JPH0535694B2 - - Google Patents

Info

Publication number: JPH0535694B2
Authority: JP; Japan
Prior art keywords: silicon carbide; group; silicon; sintered body; particles
Prior art date: 1986-12-23
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Lifetime

Application number

JP61305393A

Other languages

English (en)

Japanese (ja)

Other versions

JPS63159256A (ja

Inventor

Hiromasa Isaki

Takamasa Kawakami

Koichi Yakyo

Kazuhiro Ando

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Mitsubishi Gas Chemical Co Inc

Original Assignee

Mitsubishi Gas Chemical Co Inc

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1986-12-23

Filing date

1986-12-23

Publication date

1993-05-27

1986-12-23 Application filed by Mitsubishi Gas Chemical Co Inc filed Critical Mitsubishi Gas Chemical Co Inc

1986-12-23 Priority to JP61305393A priority Critical patent/JPS63159256A/ja

1988-07-02 Publication of JPS63159256A publication Critical patent/JPS63159256A/ja

1993-05-27 Publication of JPH0535694B2 publication Critical patent/JPH0535694B2/ja

Status Granted legal-status Critical Current

Links

229910010271 silicon carbide Inorganic materials 0.000 claims description 49
HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims description 41
239000002245 particle Substances 0.000 claims description 39
239000000843 powder Substances 0.000 claims description 38
239000002131 composite material Substances 0.000 claims description 28
229910052710 silicon Inorganic materials 0.000 claims description 24
XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 23
239000010703 silicon Substances 0.000 claims description 23
238000005245 sintering Methods 0.000 claims description 20
229910052581 Si3N4 Inorganic materials 0.000 claims description 18
238000000034 method Methods 0.000 claims description 18
HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 18
238000010438 heat treatment Methods 0.000 claims description 17
239000007789 gas Substances 0.000 claims description 15
229910052739 hydrogen Inorganic materials 0.000 claims description 13
239000001257 hydrogen Substances 0.000 claims description 12
IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 11
239000000203 mixture Substances 0.000 claims description 11
238000013001 point bending Methods 0.000 claims description 11
150000003961 organosilicon compounds Chemical class 0.000 claims description 10
125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 claims description 9
OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 9
125000000217 alkyl group Chemical group 0.000 claims description 9
125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 9
229910052799 carbon Inorganic materials 0.000 claims description 8
238000006243 chemical reaction Methods 0.000 claims description 8
125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 8
229910052757 nitrogen Inorganic materials 0.000 claims description 8
239000012071 phase Substances 0.000 claims description 8
230000001590 oxidative effect Effects 0.000 claims description 6
229910052760 oxygen Inorganic materials 0.000 claims description 6
229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 5
-1 NH3 organosilicon compound Chemical class 0.000 claims description 5
QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 5
239000001301 oxygen Substances 0.000 claims description 5
239000010419 fine particle Substances 0.000 claims description 4
229910052736 halogen Inorganic materials 0.000 claims description 4
150000002367 halogens Chemical class 0.000 claims description 4
UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 2
229910021193 La 2 O 3 Inorganic materials 0.000 claims description 2
OBFQBDOLCADBTP-UHFFFAOYSA-N aminosilicon Chemical compound [Si]N OBFQBDOLCADBTP-UHFFFAOYSA-N 0.000 claims description 2
125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 claims description 2
238000004519 manufacturing process Methods 0.000 claims description 2
125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 claims description 2
125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 claims description 2
150000002431 hydrogen Chemical class 0.000 claims 4
239000012808 vapor phase Substances 0.000 claims 1
230000000052 comparative effect Effects 0.000 description 12
239000002994 raw material Substances 0.000 description 8
238000002156 mixing Methods 0.000 description 7
238000010574 gas phase reaction Methods 0.000 description 6
230000000704 physical effect Effects 0.000 description 6
238000012360 testing method Methods 0.000 description 6
LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
229910052786 argon Inorganic materials 0.000 description 4
208000010392 Bone Fractures Diseases 0.000 description 3
206010017076 Fracture Diseases 0.000 description 3
PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
238000002425 crystallisation Methods 0.000 description 3
230000008025 crystallization Effects 0.000 description 3
229910001873 dinitrogen Inorganic materials 0.000 description 3
FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 description 3
239000012535 impurity Substances 0.000 description 3
QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
238000007796 conventional method Methods 0.000 description 2
229910003460 diamond Inorganic materials 0.000 description 2
239000010432 diamond Substances 0.000 description 2
239000006185 dispersion Substances 0.000 description 2
230000000694 effects Effects 0.000 description 2
229930195733 hydrocarbon Natural products 0.000 description 2
150000002430 hydrocarbons Chemical class 0.000 description 2
125000000250 methylamino group Chemical group [H]N(*)C([H])([H])[H] 0.000 description 2
239000011812 mixed powder Substances 0.000 description 2
238000005121 nitriding Methods 0.000 description 2
238000000879 optical micrograph Methods 0.000 description 2
239000000047 product Substances 0.000 description 2
230000035939 shock Effects 0.000 description 2
239000012798 spherical particle Substances 0.000 description 2
XOZLAGADZWZUQH-UHFFFAOYSA-N 1,3,5-trimethyl-1,3,5,2,4,6-triazatrisilinane Chemical compound CN1[SiH2]N([SiH2]N([SiH2]1)C)C XOZLAGADZWZUQH-UHFFFAOYSA-N 0.000 description 1
238000007088 Archimedes method Methods 0.000 description 1
208000013201 Stress fracture Diseases 0.000 description 1
239000007983 Tris buffer Substances 0.000 description 1
238000002441 X-ray diffraction Methods 0.000 description 1
UMVBXBACMIOFDO-UHFFFAOYSA-N [N].[Si] Chemical compound [N].[Si] UMVBXBACMIOFDO-UHFFFAOYSA-N 0.000 description 1
230000002411 adverse Effects 0.000 description 1
229910021529 ammonia Inorganic materials 0.000 description 1
230000005540 biological transmission Effects 0.000 description 1
230000015572 biosynthetic process Effects 0.000 description 1
239000000919 ceramic Substances 0.000 description 1
229910010293 ceramic material Inorganic materials 0.000 description 1
239000007795 chemical reaction product Substances 0.000 description 1
239000011362 coarse particle Substances 0.000 description 1
150000001875 compounds Chemical class 0.000 description 1
239000000470 constituent Substances 0.000 description 1
239000013078 crystal Substances 0.000 description 1
239000002178 crystalline material Substances 0.000 description 1
229910021419 crystalline silicon Inorganic materials 0.000 description 1
HNQXCHVZYRDHJN-UHFFFAOYSA-N cyanosilicon Chemical class [Si]C#N HNQXCHVZYRDHJN-UHFFFAOYSA-N 0.000 description 1
125000004122 cyclic group Chemical group 0.000 description 1
230000003247 decreasing effect Effects 0.000 description 1
238000011156 evaluation Methods 0.000 description 1
229910002804 graphite Inorganic materials 0.000 description 1
239000010439 graphite Substances 0.000 description 1
238000007731 hot pressing Methods 0.000 description 1
238000007373 indentation Methods 0.000 description 1
239000007791 liquid phase Substances 0.000 description 1
239000000463 material Substances 0.000 description 1
229910052751 metal Inorganic materials 0.000 description 1
239000002184 metal Substances 0.000 description 1
150000002739 metals Chemical class 0.000 description 1
239000004570 mortar (masonry) Substances 0.000 description 1
238000000465 moulding Methods 0.000 description 1
230000003287 optical effect Effects 0.000 description 1
229920001558 organosilicon polymer Polymers 0.000 description 1
230000003647 oxidation Effects 0.000 description 1
238000007254 oxidation reaction Methods 0.000 description 1
239000011148 porous material Substances 0.000 description 1
238000012545 processing Methods 0.000 description 1
238000001878 scanning electron micrograph Methods 0.000 description 1
150000003377 silicon compounds Chemical class 0.000 description 1
239000000126 substance Substances 0.000 description 1
125000001424 substituent group Chemical group 0.000 description 1
238000001308 synthesis method Methods 0.000 description 1
238000003786 synthesis reaction Methods 0.000 description 1
230000008016 vaporization Effects 0.000 description 1
230000004580 weight loss Effects 0.000 description 1

Landscapes

Ceramic Products (AREA)

JP61305393A 1986-12-23 1986-12-23 窒化ケイ素−炭化ケイ素複合焼結体およびその製造法 Granted JPS63159256A (ja)

Priority Applications (1)

Application Number	Priority Date	Filing Date	Title
JP61305393A JPS63159256A (ja)	1986-12-23	1986-12-23	窒化ケイ素−炭化ケイ素複合焼結体およびその製造法

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
JP61305393A JPS63159256A (ja)	1986-12-23	1986-12-23	窒化ケイ素−炭化ケイ素複合焼結体およびその製造法

Publications (2)

Publication Number	Publication Date
JPS63159256A JPS63159256A (ja)	1988-07-02
JPH0535694B2 true JPH0535694B2 (es)	1993-05-27

Family

ID=17944581

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP61305393A Granted JPS63159256A (ja)	1986-12-23	1986-12-23	窒化ケイ素−炭化ケイ素複合焼結体およびその製造法

Country Status (1)

Country	Link
JP (1)	JPS63159256A (es)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JP2829229B2 (ja) *	1993-10-25	1998-11-25	株式会社東芝	窒化ケイ素系セラミックス焼結体

1986
- 1986-12-23 JP JP61305393A patent/JPS63159256A/ja active Granted

Also Published As

Publication number	Publication date
JPS63159256A (ja)	1988-07-02

Publication	Publication Date	Title
US4800182A (en)	1989-01-24	Silicon nitride-silicon carbide composite material and process for production thereof
TW397807B (en)	2000-07-11	Aluminium nitride sintered body
Wang et al.	2022	Thermal and mechanical properties of Si3N4 ceramics obtained via two-step sintering
JP4312293B2 (ja)	2009-08-12	炭化珪素系セラミック複合材料とその製造方法
WO1999011583A1 (en)	1999-03-11	Silicon nitride sinter having high thermal conductivity and process for preparing the same
JPH11314969A (ja)	1999-11-16	高熱伝導性Ｓｉ３Ｎ４焼結体及びその製造方法
US5360772A (en)	1994-11-01	Ceramic material reinforced by the incorporation of TiC, TiCN and TiN whiskers and processes for production thereof
JPH02160669A (ja)	1990-06-20	窒化ケイ素―炭化ケイ素複合焼結体およびその製造法
KR100325325B1 (ko)	2002-03-06	강도와 인성이 우수한 질화규소 세라믹 제조방법
JPH01275470A (ja)	1989-11-06	窒化ケイ素−炭化ケイ素複合焼結体の製造法
JPH02302368A (ja)	1990-12-14	高靭性炭化珪素焼結体及びその製造方法
JP2649220B2 (ja)	1997-09-03	窒化珪素／炭化珪素複合粉末及び複合成形体並びにそれらの製造方法及び窒化珪素／炭化珪素複合焼結体の製造方法
JP3297740B2 (ja)	2002-07-02	炭化けい素粉末の低温焼結方法
JPS6212663A (ja)	1987-01-21	Ｂ４ｃ質複合体およびその製造方法
JPS63159256A (ja)	1988-07-02	窒化ケイ素−炭化ケイ素複合焼結体およびその製造法
JP2519076B2 (ja)	1996-07-31	炭化珪素ウィスカ―強化セラミックスの製造方法
JPH01282154A (ja)	1989-11-14	繊維強化酸窒化珪素焼結体の製造方法
JP2524635B2 (ja)	1996-08-14	繊維強化セラミックス
JP3653533B2 (ja)	2005-05-25	窒化ケイ素質複合材料およびその製造方法
JP2910359B2 (ja)	1999-06-23	窒化ケイ素質焼結体の製造方法
JPH06128052A (ja)	1994-05-10	窒化珪素焼結体及びその製造方法
JPH0535683B2 (es)	1993-05-27
JPH02102108A (ja)	1990-04-13	炭化ケイ素ウイスカーを含む窒化ケイ素−炭化ケイ素複合セラミックス原料の製造法
JPH01197357A (ja)	1989-08-09	アルミナ−サイアロン複合焼結体
JPH06128040A (ja)	1994-05-10	窒化珪素焼結体及びその製造方法