JPH0440319B2 - - Google Patents
Info
- Publication number
- JPH0440319B2 JPH0440319B2 JP60074373A JP7437385A JPH0440319B2 JP H0440319 B2 JPH0440319 B2 JP H0440319B2 JP 60074373 A JP60074373 A JP 60074373A JP 7437385 A JP7437385 A JP 7437385A JP H0440319 B2 JPH0440319 B2 JP H0440319B2
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- semiconductor thin
- deflection
- speed
- frequency
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60074373A JPS61236677A (ja) | 1985-04-10 | 1985-04-10 | 半導体薄膜結晶層の製造方法 |
| US06/762,374 US4662949A (en) | 1985-02-15 | 1985-08-05 | Method of forming a single crystal semiconductor layer from a non-single crystalline material by a shaped energy beam |
| US06/904,942 US4746803A (en) | 1985-02-15 | 1986-09-08 | Method of forming a single crystal semiconductor layer from a non-single-crystalline material and apparatus for forming the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60074373A JPS61236677A (ja) | 1985-04-10 | 1985-04-10 | 半導体薄膜結晶層の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61236677A JPS61236677A (ja) | 1986-10-21 |
| JPH0440319B2 true JPH0440319B2 (cs) | 1992-07-02 |
Family
ID=13545300
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60074373A Granted JPS61236677A (ja) | 1985-02-15 | 1985-04-10 | 半導体薄膜結晶層の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61236677A (cs) |
-
1985
- 1985-04-10 JP JP60074373A patent/JPS61236677A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61236677A (ja) | 1986-10-21 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPH10242073A (ja) | レーザー照射装置およびレーザー照射方法 | |
| JPH0410216B2 (cs) | ||
| US4746803A (en) | Method of forming a single crystal semiconductor layer from a non-single-crystalline material and apparatus for forming the same | |
| JPS6115319A (ja) | 半導体装置の製造方法 | |
| JPS61236677A (ja) | 半導体薄膜結晶層の製造方法 | |
| JPS62145718A (ja) | 半導体単結晶層の製造方法 | |
| US20070080647A1 (en) | Divergence-controlled hybrid multiple electron beam-emitting device | |
| JPH0136974B2 (cs) | ||
| JPH0241899B2 (cs) | ||
| JPH0136688B2 (cs) | ||
| JPS61241910A (ja) | 半導体単結晶層の製造方法 | |
| JPH01162321A (ja) | 半導体単結晶層の製造方法 | |
| JPH0451438A (ja) | 電子ビーム露光装置及び露光方法 | |
| JPS61236678A (ja) | 半導体単結晶層の製造方法及び電子ビ−ムアニ−ル装置 | |
| JPS6347256B2 (cs) | ||
| JPH057858B2 (cs) | ||
| JPS5934640A (ja) | 絶縁物質上の半導体膜の粗大結晶粒化乃至単結晶化法 | |
| JPS58115815A (ja) | 電子ビ−ムアニ−ル方法 | |
| JPH0132628B2 (cs) | ||
| JPS5856317A (ja) | 半導体薄膜の製造方法 | |
| JPS59121826A (ja) | 半導体単結晶膜の製造方法 | |
| JPH031526A (ja) | 半導体単結晶層の製造方法 | |
| JP2999212B2 (ja) | 溶融再結晶化法による半導体薄膜の製造方法 | |
| JPS62241248A (ja) | 集束イオン線装置 | |
| JPH0354849B2 (cs) |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |