JPH0562449B2 - - Google Patents

Info

Publication number
JPH0562449B2
JPH0562449B2 JP60028357A JP2835785A JPH0562449B2 JP H0562449 B2 JPH0562449 B2 JP H0562449B2 JP 60028357 A JP60028357 A JP 60028357A JP 2835785 A JP2835785 A JP 2835785A JP H0562449 B2 JPH0562449 B2 JP H0562449B2
Authority
JP
Japan
Prior art keywords
mask
substrate
exposed
holding means
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60028357A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61188933A (ja
Inventor
Hiroshi Shinkai
Junji Isohata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP60028357A priority Critical patent/JPS61188933A/ja
Publication of JPS61188933A publication Critical patent/JPS61188933A/ja
Publication of JPH0562449B2 publication Critical patent/JPH0562449B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP60028357A 1985-02-18 1985-02-18 露光方法 Granted JPS61188933A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60028357A JPS61188933A (ja) 1985-02-18 1985-02-18 露光方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60028357A JPS61188933A (ja) 1985-02-18 1985-02-18 露光方法

Publications (2)

Publication Number Publication Date
JPS61188933A JPS61188933A (ja) 1986-08-22
JPH0562449B2 true JPH0562449B2 (de) 1993-09-08

Family

ID=12246358

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60028357A Granted JPS61188933A (ja) 1985-02-18 1985-02-18 露光方法

Country Status (1)

Country Link
JP (1) JPS61188933A (de)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2503572B2 (ja) * 1988-03-08 1996-06-05 株式会社ニコン 露光装置及び露光方法

Also Published As

Publication number Publication date
JPS61188933A (ja) 1986-08-22

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term