JPH0564918A - Electrostatic recording device - Google Patents
Electrostatic recording deviceInfo
- Publication number
- JPH0564918A JPH0564918A JP22906191A JP22906191A JPH0564918A JP H0564918 A JPH0564918 A JP H0564918A JP 22906191 A JP22906191 A JP 22906191A JP 22906191 A JP22906191 A JP 22906191A JP H0564918 A JPH0564918 A JP H0564918A
- Authority
- JP
- Japan
- Prior art keywords
- adhesive
- insulating substrate
- electrode
- ion
- support
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000000853 adhesive Substances 0.000 claims abstract description 101
- 230000001070 adhesive effect Effects 0.000 claims abstract description 98
- 239000000758 substrate Substances 0.000 claims abstract description 82
- 239000003522 acrylic cement Substances 0.000 claims abstract description 17
- 239000011159 matrix material Substances 0.000 claims description 16
- 239000012790 adhesive layer Substances 0.000 abstract description 6
- 238000004519 manufacturing process Methods 0.000 abstract description 3
- 150000002500 ions Chemical class 0.000 description 96
- 239000010410 layer Substances 0.000 description 39
- 239000003795 chemical substances by application Substances 0.000 description 11
- 229920006332 epoxy adhesive Polymers 0.000 description 11
- 239000011248 coating agent Substances 0.000 description 9
- 238000000576 coating method Methods 0.000 description 9
- 239000004820 Pressure-sensitive adhesive Substances 0.000 description 8
- 239000012212 insulator Substances 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 7
- 239000000463 material Substances 0.000 description 7
- 238000012805 post-processing Methods 0.000 description 7
- 238000005304 joining Methods 0.000 description 6
- 239000007788 liquid Substances 0.000 description 4
- 239000004593 Epoxy Substances 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 238000006757 chemical reactions by type Methods 0.000 description 3
- 230000003111 delayed effect Effects 0.000 description 3
- 238000006073 displacement reaction Methods 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 229920002430 Fibre-reinforced plastic Polymers 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 229920000180 alkyd Polymers 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 239000003989 dielectric material Substances 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 239000011151 fibre-reinforced plastic Substances 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 238000013019 agitation Methods 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 239000011889 copper foil Substances 0.000 description 1
- 238000002788 crimping Methods 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 239000002685 polymerization catalyst Substances 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- 238000005303 weighing Methods 0.000 description 1
Landscapes
- Dot-Matrix Printers And Others (AREA)
- Printers Or Recording Devices Using Electromagnetic And Radiation Means (AREA)
- Electrophotography Using Other Than Carlson'S Method (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】この発明はイオンフロ−を記録信
号電荷によって制御して誘電体ドラムの記録層上に静電
電荷像を形成する静電記録装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electrostatic recording apparatus which forms an electrostatic charge image on a recording layer of a dielectric drum by controlling an ion flow by recording signal charges.
【０００２】[0002]
【従来の技術】一般に、例えば静電印刷等の技術分野で
は高電流密度のイオンを発生させ、これを抽出して選択
的に被帯電部材に付与してこの被帯電部材を画像状に帯
電させる静電記録装置が知られている。2. Description of the Related Art Generally, in the technical field of electrostatic printing, for example, ions of high current density are generated, and these ions are extracted and selectively applied to a member to be charged to charge the member to be imaged. Electrostatic recording devices are known.
【０００３】図６（Ａ），（Ｂ）はこの静電記録装置に
用いられるイオンフロー静電記録ヘッド１の要部の概略
構成を示すもので、２はイオン発生部、３はイオン流制
御部である。また、イオン発生部２にはイオン発生用の
複数の第１電極４…と複数の第２電極５…とが設けられ
ており、これらの第１電極４…と第２電極５…との間に
は誘電体からなる誘電体層６が配設されている。FIGS. 6A and 6B show a schematic structure of a main part of an ion flow electrostatic recording head 1 used in this electrostatic recording apparatus. Reference numeral 2 is an ion generating portion, and 3 is an ion flow control. It is a department. Further, the ion generating part 2 is provided with a plurality of first electrodes 4 for ion generation and a plurality of second electrodes 5 ... Between the first electrodes 4 and the second electrodes 5. Is provided with a dielectric layer 6 made of a dielectric material.
【０００４】なお、静電記録ヘッド１には絶縁基板７が
設けられており、この絶縁基板７上に一方向に延びる複
数の第１電極４…が略平行に並設されている。また、誘
電体層６は絶縁基板７における第１電極４…の配設面側
に設けられている。The electrostatic recording head 1 is provided with an insulating substrate 7, and a plurality of first electrodes 4 ... Which extend in one direction are arranged in parallel on the insulating substrate 7. The dielectric layer 6 is provided on the surface of the insulating substrate 7 on which the first electrodes 4 are arranged.
【０００５】さらに、複数の第２電極５…は誘電体層６
における絶縁基板７とは反対側の面に第１電極４…と交
差する方向に並設させた状態で接着剤ｓによって固着さ
れており、第１電極４…と第２電極５…とによってマト
リックスが構成されている。そして、第２電極５…には
このマトリックスと対応する部位にそれぞれ開口部５ａ
…が形成されている。Further, the plurality of second electrodes 5 ...
Is fixed to the surface opposite to the insulating substrate 7 in parallel with the first electrodes 4 by an adhesive s. The matrix is formed by the first electrodes 4 and the second electrodes 5. Is configured. Then, the second electrodes 5 ... Are provided with openings 5a at the portions corresponding to the matrix.
... is formed.
【０００６】また、イオン流制御部３には第２電極５…
に対して第１電極４…とは反対側に配置された帯状の第
３電極８が設けられている。この第３電極８には第１電
極４…と第２電極５…とのマトリックスと対応する部位
にイオン流通過用の開口部８ａ…が形成されている。Further, the ion flow controller 3 has a second electrode 5 ...
On the other hand, a strip-shaped third electrode 8 arranged on the side opposite to the first electrodes 4 is provided. The third electrode 8 is formed with openings 8a for passing an ion flow at a site corresponding to the matrix of the first electrode 4 ... And the second electrode 5.
【０００７】さらに、第２電極５…と第３電極８との間
には絶縁体層９が配設されている。この絶縁体層９には
第２電極５…および第３電極８の各開口部５ａ…、８ａ
…と対応する部位にイオン流通過用の開口部９ａ…が形
成されている。そして、第２電極５…、絶縁体層９およ
び第３電極８の各開口部５ａ…、９ａ…、８ａ…によっ
てイオン流通過口１１…が形成されている。Further, an insulator layer 9 is provided between the second electrodes 5 ... And the third electrode 8. The insulator layer 9 has openings 5a ..., 8a for the second electrode 5 ... and the third electrode 8, respectively.
An opening 9a for passing an ion flow is formed in a portion corresponding to. The ion flow passage ports 11 ... Are formed by the openings 5a ..., 9a ..., 8a ... of the second electrode 5, the insulator layer 9, and the third electrode 8.
【０００８】また、イオンフロー静電記録ヘッド１の動
作時には印字信号にもとづいて第１電極４…と第２電極
５…との間のマトリックスが適宜選択され、選択された
マトリックス部分に対応する第１電極４…と第２電極５
…との間に交流電圧が印加される。これにより、選択さ
れたマトリックス部分に対応する第２電極５…の開口部
５ａ…内の近傍部位に正、負のイオンが発生する。この
とき、第２電極５…と第３電極８との間にはバイアス電
圧が印加され、その極性によって決まるイオンのみが第
２電極５…の開口部５ａ…内の近傍部位に発生したイオ
ンから抽出される。Further, during operation of the ion flow electrostatic recording head 1, the matrix between the first electrodes 4 ... And the second electrodes 5 ... Is appropriately selected based on the print signal, and the matrix corresponding to the selected matrix portion is selected. 1 electrode 4 ... and 2nd electrode 5
An alternating voltage is applied between. As a result, positive and negative ions are generated in the vicinity of the openings 5a ... Of the second electrodes 5 ... Corresponding to the selected matrix portion. At this time, a bias voltage is applied between the second electrode 5 ... And the third electrode 8, and only the ions determined by the polarity thereof are generated from the ions generated in the vicinity of the openings 5a ... of the second electrode 5. To be extracted.
【０００９】ここで、抽出されたイオンは絶縁体層９の
開口部９ａおよび第３電極８の開口部８ａ…を通過し、
図示しない誘電体ドラムを局部的に帯電させる。したが
って、マトリックス構造の第１電極４…および第２電極
５…を選択的に駆動することにより、誘電体ドラム上に
ドットによる静電気録を行なうことができる。Here, the extracted ions pass through the opening 9a of the insulator layer 9 and the opening 8a of the third electrode 8 ,.
A dielectric drum (not shown) is locally charged. Therefore, by selectively driving the first electrode 4 ... And the second electrode 5 ... Of matrix structure, electrostatic recording by dots can be performed on the dielectric drum.
【００１０】また、ここで使用されるイオンフロー静電
記録ヘッド１の誘電体層６を形成する誘電物質はイオン
発生のために印加される高電圧でも絶縁破壊しないこと
が要求されるとともに、イオンを効率よく発生させ、絶
縁破壊にも耐えられる厚さを必要とするため、高誘電率
のものが適している。Further, the dielectric material forming the dielectric layer 6 of the ion flow electrostatic recording head 1 used here is required not to cause dielectric breakdown even at a high voltage applied for ion generation, and at the same time, A material having a high dielectric constant is suitable because it needs to have a thickness that can efficiently generate a dielectric constant and withstand dielectric breakdown.
【００１１】そこで、例えば、特開平2-153760号公報に
は誘電体層６の材料としてシリコーン変性ポリエステル
アルキド樹脂中に酸化チタン粉末を混在させたものを用
いたものが示されている。また、第２電極５…用の材料
としてはステンレス鋼を用い、この第２電極５…を誘電
体層６に固着するにもシリコーン系の感圧接着剤を用い
ている。Therefore, for example, Japanese Patent Application Laid-Open No. 2-153760 discloses a material in which titanium oxide powder is mixed in a silicone-modified polyester alkyd resin as a material for the dielectric layer 6. Further, stainless steel is used as a material for the second electrodes 5 ..., and a silicone pressure-sensitive adhesive is also used to fix the second electrodes 5 ... to the dielectric layer 6.
【００１２】ところで、この種のイオンフロー静電記録
ヘッド１としてシート状の絶縁基板７上に、第１電極４
…、誘電体層６、第２電極５…、絶縁体層９および第３
電極８を順次積層させてイオンカ−トリッジシ−トを形
成し、このイオンカ−トリッジシ−トの絶縁基板７を図
示しないプリンタ本体に装着される支持体に固定させた
構成のものが知られている。By the way, as the ion flow electrostatic recording head 1 of this type, a first electrode 4 is formed on a sheet-like insulating substrate 7.
, Dielectric layer 6, second electrode 5, insulator layer 9 and third layer
There is known a structure in which electrodes 8 are sequentially laminated to form an ion cartridge sheet, and an insulating substrate 7 of the ion cartridge sheet is fixed to a support body mounted on a printer body (not shown).
【００１３】この場合、例えばアルミニウム等の熱伝導
率の高い材料を使用して形成された支持体にイオンカ−
トリッジシ−トの絶縁基板７を固着することにより、イ
オンフロー静電記録ヘッド１の動作時に高電流密度のイ
オン発生にともない高熱が発生した際に、イオンフロー
静電記録ヘッド１に蓄積される熱をこの支持体を介して
伝熱させ、放熱させて除去するようにしている。In this case, an ion cover is formed on the support formed of a material having a high thermal conductivity such as aluminum.
By fixing the insulating substrate 7 of the trench sheet, the heat accumulated in the ion flow electrostatic recording head 1 when high heat is generated due to the generation of high current density ions during operation of the ion flow electrostatic recording head 1. Is transferred through this support, and is radiated to remove it.
【００１４】また、イオンカ−トリッジシ−トの絶縁基
板７と支持体との固着には通常、エポシキ系接着剤が使
用されており、この固着作業時の両者間の位置ずれ許容
量は５０μｍ以内程度に設定されている。Further, an epoxy adhesive is usually used for fixing the insulating substrate 7 of the ion cartridge sheet and the support, and the allowable positional deviation between the two during the fixing work is within about 50 μm. Is set to.
【００１５】[0015]
【発明が解決しようとする課題】上記従来構成の静電記
録装置にあってはイオンカ−トリッジシ−トの絶縁基板
７を支持体に固着する際に使用されるエポシキ系接着剤
の硬化速度が比較的遅いので、後加工が滞る問題があ
る。In the electrostatic recording apparatus having the above-mentioned conventional structure, the curing speed of the epoxy adhesive used for fixing the insulating substrate 7 of the ion cartridge sheet to the support is compared. Since it is slow, there is a problem that post-processing is delayed.
【００１６】例えば、室温硬化型のエポキシ系接着剤は
２液混合型の接着剤であり、２液の秤量および撹拌が必
要になるので、その作業に手間がかかるうえ、接着作業
後、完全に硬化するまでには長時間を要する問題があ
る。For example, a room temperature curing type epoxy adhesive is a two-component mixed type adhesive, which requires weighing and agitation of the two liquids, which requires a lot of work and is completely completed after the bonding work. There is a problem that it takes a long time to cure.
【００１７】また、加熱硬化型のエポキシ系接着剤は１
００℃以上の温度で数時間保持させなければ硬化しない
ので、このエポキシ系接着剤の硬化時の加熱動作にとも
ないイオンカ−トリッジシ−トの各構成部材等の材質を
必要以上に劣化させるおそれがある。The heat-curable epoxy adhesive is 1
Since it does not cure unless it is kept at a temperature of 00 ° C. or higher for several hours, there is a possibility that the material of each constituent member of the ion cartridge sheet may be deteriorated more than necessary due to the heating operation during curing of the epoxy adhesive. ..
【００１８】そこで、イオンカ−トリッジシ−トの絶縁
基板７における誘電体層６との接合部位以外の部分と対
応する絶縁基板７の裏面側に粘着剤を貼着するととも
に、この絶縁基板７における誘電体層６との接合部位と
対応する絶縁基板７の裏面側に室温硬化型のエポキシ系
接着剤を塗布した後、このイオンカ−トリッジシ−トの
絶縁基板７の粘着剤の貼着面およびエポキシ系接着剤の
塗布面をそれぞれ支持体の対応部位に接合させ、粘着剤
と仮硬化中の接着剤により、イオンカ−トリッジシ−ト
を支持体側に固定した状態で、イオンカ−トリッジシ−
トと支持体との接合部品を後加工工程に進めている。Therefore, an adhesive agent is attached to the back surface side of the insulating substrate 7 corresponding to the portion of the insulating substrate 7 of the ion cartridge sheet other than the joint portion with the dielectric layer 6, and the dielectric in the insulating substrate 7 is also reduced. After the room temperature curing type epoxy adhesive is applied to the back surface side of the insulating substrate 7 corresponding to the bonding portion with the body layer 6, the adhesive surface of the insulating substrate 7 of this ion cartridge sheet and the epoxy adhesive. The surface to which the adhesive is applied is bonded to the corresponding portion of the support, and the ion cartridge sheet is fixed to the support with the adhesive and the adhesive that is being pre-cured.
We are proceeding with the post-processing process of the joint parts between the support and the support.
【００１９】しかしながら、この場合には仮硬化中の接
着剤が完全に硬化するまでの比較的長い時間、絶縁基板
７のエポキシ系接着剤の塗布面を支持体側に押さえ付け
る状態で保持する必要があるので、支持体側に絶縁基板
７のエポキシ系接着剤の塗布面を押さえつける加圧によ
り、接着剤層の位置ずれが生じ易い問題がある。そし
て、イオンカ−トリッジシ−トの絶縁基板７と支持体と
の固着作業時の両者間の位置ずれ量が許容量を越えて拡
大した場合にはイオンフロー静電記録ヘッド１の動作時
に画質が低下する問題がある。However, in this case, it is necessary to hold the epoxy-based adhesive application surface of the insulating substrate 7 in a state of being pressed against the support side for a relatively long time until the adhesive being temporarily cured is completely cured. Therefore, there is a problem that the position of the adhesive layer is likely to be displaced due to the pressure that presses the epoxy-based adhesive application surface of the insulating substrate 7 toward the support side. When the amount of positional deviation between the insulating substrate 7 of the ion cartridge sheet and the supporting member during the work of adhering to each other exceeds the permissible amount, the image quality deteriorates during operation of the ion flow electrostatic recording head 1. I have a problem to do.
【００２０】また、絶縁基板７における誘電体層６との
接合部位以外の部分と対応する絶縁基板７の裏面側に貼
着された粘着剤はエポキシ系接着剤を均一に塗布したの
ち、スキージする際のスペーサとしても利用される。し
かし、粘着剤端面のダマや絶縁基板７の裏面側への貼着
の際の空気巻き込み等により、均一な接着層が得られ
ず、画質が低下する問題がある。The adhesive adhered to the back surface side of the insulating substrate 7 corresponding to the portion of the insulating substrate 7 other than the portion to be joined to the dielectric layer 6 is squeegeeed after the epoxy adhesive is uniformly applied. It is also used as a spacer at the time. However, there is a problem that a uniform adhesive layer cannot be obtained and the image quality is deteriorated due to lumps of the end surface of the pressure-sensitive adhesive or air entrainment during attachment to the back surface side of the insulating substrate 7.
【００２１】この発明は上記事情を考慮してなされたも
ので、その目的は、イオンカ−トリッジシ−トの絶縁基
板と支持体との固着作業の作業性を高めることができ、
イオンカ−トリッジシ−トと支持体との接合作業の後加
工工程の滞りを防止することができるとともに、接着剤
層の位置ずれが生じにくく、印字品質が高い高精度の画
像を形成することができる静電記録装置を提供すること
にある。The present invention has been made in consideration of the above circumstances, and an object thereof is to improve workability of fixing work between an insulating substrate of an ion cartridge sheet and a support,
It is possible to prevent a delay in the post-processing step of joining work between the ion cartridge sheet and the support, and to prevent misalignment of the adhesive layer to form a highly accurate image with high print quality. An object is to provide an electrostatic recording device.
【００２２】[0022]
【課題を解決するための手段】この発明は絶縁基板上に
同方向に略平行に並設された複数の第１電極と、これら
の第１電極の延設方向と異なる方向に延設され、前記第
１電極とともにマトリックスを構成し、かつこのマトリ
ックスと対応する部位に開口部が形成された複数の第２
電極と、前記第２電極に対して前記第１電極とは反対側
に配置され、前記マトリックスと対応する部位にイオン
流通過用の開口部が形成された第３電極と、前記第１電
極と第２電極との間に配設された誘電体層と、前記第２
電極と第３電極との間に配設され、前記マトリックスと
対応する部位にイオン流通過用の開口部が形成された絶
縁体層とを備えたイオンカ−トリッジシ−トが形成され
るとともに、このイオンカ−トリッジシ−トがプリンタ
本体に装着される支持体に固定される静電記録装置にお
いて、前記イオンカ−トリッジシ−トの絶縁基板と前記
支持体との間にアクリル系接着剤によって形成される接
着部を設けたものである。According to the present invention, a plurality of first electrodes arranged in parallel on the insulating substrate in substantially the same direction, and extending in a direction different from the extending direction of these first electrodes, A plurality of second electrodes that form a matrix with the first electrodes and that have openings formed at portions corresponding to the matrix.
An electrode, a third electrode arranged on the opposite side of the second electrode from the first electrode, and having an opening for ion flow passage formed in a portion corresponding to the matrix; A dielectric layer disposed between the second electrode and the second electrode;
An ion cartridge sheet is provided which is disposed between the electrode and the third electrode and has an insulator layer having an opening for passing an ion flow formed in a portion corresponding to the matrix, and In an electrostatic recording apparatus in which an ion cartridge sheet is fixed to a support mounted on a printer body, an adhesive formed by an acrylic adhesive between the insulating substrate of the ion cartridge sheet and the support. Parts are provided.
【００２３】[0023]
【作用】上記の構成において、イオンカ−トリッジシ−
トの絶縁基板と支持体との間にアクリル系接着剤によっ
て形成される接着部を設けることにより、エポキシ系接
着剤を使用する場合に比べて短時間で接着剤を硬化さ
せ、絶縁基板と支持体との固着作業の作業性を高めると
ともに、絶縁基板と支持体との接合作業の後加工工程の
滞りを防止し、かつ絶縁基板と支持体との間の位置ずれ
防止および接着層を均一化して画質の低下を防止するよ
うにしたものである。In the above structure, the ion cartridge shield
By providing an adhesive part formed by an acrylic adhesive between the insulating substrate and the support, the adhesive is cured in a shorter time than when an epoxy adhesive is used, and the insulating substrate and the support are supported. In addition to improving the workability of fixing work to the body, it prevents the post-processing step of joining work between the insulating substrate and the support body, prevents misalignment between the insulating substrate and the support body, and makes the adhesive layer uniform. The image quality is prevented from being deteriorated.
【００２４】[0024]
【実施例】図１乃至図５はこの発明の第１の実施例を示
すものである。なお、図１乃至図５中で、図６（Ａ），
（Ｂ）と同一部分には同一の符号を付してその説明を省
略する。1 to 5 show a first embodiment of the present invention. In addition, in FIG. 1 to FIG.
The same parts as those in (B) are designated by the same reference numerals, and the description thereof will be omitted.
【００２５】図１および図２中で、１Ｓは静電記録装置
のイオンカ−トリッジシ−ト、２１はこのイオンカ−ト
リッジシ−ト１Ｓが取付けられる支持体である。この支
持体２１は図示しないプリンタ本体に装着されるもので
ある。In FIGS. 1 and 2, 1S is an ion cartridge sheet of the electrostatic recording apparatus, and 21 is a support to which the ion cartridge sheet 1S is attached. The support 21 is attached to a printer body (not shown).
【００２６】さらに、イオンカ−トリッジシ−ト１Ｓの
絶縁基板７は合成樹脂材料、例えば厚さが１００μｍの
ガラス−エポキシＦＲＰ（繊維強化プラスチック）基板
が使用される。そして、この絶縁基板７の幅方向中央位
置には厚さ１８μｍの略帯状の銅箔が貼着されて一体化
されたのち、エッチング加工でパターニングして第１電
極４…が回路形成されている。Further, as the insulating substrate 7 of the ion cartridge sheet 1S, a synthetic resin material, for example, a glass-epoxy FRP (fiber reinforced plastic) substrate having a thickness of 100 μm is used. Then, a substantially strip-shaped copper foil having a thickness of 18 μm is attached and integrated at the center position in the width direction of the insulating substrate 7, and then patterned by etching to form the first electrodes 4 ... ..
【００２７】また、誘電体層６は誘電体粉末、例えば誘
電率の大きい無機物微粉末を溶剤を含む有機高分子材料
中に分散させたペースト状のものを絶縁基板７上に塗布
後、乾燥、硬化させたものを用いる。As the dielectric layer 6, a dielectric powder, for example, a paste in which fine inorganic powder having a large dielectric constant is dispersed in an organic polymer material containing a solvent is applied on the insulating substrate 7 and then dried. A cured product is used.
【００２８】ここでは例えば、酸化チタンをフィラーと
し、シリコーン変性アルキド樹脂をバインダーとした誘
電体ペーストが図３（Ａ）に示すように絶縁基板７にお
ける各第１電極４のパターン間の間隙部上および第１電
極４上に塗布されたのち、乾燥後、硬化されて、第１電
極４…上に厚さ３３μｍに形成された誘電体層６が用い
られる。Here, for example, a dielectric paste using titanium oxide as a filler and a silicone-modified alkyd resin as a binder is placed on the gap between the patterns of the first electrodes 4 on the insulating substrate 7 as shown in FIG. 3 (A). The dielectric layer 6 is applied on the first electrode 4, dried, and then cured to have a thickness of 33 μm on the first electrode 4.
【００２９】また、誘電体層６上の第２電極５…は予め
例えば厚さ３０μｍのステンレス箔がエッチング等でパ
ターニングされて複数の第２電極５…および各第２電極
５の開口部５ａ…が形成されたもので、図３（Ｂ）に示
すように複数の第１電極４…と各第２電極５の開口部５
ａ…とを対応させて位置決めした状態で、誘電体層６上
に配置され、接着剤ｓを介して誘電体層６側に接着され
ている。The second electrodes 5 on the dielectric layer 6 are patterned in advance by etching, for example, a stainless steel foil having a thickness of 30 μm, and the plurality of second electrodes 5 and the openings 5a of the respective second electrodes 5 are formed. 3B, the plurality of first electrodes 4 ... And the openings 5 of the respective second electrodes 5 are formed as shown in FIG. 3B.
are arranged on the dielectric layer 6 in a state where they are positioned in correspondence with a ... And adhered to the dielectric layer 6 side via an adhesive s.
【００３０】この接着剤ｓはシリコーン系接着剤をトル
エンで４倍に希釈したものが使用される。そして、第２
電極５…の接着作業時には予めこの接着剤ｓを誘電体層
６および絶縁基板７上にスプレーまたはディッピング等
の手段で塗布したのち、７０℃で、５分間加熱し、この
接着剤ｓ中の溶剤分を揮発・乾燥させた状態で第２電極
５…を接着するようになっている。続いて、第２電極５
…が誘電体層６上に接着された状態で、この接着剤ｓが
１３０℃の熱板上で、１０分間、８Kg／cm2 の荷重下で
加熱硬化される。As the adhesive s, a silicone-based adhesive diluted with toluene four times is used. And the second
At the time of bonding the electrodes 5 ..., the adhesive s is applied on the dielectric layer 6 and the insulating substrate 7 in advance by means such as spraying or dipping, and then heated at 70 ° C. for 5 minutes to remove the solvent in the adhesive s. The second electrodes 5 are adhered in a state where the components are volatilized and dried. Then, the second electrode 5
Is adhered on the dielectric layer 6, and this adhesive s is placed on a hot plate at 130 ° C. for 10 minutes, 8 kg / cm 2 It is heat-cured under the load.
【００３１】また、イオンフロー静電記録ヘッド１の製
造時には第２電極５…を誘電体層６上に接着させた状態
で、絶縁基板７、第２電極５…およびその開口部５ａ…
内の接着剤ｓ上をシランカップリング剤で処理してお
く。Further, when the ion flow electrostatic recording head 1 is manufactured, the insulating substrate 7, the second electrode 5 ... And the openings 5a ... In the state where the second electrode 5 ... Is adhered on the dielectric layer 6.
The inside of the adhesive s is treated with a silane coupling agent.
【００３２】さらに、絶縁体層９は絶縁基板７、第２電
極５およびその開口部５ａ…内の接着剤ｓ上に感光性絶
縁フィルム（ソルダーレジスト）を真空ラミネートして
形成される。そして、この絶縁体層９の形成後、この絶
縁体層９に通常の感光性フィルムと同様に露光、現像等
のフォトエッチング処理が施されて第２電極５…の開口
部５ａ…と対応する位置に開口部９ａ…が形成される。Further, the insulating layer 9 is formed by vacuum laminating a photosensitive insulating film (solder resist) on the insulating substrate 7, the second electrode 5 and the adhesive s in the openings 5a. Then, after the insulator layer 9 is formed, the insulator layer 9 is subjected to photoetching treatment such as exposure and development in the same manner as a normal photosensitive film to correspond to the openings 5a ... Of the second electrodes 5. The openings 9a ... Are formed at the positions.
【００３３】また、絶縁体層９の上には図３（Ｃ）に示
すように第３電極８がその開口部８ａ…を絶縁体層９の
開口部９ａ…に対応させた状態で位置決めされて接着さ
れ、イオンカ−トリッジシ−ト１Ｓのイオンフロー静電
記録ヘッド１が製造される。この場合、第３電極８と絶
縁体層９とは例えば、粘着剤や両面テープで貼り合わせ
たり、或いは第３電極８上から片面テープで絶縁体層９
に貼り付けるようにしている。Further, as shown in FIG. 3C, the third electrode 8 is positioned on the insulating layer 9 with the openings 8a of the third electrode 8 corresponding to the openings 9a of the insulating layer 9. Are bonded together to manufacture the ion flow electrostatic recording head 1 of the ion cartridge sheet 1S. In this case, the third electrode 8 and the insulating layer 9 may be attached to each other with, for example, an adhesive or a double-sided tape, or the insulating layer 9 may be attached onto the third electrode 8 with a single-sided tape.
I am trying to paste it on.
【００３４】一方、プリンタ本体に装着される支持体２
１の上面には図４に示すようにイオンカ−トリッジシ−
ト１Ｓのイオンフロー静電記録ヘッド１よりも若干幅寸
法が大きいヘッド接着部２２が形成されており、このヘ
ッド接着部２２の両側に溝部２３がそれぞれ形成されて
いる。これらの一対の溝部２３，２３はイオンフロー静
電記録ヘッド１の第１電極４…と同方向に平行に延設さ
れたものである。On the other hand, the support 2 mounted on the printer body
As shown in FIG. 4, on the upper surface of No. 1 is an ion cartridge shield.
The head adhesion portion 22 having a width slightly larger than that of the ion flow electrostatic recording head 1 of 1S is formed, and the groove portions 23 are formed on both sides of the head adhesion portion 22. The pair of groove portions 23, 23 extend in the same direction as the first electrodes 4, ... Of the ion flow electrostatic recording head 1.
【００３５】さらに、これらの一対の溝部２３，２３間
の間隔はイオンカ−トリッジシ−ト１Ｓ上に形成された
誘電体層６の幅よりも数ミリ程度大きく設定されてい
る。また、支持体２１の上面両側の角部には面取りされ
たＲ部２４がそれぞれ形成されている。そして、各溝部
２３の溝幅は支持体２１の上面に一対の溝部２３，２３
間の間隔を確保した部分からこの支持体２１の上面両側
のＲ部２４までを最大幅に設定されている。なお、各溝
部２３の最小の溝幅は０．０５mm、深さは０．０５mm以
上に設定されている。Further, the interval between the pair of groove portions 23, 23 is set to be several millimeters larger than the width of the dielectric layer 6 formed on the ion cartridge sheet 1S. Further, chamfered R portions 24 are formed at corners on both sides of the upper surface of the support body 21, respectively. The groove width of each groove portion 23 is such that the pair of groove portions 23,
The maximum width is set from the portion where the space is secured to the R portions 24 on both sides of the upper surface of the support 21. The minimum groove width of each groove 23 is set to 0.05 mm and the depth thereof is set to 0.05 mm or more.
【００３６】また、イオンカ−トリッジシ−ト１Ｓの絶
縁基板７の裏面には図５に示すように支持体２１の両側
の溝部２３，２３におけるＲ部２４側の縁部と対応する
位置に粘着剤貼着基準ライン７ａ，７ａが形成されてい
る。そして、両側の粘着剤貼着基準ライン７ａ，７ａの
内側のイオンフロー静電記録ヘッド１の積層部分と対応
する部位に接着剤塗布部７ｂ、両側の粘着剤貼着基準ラ
イン７ａ，７ａの外側に粘着剤塗布部７ｃ，７ｃがそれ
ぞれ形成されている。Further, as shown in FIG. 5, on the back surface of the insulating substrate 7 of the ion cartridge sheet 1S, an adhesive is provided at a position corresponding to the edges of the grooves 23, 23 on both sides of the support 21 on the R portion 24 side. Adhesion reference lines 7a, 7a are formed. Then, the adhesive application section 7b is provided inside the pressure-sensitive adhesive sticking reference lines 7a, 7a corresponding to the laminated portion of the ion flow electrostatic recording head 1, and the outside of the pressure-sensitive adhesive sticking reference lines 7a, 7a on both sides. Adhesive applying portions 7c and 7c are formed on the respective surfaces.
【００３７】さらに、イオンカ−トリッジシ−ト１Ｓの
絶縁基板７と支持体２１との間には２液反応型アクリル
系接着剤によって形成される接着部２５が形成されてい
る。この場合、イオンカ−トリッジシ−ト１Ｓの絶縁基
板７と支持体２１との接着作業時には支持体２１のヘッ
ド接着部２２には例えば日本ロックタイト社製のＬＩ−
５０４（商品名）、３２６ＬＶＵＶ（商品名）等の２液
反応型アクリル系接着剤が塗布される。Further, an adhesive portion 25 formed of a two-liquid reactive acrylic adhesive is formed between the insulating substrate 7 of the ion cartridge sheet 1S and the support 21. In this case, at the time of bonding the insulating substrate 7 of the ion cartridge sheet 1S and the supporting body 21, the head bonding portion 22 of the supporting body 21 is, for example, LI- manufactured by Nippon Loctite Co.
A two-component reactive acrylic adhesive such as 504 (trade name), 326LVUV (trade name) is applied.
【００３８】また、イオンカ−トリッジシ−ト１Ｓの絶
縁基板７には裏面両側の粘着剤塗布部７ｃ，７ｃに例え
ば住友３Ｍ社製の９４６０（商品名）、９４６９（商品
名）等の粘着剤が塗布されるとともに、さらにこの粘着
剤の塗布後、接着剤塗布部７ｂに例えば日本ロックタイ
ト社製のプライマーＮ（商品名）等の反応促進剤が塗布
される。Further, on the insulating substrate 7 of the ion cartridge sheet 1S, pressure sensitive adhesives such as 9460 (trade name) and 9469 (trade name) manufactured by Sumitomo 3M Co., Ltd. are applied to the pressure sensitive adhesive application portions 7c, 7c on both sides of the back surface. After the application of the pressure-sensitive adhesive, a reaction accelerator such as Primer N (trade name) manufactured by Nippon Loctite Co., Ltd. is applied to the adhesive application portion 7b.
【００３９】続いて、イオンカ−トリッジシ−ト１Ｓの
絶縁基板７と支持体２１との間の位置合わせ調整が行わ
れた後、図１に示すように支持体２１側のヘッド接着部
２２の２液反応型アクリル系接着剤と絶縁基板７側の接
着剤塗布部７ｂの反応促進剤との間が接触された状態
で、８Kg／cm2 の荷重下で約２分間以上硬化される。そ
して、この支持体２１のヘッド接着部２２と絶縁基板７
の接着剤塗布部７ｂとの間の接合部によって２液反応型
アクリル系接着剤によって形成される接着部２５が形成
されている。Then, after the alignment adjustment between the insulating substrate 7 of the ion cartridge sheet 1S and the support 21 is carried out, as shown in FIG. 8 kg / cm 2 with the liquid reaction type acrylic adhesive and the reaction accelerator of the adhesive application portion 7b on the insulating substrate 7 side in contact with each other It is cured under the load of about 2 minutes or more. Then, the head bonding portion 22 of the support 21 and the insulating substrate 7
An adhesive portion 25 formed of a two-component reactive acrylic adhesive is formed by the joint portion between the adhesive application portion 7b and the adhesive application portion 7b.
【００４０】その後、支持体２１のＲ部２４に当たるイ
オンカ−トリッジシ−ト１Ｓの絶縁基板７の粘着剤塗布
部７ｃ，７ｃを端縁部側から加熱して湾曲癖を付け、さ
らに支持体２１の側面に馴染ませるようにこの絶縁基板
７を支持体２１側に圧着することにより、イオンカ−ト
リッジシ−ト１Ｓの絶縁基板７と支持体２１との間が接
着される。After that, the pressure sensitive adhesive coating portions 7c, 7c of the insulating substrate 7 of the ion cartridge sheet 1S corresponding to the R portion 24 of the support 21 are heated from the end edge side to give a curl, and the support 21 is further bent. The insulating substrate 7 of the ion cartridge sheet 1S and the supporting body 21 are bonded to each other by crimping the insulating substrate 7 on the side of the supporting body 21 so as to fit the side surface.
【００４１】そこで、上記構成のものにあってはイオン
カ−トリッジシ−ト１Ｓの絶縁基板７の接着剤塗布部７
ｂに反応促進剤を塗布し、支持体２１のヘッド接着部２
２に２液反応型アクリル系接着剤を塗布し、これらを接
合させてイオンカ−トリッジシ−ト１Ｓの絶縁基板７と
支持体２１との間に２液反応型アクリル系接着剤によっ
て形成される接着部２５を設けたので、イオンカ−トリ
ッジシ−ト１Ｓの絶縁基板７と支持体２１との接合作業
時に従来のようにエポキシ系接着剤を使用する場合に比
べて短時間で接着剤を硬化させ、絶縁基板７と支持体２
１との固着作業の作業性を高めることができる。この場
合、イオンカ−トリッジシ−ト１Ｓの絶縁基板７の接着
剤塗布部７ｂに塗布された反応促進剤は乾燥速度が早い
ので、絶縁基板７の取扱いを容易に行なうことができ
る。そのため、イオンカ−トリッジシ−ト１Ｓと支持体
２１との接合作業の後加工工程の滞りを防止することが
できるとともに、接着部２５の位置ずれが生じにくくす
ることもできる。Therefore, in the case of the above structure, the adhesive applying portion 7 of the insulating substrate 7 of the ion cartridge sheet 1S is used.
b is coated with a reaction accelerator, and the head adhesive portion 2 of the support 21 is
A two-component reaction type acrylic adhesive is applied to 2 and the two are bonded to each other to form a bond between the insulating substrate 7 of the ion cartridge sheet 1S and the support 21 by the two-component reaction type acrylic adhesive. Since the portion 25 is provided, the adhesive is hardened in a shorter time as compared with the conventional case where an epoxy adhesive is used when joining the insulating substrate 7 of the ion cartridge sheet 1S and the support 21. Insulating substrate 7 and support 2
It is possible to improve the workability of the fixing work with 1. In this case, since the reaction accelerator applied to the adhesive applying portion 7b of the insulating substrate 7 of the ion cartridge sheet 1S has a high drying rate, the insulating substrate 7 can be easily handled. Therefore, it is possible to prevent the post-processing step of the joining work between the ion cartridge sheet 1S and the support body 21 from being delayed, and it is possible to prevent the displacement of the adhesive portion 25 from occurring.
【００４２】また、支持体２１の上面におけるヘッド接
着部２２の両側に溝部２３をそれぞれ設けたので、支持
体２１のヘッド接着部２２の２液反応型アクリル系接着
剤と絶縁基板７の接着剤塗布部７ｂの反応促進剤との間
を接触させた状態で、８Kg／cm2 の荷重下で硬化させる
際に、支持体２１のヘッド接着部２２と絶縁基板７の接
着剤塗布部７ｂとの間から押し出された接着剤をヘッド
接着部２２の両側の溝部２３，２３内に流入させること
ができる。Since the grooves 23 are provided on both sides of the head adhesive portion 22 on the upper surface of the support 21, the two-component reactive acrylic adhesive of the head adhesive portion 22 of the support 21 and the adhesive of the insulating substrate 7 are provided. 8 kg / cm 2 with the reaction accelerator of the coating part 7b in contact with When the adhesive is extruded from between the head adhesive portion 22 of the support 21 and the adhesive applying portion 7b of the insulating substrate 7 when the adhesive is cured under the load of Can be flowed in.
【００４３】そのため、支持体２１のヘッド接着部２２
と絶縁基板７の接着剤塗布部７ｂとの間での接着剤の流
れの滞りを防止することができるので、支持体２１のヘ
ッド接着部２２と絶縁基板７の接着剤塗布部７ｂとの間
で局部的に接着剤が溜まることを防止して接着部２５の
厚さをこの接着部２５全体に亙り略均一化することがで
きる。その結果、各イオンフロー静電記録ヘッド１の各
イオン流通過口１１…でのイオン発生量を均一化するこ
とができるので、イオンフロー静電記録ヘッド１の動作
時の画質低下を防止することができる。Therefore, the head bonding portion 22 of the support 21 is
Since it is possible to prevent the delay of the flow of the adhesive between the adhesive coating portion 7b of the insulating substrate 7 and the adhesive coating portion 7b of the insulating substrate 7, between the head bonding portion 22 of the support 21 and the adhesive coating portion 7b of the insulating substrate 7. Thus, the adhesive can be prevented from locally accumulating and the thickness of the adhesive portion 25 can be made substantially uniform over the entire adhesive portion 25. As a result, the amount of ions generated at each ion flow passage port 11 of each ion flow electrostatic recording head 1 can be made uniform, so that the deterioration of image quality during operation of the ion flow electrostatic recording head 1 can be prevented. You can
【００４４】なお、この発明は上記実施例に限定される
ものではない。例えば、上記実施例ではイオンカ−トリ
ッジシ−ト１Ｓの絶縁基板７と支持体２１との接着作業
時に支持体２１のヘッド接着部２２に２液反応型アクリ
ル系接着剤、イオンカ−トリッジシ−ト１Ｓの絶縁基板
７における接着剤塗布部７ｂに反応促進剤をそれぞれ塗
布して２液反応型アクリル系接着剤によって形成される
接着部２５を形成した構成のものを示したが、上記２液
反応型アクリル系接着剤と反応促進剤とに代えてＳＧＡ
（第２世代アクリル系）接着剤を使用してもよい。The present invention is not limited to the above embodiment. For example, in the above-described embodiment, when the insulating substrate 7 of the ion cartridge sheet 1S and the supporting body 21 are bonded to each other, a two-component reactive acrylic adhesive, an ion cartridge sheet 1S is attached to the head bonding portion 22 of the supporting body 21. A structure in which a reaction accelerator is applied to each adhesive application portion 7b of the insulating substrate 7 to form an adhesive portion 25 formed of a two-component reactive acrylic adhesive is shown. SGA instead of the system adhesive and reaction accelerator
A (2nd generation acrylic) adhesive may be used.
【００４５】このＳＧＡ接着剤は重合触媒と還元剤とを
Ａ剤・Ｂ剤に分け、それにメタクリレートモノマーやポ
リマーなどを配合したもので、Ａ剤とＢ剤とを接触させ
ることにより、互いに硬化が始まる２液非混合型アクリ
ル系接着剤である。This SGA adhesive is one in which a polymerization catalyst and a reducing agent are divided into A agent and B agent, and a methacrylate monomer or polymer is mixed therein. By contacting the A agent and the B agent, they cure each other. It is a two-component non-mixing type acrylic adhesive that begins.
【００４６】そして、イオンカ−トリッジシ−ト１Ｓの
絶縁基板７と支持体２１との接着作業時には支持体２１
のヘッド接着部２２にはＳＧＡ接着剤のＡ剤が塗布さ
れ、イオンカ−トリッジシ−ト１Ｓの絶縁基板７には裏
面両側の粘着剤塗布部７ｃ，７ｃに第１の実施例と同様
の粘着剤が塗布されるとともに、さらにこの粘着剤の塗
布後、接着剤塗布部７ｂにＳＧＡ接着剤のＢ剤が塗布さ
れる。このＳＧＡ接着剤の一例としては例えば協立化学
社の８４５（商品名）、電気化学社のＥ５１０−０７
（商品名）等がある。When the insulating substrate 7 of the ion cartridge sheet 1S is bonded to the support 21, the support 21 is used.
Of the SGA adhesive is applied to the head adhesive portion 22 of the above, and the same adhesive as in the first embodiment is applied to the adhesive applying portions 7c and 7c on both sides of the back surface of the insulating substrate 7 of the ion cartridge sheet 1S. Is further applied, and after the adhesive is applied, the B agent of the SGA adhesive is applied to the adhesive applying portion 7b. As an example of this SGA adhesive, for example, 845 (trade name) of Kyoritsu Chemical Co., Ltd., E510-07 of Denki Kagaku Co., Ltd.
(Product name) etc.
【００４７】続いて、イオンカ−トリッジシ−ト１Ｓの
絶縁基板７と支持体２１との間の位置合わせ調整が行わ
れた後、支持体２１側のヘッド接着部２２のＳＧＡ接着
剤のＡ剤と絶縁基板７側の接着剤塗布部７ｂのＢ剤との
間が接触された状態で、８Kg／cm2 の荷重下で約２分間
以上硬化される。そして、この支持体２１のヘッド接着
部２２と絶縁基板７の接着剤塗布部７ｂとの間の接合部
によって２液非混合型アクリル系接着剤によって形成さ
れる接着部２５が形成されている。Subsequently, after adjusting the alignment between the insulating substrate 7 of the ion cartridge sheet 1S and the support 21, the AGA of the SGA adhesive of the head adhesive 22 on the support 21 side is adjusted. 8 kg / cm 2 in a state where the adhesive agent applied portion 7b on the insulating substrate 7 side is in contact with the agent B. It is cured under the load of about 2 minutes or more. The joint between the head adhesive portion 22 of the support 21 and the adhesive applying portion 7b of the insulating substrate 7 forms an adhesive portion 25 formed of a two-liquid non-mixing acrylic adhesive.
【００４８】その後、第１の実施例と同様に支持体２１
のＲ部２４に当たるイオンカ−トリッジシ−ト１Ｓの絶
縁基板７の粘着剤塗布部７ｃ，７ｃを端縁部側から加熱
して湾曲癖を付け、さらに支持体２１の側面に馴染ませ
るようにこの絶縁基板７を支持体２１側に圧着すること
により、イオンカ−トリッジシ−ト１Ｓの絶縁基板７と
支持体２１との間が接着される。After that, as in the case of the first embodiment, the support 21
The insulation coating 7c of the insulating substrate 7 of the ion cartridge sheet 1S, which corresponds to the R portion 24, is heated from the end edge side to give a curl, and the insulation is applied to the side surface of the support 21. By pressure-bonding the substrate 7 to the supporting body 21 side, the insulating substrate 7 of the ion cartridge sheet 1S and the supporting body 21 are bonded.
【００４９】そこで、上記構成のものにあってはイオン
カ−トリッジシ−ト１Ｓの絶縁基板７の接着剤塗布部７
ｂにＳＧＡ接着剤のＢ剤、支持体２１のヘッド接着部２
２にＳＧＡ接着剤のＡ剤をそれぞれ塗布し、これらを接
合させてイオンカ−トリッジシ−ト１Ｓの絶縁基板７と
支持体２１との間にアクリル系接着剤によって形成され
る接着部２５を設けたので、イオンカ−トリッジシ−ト
１Ｓの絶縁基板７と支持体２１との接合作業時に従来の
ようにエポキシ系接着剤を使用する場合に比べて短時間
で接着剤を硬化させ、絶縁基板７と支持体２１との固着
作業の作業性を高めることができる。そのため、イオン
カ−トリッジシ−ト１Ｓと支持体２１との接合作業の後
加工工程の滞りを防止することができるとともに、接着
部２５の位置ずれが生じにくくすることもできる。Therefore, in the above structure, the adhesive applying portion 7 of the insulating substrate 7 of the ion cartridge sheet 1S is used.
In B, agent B of SGA adhesive, head adhesive portion 2 of the support 21
The SGA adhesive agent A was applied to each of No. 2 and joined together to form an adhesive portion 25 formed of an acrylic adhesive agent between the insulating substrate 7 of the ion cartridge sheet 1S and the support 21. Therefore, when bonding the insulating substrate 7 of the ion cartridge sheet 1S and the support 21 to each other, the adhesive is hardened in a shorter time as compared with the case where an epoxy adhesive is used as in the conventional case, and the insulating substrate 7 and the support are supported. It is possible to improve the workability of the fixing work with the body 21. Therefore, it is possible to prevent the post-processing step of the joining work between the ion cartridge sheet 1S and the support body 21 from being delayed, and it is possible to prevent the displacement of the adhesive portion 25 from occurring.
【００５０】また、支持体２１のヘッド接着部２２のＳ
ＧＡ接着剤のＡ剤と絶縁基板７の接着剤塗布部７ｂのＢ
剤との間を接触させた状態で、８Kg／cm2 の荷重下で硬
化させる際に、支持体２１のヘッド接着部２２と絶縁基
板７の接着剤塗布部７ｂとの間から押し出された接着剤
をヘッド接着部２２の両側の溝部２３，２３内に流入さ
せることができる。Further, S of the head adhesive portion 22 of the support 21 is
Agent A of GA adhesive and B of adhesive application portion 7b of insulating substrate 7
8Kg / cm 2 in contact with the agent When the adhesive is extruded from between the head adhesive portion 22 of the support 21 and the adhesive applying portion 7b of the insulating substrate 7 when the adhesive is cured under the load of Can be flowed in.
【００５１】そのため、支持体２１のヘッド接着部２２
と絶縁基板７の接着剤塗布部７ｂとの間での接着剤の流
れの滞りを防止することができるので、支持体２１のヘ
ッド接着部２２と絶縁基板７の接着剤塗布部７ｂとの間
で局部的に接着剤が溜まることを防止して接着部２５の
厚さをこの接着部２５全体に亙り略均一化することがで
きる。その結果、各イオンフロー静電記録ヘッド１の各
イオン流通過口１１…でのイオン発生量を均一化するこ
とができるので、イオンフロー静電記録ヘッド１の動作
時の画質低下を防止することができる。Therefore, the head bonding portion 22 of the support 21 is
Since it is possible to prevent the delay of the flow of the adhesive between the adhesive coating portion 7b of the insulating substrate 7 and the adhesive coating portion 7b of the insulating substrate 7, between the head bonding portion 22 of the support 21 and the adhesive coating portion 7b of the insulating substrate 7. Thus, the adhesive can be prevented from locally accumulating and the thickness of the adhesive portion 25 can be made substantially uniform over the entire adhesive portion 25. As a result, the amount of ions generated at each ion flow passage port 11 of each ion flow electrostatic recording head 1 can be made uniform, so that the deterioration of image quality during operation of the ion flow electrostatic recording head 1 can be prevented. You can
【００５２】また、ヘッド接着部２２の両側の溝部２
３，２３内に流入した接着剤はＳＧＡ接着剤のＡ剤とＢ
剤とが混合されたものであるので、これらの溝部２３，
２３内でＳＧＡ接着剤の硬化を継続させることができ、
接着剤の硬化時間を効果的に短縮することができる。さ
らに、その他この発明の要旨を逸脱しない範囲で種々の
変形実施できることは勿論である。The groove portions 2 on both sides of the head adhesive portion 22 are also provided.
Adhesives flowing into the inside of 3,23 are SGA adhesives A and B
Since these are mixed with the agent, these groove portions 23,
In 23, the SGA adhesive can continue to cure,
The curing time of the adhesive can be effectively shortened. Further, it goes without saying that various modifications can be made without departing from the scope of the present invention.
【００５３】[0053]
【発明の効果】この発明によればイオンカ−トリッジシ
−トの絶縁基板と前記支持体との間にアクリル系接着剤
によって形成される接着部を設けたので、イオンカ−ト
リッジシ−トの絶縁基板と支持体との固着作業の作業性
を高めることができ、イオンカ−トリッジシ−トと支持
体との接合作業の後加工工程の滞りを防止することがで
きるとともに、接着剤層の位置ずれが生じにくく、印字
品質が高い高精度の画像を形成することができる。According to the present invention, since an adhesive portion formed of an acrylic adhesive is provided between the insulating substrate of the ion cartridge sheet and the support, the insulating substrate of the ion cartridge sheet is provided. The workability of the fixing work with the support can be improved, delay of the post-processing step of the work of joining the ion cartridge sheet and the support can be prevented, and the displacement of the adhesive layer hardly occurs. It is possible to form a highly accurate image with high print quality.
【図１】 この発明の第１の実施例のイオンカ−トリッ
ジシートの取付け状態を示す要部の縦断面図。FIG. 1 is a vertical cross-sectional view of a main part showing an attached state of an ion cartridge sheet according to a first embodiment of the present invention.
【図２】 イオンカ−トリッジシ−トを支持体に取付け
た状態を示す斜視図。FIG. 2 is a perspective view showing a state in which an ion cartridge sheet is attached to a support.
【図３】 イオンフロー静電記録ヘッドの製造工程を示
すもので、（Ａ）は誘電体層の積層状態を示す縦断面
図、（Ｂ）は第２電極の積層状態を示す縦断面図、
（Ｃ）は絶縁体層および第３電極を順次積層させた状態
を示す縦断面図。3A and 3B show a manufacturing process of an ion flow electrostatic recording head, in which FIG. 3A is a vertical sectional view showing a laminated state of a dielectric layer, and FIG. 3B is a vertical sectional view showing a laminated state of a second electrode;
FIG. 6C is a vertical cross-sectional view showing a state in which an insulating layer and a third electrode are sequentially stacked.
【図４】 支持体の溝部を示す斜視図。FIG. 4 is a perspective view showing a groove portion of a support body.
【図５】 イオンカ−トリッジシ−トの絶縁体層裏面の
粘着剤貼着基準ラインを示す斜視図。FIG. 5 is a perspective view showing an adhesive sticking reference line on the back surface of the insulating layer of the ion cartridge sheet.
【図６】 イオンフロー静電記録ヘッドの概略構成を示
すもので、（Ａ）は要部の斜視図、（Ｂ）は同縦断面
図。6A and 6B show a schematic configuration of an ion flow electrostatic recording head, in which FIG. 6A is a perspective view of a main part, and FIG.
１Ｓ…イオンカ−トリッジシ−ト，２…イオン発生部，
３…イオン流制御部，４…第１電極，５…第２電極，５
ａ，８ａ，９ａ…開口部，６…誘電体層，７…絶縁基
板，８…第３電極，９…絶縁体層，１１…イオン流通過
口，２１…支持体，２５…接着部。1S ... Ion cartridge sheet, 2 ... Ion generator,
3 ... Ion flow control unit, 4 ... First electrode, 5 ... Second electrode, 5
a, 8a, 9a ... Opening portion, 6 ... Dielectric layer, 7 ... Insulating substrate, 8 ... Third electrode, 9 ... Insulating layer, 11 ... Ion flow passage port, 21 ... Support body, 25 ... Adhesive portion.
Claims (1)
た複数の第１電極と、これらの第１電極の延設方向と異
なる方向に延設され、前記第１電極とともにマトリック
スを構成し、かつこのマトリックスと対応する部位に開
口部が形成された複数の第２電極と、前記第２電極に対
して前記第１電極とは反対側に配置され、前記マトリッ
クスと対応する部位にイオン流通過用の開口部が形成さ
れた第３電極と、前記第１電極と第２電極との間に配設
された誘電体層と、前記第２電極と第３電極との間に配
設され、前記マトリックスと対応する部位にイオン流通
過用の開口部が形成された絶縁体層とを備えたイオンカ
−トリッジシ−トが形成されるとともに、このイオンカ
−トリッジシ−トがプリンタ本体に装着される支持体に
固定される静電記録装置において、前記イオンカ−トリ
ッジシ−トの絶縁基板と前記支持体との間にアクリル系
接着剤によって形成される接着部を設けたことを特徴と
する静電記録装置。1. A plurality of first electrodes arranged in parallel in the same direction on an insulating substrate and a plurality of first electrodes extending in a direction different from the extending direction of the first electrodes, and forming a matrix together with the first electrodes. A plurality of second electrodes that are configured and have openings formed in the portions corresponding to the matrix; and a plurality of second electrodes that are arranged on the opposite side of the second electrode from the first electrode and that correspond to the matrix. A third electrode having an opening for passing an ion flow, a dielectric layer disposed between the first electrode and the second electrode, and a dielectric layer disposed between the second electrode and the third electrode. An ion cartridge sheet is provided, which is provided with an insulating layer having an opening for passing an ion flow in a portion corresponding to the matrix, and the ion cartridge sheet is attached to the printer body. Electrostatic recording fixed on a support The electrostatic recording apparatus according to claim 1, wherein an adhesive portion formed of an acrylic adhesive is provided between the insulating substrate of the ion cartridge sheet and the support.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22906191A JPH0564918A (en) | 1991-09-09 | 1991-09-09 | Electrostatic recording device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22906191A JPH0564918A (en) | 1991-09-09 | 1991-09-09 | Electrostatic recording device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0564918A true JPH0564918A (en) | 1993-03-19 |
Family
ID=16886129
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP22906191A Withdrawn JPH0564918A (en) | 1991-09-09 | 1991-09-09 | Electrostatic recording device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0564918A (en) |
-
1991
- 1991-09-09 JP JP22906191A patent/JPH0564918A/en not_active Withdrawn
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A300 | Withdrawal of application because of no request for examination |
Free format text: JAPANESE INTERMEDIATE CODE: A300 Effective date: 19981203 |