JPH0351113B2 - - Google Patents

Info

Publication number
JPH0351113B2
JPH0351113B2 JP59143230A JP14323084A JPH0351113B2 JP H0351113 B2 JPH0351113 B2 JP H0351113B2 JP 59143230 A JP59143230 A JP 59143230A JP 14323084 A JP14323084 A JP 14323084A JP H0351113 B2 JPH0351113 B2 JP H0351113B2
Authority
JP
Japan
Prior art keywords
trench
groove
forming
insulating film
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59143230A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6123360A (ja
Inventor
Kenji Miura
Ban Nakajima
Kazushige Minegishi
Takashi Morie
Satofumi Somatani
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NTT Inc
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP59143230A priority Critical patent/JPS6123360A/ja
Priority to US06/753,283 priority patent/US4672410A/en
Priority to KR1019850004990A priority patent/KR900000207B1/ko
Priority to DE19853525418 priority patent/DE3525418A1/de
Publication of JPS6123360A publication Critical patent/JPS6123360A/ja
Publication of JPH0351113B2 publication Critical patent/JPH0351113B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B12/00Dynamic random access memory [DRAM] devices
    • H10B12/30DRAM devices comprising one-transistor - one-capacitor [1T-1C] memory cells
    • H10B12/39DRAM devices comprising one-transistor - one-capacitor [1T-1C] memory cells the capacitor and the transistor being in a same trench
    • H10B12/395DRAM devices comprising one-transistor - one-capacitor [1T-1C] memory cells the capacitor and the transistor being in a same trench the transistor being vertical

Landscapes

  • Semiconductor Integrated Circuits (AREA)
  • Semiconductor Memories (AREA)
JP59143230A 1984-07-12 1984-07-12 半導体記憶装置およびその製造方法 Granted JPS6123360A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP59143230A JPS6123360A (ja) 1984-07-12 1984-07-12 半導体記憶装置およびその製造方法
US06/753,283 US4672410A (en) 1984-07-12 1985-07-09 Semiconductor memory device with trench surrounding each memory cell
KR1019850004990A KR900000207B1 (ko) 1984-07-12 1985-07-12 반도체 기억장치와 그 제조방법
DE19853525418 DE3525418A1 (de) 1984-07-12 1985-07-12 Halbleiterspeichereinrichtung und verfahren zu ihrer herstellung

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59143230A JPS6123360A (ja) 1984-07-12 1984-07-12 半導体記憶装置およびその製造方法

Publications (2)

Publication Number Publication Date
JPS6123360A JPS6123360A (ja) 1986-01-31
JPH0351113B2 true JPH0351113B2 (de) 1991-08-05

Family

ID=15333925

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59143230A Granted JPS6123360A (ja) 1984-07-12 1984-07-12 半導体記憶装置およびその製造方法

Country Status (1)

Country Link
JP (1) JPS6123360A (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4651184A (en) * 1984-08-31 1987-03-17 Texas Instruments Incorporated Dram cell and array
JPS6258657A (ja) * 1985-09-06 1987-03-14 Matsushita Electric Ind Co Ltd 半導体装置の製造方法
JP2674744B2 (ja) * 1986-06-10 1997-11-12 ソニー株式会社 半導体メモリ装置の製造方法
JP2512902B2 (ja) * 1986-07-28 1996-07-03 日本電気株式会社 半導体記憶装置の製造方法
JP2521928B2 (ja) * 1986-11-13 1996-08-07 三菱電機株式会社 半導体記憶装置
JPS63115367A (ja) * 1986-11-04 1988-05-19 Matsushita Electronics Corp 半導体装置の製造方法
JPH0744274B2 (ja) * 1986-12-08 1995-05-15 株式会社東芝 半導体装置及びその製造方法
JPH0748525B2 (ja) * 1987-03-24 1995-05-24 沖電気工業株式会社 半導体メモリ装置の製造方法
JP2012054334A (ja) * 2010-08-31 2012-03-15 Elpida Memory Inc 半導体デバイス及びその製造方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5636164U (de) * 1979-08-27 1981-04-07
JPS5919366A (ja) * 1982-07-23 1984-01-31 Hitachi Ltd 半導体記憶装置
JPS6122665A (ja) * 1984-07-11 1986-01-31 Hitachi Ltd 半導体集積回路装置

Also Published As

Publication number Publication date
JPS6123360A (ja) 1986-01-31

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