JPH0480043U - - Google Patents
Info
- Publication number
- JPH0480043U JPH0480043U JP12539090U JP12539090U JPH0480043U JP H0480043 U JPH0480043 U JP H0480043U JP 12539090 U JP12539090 U JP 12539090U JP 12539090 U JP12539090 U JP 12539090U JP H0480043 U JPH0480043 U JP H0480043U
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- atmospheric pressure
- cvd apparatus
- pressure cvd
- tray
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001505 atmospheric-pressure chemical vapour deposition Methods 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 claims 1
- 239000004065 semiconductor Substances 0.000 claims 1
Description
第１図は、本考案の一実施例のウエーハ自動機
構付き常圧ＣＶＤ装置の膜の成長部分の断面図、
第２図は、第１図のＡ−Ａ線に沿う縦断面図であ
る。第３図は、従来の常圧ＣＶＤ装置の斜視図で
ある。
１……ウエーハ搬送用トレー、２……成長ヘツ
ド、３……ヘツドカバー、４……ウエーハ自転用
歯車、５……ウエーハ自転用ベルト、６……ヒー
タ、７……ベアリング、８……ウエーハ。
FIG. 1 is a sectional view of a film growth part of an atmospheric pressure CVD apparatus with an automatic wafer mechanism according to an embodiment of the present invention;
FIG. 2 is a longitudinal sectional view taken along line A-A in FIG. 1. FIG. 3 is a perspective view of a conventional atmospheric pressure CVD apparatus. 1... Wafer transport tray, 2... Growth head, 3... Head cover, 4... Wafer rotation gear, 5... Wafer rotation belt, 6... Heater, 7... Bearing, 8... Wafer.
Claims (1)
圧ＣＶＤ装置において、ウエーハを載置するトレ
ーに、ウエーハを自転させる機構を備えたことを
特徴とする常圧ＣＶＤ装置。 An atmospheric pressure CVD apparatus used for forming an insulating film in a semiconductor manufacturing process, characterized in that a tray on which a wafer is placed is equipped with a mechanism for rotating the wafer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12539090U JPH0480043U (en) | 1990-11-27 | 1990-11-27 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12539090U JPH0480043U (en) | 1990-11-27 | 1990-11-27 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0480043U true JPH0480043U (en) | 1992-07-13 |
Family
ID=31872990
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12539090U Pending JPH0480043U (en) | 1990-11-27 | 1990-11-27 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0480043U (en) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59162275A (en) * | 1983-02-26 | 1984-09-13 | ライボルト−ヘレ−ウス・ゲゼルシヤフト・ミツト・ベシユレンクテル・ハフツング | Device for manufacturing layer having rotation-symmetric thick profiles on substrate by cathode sputtering and methodof driving device |
| JPH01318235A (en) * | 1988-06-20 | 1989-12-22 | Kawasaki Steel Corp | Semiconductor manufacturing device |
-
1990
- 1990-11-27 JP JP12539090U patent/JPH0480043U/ja active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59162275A (en) * | 1983-02-26 | 1984-09-13 | ライボルト−ヘレ−ウス・ゲゼルシヤフト・ミツト・ベシユレンクテル・ハフツング | Device for manufacturing layer having rotation-symmetric thick profiles on substrate by cathode sputtering and methodof driving device |
| JPH01318235A (en) * | 1988-06-20 | 1989-12-22 | Kawasaki Steel Corp | Semiconductor manufacturing device |