JPH0465543B2 - - Google Patents

Info

Publication number
JPH0465543B2
JPH0465543B2 JP2004582A JP458290A JPH0465543B2 JP H0465543 B2 JPH0465543 B2 JP H0465543B2 JP 2004582 A JP2004582 A JP 2004582A JP 458290 A JP458290 A JP 458290A JP H0465543 B2 JPH0465543 B2 JP H0465543B2
Authority
JP
Japan
Prior art keywords
copper
ceramic
semiconductor element
pin
tungsten
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP2004582A
Other languages
Japanese (ja)
Other versions
JPH0340454A (en
Inventor
Toshiro Kuroda
Koichi Kumazawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Electric Industries Ltd
Original Assignee
Sumitomo Electric Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Electric Industries Ltd filed Critical Sumitomo Electric Industries Ltd
Priority to JP458290A priority Critical patent/JPH0340454A/en
Publication of JPH0340454A publication Critical patent/JPH0340454A/en
Publication of JPH0465543B2 publication Critical patent/JPH0465543B2/ja
Granted legal-status Critical Current

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  • Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
  • Lead Frames For Integrated Circuits (AREA)

Description

【発明の詳細な説明】[Detailed description of the invention]

[産業上の利用分野] 本発明は、ピン、グリツドアレイパツケージに
関するもので、更に詳しくはピン、グリツドアレ
イパツケージの半導体素子搭載部として、銅−タ
ングステンあるいは銅−モリブデンよりなる非合
金組成体を用いたものである。 [従来の技術] 従来、半導体用セラミツクパツケージはグリー
ンセラミツクシートに必要金属層をスクリーンプ
リント法により印刷しこれを積層し焼結一体化し
て、このセラミツク体の金属層に必要な金属部材
をろう付けにより取りつける方法か、又はプレス
法によつてセラミツク枠体を成形し、これにメタ
ライズを施して、このメタライズ部を介して金属
部材とろう付法により接着しパツケージとしてき
た。 しかし、積層パツケージの中でも、半導体素子
を接着する部分、いわゆる半導体素子搭載部がセ
ラミツク上のメタライズ部によつて構成されてい
るパツケージでは、セラミツクを焼結一体化する
際に起るシート自身の歪或いは積層時の外的な力
によつて生ずる歪により半導体素子搭載部のセラ
ミツクに反りや、うねりを生ずることがあるとい
う欠点があり、半導体素子の接着強度が弱いとか
又半導体素子が水平に搭載されない等の欠点が生
じ、半導体素子搭載部の平坦なパツケージを製作
するためにすでに特願昭56−214341号として提案
された発明等がなされてきた。 最近、技術の発展に伴つて大型の素子を搭載す
るパツケージが要求されるようになり、したがつ
てパツケージ自体も大型化され、セラミツクの歪
を僅少にとどめたり、接合する半導体素子搭載部
材との膨脹差を解消せしめたりすることがますま
す困難さを増してきた。 第2図は従来法によつて製作された超LSIを搭
載するためのパツケージであつて、ピン・グリツ
ド・アレイ(Pin Grid Array)と呼ばれるパツ
ケージの要部断面図である。ピン・グリツド・ア
レイは外径寸法は約25mm角あるいはそれ以上の大
型パツケージであつて、セラミツク1上面に植設
されたリードとなるべきピン4の数は70本以上か
ら数百本にも及ぶものであり中に封入される半導
体素子も大型のものである。 第2図に示した従来法では無酸素銅板2をセラ
ミツクに接着し得ないため中間にコバール3を介
在せしめる提案がなされたがコバールと無酸素銅
との大きな膨脹係数差のために不具合が多かつ
た。又無酸素銅とセラミツクを直接接着した場合
もセラミツクにクラツクが入り製作不可能であつ
た。 又第2図のようなピン・クリツド・アレイでは
無酸素銅板2上の半導体素子接着部5にもコバー
ル又はモリブデン或いはタングステン等の薄板を
接着し半導体素子のシリコンと無酸素銅との熱膨
脹差の対策を施す必要があつた。 一方、シリコン素子と銅を主体とする端子板が
接続される構造の半導体装置において、両者の中
間に、銅中にタングステン又はモリブデンを分散
せしめて焼結してなる電極を介在せしめた装置も
知られている(特開昭50−62776号公報参照)。 [発明が解決しようとする課題] 本発明は前記諸欠点、諸問題を一挙に解決する
だけでなく、大型化を可能にしたピン、グリツド
アレイパツケージを提供することを目的とする。
又、用いる材質については、特開昭50−62776号
公報記載の技術では、銅とタングステン又はモリ
ブデンとの混合物が焼結体であるため、熱膨脹係
数、熱伝導率ともW(又はMo)/Cuの複合則が
あてはまらず、実質的には空孔が存在するもの
で、メツキ性、気密性や熱伝導等の基板に要求さ
れる特性の点で問題がある。本発明では、W(又
はMo)/Cuの複合材料におけるこの点の問題も
解決するものである。 [課題を解決するための手段] 本発明は、半導体素子搭載用部材兼放熱板がタ
ングステン又はモリブデン多孔体芯材の空〓に溶
浸法により銅を溶融充填した、重量%で99〜70%
がタングステン又はモリブデンからなり、残部が
銅の組成を有し、その熱膨脹係数が搭載する半導
体素子並びにセラミツク枠体の熱膨脹係数に相当
し、かつ高い熱伝導性を具備した非合金組成体に
ニツケルメツキを施して構成され、かかる半導体
搭載用部材兼放熱板の上部に予めメタライズされ
たセラミツク枠体が直接ろう付接合されており、
さらに当該セラミツク枠体上部に導出用リードピ
ンがろう付接合により植設されて一体構造として
なることを特徴とするピン、グリツドアレイパツ
ケージである。 本発明で使用する非合金組成体は、上記のとお
りタングステン又はモリブデン多孔体を芯材とし
て、それに銅材を溶融して充填せしめた複合材料
である。これは溶浸法と呼ばれる方法であつて、
この方法によると、毛細管現象によりタングステ
ン又はモリブデンの多孔体の空〓率は溶融した銅
によりほぼ完全に充填されるので、非合金組成体
の密度は実質100%になる。 前記材料の持つ特性のうち熱膨脹係数及び熱伝
導率を第1表で銅−タングステン組成体につい
て、第2表で銅−モリブデン組成体について示し
た。
[Industrial Application Field] The present invention relates to a pin or grid array package, and more specifically, a non-alloy composition made of copper-tungsten or copper-molybdenum is used as a semiconductor element mounting portion of a pin or grid array package. It uses [Prior art] Conventionally, ceramic packages for semiconductors have been produced by printing the necessary metal layers on green ceramic sheets using a screen printing method, laminating them, sintering them into one piece, and brazing the necessary metal members to the metal layers of the ceramic body. A ceramic frame is formed by a method of attaching the ceramic frame by a method of attaching the ceramic frame by a method of attaching the ceramic frame to a ceramic frame, or a method of attaching the ceramic frame by a press method, metallizing the frame, and bonding it to a metal member through the metallized portion by a brazing method to form a package. However, among laminated packages, in packages where the part to which the semiconductor element is bonded, the so-called semiconductor element mounting part, is composed of a metallized part on the ceramic, the sheet itself is distorted when the ceramic is sintered and integrated. Another drawback is that distortion caused by external forces during stacking may cause warping or waviness in the ceramic of the semiconductor element mounting area, and the adhesive strength of the semiconductor element may be weak, or the semiconductor element may be mounted horizontally. However, an invention proposed in Japanese Patent Application No. 56-214341 has already been made in order to manufacture a flat package for a semiconductor element mounting portion. Recently, with the development of technology, there has been a demand for packages that can mount large devices, and the packages themselves have also become larger. It has become increasingly difficult to eliminate the difference in expansion. FIG. 2 is a cross-sectional view of the main part of a package called a pin grid array, which is a package for mounting a VLSI manufactured by a conventional method. The pin grid array is a large package with an outer diameter of approximately 25 mm square or more, and the number of pins 4 that are implanted on the top surface of the ceramic 1 and are to become leads ranges from 70 or more to several hundred. The semiconductor elements sealed inside are also large. Since the conventional method shown in Fig. 2 cannot bond the oxygen-free copper plate 2 to the ceramic, a proposal was made to interpose Kovar 3 in the middle, but there were many problems due to the large difference in expansion coefficient between Kovar and oxygen-free copper. It was. Furthermore, even when oxygen-free copper and ceramic were bonded directly, cracks occurred in the ceramic and production was impossible. In addition, in the pin crid array as shown in Fig. 2, a thin plate of Kovar, molybdenum, or tungsten is also bonded to the semiconductor element bonding part 5 on the oxygen-free copper plate 2 to reduce the difference in thermal expansion between silicon and oxygen-free copper of the semiconductor element. It was necessary to take measures. On the other hand, in a semiconductor device having a structure in which a silicon element and a terminal plate mainly made of copper are connected, a device is also known in which an electrode made by dispersing tungsten or molybdenum in copper and sintering it is interposed between the two. (Refer to Japanese Unexamined Patent Publication No. 1983-62776). [Problems to be Solved by the Invention] An object of the present invention is to not only solve the above-mentioned drawbacks and problems all at once, but also to provide a pin and grid array package that can be made larger.
Regarding the material used, in the technology described in JP-A-50-62776, since a mixture of copper and tungsten or molybdenum is a sintered body, both the coefficient of thermal expansion and the thermal conductivity are W (or Mo)/Cu. The composite rule does not apply, and there are essentially pores, which poses problems in terms of properties required of the substrate, such as plating properties, airtightness, and heat conduction. The present invention also solves this problem in W (or Mo)/Cu composite materials. [Means for Solving the Problems] The present invention provides a semiconductor element mounting member/heat dissipation plate in which copper is melt-filled in the void of a tungsten or molybdenum porous core material by an infiltration method, and is 99 to 70% by weight.
is made of tungsten or molybdenum, the remainder is copper, the coefficient of thermal expansion corresponds to that of the semiconductor element and ceramic frame on which it is mounted, and the non-alloy composition has high thermal conductivity. A pre-metalized ceramic frame is directly soldered to the upper part of the semiconductor mounting member and heat sink, and
Furthermore, the pin and grid array package is characterized in that a lead-out lead pin is implanted in the upper part of the ceramic frame by brazing to form an integral structure. As described above, the non-alloy composition used in the present invention is a composite material in which a tungsten or molybdenum porous body is used as a core material and a copper material is melted and filled therein. This is a method called infiltration method,
According to this method, the porosity of the tungsten or molybdenum porous body is almost completely filled with molten copper due to capillarity, so that the density of the non-alloyed composition becomes substantially 100%. Among the properties of the materials, the coefficient of thermal expansion and thermal conductivity are shown in Table 1 for the copper-tungsten composition and in Table 2 for the copper-molybdenum composition.

【表】【table】

【表】 第1表及び第2表から明らかなように、銅−タ
ングステン、銅−モリブデン組成体は、銅の含有
量の比較的少い領域においてはセラミツクを持つ
熱膨脹係数50〜75×10-7に適合する熱膨脹係数を
有し、しかもその値はW(又はMo)/Cuの複合
則に基づく理論値とほぼ一致するため、銅含有率
を変えることによつて任意に必要とする熱膨脹係
数を有する複合金属材料を得ることができる。し
たがつて現在使用されている金属よりも熱膨脹係
数がセラミツクのそれに適合する金属材料を得る
ことができる。 [実施例] 第1図は本願発明によつて製作されたピン、グ
リツド・アレイの要部断面図である。第1図中セ
ラミツク枠体である部分11は常法のセラミツク
シート積層法により、必要なメタライズパターン
を施されたセラミツクシートを3〜4層(第1図
は3層のものに示している)積層し、焼結一体化
する。他方浸漬法により作成した銅15%、タング
ステン85%の組成体を所定の板状形に成形したも
のを用意し、これにニツケルメツキ1〜3μを施
す。次にセラミツク枠体11の接着すべき面に前
記金属組成体をろう付法により接着し半導体素子
搭載部12とする。このろう付の際に上方に植設
されるピン13も同時にろう付される。その後ニ
ツケルメツキ及び金メツキを施して完成体とし
た。 [発明の効果] 以上説明したごとく、本発明はセラミツク材料
に金属材料を半導体素子搭載部材として取りつけ
たピン、グリツドアレイパツケージであつて、用
いる金属材料の持つ熱膨脹係数が混合する金属の
複合則の理論値に近似し、しかもセラミツク例え
ばムライトなどにも適合しているため、この金属
材料をセラミツク部と容易に置き換えることがで
き反りや歪のない平坦な半導体搭載部を持つパツ
ケージをつくり出せるし、したがつて大型化も容
易である。更には熱伝導率が大きいため放熱部材
として用いることもでき大容量化された半導体素
子にも高い熱放散を必要とするパツケージにも最
適であり、又本金属材料にメツキ層を形成するこ
とにより直接半導体素子を接着できるためパツケ
ージの部品点数を減らしたり形状をシンプルにし
たりすることができ今後のピン、グリツドアレイ
パツケージとして必須のものとなるものである。
[Table] As is clear from Tables 1 and 2, copper-tungsten and copper-molybdenum compositions have a thermal expansion coefficient of 50 to 75×10 - which has ceramic in the region where the copper content is relatively low. 7 , and its value almost matches the theoretical value based on the compound law of W (or Mo)/Cu, so it can be adjusted arbitrarily by changing the copper content A composite metal material having the following properties can be obtained. Therefore, it is possible to obtain a metal material whose coefficient of thermal expansion matches that of ceramics better than the currently used metals. [Example] FIG. 1 is a sectional view of the main parts of a pin and grid array manufactured according to the present invention. The ceramic frame portion 11 in Fig. 1 is made of 3 to 4 layers of ceramic sheets with the necessary metallization pattern applied using a conventional ceramic sheet lamination method (Fig. 1 shows a 3-layer ceramic sheet). Laminated and sintered to integrate. On the other hand, a composition of 15% copper and 85% tungsten prepared by the dipping method is prepared and molded into a predetermined plate shape, and 1 to 3 μm of nickel plating is applied to this. Next, the metal composition is bonded to the surface of the ceramic frame 11 to be bonded by brazing to form the semiconductor element mounting portion 12. During this brazing, the pin 13 installed above is also brazed at the same time. After that, nickel plating and gold plating were applied to complete the piece. [Effects of the Invention] As explained above, the present invention is a pin or grid array package in which a metal material is attached to a ceramic material as a semiconductor element mounting member, and the present invention is a pin/grid array package in which a metal material is attached to a ceramic material as a semiconductor element mounting member. It approximates the theoretical value of , and is also compatible with ceramics such as mullite, so this metal material can be easily replaced with ceramic parts, making it possible to create a package with a flat semiconductor mounting part without warping or distortion. Therefore, it is easy to increase the size. Furthermore, due to its high thermal conductivity, it can be used as a heat dissipation member, making it ideal for large-capacity semiconductor devices and packages that require high heat dissipation. Since semiconductor elements can be directly bonded, the number of parts in the package can be reduced and the shape can be simplified, making it essential for future pin and grid array packages.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の実施例のピン、グリツドアレ
イパツケージの要部断面図、第2図は従来技術に
よるピン、グリツドパツケージの要部断面図であ
る。 1…セラミツク、2…無酸素銅板、3…コバー
ル、4…ピン、5…半導体素子接着部、11…セ
ラミツク枠体、12…半導体素子搭載部、13…
ピン。
FIG. 1 is a cross-sectional view of a main part of a pin and grid array package according to an embodiment of the present invention, and FIG. 2 is a cross-sectional view of a main part of a pin and grid array package according to the prior art. DESCRIPTION OF SYMBOLS 1... Ceramic, 2... Oxygen-free copper plate, 3... Kovar, 4... Pin, 5... Semiconductor element adhesion part, 11... Ceramic frame, 12... Semiconductor element mounting part, 13...
pin.

Claims (1)

【特許請求の範囲】[Claims] 1 半導体素子搭載用部材兼放熱板がタングステ
ン又はモリブデン多孔体芯材の空〓に溶浸法によ
り銅を溶融充填した、重量%で99〜70%がタング
ステン又はモリブデンからなり、残部が銅の組成
を有し、その熱膨脹係数が搭載する半導体素子並
びにセラミツク枠体の熱膨脹係数に相当し、かつ
高い熱伝導性を具備した非合金組成体にニツケル
メツキを施して構成され、かかる半導体搭載用部
材兼放熱板の上部に予めメタライズされたセラミ
ツク枠体が直接ろう付接合されており、さらに当
該セラミツク枠体上部に導出用リードピンがろう
付接合により植設されて一体構造としてなること
を特徴とするピン、グリツドアレイパツケージ。
1. The semiconductor element mounting member/heat sink is made of tungsten or molybdenum porous core material, which is melted and filled with copper by infiltration method, and has a composition in which 99 to 70% by weight is tungsten or molybdenum, and the remainder is copper. It is constructed by applying nickel plating to a non-alloy composition having a thermal expansion coefficient corresponding to that of the semiconductor element and ceramic frame to be mounted, and having high thermal conductivity, and which also serves as a semiconductor mounting member and heat dissipation member. A pin characterized in that a pre-metallized ceramic frame is directly brazed to the top of the plate, and a lead-out lead pin is implanted in the top of the ceramic frame by brazing to form an integral structure. Grid array packaging.
JP458290A 1990-01-16 1990-01-16 Pin grid array package Granted JPH0340454A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP458290A JPH0340454A (en) 1990-01-16 1990-01-16 Pin grid array package

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP458290A JPH0340454A (en) 1990-01-16 1990-01-16 Pin grid array package

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP57157684A Division JPS5946050A (en) 1982-09-09 1982-09-09 Ceramic package for semiconductor

Publications (2)

Publication Number Publication Date
JPH0340454A JPH0340454A (en) 1991-02-21
JPH0465543B2 true JPH0465543B2 (en) 1992-10-20

Family

ID=11588034

Family Applications (1)

Application Number Title Priority Date Filing Date
JP458290A Granted JPH0340454A (en) 1990-01-16 1990-01-16 Pin grid array package

Country Status (1)

Country Link
JP (1) JPH0340454A (en)

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5062776A (en) * 1973-10-05 1975-05-28

Also Published As

Publication number Publication date
JPH0340454A (en) 1991-02-21

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