JPH0351113B2 - - Google Patents
Info
- Publication number
- JPH0351113B2 JPH0351113B2 JP59143230A JP14323084A JPH0351113B2 JP H0351113 B2 JPH0351113 B2 JP H0351113B2 JP 59143230 A JP59143230 A JP 59143230A JP 14323084 A JP14323084 A JP 14323084A JP H0351113 B2 JPH0351113 B2 JP H0351113B2
- Authority
- JP
- Japan
- Prior art keywords
- trench
- groove
- forming
- insulating film
- semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B12/00—Dynamic random access memory [DRAM] devices
- H10B12/30—DRAM devices comprising one-transistor - one-capacitor [1T-1C] memory cells
- H10B12/39—DRAM devices comprising one-transistor - one-capacitor [1T-1C] memory cells the capacitor and the transistor being in a same trench
- H10B12/395—DRAM devices comprising one-transistor - one-capacitor [1T-1C] memory cells the capacitor and the transistor being in a same trench the transistor being vertical
Landscapes
- Semiconductor Integrated Circuits (AREA)
- Semiconductor Memories (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59143230A JPS6123360A (ja) | 1984-07-12 | 1984-07-12 | 半導体記憶装置およびその製造方法 |
| US06/753,283 US4672410A (en) | 1984-07-12 | 1985-07-09 | Semiconductor memory device with trench surrounding each memory cell |
| KR1019850004990A KR900000207B1 (ko) | 1984-07-12 | 1985-07-12 | 반도체 기억장치와 그 제조방법 |
| DE19853525418 DE3525418A1 (de) | 1984-07-12 | 1985-07-12 | Halbleiterspeichereinrichtung und verfahren zu ihrer herstellung |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59143230A JPS6123360A (ja) | 1984-07-12 | 1984-07-12 | 半導体記憶装置およびその製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6123360A JPS6123360A (ja) | 1986-01-31 |
| JPH0351113B2 true JPH0351113B2 (de) | 1991-08-05 |
Family
ID=15333925
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59143230A Granted JPS6123360A (ja) | 1984-07-12 | 1984-07-12 | 半導体記憶装置およびその製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6123360A (de) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4651184A (en) * | 1984-08-31 | 1987-03-17 | Texas Instruments Incorporated | Dram cell and array |
| JPS6258657A (ja) * | 1985-09-06 | 1987-03-14 | Matsushita Electric Ind Co Ltd | 半導体装置の製造方法 |
| JP2674744B2 (ja) * | 1986-06-10 | 1997-11-12 | ソニー株式会社 | 半導体メモリ装置の製造方法 |
| JP2512902B2 (ja) * | 1986-07-28 | 1996-07-03 | 日本電気株式会社 | 半導体記憶装置の製造方法 |
| JP2521928B2 (ja) * | 1986-11-13 | 1996-08-07 | 三菱電機株式会社 | 半導体記憶装置 |
| JPS63115367A (ja) * | 1986-11-04 | 1988-05-19 | Matsushita Electronics Corp | 半導体装置の製造方法 |
| JPH0744274B2 (ja) * | 1986-12-08 | 1995-05-15 | 株式会社東芝 | 半導体装置及びその製造方法 |
| JPH0748525B2 (ja) * | 1987-03-24 | 1995-05-24 | 沖電気工業株式会社 | 半導体メモリ装置の製造方法 |
| JP2012054334A (ja) * | 2010-08-31 | 2012-03-15 | Elpida Memory Inc | 半導体デバイス及びその製造方法 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5636164U (de) * | 1979-08-27 | 1981-04-07 | ||
| JPS5919366A (ja) * | 1982-07-23 | 1984-01-31 | Hitachi Ltd | 半導体記憶装置 |
| JPS6122665A (ja) * | 1984-07-11 | 1986-01-31 | Hitachi Ltd | 半導体集積回路装置 |
-
1984
- 1984-07-12 JP JP59143230A patent/JPS6123360A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6123360A (ja) | 1986-01-31 |
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