JPH0320860U - - Google Patents
Info
- Publication number
- JPH0320860U JPH0320860U JP8014989U JP8014989U JPH0320860U JP H0320860 U JPH0320860 U JP H0320860U JP 8014989 U JP8014989 U JP 8014989U JP 8014989 U JP8014989 U JP 8014989U JP H0320860 U JPH0320860 U JP H0320860U
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor wafer
- wafer
- holding plate
- semiconductor
- duct
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 claims 3
- 239000003463 adsorbent Substances 0.000 claims 1
- 239000012212 insulator Substances 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 238000010884 ion-beam technique Methods 0.000 description 2
- 230000007935 neutral effect Effects 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
- Electron Beam Exposure (AREA)
Description
第１図は本考案のウエハ保持板の平面図、第２
図は従来のチヤージアツプ防止を模式的に示す側
面図である。 １……ウエハ、２……ウエハ保持板、２ａ……
ウエハ保持部、３……イオンビーム、３ａ……偏
向されたイオンビーム、４……中性器、５……分
離器、６……ダクト吸着体。
図は従来のチヤージアツプ防止を模式的に示す側
面図である。 １……ウエハ、２……ウエハ保持板、２ａ……
ウエハ保持部、３……イオンビーム、３ａ……偏
向されたイオンビーム、４……中性器、５……分
離器、６……ダクト吸着体。
Claims (1)
- 荷電ビームの照射領域に、半導体ウエハよりも
静電容量が小さい絶縁体からなるダクト吸着体を
前記半導体ウエハの近傍に配置したウエハ保持板
を有してなる半導体製造処理装置。
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8014989U JPH0740297Y2 (ja) | 1989-07-10 | 1989-07-10 | 半導体製造処理装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8014989U JPH0740297Y2 (ja) | 1989-07-10 | 1989-07-10 | 半導体製造処理装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0320860U true JPH0320860U (ja) | 1991-02-28 |
| JPH0740297Y2 JPH0740297Y2 (ja) | 1995-09-13 |
Family
ID=31624947
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8014989U Expired - Lifetime JPH0740297Y2 (ja) | 1989-07-10 | 1989-07-10 | 半導体製造処理装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0740297Y2 (ja) |
-
1989
- 1989-07-10 JP JP8014989U patent/JPH0740297Y2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0740297Y2 (ja) | 1995-09-13 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |