JPH0443603A - How to manufacture baristas - Google Patents
How to manufacture baristasInfo
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- JPH0443603A JPH0443603A JP2151976A JP15197690A JPH0443603A JP H0443603 A JPH0443603 A JP H0443603A JP 2151976 A JP2151976 A JP 2151976A JP 15197690 A JP15197690 A JP 15197690A JP H0443603 A JPH0443603 A JP H0443603A
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Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明は電気機器、電子機器で発生ずる異常高電圧、ノ
イズ、静電気などから機器の半導体及び回路を保護する
ためのコンデンサ特性と71′リスク特性を有する電圧
依存性非直線抵抗体磁器組成物およびバリスタの製造方
法に関するものである。DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to capacitor characteristics and 71' risk characteristics for protecting equipment semiconductors and circuits from abnormal high voltages, noise, static electricity, etc. generated in electrical and electronic equipment. The present invention relates to a method for manufacturing a voltage-dependent nonlinear resistor ceramic composition and a varistor.
従来の技術
従来、各種の電気機器、電子機器における異常高電圧の
吸収、ノイズの除去、火花消去、静電気対策のために電
圧依存性非直線抵抗特性を有するSiCバリスタや、
ZnO系バリスタなどが使用されているやこのようなバ
リスタの電圧−電流特性は近似的に次式のように表すこ
とができる。BACKGROUND ART Conventionally, SiC varistors with voltage-dependent nonlinear resistance characteristics have been used to absorb abnormally high voltages, remove noise, eliminate sparks, and counter static electricity in various electrical and electronic devices.
When a ZnO-based varistor or the like is used, the voltage-current characteristics of such a varistor can be expressed approximately as shown in the following equation.
α
1=(V/C)
ここで、■はt洟9、■は電圧、Cはバリスタ固有の定
数、αは電圧−電流非直線指数である。α 1 = (V/C) Here, ■ is the voltage, C is a constant specific to the varistor, and α is the voltage-current nonlinear index.
SiCバリスタのαは2〜7程度、ZnO系バリスタで
はαが50にもおよぶものがある。このようなバリスタ
は比較的高い電圧の吸収には優れた性能を有しているが
、誘電率が低く、固有の静電容量が小さいため、バリス
タ電圧以下の比較的低い電圧の吸収にはほとんど効果を
示さず、また誘電損失tanδが5〜10%と大きい。The α of SiC varistors is about 2 to 7, and the α of some ZnO-based varistors is as high as 50. Such varistors have excellent performance in absorbing relatively high voltages, but due to their low dielectric constant and small inherent capacitance, they have little ability to absorb relatively low voltages below the varistor voltage. It has no effect, and the dielectric loss tan δ is as large as 5 to 10%.
一方、これらの低電圧のノイズなどの除去には見かけの
誘電率が5X10’程度で、tanδが1%前後の半導
体コンデンサが利用されている。しかし、このような半
導体コンデンサはサージなどによりある限度以上の電圧
または電流が印加されると、静電容量が減少したり破壊
したりして、コンデンサとしての機能を果たさなくなっ
たりする。On the other hand, semiconductor capacitors with an apparent dielectric constant of about 5×10' and a tan δ of about 1% are used to remove these low voltage noises. However, when a voltage or current exceeding a certain limit is applied to such a semiconductor capacitor due to a surge or the like, the capacitance decreases or breaks down, and the capacitor no longer functions as a capacitor.
そこで最近になって5rTi03を主成分とし、バリス
タ特性とコンデンサ特性の両方の機能を有するものが開
発され、コンビヱータなどの電子機器におけるIC,L
SIなどの半導体素子の保護に利用されている。Recently, a product containing 5rTi03 as the main component and having both varistor and capacitor properties has been developed, and it is used as IC and L in electronic devices such as combinators.
It is used to protect semiconductor devices such as SI.
発明が解決しようとする課題
1−8記の5rTi(hを主成分とするバリスタとコン
デンサの両方の機能を有する素子は、ZnO系バリスタ
に比べmN率が約10倍と大きいが、αやサージ耐量が
小さく、バリスタ電圧を低くすると特性が劣化しやすい
といった欠点を有していた。Problems to be Solved by the Invention The element having the functions of both a varistor and a capacitor whose main component is 5rTi (h) as described in Problem 1-8 has an mN ratio about 10 times higher than that of a ZnO-based varistor, but it has problems with α and surge. It has the disadvantage that its withstand capacity is small, and its characteristics tend to deteriorate when the varistor voltage is lowered.
そこでオ発明では、誘電率が大きく、バリスタ電圧が低
く、αが大きいと共にサージ耐量が大きい電圧依存性非
直線抵抗体磁器組成物およびバリスタの製造方法を掃供
することを目的とするものである。Therefore, the object of the present invention is to provide a voltage-dependent nonlinear resistor ceramic composition having a large dielectric constant, a low varistor voltage, a large α, and a large surge withstand capacity, and a method for manufacturing the varistor.
!l!!題を解決するための手段
上記の問題点を解決するために本発明では、Sr1−x
MgllTi03 (0.001≦x≦0.300)
(以下第1成分と呼ぶ)を90.000−99.998
mol!、NbtOs+ TaxesWO3,Oy!0
3.hos、LatOs+Ce(h、5at(hrPr
601++Nd2O3,xのうち少なくとも1種類以上
(以下第2成分と呼ぶ)を0.001〜5.000s+
olχ、Alt03,5bJ=、BaO,Be0p b
o 、 BJ3 、 Cr 2O3,:l 、FeJx
、 Cd01K 2O3,lCab、 C0tOi
+ Cu0Cu2O3,,l、i、O,LiF、MgO
,MnO,、Mo0=、NarO,NaF、Ni0Rh
2O3,i、 5eOz、 Ag2O3,,5iOz
、 SiC,SrO,Tl z(h、 Th0z 、
T iozν、O3,Bi、Os、ZnO,Zr0i、
5nOzのうち少なくとも1種類以上(以下第3成分と
呼ぶ)を0.001〜5.000molχ含有してなる
t成分100fj量部と、)IgTi(h60.000
〜32.500IlolX、 5iOz 40.00
0〜67.5molχからなる混合物を1200〜13
00℃で焼成してなる添加物(以■第4成分と呼ぶ)
0.001〜10.000重量部とからなる電圧依存
性非直線抵抗体M!i器組成物を得ることにより、問題
を解決しようとするものである。! l! ! Means for Solving the Problems In order to solve the above problems, in the present invention, Sr1-x
MgllTi03 (0.001≦x≦0.300)
(hereinafter referred to as the first component) is 90.000-99.998
Mol! ,NbtOs+ TaxesWO3,Oy! 0
3. hos, LatOs+Ce(h, 5at(hrPr
601++Nd2O3, x at least one type (hereinafter referred to as the second component) of 0.001 to 5.000s+
olχ, Alt03,5bJ=, BaO, Be0p b
o, BJ3, Cr2O3,:l, FeJx
, Cd01K 2O3, lCab, C0tOi
+ Cu0Cu2O3,,l,i,O,LiF,MgO
,MnO,,Mo0=,NarO,NaF,Ni0Rh
2O3,i, 5eOz, Ag2O3,,5iOz
, SiC, SrO, Tl z(h, Th0z,
Tiozν, O3, Bi, Os, ZnO, Zr0i,
100 fj parts of a t component containing 0.001 to 5.000 molχ of at least one type (hereinafter referred to as the third component) of 5 nOz;
~32.500IlolX, 5iOz 40.00
A mixture consisting of 0 to 67.5 mol χ
Additive obtained by firing at 00℃ (hereinafter referred to as the fourth component)
Voltage-dependent nonlinear resistor M consisting of 0.001 to 10.000 parts by weight! The aim is to solve this problem by obtaining an i-cell composition.
また、上記主成分と添加物とからなる組成物を1100
℃以上で焼成したバリスタの製造方法、さらにはその焼
成後、還元性雰囲気中で1200℃以」−で焼成し、そ
の後酸化性雰囲気中で900〜1300℃で焼成したバ
リスタの製造方法を捷供しようとするものである。In addition, a composition consisting of the above main ingredients and additives was added to 1100
We provide a method for producing a varistor fired at a temperature of 1200°C or higher, and a method for producing a varistor fired at a temperature of 1200°C or higher in a reducing atmosphere and then at 900 to 1300°C in an oxidizing atmosphere. This is what I am trying to do.
作用
上記の発明において、第1成分は主たる成分であり、5
rTiOsのSrの一部を?Igで置換することにより
、粒界に形成される高抵抗層がサージに対して強くなる
。Effect In the above invention, the first component is the main component, and 5
Part of Sr in rTiOs? By substituting Ig, the high resistance layer formed at the grain boundaries becomes strong against surges.
また、第2成分は主に第1成分の半導体化を促進する金
属酸化物である。さらに、第3成分は誘電率、α、サー
ジ耐量の改善に寄与するものであり、第4成分はバリス
タ電圧の低下、誘電率の改善に有効なものである。特に
、第4成分は融点が1230〜1250”Cと比較的低
いため、融点前後の温度で焼成すると液相となり、その
他の成分の反応を促進すると共に粒子の成長を促進する
。そのため粒界部分に第3成分が偏析しやすくなり、粒
界が高抵抗化されやすくなり、バリスタ機能およびコン
デンサ機能が改善される。また、粒成長が促進されるた
めバリスタ電圧が低くなり、粒径の均一性が向上するた
め特性の安定性が良くなり、特にサージ耐量が改善され
る。Further, the second component is mainly a metal oxide that promotes the semiconductor formation of the first component. Further, the third component contributes to improving the dielectric constant, α, and surge resistance, and the fourth component is effective in reducing the varistor voltage and improving the dielectric constant. In particular, the fourth component has a relatively low melting point of 1230 to 1250"C, so when fired at a temperature around the melting point, it turns into a liquid phase, promoting the reaction of the other components and grain growth. Therefore, the grain boundary area The third component becomes more likely to segregate, making grain boundaries more likely to have high resistance, improving varistor and capacitor functions.Also, grain growth is promoted, which lowers varistor voltage and improves grain size uniformity. This improves the stability of the characteristics, especially the surge resistance.
実施例 以下に実施例を挙げて本発明を擬体的に説明する。Example The present invention will be explained in a mimetic manner by giving examples below.
まず、MgTiO3,5iOzを下記の第1表に示すよ
うに組成比を種々変えて秤量し、ボールミルなどで24
Hr混合する。次に、乾燥した後、下記の第1表に示す
ように温度を種々変えて焼成し、再びボールミルなどで
24Hr粉砕した後、乾燥し第4成分とする。次いで、
第1成分、第2成分、第3成分、第4成分を下記の第1
表に示した組成比になるように秤量し、ボールミルなど
で24Hr混合した後、乾燥し、ポリビニルアルコール
などの有機バインダーをlQwt@添加して造粒した後
、I (t/d)のプレス圧力で10φXIt(w)の
円板状に成形し、1100”Cで12)1r焼成し脱バ
インダーする。次に、第1表に示したように温度と時間
を種々変えて焼成(第1焼成)し、その後還元性雰囲気
、例えば、N、:Hz=9 : 1のガス中で温度と時
間を種々変えて焼成(第2焼成)する。さらにその後、
酸化性雰囲気中で温度と時間を種々変えて焼成(第3焼
成)する。First, MgTiO3,5iOz was weighed at various composition ratios as shown in Table 1 below, and then milled using a ball mill or the like at 24
Mix for hours. Next, after drying, the mixture is fired at various temperatures as shown in Table 1 below, and then ground again for 24 hours using a ball mill, etc., and then dried to obtain a fourth component. Then,
The first component, second component, third component, and fourth component are
The composition ratio shown in the table was weighed, mixed for 24 hours using a ball mill, etc., dried, and granulated by adding lQwt@ of an organic binder such as polyvinyl alcohol, followed by pressing pressure of I (t/d). It was molded into a disk shape of 10φ Then, it is fired (second firing) in a reducing atmosphere, for example, a gas of N, :Hz=9:1, at various temperatures and times.Furthermore, after that,
Firing is performed in an oxidizing atmosphere at various temperatures and times (third firing).
(以下余白)
上記のようにして得られた第1図および第2図に示す焼
結体1の両平面に外周を残すようにしてAgなとの導電
性ペーストをスクリーン印刷などにより塗布し、630
℃,3m1nで焼成し、ti2.3を形成する0次に、
半田などによりリード線〔図示せず)を取り付け、エポ
キシなどの樹脂(図示せず)を塗装する。このようにし
て得られた素子の特性を下記の第2表に示す。(Hereinafter, blank space) A conductive paste such as Ag is applied by screen printing or the like, leaving the outer periphery on both planes of the sintered body 1 shown in FIGS. 1 and 2 obtained as described above. 630
℃, 3m1n to form ti2.3,
A lead wire (not shown) is attached using solder or the like, and a resin (not shown) such as epoxy is applied. The characteristics of the device thus obtained are shown in Table 2 below.
なお、第2表において、誘電率は11Hzでの静電容量
から計算したものであり、αは
a −1/ log(V +ama/ V IIIA)
(ただし、V I IIA、 V + ohmは1!m
A、 l0IIAのt流を流した時に素子の両端にかか
る電圧である。)で評価した。また、サージ耐量はパル
ス性のt流を印加した後のV、、、の変化率が±10%
以内である時の最大のパルス性電滓値により評価してい
る。In addition, in Table 2, the dielectric constant is calculated from the capacitance at 11 Hz, and α is a −1/log(V + ama/V IIIA)
(However, VI IIA, V + ohm is 1!m
A, is the voltage applied across the element when a current of 10IIA is applied. ) was evaluated. In addition, the surge withstand capacity is ±10% change rate of V after applying pulsed t current.
The evaluation is based on the maximum pulsed electric slag value when the value is within the range.
(以下余白)
本発明において、第1成分のSr I−xM口T;0.
のXの範囲を規定したのは、Xが0.001よりも小さ
いと効果を示さず2O3,Y2O3,La2O3,Ce
O2,Sm2O3,Pr6O11,Nd2O.300を
超えると格子欠陥が発生しにくくなるため半導体化が促
進されず、粒界に?1gが単一相として析出するため組
織が不均一になり、V l+IAが高くなりすぎて特性
が劣化するためである。さらに、第2成分ばO,OO1
molχ未満では効果を示さず、5.000molχを
超えると粒界に偏析して粒界の高抵抗化を抑制し、粒界
に第2相を形成することから特性が劣化するものである
。また、第3成分は0.001molχ未満では効果を
示さず、5.000 molχを超えると粒界に偏析し
て第2相を形成することから特性が劣化するものである
。そして、第4成分はMgTiOsとS i、 Ozの
2成分系の相図のなかで最も融点の低い領域の物質であ
り、その範囲外では融点が高くなるものである。また、
第4成分の添加量は2O3,Y2O3,La2O3,C
eO2,Sm2O3,Pr6O11,Nd2O.001
31量部未満では効果を示さず、10.000重量部を
超えると粒界の抵抗は高くなるが粒界の幅が厚くなるた
め、静電容量が小さくなると共に■1.Aが高(なり、
サージに対して弱くなるものである。(Hereinafter, blank space) In the present invention, Sr I-xM mouth T of the first component is 0.
The reason for specifying the range of X is that 2O3, Y2O3, La2O3, Ce
O2, Sm2O3, Pr6O11, Nd2O. If it exceeds 300, lattice defects are less likely to occur, so semiconductor formation is not promoted, and grain boundaries occur. This is because 1g precipitates as a single phase, resulting in a non-uniform structure, resulting in an excessively high V l+IA and deterioration of properties. Furthermore, if the second component is O, OO1
If it is less than mol.chi., it will not show any effect, and if it exceeds 5.000 mol.chi., it will segregate at the grain boundaries, suppress the increase in grain boundary resistance, and form a second phase at the grain boundaries, resulting in deterioration of properties. Further, the third component exhibits no effect when it is less than 0.001 molχ, and when it exceeds 5.000 molχ, it segregates at grain boundaries and forms a second phase, resulting in deterioration of properties. The fourth component is a substance with the lowest melting point in the phase diagram of the binary system of MgTiOs, Si, and Oz, and has a high melting point outside of this range. Also,
The amount of the fourth component added is 2O3, Y2O3, La2O3, C
eO2, Sm2O3, Pr6O11, Nd2O. 001
If it is less than 31 parts by weight, no effect will be shown, and if it exceeds 10,000 parts by weight, the grain boundary resistance will increase, but the width of the grain boundaries will become thicker, so the capacitance will decrease and (1). A is high
This makes it vulnerable to surges.
さらに、第4成分の焼成温度を規定したのは9、低融点
の第4成分が合成される温度が1200℃であるためで
ある。そして、第1焼成の温度を規定したのは、第4成
分の融点が1230〜1250”Cであるため、110
0℃以上の温度で焼成すると第4成分が液相に近い状態
になって焼結が促進されるためであり、1100”c未
満では第4成分の液相焼結効果がないためである。また
、第2焼成の温度を規定したのは、1200℃未満では
第1焼成後の焼結体が十分に還元されず、バリスタ特性
、コンデンサ特性が共に劣化するためである。Furthermore, the firing temperature of the fourth component was specified in 9 because the temperature at which the fourth component with a low melting point is synthesized is 1200°C. The temperature for the first firing was determined to be 110"C because the melting point of the fourth component is 1230-1250"C.
This is because if the fourth component is fired at a temperature of 0° C. or higher, the fourth component will be in a state close to a liquid phase and sintering will be promoted, and if it is less than 1100″c, the fourth component will not have a liquid phase sintering effect. Further, the temperature of the second firing is specified because if it is lower than 1200°C, the sintered body after the first firing will not be sufficiently reduced, and both the varistor characteristics and the capacitor characteristics will deteriorate.
さらに、第3焼成の温度を規定したのは、900℃未満
では粒界の高抵抗化が十分に進まないため、VImAが
低くなりすぎバリスタ特性が劣化するためであり、13
00℃を超えると静電容量が小さくなりすぎコンデンサ
特性が劣化するためである。さらに、第1焼成の雰囲気
は酸化性雰囲気でも還元性雰囲気でも同様の効果がある
ことを確認した。Furthermore, the temperature of the third firing was specified because if it is less than 900°C, the resistance of the grain boundaries will not increase sufficiently, and the VImA will become too low and the varistor characteristics will deteriorate.
This is because if the temperature exceeds 00° C., the capacitance becomes too small and the capacitor characteristics deteriorate. Furthermore, it was confirmed that the same effect can be obtained whether the atmosphere for the first firing is an oxidizing atmosphere or a reducing atmosphere.
また、本実施例では添加物の組み合わせについては、第
1成分としてSr+−JgxTi03(0.001≦x
≦0.300)、第2成分としてNbz05+Ta2O
3,sJO3,Dy1OsYtOs、LatOi、Ce
0z 、第3成分としてa+、o、、pb。In addition, in this example, regarding the combination of additives, the first component is Sr+-JgxTi03 (0.001≦x
≦0.300), Nbz05+Ta2O as the second component
3, sJO3, Dy1OsYtOs, LatOi, Ce
0z, a+, o,, pb as the third component.
CrtOs、 CdO,K、O,Co2O3,!+ C
ub、 Cu、O,Mn01. Mo01. NiON
loA、SiC,TltOs、ZnO,Zr0z 、第
4成分としてMgTiO3,SiO□についてのみ示し
たが、その他に第2成分として511203. Prb
O+ I+ Nd2O3,s、第3成分として5btO
,、Bad、 Bed、 810.、 Fet03.
Cab、 Litu、 LiF、 MgONa tO,
NaF、 Rhz03.5eat、 5ift、 Sr
O,Th0z、 Tl0z、 VtO5Bigot、S
nowを用いた組成の組み合わせでも同様の効果が得ら
れることを確認した。また、第2成分および第3成分に
ついては、それぞれ2種類以上を所定の範囲で組み合わ
せて用いても差支えないことを併せてi認した。CrtOs, CdO,K,O,Co2O3,! +C
ub, Cu, O, Mn01. Mo01. NiON
loA, SiC, TltOs, ZnO, Zr0z, and only MgTiO3 and SiO□ are shown as the fourth component, but in addition, 511203. Prb
O+ I+ Nd2O3,s, 5btO as third component
,, Bad, Bed, 810. , Fet03.
Cab, Litu, LiF, MgONatO,
NaF, Rhz03.5eat, 5ift, Sr
O, Th0z, Tl0z, VtO5Bigot, S
It was confirmed that similar effects can be obtained by combining compositions using now. Furthermore, it was also acknowledged that two or more types of the second component and the third component may be used in combination within a predetermined range.
なお、第1成分、第2成分、第3成分、第4成分を第1
焼成するだけでも第4成分が液相となり、その他の成分
の反応を促進すると共に粒子の成長を促進するため、粒
界部分に第3成分が偏析しやすくなり、粒界が高抵抗化
され易くなり、バリスタ機能およびコンデンサ機能が改
善されるという効果がある。Note that the first component, second component, third component, and fourth component are
Just by firing, the fourth component turns into a liquid phase, which promotes the reaction of other components and the growth of grains, making it easier for the third component to segregate at the grain boundaries, making the grain boundaries more likely to have high resistance. This has the effect of improving the varistor function and capacitor function.
発明の効果
以上に示したように本発明によれば、第4成分による液
相焼結効果により、粒子径が大きいため、バリスタ電圧
が低く、誘電率εおよびαが大きく、粒子径のばらつき
が小さいため、づ−ジ電流が素子に均一に流れ、また−
gによって粒界が効果的に高抵抗化されるため、サージ
耐量が大きくなるという効果が得られる。Effects of the Invention As described above, according to the present invention, due to the liquid phase sintering effect of the fourth component, the particle size is large, so the varistor voltage is low, the dielectric constants ε and α are large, and the variation in particle size is reduced. Because it is small, the current flows uniformly through the element, and the -
Since the grain boundaries are effectively made to have a high resistance by g, the effect of increasing the surge resistance can be obtained.
第1図は本発明による素子を示す上面図、第2図は本発
明による素子を示す断面図である。
】・・・・・焼結体、2.3・・・・・電極。
代理人の氏名 弁理士 粟野重孝 は力川名第
図
第 2 図
空−lFIG. 1 is a top view showing an element according to the invention, and FIG. 2 is a sectional view showing the element according to the invention. ]... Sintered body, 2.3... Electrode. Name of agent: Patent attorney Shigetaka Awano
Claims (3)
1≦x≦0.300)を90.000〜99.998m
ol%、Nb_2O_5,Ta_2O_5,WO_3,
Dy_2O_3,Y_2O_3,La_2O_3,Ce
O_2,Sm_2O_3,Pr_6O_1_1,Nd_
2O_3のうち少なくとも1種類以上を0.001〜5
.000mol%、Al_2O_3,Sb_2O_3,
BaO,BeO,PbO,B_2O_3,Cr_2O_
3,Fe_2O_3,CdO,K_2O,CaO,Co
_2O_3,CuO,Cu_2O,Li_2O,LiF
,MgO,MnO_2,MoO_3,Na_2O_3,
NaF,NiO,Rh_2O_3,SeO_2,Ag_
2O,SiO_2,SiC,SrO,Tl_2O_3,
ThO_2,TiO_2,V_2O_5,Bi_2O_
3,ZnO,ZrO_2,SnO_2のうち少なくとも
1種類以上を0.001〜5.000mol%含有して
なる主成分100重量部と、MgTiO_360.00
0〜32.500mol%,SiO_240.000〜
67.5mol%からなる混合物を1200℃以上で焼
成してなる添加物0.001〜10.000重量部とか
らなることを特徴とする電圧依存性非直線抵抗体磁器組
成物。(1) Sr_1_-_xMg_xTiO_3(0.00
1≦x≦0.300) from 90.000 to 99.998m
ol%, Nb_2O_5, Ta_2O_5, WO_3,
Dy_2O_3, Y_2O_3, La_2O_3, Ce
O_2, Sm_2O_3, Pr_6O_1_1, Nd_
At least one type of 2O_3 from 0.001 to 5
.. 000mol%, Al_2O_3, Sb_2O_3,
BaO, BeO, PbO, B_2O_3, Cr_2O_
3, Fe_2O_3, CdO, K_2O, CaO, Co
_2O_3, CuO, Cu_2O, Li_2O, LiF
, MgO, MnO_2, MoO_3, Na_2O_3,
NaF, NiO, Rh_2O_3, SeO_2, Ag_
2O, SiO_2, SiC, SrO, Tl_2O_3,
ThO_2, TiO_2, V_2O_5, Bi_2O_
3. 100 parts by weight of a main component containing 0.001 to 5.000 mol% of at least one of ZnO, ZrO_2, and SnO_2, and MgTiO_360.00
0~32.500mol%, SiO_240.000~
A voltage-dependent nonlinear resistor ceramic composition comprising 0.001 to 10.000 parts by weight of an additive obtained by firing a mixture consisting of 67.5 mol % at 1200° C. or higher.
x≦0.300)を90.000〜99.998mol
%、Nb_2O_5,Ta_2O_5,WO_3,Dy
_2O_3,Y_2O_3,La_2O_3,CeO_
2,Sm_2O_3,Pr_6O_1_1,Nd_2O
_3のうち少なくとも1種類以上を0.001〜5.0
00mol%、Al_2O_3,Sb_2O_3,Ba
O,BeO,PbO,B_2O_3,Cr_2O_3,
Fe_2O_3,CdO,K_2O,CaO,Co_2
O_3,CuO,Cu_2O,Li_2O,LiF,M
gO,MnO_2,MoO_3,Na_2O,NaF,
NiO,Rh_2O_3,SeO_2,Ag_2O,S
iO_2,SiC,SrO,Tl_2O_3,ThO_
2,TiO_2,V_2O_5,Bi_2O_3,Zn
O,ZrO_2,SnO_2のうち少なくとも1種類以
上を0.001〜5.000mol%含有してなる主成
分100重量部と、MgTiO_360.000〜32
.500mol%,SiO_240.000〜67.5
mol%からなる混合物を1200℃以上で焼成してな
る添加物0.001〜10.000重量部とからなる組
成物を、1100℃以上で焼成したことを特徴とするバ
リスタの製造方法。(2) Sr_1-xMg_xTiO_3 (0.001≦
x≦0.300) from 90.000 to 99.998 mol
%, Nb_2O_5, Ta_2O_5, WO_3, Dy
_2O_3, Y_2O_3, La_2O_3, CeO_
2, Sm_2O_3, Pr_6O_1_1, Nd_2O
_0.001 to 5.0 of at least one type of 3
00mol%, Al_2O_3, Sb_2O_3, Ba
O, BeO, PbO, B_2O_3, Cr_2O_3,
Fe_2O_3, CdO, K_2O, CaO, Co_2
O_3, CuO, Cu_2O, Li_2O, LiF, M
gO, MnO_2, MoO_3, Na_2O, NaF,
NiO, Rh_2O_3, SeO_2, Ag_2O, S
iO_2, SiC, SrO, Tl_2O_3, ThO_
2, TiO_2, V_2O_5, Bi_2O_3, Zn
100 parts by weight of the main component containing 0.001 to 5.000 mol% of at least one of O, ZrO_2, and SnO_2, and MgTiO_360.000 to 32
.. 500mol%, SiO_240.000~67.5
1. A method for producing a varistor, characterized in that a composition comprising 0.001 to 10.000 parts by weight of an additive is obtained by firing a mixture consisting of mol % at 1200°C or higher, and firing at 1100°C or higher.
x≦0.300)を90.000〜99.998mol
%、Nb_2O_5,Ta_2O_5,WO_3,Dy
_2O_3,Y_2O_3,La_2O_3,CeO_
2,Sm_2O_3,Pr_6O_1_1,Nd_2O
_3のうち少なくとも1種類以上を0.001〜5.0
00mol%、Al_2O_3,Sb_2O_3,Ba
O,BeO,PbO,B_2O_3,Cr_2O_3,
Fe_2O_3,CdO,K_2O,CaO,Co_2
O_3,CuO,Cu_2O,Li_2O,LiF,M
gO,MnO_2,MoO_3,Na_2O,NaF,
NiO,Rh_2O_3,SeO_2,Ag_2O,S
iO_2,SiC,SrO,Tl_2O_3,ThO_
2,TiO_2,V_2O_5,Bi_2O_3,Zn
O,ZrO_2,SnO_2のうち少なくとも1種類以
上を0.001〜5.000mol%含有してなる主成
分100重量部と、MgTiO_360.000〜32
.500mol%,SiO_240.000〜67.5
mol%からなる混合物を1200℃以上で焼成してな
る添加物0.001〜10.000重量部とからなる組
成物を、1100℃以上で焼成した後、還元性雰囲気中
で1200℃以上で焼成し、その後酸化性雰囲気中で9
00〜1300℃で焼成したことを特徴とするバリスタ
の製造方法。(3) Sr_1-xMg_xTiO_3 (0.001≦
x≦0.300) from 90.000 to 99.998 mol
%, Nb_2O_5, Ta_2O_5, WO_3, Dy
_2O_3, Y_2O_3, La_2O_3, CeO_
2, Sm_2O_3, Pr_6O_1_1, Nd_2O
_0.001 to 5.0 of at least one type of 3
00mol%, Al_2O_3, Sb_2O_3, Ba
O, BeO, PbO, B_2O_3, Cr_2O_3,
Fe_2O_3, CdO, K_2O, CaO, Co_2
O_3, CuO, Cu_2O, Li_2O, LiF, M
gO, MnO_2, MoO_3, Na_2O, NaF,
NiO, Rh_2O_3, SeO_2, Ag_2O, S
iO_2, SiC, SrO, Tl_2O_3, ThO_
2, TiO_2, V_2O_5, Bi_2O_3, Zn
100 parts by weight of the main component containing 0.001 to 5.000 mol% of at least one of O, ZrO_2, and SnO_2, and MgTiO_360.000 to 32
.. 500mol%, SiO_240.000~67.5
A composition consisting of 0.001 to 10.000 parts by weight of an additive obtained by firing a mixture consisting of mol% at 1200°C or higher is fired at 1100°C or higher, and then fired at 1200°C or higher in a reducing atmosphere. and then 9 hours in an oxidizing atmosphere.
A method for manufacturing a varistor, characterized in that the varistor is fired at a temperature of 00 to 1300°C.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2151976A JP2822612B2 (en) | 1990-06-11 | 1990-06-11 | Varistor manufacturing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2151976A JP2822612B2 (en) | 1990-06-11 | 1990-06-11 | Varistor manufacturing method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0443603A true JPH0443603A (en) | 1992-02-13 |
| JP2822612B2 JP2822612B2 (en) | 1998-11-11 |
Family
ID=15530343
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2151976A Expired - Fee Related JP2822612B2 (en) | 1990-06-11 | 1990-06-11 | Varistor manufacturing method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2822612B2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0521053U (en) * | 1991-09-03 | 1993-03-19 | 東陶機器株式会社 | Ceiling connection structure of prefabricated building unit |
| CN106631002A (en) * | 2017-01-11 | 2017-05-10 | 电子科技大学 | Dielectric material for Mg-Zn-Ti-based radio-frequency MLCC (multi-layer ceramic capacitor) and preparation method of dielectric material |
-
1990
- 1990-06-11 JP JP2151976A patent/JP2822612B2/en not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0521053U (en) * | 1991-09-03 | 1993-03-19 | 東陶機器株式会社 | Ceiling connection structure of prefabricated building unit |
| CN106631002A (en) * | 2017-01-11 | 2017-05-10 | 电子科技大学 | Dielectric material for Mg-Zn-Ti-based radio-frequency MLCC (multi-layer ceramic capacitor) and preparation method of dielectric material |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2822612B2 (en) | 1998-11-11 |
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