JPH0554263B2 - - Google Patents
Info
- Publication number
- JPH0554263B2 JPH0554263B2 JP57057241A JP5724182A JPH0554263B2 JP H0554263 B2 JPH0554263 B2 JP H0554263B2 JP 57057241 A JP57057241 A JP 57057241A JP 5724182 A JP5724182 A JP 5724182A JP H0554263 B2 JPH0554263 B2 JP H0554263B2
- Authority
- JP
- Japan
- Prior art keywords
- wiring
- polysilicon
- insulating film
- diffusion layer
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Electrodes Of Semiconductors (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57057241A JPS58175847A (ja) | 1982-04-08 | 1982-04-08 | 半導体装置の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57057241A JPS58175847A (ja) | 1982-04-08 | 1982-04-08 | 半導体装置の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58175847A JPS58175847A (ja) | 1983-10-15 |
| JPH0554263B2 true JPH0554263B2 (lt) | 1993-08-12 |
Family
ID=13050031
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57057241A Granted JPS58175847A (ja) | 1982-04-08 | 1982-04-08 | 半導体装置の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58175847A (lt) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL8402859A (nl) * | 1984-09-18 | 1986-04-16 | Philips Nv | Werkwijze voor het vervaardigen van submicrongroeven in bijvoorbeeld halfgeleidermateriaal en met deze werkwijze verkregen inrichtingen. |
| JPH0642484B2 (ja) * | 1985-09-09 | 1994-06-01 | 日本電信電話株式会社 | 半導体装置の製造方法 |
| EP0296718A3 (en) * | 1987-06-26 | 1990-05-02 | Hewlett-Packard Company | A coplanar and self-aligned contact structure |
-
1982
- 1982-04-08 JP JP57057241A patent/JPS58175847A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS58175847A (ja) | 1983-10-15 |
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