JPH0390432U - - Google Patents
Info
- Publication number
- JPH0390432U JPH0390432U JP15215389U JP15215389U JPH0390432U JP H0390432 U JPH0390432 U JP H0390432U JP 15215389 U JP15215389 U JP 15215389U JP 15215389 U JP15215389 U JP 15215389U JP H0390432 U JPH0390432 U JP H0390432U
- Authority
- JP
- Japan
- Prior art keywords
- rings
- static pressure
- reaction tube
- seal portion
- space
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003068 static effect Effects 0.000 claims description 3
- 239000004065 semiconductor Substances 0.000 claims description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 1
- 239000007789 gas Substances 0.000 claims 1
- 239000012495 reaction gas Substances 0.000 claims 1
- 235000012431 wafers Nutrition 0.000 claims 1
- 238000004518 low pressure chemical vapour deposition Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
Description
第１図は本考案の一実施例を示す要部の縦断面
図である。第２図は従来の半導体製造装置（減圧
ＣＶＤ装置）の要部の縦断面図である。
１……反応管、１２……シール部、１３……静
圧計、１４，１５……オーリング。
FIG. 1 is a vertical cross-sectional view of the main parts of an embodiment of the present invention. FIG. 2 is a longitudinal cross-sectional view of the main parts of a conventional semiconductor manufacturing apparatus (low pressure CVD apparatus). 1... Reaction tube, 12... Seal part, 13... Static pressure gauge, 14, 15... O-ring.
Claims (1)
ーハのガス処理を行う反応管と、反応管の外周に
２本のオーリングを装着してそのオーリング間に
空間を形成した２重構造のシール部と、シール部
の前記２本のオーリング間の空間の静圧を監視し
てシール部のリークを検知する静圧計とを具備し
てなる半導体製造装置。 A reaction tube that performs gas treatment on semiconductor wafers using a reaction gas containing hydrogen gas, and a double-layer seal with two O-rings attached to the outer periphery of the reaction tube and a space formed between the O-rings. and a static pressure gauge that monitors the static pressure in the space between the two O-rings of the seal portion to detect leakage from the seal portion.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15215389U JPH0390432U (en) | 1989-12-28 | 1989-12-28 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15215389U JPH0390432U (en) | 1989-12-28 | 1989-12-28 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0390432U true JPH0390432U (en) | 1991-09-13 |
Family
ID=31698428
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15215389U Pending JPH0390432U (en) | 1989-12-28 | 1989-12-28 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0390432U (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009252635A (en) * | 2008-04-09 | 2009-10-29 | Tokyo Electron Ltd | Sealing structure of plasma processing apparatus, sealing method, and plasma processing apparatus |
| JP4977690B2 (en) * | 2006-04-06 | 2012-07-18 | 梅基 正美 | Wheelbarrow wheels and universal wheels |
| JP2016004868A (en) * | 2014-06-16 | 2016-01-12 | 古河機械金属株式会社 | Fixture for gas circulation pipe, and vapor growth device |
-
1989
- 1989-12-28 JP JP15215389U patent/JPH0390432U/ja active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4977690B2 (en) * | 2006-04-06 | 2012-07-18 | 梅基 正美 | Wheelbarrow wheels and universal wheels |
| JP2009252635A (en) * | 2008-04-09 | 2009-10-29 | Tokyo Electron Ltd | Sealing structure of plasma processing apparatus, sealing method, and plasma processing apparatus |
| JP2016004868A (en) * | 2014-06-16 | 2016-01-12 | 古河機械金属株式会社 | Fixture for gas circulation pipe, and vapor growth device |