JPH0369852U - - Google Patents
Info
- Publication number
- JPH0369852U JPH0369852U JP13137589U JP13137589U JPH0369852U JP H0369852 U JPH0369852 U JP H0369852U JP 13137589 U JP13137589 U JP 13137589U JP 13137589 U JP13137589 U JP 13137589U JP H0369852 U JPH0369852 U JP H0369852U
- Authority
- JP
- Japan
- Prior art keywords
- ion source
- introduction tube
- oven
- plasma generation
- heating filament
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010438 heat treatment Methods 0.000 claims description 3
- 239000000126 substance Substances 0.000 claims 1
Landscapes
- Electron Sources, Ion Sources (AREA)
Description
第１図はこの考案の一実施例のイオン源の基本
的な構成を示す断面図、第２図ａは要部断面図、
ｂはその平面図、第３図ａは従来例を示す要部断
面図、ｂはその平面図である。
１……プラズマ生成容器、７……オーブン、８
……導入管、１０……給電端子、１１……孔部、
１２……加熱用フイラメント。
FIG. 1 is a sectional view showing the basic configuration of an ion source according to an embodiment of this invention, FIG. 2a is a sectional view of the main part,
3b is a plan view thereof, FIG. 3a is a sectional view of a main part showing a conventional example, and FIG. 3b is a plan view thereof. 1... Plasma generation container, 7... Oven, 8
...Introduction pipe, 10 ... Power supply terminal, 11 ... Hole,
12...Heating filament.
Claims (1)
オーブン内で発生する蒸気をプラズマ生成容器内
に導く導入管とを備えたイオン源において、 前記導入管の外側に、前記プラズマ生成容器側
に開口する孔部を有する２つの給電端子を取付け
、この導入管の内側に、加熱用フイラメントの中
間部を挿入し、この加熱用フイラメントの両端部
を前記孔部に挿入して支持するようにしたことを
特徴とするイオン源。[Claims for Utility Model Registration] In an ion source equipped with an oven that houses and heats evaporated substances and an introduction tube that guides steam generated in the oven into a plasma generation container, outside the introduction tube, Two power supply terminals each having a hole opening toward the plasma generation container are attached, an intermediate portion of a heating filament is inserted into the introduction tube, and both ends of the heating filament are inserted into the hole. An ion source characterized in that it is supported by an ion source.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13137589U JPH0369852U (en) | 1989-11-10 | 1989-11-10 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13137589U JPH0369852U (en) | 1989-11-10 | 1989-11-10 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0369852U true JPH0369852U (en) | 1991-07-11 |
Family
ID=31678889
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13137589U Pending JPH0369852U (en) | 1989-11-10 | 1989-11-10 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0369852U (en) |
-
1989
- 1989-11-10 JP JP13137589U patent/JPH0369852U/ja active Pending