JPH0364461U - - Google Patents

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Publication number
JPH0364461U
JPH0364461U JP12589589U JP12589589U JPH0364461U JP H0364461 U JPH0364461 U JP H0364461U JP 12589589 U JP12589589 U JP 12589589U JP 12589589 U JP12589589 U JP 12589589U JP H0364461 U JPH0364461 U JP H0364461U
Authority
JP
Japan
Prior art keywords
case
oven
stores
solid element
ion implantation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12589589U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP12589589U priority Critical patent/JPH0364461U/ja
Publication of JPH0364461U publication Critical patent/JPH0364461U/ja
Pending legal-status Critical Current

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  • Electron Sources, Ion Sources (AREA)

Description

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本考案に係るイオン注入装置のイオン
源の断面図である。第2図はイオン注入装置全体
の概略構成図、第3図は従来のイオン注入装置の
イオン源の断面図である。 7……半導体ウエーハ、10……ケース、10
a……先端側、20……オーブン、30……アー
クチヤンバ、31……フイラメント、E……固定
元素。
FIG. 1 is a sectional view of an ion source of an ion implantation apparatus according to the present invention. FIG. 2 is a schematic diagram of the entire ion implantation device, and FIG. 3 is a cross-sectional view of the ion source of the conventional ion implantation device. 7... Semiconductor wafer, 10... Case, 10
a... Tip side, 20... Oven, 30... Arc chamber, 31... Filament, E... Fixed element.

Claims (1)

【実用新案登録請求の範囲】 固体元素を収納し、かつ、前記固体元素を加熱
して気化させるオーブンと、前記オーブンを収納
するケースと、前記ケースの先端側に連設し、架
設したフイラメントによつて、上記気化したガス
をイオン化させるアークチヤンバとを具備したイ
オン注入装置において、 上記ケース内に複数のオーブンを収納したこと
を特徴とするイオン注入装置。
[Claims for Utility Model Registration] An oven that stores a solid element and heats and vaporizes the solid element, a case that stores the oven, and a filament that is connected to and installed on the tip side of the case. Accordingly, an ion implantation apparatus comprising an arc chamber for ionizing the vaporized gas is characterized in that a plurality of ovens are housed in the case.
JP12589589U 1989-10-27 1989-10-27 Pending JPH0364461U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12589589U JPH0364461U (en) 1989-10-27 1989-10-27

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12589589U JPH0364461U (en) 1989-10-27 1989-10-27

Publications (1)

Publication Number Publication Date
JPH0364461U true JPH0364461U (en) 1991-06-24

Family

ID=31673745

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12589589U Pending JPH0364461U (en) 1989-10-27 1989-10-27

Country Status (1)

Country Link
JP (1) JPH0364461U (en)

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