることにより前記被めっき面21に噴射されためっ
き液は当該回収ロアによって吸引され、当該余剰のめっ
き液2がめつき液槽4に吸引回収される。On the outer periphery of the nozzle 3, there is an opening surface IA whose inner diameter dimension is in sufficient contact with the masking tape 22, although the interval is somewhat wider than the width of the plated object 21 divided by the masking tape 22 of the plating strip as in the conventional example. An outer shell 1 is provided below which collects the sprayed plating solution through a suction channel 7a.
The plating solution tank 4 is evacuated by a suction pump 8 at the upper part of the plating solution tank 4, and when the inside of the plating solution tank 4 is made negative pressure, the plating solution injected onto the surface to be plated 21 is collected. The excess plating solution 2 is sucked by the lower and collected by suction into the plating solution tank 4.
しかして、本発明においては、第1図に示すように、上
記吸引空間の負圧を検知し得る負圧センサ12が設けら
れている。According to the present invention, as shown in FIG. 1, a negative pressure sensor 12 is provided which can detect the negative pressure in the suction space.
当該負圧センサ12は、例えばマイコン制御あるいはメ
カニカル制御その他の自動制御l!梢によって例えば供
給ポンプ5と連動可能に構成されており、負圧センサ1
2が吸引空間における負圧が所定値に達しないことを検
知したときには、上記自動制御機構が作動し、供給ポン
プ5の動作を低下させるかさらに停止させる。The negative pressure sensor 12 is controlled by, for example, microcomputer control, mechanical control, or other automatic control l! For example, it is configured to be interlocked with the supply pump 5 by the top, and the negative pressure sensor 1
2 detects that the negative pressure in the suction space does not reach a predetermined value, the automatic control mechanism is activated to reduce or even stop the operation of the supply pump 5.
吸引空間は、外套部間口面IAを平滑な状態の被めっき
条20が摺動走行している限り、吸引ポンプ8により常
に所定の負圧に保たれる。しかし、前述した第2図の変
形部20Aや連続作業をする上で避けられない接続部に
生じた段差部などが開L1面IAを通過しようとする場
合には、そのための開口面1Aの周辺に間隙が生じ、そ
こから外気が吸引されて吸引空間の負圧は変動する。The suction space is always maintained at a predetermined negative pressure by the suction pump 8 as long as the smooth strip 20 to be plated slides on the front surface IA of the mantle. However, if the deformed part 20A shown in FIG. A gap is created through which outside air is sucked in, causing the negative pressure in the suction space to fluctuate.
この負圧の変動を負圧センサが速かに検知し、前記供給
ポンプ5に動作指令を発する。負圧の変動が余り大きく
なければ供給ポンプ5の駆動モータの回転を落し、めっ
き液の噴射圧力を低下させる程度でよいが、大きな変形
部20Aなどにより大きな負圧変動があったら、供給ポ
ンプ5の動作を停止させ、−時的にめっき液の噴射を停
止させる。このように負圧変動の大小に応じめっき液の
噴射を変化可能にすれば、変形部2OA等により形成さ
れた間隙からめつき液が流出し周辺を汚染させあるいは
不良を発生させるおそれは解消される。A negative pressure sensor quickly detects this fluctuation in negative pressure and issues an operation command to the supply pump 5. If the negative pressure fluctuations are not too large, it is sufficient to slow down the rotation of the drive motor of the supply pump 5 and reduce the injection pressure of the plating solution. However, if there are large negative pressure fluctuations due to large deformation parts 20A, etc. - temporarily stop the plating solution injection. By making it possible to change the injection of plating solution according to the magnitude of negative pressure fluctuations in this way, the risk of the plating solution flowing out from the gap formed by the deformed portion 2OA, etc., and contaminating the surrounding area or causing defects can be eliminated. .
なお、めっき液の噴射制御は、上記したように供給ポン
プ5の回転数の低下や停止によるほか、中間に設置され
たバルブ13の開閉を機械的に加減するようにしても可
能であり、如何なる動作により噴射制御を行なうかは、
適宜選択すればよい。In addition to controlling the injection of the plating solution by reducing or stopping the rotation speed of the supply pump 5 as described above, it is also possible to mechanically adjust the opening and closing of the valve 13 installed in the middle. Whether to control injection by operation or not,
You can select it as appropriate.
変形部20Aや接続段差部などが通過した後は、吸引ポ
ンプ8の動作により吸引空間内の負圧は直ちに元に復帰
する。負圧センサ12がその負圧の復帰を検知したら自
動的にめっき液の噴射を定常状態に復帰させるように構
成しておけば、長尺条体のストライブめっきにおいて中
途に変形部や段差部などがあってもめつき液を外部に流
出させて不良を発生させたりすることなく、常に円滑で
安定した連続めっき作業を進行させることができる。After the deformed portion 20A, the connection step portion, etc. have passed, the negative pressure in the suction space is immediately restored to its original state by the operation of the suction pump 8. If the configuration is such that when the negative pressure sensor 12 detects the return of the negative pressure, the injection of the plating solution is automatically returned to a steady state, deformed parts or stepped parts can be avoided during strip plating of a long strip. Even if there is a problem, the plating solution will not leak out to the outside and cause defects, and continuous plating work can always proceed smoothly and stably.
[発明の効果]
以上の通り、本発明に係る装置によれば、被めっき条体
の接続部や条体変形部分等が通過する際にめっき液の外
部への流出のおそれがなく、めっき液による作業環境の
汚染あるいは不良発生がなくなり、上記したような異常
部分通過後には再び連続めっき作業が円滑に進行され、
それによって長尺ストライプめっき条の品質向上を図り
得るなど、工業上優れた効用を発揮し得る。[Effects of the Invention] As described above, according to the apparatus according to the present invention, there is no fear that the plating solution will leak out when the connecting portion of the strip to be plated, the deformed portion of the strip, etc. pass, and the plating solution This eliminates contamination of the working environment or the occurrence of defects, and after passing through the above-mentioned abnormal areas, continuous plating work can proceed smoothly again.
As a result, the quality of long striped plating strips can be improved, and excellent industrial effects can be exhibited.
第1図は本発明に係る装置の具体的構成例を示す説明断
面図、第2図は外套部間口面近傍の状況を示す説明図、
第3および4図は既提案のめつき装置の2様の構成例を
示す説明断面図である。
l:外套、
IA:外套部間口面、
2:めっき液、
3:ノズル、
4:めっき液槽、
a
0
2
3
0
1
2
:供給ポンプ、
:補助槽、
二回収口、
:吸引流路、
:吸引ポンプ、
:陽極材、
:負圧センサ、
:バルブ、
:被めっき条、
:被めっき面、
:マスキングテープ。FIG. 1 is an explanatory sectional view showing a specific example of the configuration of the device according to the present invention, FIG. 2 is an explanatory view showing the situation near the frontage of the mantle,
FIGS. 3 and 4 are explanatory sectional views showing two types of configuration examples of the previously proposed plating apparatus. l: mantle, IA: mantle front surface, 2: plating solution, 3: nozzle, 4: plating solution tank, a 0 2 3 0 1 2: supply pump, : auxiliary tank, 2nd recovery port, : suction channel, : Suction pump, : Anode material, : Negative pressure sensor, : Valve, : Plated strip, : Plated surface, : Masking tape.
Claims (1)
するノズルと該ノズルの周囲を区画してめっき開口面を
形成する外套と、めっき槽の内部を負圧とし噴射しため
っき液をめっき槽内に回収せしめるための吸引手段とを
有し、前記外套の開口面に被めっき条を摺動走行させて
被めっき面にめっきをする装置において、前記めっき液
の吸引空間内の負圧を検知可能な負圧センサを設け、当
該負圧センサとめっき液供給側とを自動的に連動制御可
能に構成し、吸引空間内の負圧が所定値より変動した場
合には供給ンプの動作を低下ないし停止せしめるなどし
てめっき液の噴射を制御する一方、所定負圧に吸引空間
の負圧が復帰した際には供給ポンプ等の動作を自動的に
復帰再開させるなどしてノズルよりのめっき液の噴射を
正常動作に復帰可能に構成してなるストライプめっき装
置。(1) A nozzle that sprays the plating solution in the plating solution tank toward the plating surface, a jacket that partitions the periphery of the nozzle and forms a plating opening surface, and a negative pressure inside the plating tank that sprays the plating solution. and a suction means for recovering the plating solution into a plating tank, and in an apparatus for plating a surface to be plated by sliding a strip to be plated on an opening surface of the mantle, the negative pressure in the suction space for the plating solution A negative pressure sensor capable of detecting is provided, and the negative pressure sensor and the plating solution supply side are configured to be automatically controlled in conjunction with each other, and the supply pump is activated when the negative pressure in the suction space fluctuates from a predetermined value. On the other hand, when the negative pressure in the suction space returns to a predetermined negative pressure, the operation of the supply pump, etc. is automatically restarted to control the injection of plating solution from the nozzle. A stripe plating device configured to enable the spraying of plating solution to return to normal operation.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP32090389A JPH03183794A (en) | 1989-12-11 | 1989-12-11 | stripe plating equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP32090389A JPH03183794A (en) | 1989-12-11 | 1989-12-11 | stripe plating equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH03183794A true JPH03183794A (en) | 1991-08-09 |
Family
ID=18126557
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP32090389A Pending JPH03183794A (en) | 1989-12-11 | 1989-12-11 | stripe plating equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH03183794A (en) |
-
1989
- 1989-12-11 JP JP32090389A patent/JPH03183794A/en active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPH08173879A (en) | Method and device for coating moving support body in curtainform | |
| JP3811812B2 (en) | Coating equipment | |
| JPH03183794A (en) | stripe plating equipment | |
| US5374795A (en) | Wire cut electric discharge machine | |
| JP3241556B2 (en) | Supply method of skin pass liquid in skin pass mill of metal strip | |
| JPS6120027Y2 (en) | ||
| JP3760907B2 (en) | Continuous molten metal plating equipment | |
| JP2580810B2 (en) | Stripe plating equipment | |
| JPH0527715B2 (en) | ||
| JPS627840A (en) | Melt plating equipment | |
| JP2623792B2 (en) | Stripe plating equipment | |
| JPH03183793A (en) | Stripe-plating device | |
| JPH02153091A (en) | stripe plating equipment | |
| JP3714032B2 (en) | Wire cut electric discharge machine | |
| JP2951864B2 (en) | Temper rolling method and apparatus | |
| JP3187219B2 (en) | Continuous electroplating equipment for metal strip | |
| KR20260013020A (en) | Intermittent Pattern Formation Method and Coating System | |
| JPS59201724A (en) | Machining fluid supply device for wire cut electrical discharge machine | |
| JP2709968B2 (en) | High-speed resin coating method | |
| JP3019955B2 (en) | Paint treatment method and paint treatment equipment | |
| KR20260029934A (en) | Electrode coating method and Electrode coating apparatus | |
| JPH02153090A (en) | stripe plating equipment | |
| JPH02190495A (en) | Stripe plating device | |
| KR960005664Y1 (en) | Strip running stabilization device of hot dip plating line | |
| KR100225892B1 (en) | Soldering solvent application method |