JPH0474440B2 - - Google Patents

Info

Publication number: JPH0474440B2
Authority: JP; Japan
Prior art keywords: etching; etching solution; aluminum; hydrochloric acid; concentration
Prior art date: 1981-07-28
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired

Application number

JP11834681A

Other languages

English (en)

Japanese (ja)

Other versions

JPS5819499A (ja

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1981-07-28

Filing date

1981-07-28

Publication date

1992-11-26

1981-07-28 Application filed filed Critical

1981-07-28 Priority to JP11834681A priority Critical patent/JPS5819499A/ja

1983-02-04 Publication of JPS5819499A publication Critical patent/JPS5819499A/ja

1992-11-26 Publication of JPH0474440B2 publication Critical patent/JPH0474440B2/ja

Status Granted legal-status Critical Current

Links

238000005530 etching Methods 0.000 claims description 104
VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 72
229910052782 aluminium Inorganic materials 0.000 claims description 70
XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 32
NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 claims description 23
238000000034 method Methods 0.000 claims description 23
239000003456 ion exchange resin Substances 0.000 claims description 14
229920003303 ion-exchange polymer Polymers 0.000 claims description 14
239000000126 substance Substances 0.000 claims description 14
239000000203 mixture Substances 0.000 claims description 13
230000002378 acidificating effect Effects 0.000 claims description 9
239000003729 cation exchange resin Substances 0.000 claims description 9
239000002253 acid Substances 0.000 claims description 7
239000005416 organic matter Substances 0.000 claims description 6
150000007513 acids Chemical class 0.000 claims description 2
150000001735 carboxylic acids Chemical class 0.000 claims description 2
150000002763 monocarboxylic acids Chemical class 0.000 claims description 2
150000002989 phenols Chemical class 0.000 claims description 2
229920006395 saturated elastomer Polymers 0.000 claims description 2
239000000243 solution Substances 0.000 description 70
-1 aluminum ion Chemical class 0.000 description 37
HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 15
KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 15
238000000866 electrolytic etching Methods 0.000 description 13
239000007864 aqueous solution Substances 0.000 description 8
239000011347 resin Substances 0.000 description 8
229920005989 resin Polymers 0.000 description 8
235000015165 citric acid Nutrition 0.000 description 5
235000011121 sodium hydroxide Nutrition 0.000 description 5
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
230000007423 decrease Effects 0.000 description 3
238000005238 degreasing Methods 0.000 description 3
239000000463 material Substances 0.000 description 3
230000008929 regeneration Effects 0.000 description 3
238000011069 regeneration method Methods 0.000 description 3
238000001179 sorption measurement Methods 0.000 description 3
FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 2
GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 2
VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 2
238000007796 conventional method Methods 0.000 description 2
238000003795 desorption Methods 0.000 description 2
239000007788 liquid Substances 0.000 description 2
BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
229910017604 nitric acid Inorganic materials 0.000 description 2
238000002791 soaking Methods 0.000 description 2
239000002699 waste material Substances 0.000 description 2
238000004065 wastewater treatment Methods 0.000 description 2
BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 description 1
SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 1
NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
229910000838 Al alloy Inorganic materials 0.000 description 1
FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 1
OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 1
GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
230000002411 adverse Effects 0.000 description 1
239000003513 alkali Substances 0.000 description 1
BJEPYKJPYRNKOW-UHFFFAOYSA-N alpha-hydroxysuccinic acid Natural products OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 description 1
230000002542 deteriorative effect Effects 0.000 description 1
230000005611 electricity Effects 0.000 description 1
238000005868 electrolysis reaction Methods 0.000 description 1
239000000839 emulsion Substances 0.000 description 1
235000019253 formic acid Nutrition 0.000 description 1
238000005342 ion exchange Methods 0.000 description 1
239000003350 kerosene Substances 0.000 description 1
VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
239000011976 maleic acid Substances 0.000 description 1
239000001630 malic acid Substances 0.000 description 1
235000011090 malic acid Nutrition 0.000 description 1
238000007726 management method Methods 0.000 description 1
229910052751 metal Inorganic materials 0.000 description 1
239000002184 metal Substances 0.000 description 1
150000002739 metals Chemical class 0.000 description 1
LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
230000000813 microbial effect Effects 0.000 description 1
238000006386 neutralization reaction Methods 0.000 description 1
231100000989 no adverse effect Toxicity 0.000 description 1
238000002203 pretreatment Methods 0.000 description 1
230000001172 regenerating effect Effects 0.000 description 1
239000002904 solvent Substances 0.000 description 1
230000003746 surface roughness Effects 0.000 description 1
239000011975 tartaric acid Substances 0.000 description 1
235000002906 tartaric acid Nutrition 0.000 description 1
VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
238000005406 washing Methods 0.000 description 1
239000002351 wastewater Substances 0.000 description 1
239000003643 water by type Substances 0.000 description 1

Landscapes

Printing Plates And Materials Therefor (AREA)

JP11834681A 1981-07-28 1981-07-28 印刷版用アルミニウム板の電解ヱツチング方法 Granted JPS5819499A (ja)

Priority Applications (1)

Application Number	Priority Date	Filing Date	Title
JP11834681A JPS5819499A (ja)	1981-07-28	1981-07-28	印刷版用アルミニウム板の電解ヱツチング方法

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
JP11834681A JPS5819499A (ja)	1981-07-28	1981-07-28	印刷版用アルミニウム板の電解ヱツチング方法

Publications (2)

Publication Number	Publication Date
JPS5819499A JPS5819499A (ja)	1983-02-04
JPH0474440B2 true JPH0474440B2 (fr)	1992-11-26

Family

ID=14734413

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP11834681A Granted JPS5819499A (ja)	1981-07-28	1981-07-28	印刷版用アルミニウム板の電解ヱツチング方法

Country Status (1)

Country	Link
JP (1)	JPS5819499A (fr)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US5378802A (en) *	1991-09-03	1995-01-03	Ocg Microelectronic Materials, Inc.	Method for removing impurities from resist components and novolak resins
CN102529309B (zh) *	2010-12-14	2014-10-01	中国科学院化学研究所	喷墨打印直接制版用铝版基的制备方法

1981
- 1981-07-28 JP JP11834681A patent/JPS5819499A/ja active Granted

Also Published As

Publication number	Publication date
JPS5819499A (ja)	1983-02-04

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