JPH0582968B2 - - Google Patents
Info
- Publication number
- JPH0582968B2 JPH0582968B2 JP61061981A JP6198186A JPH0582968B2 JP H0582968 B2 JPH0582968 B2 JP H0582968B2 JP 61061981 A JP61061981 A JP 61061981A JP 6198186 A JP6198186 A JP 6198186A JP H0582968 B2 JPH0582968 B2 JP H0582968B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- tungsten
- metal
- opening
- metal film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6198186A JPS62219945A (ja) | 1986-03-22 | 1986-03-22 | 半導体装置の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6198186A JPS62219945A (ja) | 1986-03-22 | 1986-03-22 | 半導体装置の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62219945A JPS62219945A (ja) | 1987-09-28 |
| JPH0582968B2 true JPH0582968B2 (fr) | 1993-11-24 |
Family
ID=13186865
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6198186A Granted JPS62219945A (ja) | 1986-03-22 | 1986-03-22 | 半導体装置の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62219945A (fr) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5149672A (en) * | 1988-08-01 | 1992-09-22 | Nadia Lifshitz | Process for fabricating integrated circuits having shallow junctions |
| US4999317A (en) * | 1989-09-29 | 1991-03-12 | At&T Bell Laboratories | Metallization processing |
| US5084415A (en) * | 1989-10-23 | 1992-01-28 | At&T Bell Laboratories | Metallization processing |
| US5700716A (en) | 1996-02-23 | 1997-12-23 | Micron Technology, Inc. | Method for forming low contact resistance contacts, vias, and plugs with diffusion barriers |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57208161A (en) * | 1981-06-18 | 1982-12-21 | Fujitsu Ltd | Semiconductor device |
| JPS61147549A (ja) * | 1984-12-21 | 1986-07-05 | Toshiba Corp | 半導体装置 |
| JPS61248442A (ja) * | 1985-04-26 | 1986-11-05 | Hitachi Ltd | 半導体素子用微細電極配線 |
-
1986
- 1986-03-22 JP JP6198186A patent/JPS62219945A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62219945A (ja) | 1987-09-28 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |