JPH042181B2 - - Google Patents

Info

Publication number
JPH042181B2
JPH042181B2 JP59016258A JP1625884A JPH042181B2 JP H042181 B2 JPH042181 B2 JP H042181B2 JP 59016258 A JP59016258 A JP 59016258A JP 1625884 A JP1625884 A JP 1625884A JP H042181 B2 JPH042181 B2 JP H042181B2
Authority
JP
Japan
Prior art keywords
phenol
cresol
catalyst
acid
reaction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59016258A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60159846A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1625884A priority Critical patent/JPS60159846A/ja
Priority to CA000448523A priority patent/CA1255952A/en
Priority to EP84301389A priority patent/EP0118291B1/de
Priority to DE8484301389T priority patent/DE3482665D1/de
Priority to MX200530A priority patent/MX163264B/es
Priority to KR1019840001085A priority patent/KR920003435B1/ko
Publication of JPS60159846A publication Critical patent/JPS60159846A/ja
Priority to US07/175,658 priority patent/US4863829A/en
Publication of JPH042181B2 publication Critical patent/JPH042181B2/ja
Priority to SG98/92A priority patent/SG9892G/en
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
JP1625884A 1983-03-04 1984-01-31 ポジ型フオトレジスト組成物 Granted JPS60159846A (ja)

Priority Applications (8)

Application Number Priority Date Filing Date Title
JP1625884A JPS60159846A (ja) 1984-01-31 1984-01-31 ポジ型フオトレジスト組成物
CA000448523A CA1255952A (en) 1983-03-04 1984-02-29 Positive type photoresist composition
EP84301389A EP0118291B1 (de) 1983-03-04 1984-03-02 Photoschutzschicht-Zusammensetzungen mit "Novolak"-Kunststoff
DE8484301389T DE3482665D1 (de) 1983-03-04 1984-03-02 Photoschutzschicht-zusammensetzungen mit "novolak"-kunststoff.
MX200530A MX163264B (es) 1983-03-04 1984-03-02 Composicion fotorresistente de tipo positivo
KR1019840001085A KR920003435B1 (ko) 1983-03-04 1984-03-03 포지티브형 감광성 내식막 조성물
US07/175,658 US4863829A (en) 1983-03-04 1988-03-29 Positive type high gamma-value photoresist composition with novolak resin possessing
SG98/92A SG9892G (en) 1983-03-04 1992-02-01 Photoresist composition containing a novolak resin

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1625884A JPS60159846A (ja) 1984-01-31 1984-01-31 ポジ型フオトレジスト組成物

Publications (2)

Publication Number Publication Date
JPS60159846A JPS60159846A (ja) 1985-08-21
JPH042181B2 true JPH042181B2 (de) 1992-01-16

Family

ID=11911533

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1625884A Granted JPS60159846A (ja) 1983-03-04 1984-01-31 ポジ型フオトレジスト組成物

Country Status (1)

Country Link
JP (1) JPS60159846A (de)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61141441A (ja) * 1984-12-14 1986-06-28 Tokyo Ohka Kogyo Co Ltd ポジ型ホトレジスト組成物
JPH0650395B2 (ja) * 1985-08-09 1994-06-29 東京応化工業株式会社 ポジ型ホトレジスト用組成物
JPS62124557A (ja) * 1985-11-25 1987-06-05 Konishiroku Photo Ind Co Ltd 感光性組成物及び感光性平版印刷版材料
JPS62161146A (ja) * 1986-01-10 1987-07-17 Mitsubishi Petrochem Co Ltd ホトレジスト組成物
JP2626655B2 (ja) * 1986-01-24 1997-07-02 住友化学工業株式会社 ポジ型フォトレジスト用ノボラック樹脂の製造法
JPH0654387B2 (ja) * 1986-05-02 1994-07-20 東京応化工業株式会社 ポジ型ホトレジスト組成物
JPH0656487B2 (ja) * 1986-05-02 1994-07-27 東京応化工業株式会社 ポジ型ホトレジスト用組成物
JPH0654388B2 (ja) * 1986-05-02 1994-07-20 東京応化工業株式会社 ポジ型ホトレジスト組成物
JP2564485B2 (ja) * 1986-05-19 1996-12-18 住友化学工業株式会社 ポジ型フォトレジスト用クレゾールノボラック樹脂
JPH03253859A (ja) * 1990-03-05 1991-11-12 Fuji Photo Film Co Ltd 感電離放射線性樹脂組成物
EP0720052A1 (de) * 1994-12-27 1996-07-03 Mitsubishi Chemical Corporation Fotoempfindliche Zusammensetzung und fotolithographische Druckplatte
JP2542800B2 (ja) * 1995-05-29 1996-10-09 東京応化工業株式会社 半導体デバイス用レジストパタ―ンの製造方法
JP4273897B2 (ja) 2003-09-25 2009-06-03 住友ベークライト株式会社 フォトレジスト用樹脂の製造方法
EP2639637B1 (de) 2010-11-10 2017-03-22 DIC Corporation Positiv wirkende photolackzusammensetzung

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5817112A (ja) * 1981-06-22 1983-02-01 フイリツプ・エイ・ハント・ケミカル・コ−ポレイシヨン ポジ型ノボラツクホトレジスト組成物及びその調製物
JPS59162542A (ja) * 1983-03-04 1984-09-13 Sumitomo Chem Co Ltd ポジ型フオトレジスト組成物

Also Published As

Publication number Publication date
JPS60159846A (ja) 1985-08-21

Similar Documents

Publication Publication Date Title
KR920003435B1 (ko) 포지티브형 감광성 내식막 조성물
US4837121A (en) Thermally stable light-sensitive compositions with o-quinone diazide and phenolic resin
JPH01105243A (ja) ポジ型フォトレジスト用ノボラック樹脂
JPH042181B2 (de)
JPH03228059A (ja) ポジ型レジスト組成物
US5225311A (en) Positive photoresist composition
EP0458988B1 (de) Positiv arbeitende photoresistzusammensetzung
JPH0232352A (ja) ポジ型レジスト用組成物
JP2625883B2 (ja) ポジ型レジスト組成物
EP0424464B1 (de) Wärmestabile phenol-harzzusammensetzungen und deren verwendung bei lichtempfindlichen zusammensetzungen
JPH04261B2 (de)
JP2625882B2 (ja) ポジ型レジスト用組成物
JPH08262712A (ja) 感放射線性樹脂組成物
WO1992012205A1 (fr) Composition pour reserve positive
JP2629271B2 (ja) ポジ型レジスト用組成物
JP3931486B2 (ja) ポジ型レジスト組成物
US5322757A (en) Positive photoresists comprising a novolak resin made from 2,3-dimethyl phenol,2,3,5-trimethylphenol and aldehyde with no meta-cresol present
JPH02300751A (ja) ポジ型フォトレジスト組成物
US4970287A (en) Thermally stable phenolic resin compositions with ortho, ortho methylene linkage
JPH0219846A (ja) 集積回路製作用ポジ型レジスト組成物の製造方法
KR20000029176A (ko) 포지티브형 포토레지스트 조성물
JPH0588466B2 (de)
JPS61275748A (ja) ポジ型フオトレジスト組成物
US5024921A (en) Thermally stable light-sensitive compositions with o-quinone diazide and phenolic resin used in a method of forming a positive photoresist image
JPH0819021B2 (ja) ポリフェノール化合物

Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees