JPH0363930U - - Google Patents
Info
- Publication number
- JPH0363930U JPH0363930U JP12499889U JP12499889U JPH0363930U JP H0363930 U JPH0363930 U JP H0363930U JP 12499889 U JP12499889 U JP 12499889U JP 12499889 U JP12499889 U JP 12499889U JP H0363930 U JPH0363930 U JP H0363930U
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- film transistor
- semiconductor layer
- utility
- scope
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000010409 thin film Substances 0.000 claims description 3
- 239000004065 semiconductor Substances 0.000 claims description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 1
- 229910052799 carbon Inorganic materials 0.000 claims 1
- 239000010408 film Substances 0.000 description 4
- 238000010586 diagram Methods 0.000 description 2
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Landscapes
- Thin Film Transistor (AREA)
Description
第1図は本考案の薄膜トランジスタの一実施例
の断面図、第2図はプラズマCVD法によりa−
Si:H:C膜を成膜する時の流量比(CH4/
SiH4)と、a−Si:H:C膜の暗導電率(
σd)、光導電率(σPh)及びこれらの比(σ
Ph/σd)との関係を示す図、第3図は上記の
流量比(CH4/SiH4)とトランジスタのオ
ン電流IONとの関係を示す図、第4図は従来の
薄膜トランジスタの断面図である。 11……基板、12……ゲート電極、13……
ゲート絶縁膜、14……半導体層、15……コン
タクト層、16……ソース・ドレイン電極、17
……保護絶縁膜、18……遮光膜。
の断面図、第2図はプラズマCVD法によりa−
Si:H:C膜を成膜する時の流量比(CH4/
SiH4)と、a−Si:H:C膜の暗導電率(
σd)、光導電率(σPh)及びこれらの比(σ
Ph/σd)との関係を示す図、第3図は上記の
流量比(CH4/SiH4)とトランジスタのオ
ン電流IONとの関係を示す図、第4図は従来の
薄膜トランジスタの断面図である。 11……基板、12……ゲート電極、13……
ゲート絶縁膜、14……半導体層、15……コン
タクト層、16……ソース・ドレイン電極、17
……保護絶縁膜、18……遮光膜。
Claims (1)
- 半導体層に微量の炭素を混入したことを特徴と
する薄膜トランジスタ。
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12499889U JPH0363930U (ja) | 1989-10-25 | 1989-10-25 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12499889U JPH0363930U (ja) | 1989-10-25 | 1989-10-25 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0363930U true JPH0363930U (ja) | 1991-06-21 |
Family
ID=31672887
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12499889U Pending JPH0363930U (ja) | 1989-10-25 | 1989-10-25 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0363930U (ja) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60111472A (ja) * | 1983-11-22 | 1985-06-17 | Matsushita Electric Ind Co Ltd | 半導体装置 |
| JPS63219171A (ja) * | 1987-03-06 | 1988-09-12 | Hosiden Electronics Co Ltd | 薄膜トランジスタ |
-
1989
- 1989-10-25 JP JP12499889U patent/JPH0363930U/ja active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60111472A (ja) * | 1983-11-22 | 1985-06-17 | Matsushita Electric Ind Co Ltd | 半導体装置 |
| JPS63219171A (ja) * | 1987-03-06 | 1988-09-12 | Hosiden Electronics Co Ltd | 薄膜トランジスタ |
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