JPH0592B2 - - Google Patents
Info
- Publication number
- JPH0592B2 JPH0592B2 JP18836888A JP18836888A JPH0592B2 JP H0592 B2 JPH0592 B2 JP H0592B2 JP 18836888 A JP18836888 A JP 18836888A JP 18836888 A JP18836888 A JP 18836888A JP H0592 B2 JPH0592 B2 JP H0592B2
- Authority
- JP
- Japan
- Prior art keywords
- plate
- plate material
- frame
- chambers
- partition wall
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J3/00—Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
- B01J3/03—Pressure vessels, or vacuum vessels, having closure members or seals specially adapted therefor
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physical Vapour Deposition (AREA)
Description
【発明の詳細な説明】
［産業上の利用分野］
本発明は、帯板等の板材に真空中でコーテイン
グ等の処理を連続して行う処理ラインにおいて、
圧力の異なる２室の間の圧力差を保持するための
差圧シール装置に関するものである。[Detailed Description of the Invention] [Industrial Application Field] The present invention is directed to a processing line that continuously performs treatments such as coating on plate materials such as strips in a vacuum.
The present invention relates to a differential pressure sealing device for maintaining a pressure difference between two chambers having different pressures.
［従来の技術］
帯板等の板材に装飾性、耐食性、耐摩耗性等を
付与するために、真空中でイオンプレーテイン
グ、スパツタリング、プラズマCVD（chemical
vapor deposition）、真空蒸着等により、材料の
表面に連続的にセラミツクスや金属の皮膜を形成
するコーテイング技術が開発されつつある。この
ような処理を行うライン等において、板材を大気
中から真空の処理室に入れるためには、大気圧か
ら順次圧力を下げた多段の真空室を通過させるこ
とが要求される。また、一つのラインで複数の処
理を行う場合は、真空度の異なる処理室を連続的
に通過させることが要求される。[Prior art] In order to impart decorative properties, corrosion resistance, abrasion resistance, etc. to plate materials such as strips, ion plating, sputtering, plasma CVD (chemical
Coating technologies are being developed that continuously form ceramic or metal films on the surface of materials using methods such as vapor deposition and vacuum evaporation. In a line or the like where such processing is carried out, in order to introduce a plate material from the atmosphere into a vacuum processing chamber, it is required to pass the plate material through multiple vacuum chambers in which the pressure is sequentially lowered from atmospheric pressure. Furthermore, when performing multiple treatments in one line, it is required to pass through treatment chambers with different degrees of vacuum continuously.
このような要求に応える装置として、板材を上
下から挟んでシールする一対のロールを多段配置
したシール装置を、真空度の異なる処理室の間に
配したもの（特開昭57−195753）、さらに真空の
処理室と大気の間に配したもの（特開昭57−
195754）が知られている。 In order to meet these demands, a sealing device in which a pair of rolls for sandwiching and sealing a plate from above and below is arranged in multiple stages between processing chambers with different degrees of vacuum (Japanese Patent Laid-Open No. 1957-53); Placed between the vacuum processing chamber and the atmosphere (Japanese Patent Application Laid-open No. 1987-
195754) is known.
［発明が解決しようとする課題］
真空処理を行う装置において、高真空を得るた
めおよび高温に耐えるために、装置を金属製にす
る必要がある。帯板等の板材を連続処理する場
合、コーテイング等の処理を行つた板材にシール
装置の金属ロールが接触すると、板材の表面に形
成された皮膜に疵がつき、またコーテイングされ
る前の板材に金属ロールが接触しても、板材の表
面に疵がついてコーテイング後の表面疵になると
いう問題があつた。[Problems to be Solved by the Invention] In an apparatus for performing vacuum processing, it is necessary to make the apparatus made of metal in order to obtain a high vacuum and to withstand high temperatures. When continuously processing plate materials such as strips, if the metal roll of the sealing device comes into contact with the plate material that has been coated, the film formed on the surface of the plate may be scratched, and the plate material before being coated may be damaged. There was a problem in that even if the metal roll came into contact with the plate, the surface of the plate would be scratched, resulting in surface flaws after coating.
本発明は、帯板等の板材にコーテイング等の処
理を連続して行う処理ラインにおいて、圧力の異
なる２室の間の圧力差を保持するとともに、被処
理材の表面に疵や汚れを発生させることのない差
圧シール装置を提供することを目的とする。 The present invention maintains a pressure difference between two chambers with different pressures in a processing line that continuously performs treatments such as coating on plate materials such as strips, and prevents scratches and dirt from occurring on the surface of the material to be treated. The purpose of the present invention is to provide a differential pressure sealing device that will never cause problems.
［課題を解決するための手段］
本発明装置を図面に示す具体例により説明す
る。[Means for Solving the Problems] The device of the present invention will be explained using a specific example shown in the drawings.
本発明の差圧シール装置は、第１図（第２図の
−断面図）、第２図（第１図の−断面図）
および第３図（第１図の−断面図）に示すよ
うに、帯板等の板材Ｓが略水平方向に搬送され、
板材Ｓの下面に処理が施される処理ラインにおい
て圧力の異なるＡ、B2室の境界をなす装置であ
つて、上隔壁１、下隔壁２、上フレーム３、下フ
レーム４、上プレート５、下プレート６、ガイド
ロール７、シールプレート８を有し、これらはい
ずれも金属製である。 The differential pressure sealing device of the present invention is shown in FIG. 1 (-cross-sectional view of FIG. 2) and FIG. 2 (-cross-sectional view of FIG. 1).
And as shown in FIG. 3 (-cross-sectional view of FIG. 1), a plate material S such as a band plate is conveyed in a substantially horizontal direction,
This is a device that forms the boundary between chambers A and B, which have different pressures, in the processing line where the lower surface of the plate material S is processed, and includes an upper partition wall 1, a lower partition wall 2, an upper frame 3, a lower frame 4, an upper plate 5, and a lower It has a plate 6, a guide roll 7, and a seal plate 8, all of which are made of metal.
上隔壁１の下端と下隔壁２の上端の間には板材
Ｓが通過する間隙が設けられ、上フレーム３は上
隔壁１の下端から下方に突出して上下位置調整可
能に設けられ、下フレーム４は下隔壁２の上端か
ら上方に突出して上下位置調整可能に設けられて
いる。 A gap is provided between the lower end of the upper partition wall 1 and the upper end of the lower partition wall 2, through which the plate material S passes. protrudes upward from the upper end of the lower partition wall 2 and is provided so that its vertical position can be adjusted.
上フレーム３の下端には上プレート５が板材Ｓ
と平行に設けられ、下フレーム４の上端には下プ
レート６が板材Ｓと平行に設けられている。上プ
レート５の板材Ｓ搬送方向の前後端にはガイドロ
ール７ａ，７ｂが設けられ、ガイドロール７ａ，
７ｂの軸は板材Ｓの表面と平行でかつ板材Ｓの搬
送方向と直角になつており、上プレート５の下面
より下方に突出し、かつ下プレート６との間に間
隙をもつて設けられている。 The upper plate 5 is a plate material S at the lower end of the upper frame 3.
A lower plate 6 is provided parallel to the plate material S at the upper end of the lower frame 4. Guide rolls 7a, 7b are provided at the front and rear ends of the upper plate 5 in the conveying direction of the plate material S.
The axis of 7b is parallel to the surface of the plate material S and perpendicular to the conveyance direction of the plate material S, projects downward from the lower surface of the upper plate 5, and is provided with a gap between it and the lower plate 6. .
さらに上プレート５および下プレート６の板材
Ｓ搬送方向両側端部にはシールプレート８が設け
られ、シールプレート８は両プレート５および６
の間隙を埋めかつ前記２室の側壁９ａ，９ｂと密
着している。 Further, seal plates 8 are provided at both ends of the upper plate 5 and the lower plate 6 in the direction of conveyance of the plate material S.
It fills the gap and is in close contact with the side walls 9a, 9b of the two chambers.
第１図および第２図において、１０ａ，１０ｂ
はガイドロール７ａを上プレート５に取り付ける
ための軸受ブロツク、１０ｃ，１０ｄはガイドロ
ール７ｂを上プレート５に取り付けるための軸受
ブロツクである。本例では、上プレート５の板材
Ｓ搬送方向前後端には、第２図のように切欠きが
設けてあつて、該切欠きにガイドロール７ａ，７
ｂが取り付けられている。 In FIG. 1 and FIG. 2, 10a, 10b
1 is a bearing block for attaching the guide roll 7a to the upper plate 5, and 10c and 10d are bearing blocks for attaching the guide roll 7b to the upper plate 5. In this example, notches are provided at the front and rear ends of the upper plate 5 in the conveying direction of the plate material S, as shown in FIG.
b is attached.
また、１１ａ，１１ｂは上フレーム３を上隔壁
１に取り付けるためのネジであり、上フレーム３
には長穴１３ａ，１３ｂが設けてあつて、上フレ
ーム３を上隔壁１に対して上下位置調整できるよ
うになつている。１２ａ，１２ｂは下フレーム４
を下隔壁２に取り付けるためのネジであり、下フ
レーム４には長穴１４ａ，１４ｂが設けてあつ
て、下フレーム４を下隔壁２に対して上下位置調
整できるようになつている。 Further, 11a and 11b are screws for attaching the upper frame 3 to the upper bulkhead 1, and
Elongated holes 13a and 13b are provided in the upper frame 3 so that the upper frame 3 can be vertically adjusted relative to the upper partition wall 1. 12a and 12b are the lower frame 4
The lower frame 4 is provided with elongated holes 14a and 14b so that the lower frame 4 can be vertically adjusted with respect to the lower partition wall 2.
［作用］
Ａ、B2室は上隔壁１、下隔壁２および上フレ
ーム３、下フレーム４で遮断され、上プレート５
と下プレート６の間隙のみが開いている。そし
て、第３図のように、この間隙の側壁９ａ，９ｂ
側にはシールプレート８ａ，８ｂが設けてあり、
上プレート５と下プレート６とシールプレート７
ａ，７ｂで囲まれた通路を通して板材Ｓが搬送さ
れるとともに、Ａ、B2室の雰囲気はこの通路の
みで通じている。[Function] The A and B2 chambers are blocked by the upper partition wall 1, the lower partition wall 2, the upper frame 3, and the lower frame 4, and the upper plate 5
Only the gap between the lower plate 6 and the lower plate 6 is open. Then, as shown in FIG. 3, the side walls 9a and 9b of this gap are
Seal plates 8a and 8b are provided on the sides,
Upper plate 5, lower plate 6 and seal plate 7
The plate material S is conveyed through the passage surrounded by a and 7b, and the atmosphere of rooms A and B2 is communicated only through this passage.
この通路の長さは上プレート５および下プレー
ト６の長さに相当し、第１図のように、この長さ
を上プレート５と下プレート６の間隙に対して長
く取ることにより、Ａ、B2室の間の気体の通気
抵抗を大にすることができ、２室間の圧力差を保
持することができる。上プレート５と下プレート
６の間隙は、板材Ｓの厚さに応じ、上隔壁１と上
フレーム３の取り付け位置および下隔壁２と下フ
レーム４の取り付け位置の調整を行うことによつ
て、必要最小限に調整することができる。 The length of this passage corresponds to the length of the upper plate 5 and the lower plate 6, and as shown in FIG. 1, by making this length longer than the gap between the upper plate 5 and the lower plate 6, It is possible to increase the gas ventilation resistance between chambers B2 and maintain the pressure difference between the two chambers. The gap between the upper plate 5 and the lower plate 6 can be determined as necessary by adjusting the mounting position of the upper partition wall 1 and the upper frame 3 and the mounting position of the lower partition wall 2 and the lower frame 4 according to the thickness of the plate material S. Can be adjusted to a minimum.
上プレート５の板材Ｓ搬送方向前後端には、第
１図のように、ガイドロール７ａ，７ｂが上プレ
ート５の下面よりも下方に突出して設けてあり、
板材Ｓは前後面リール等の図示しない搬送手段に
よつて上面がガイドロール７ａ，７ｂと接触する
ように搬送されるので、板材Ｓと上プレート５お
よび下プレート６との間に間隙が保たれる。この
ため、板材Ｓの下面は無接触の状態で搬送するこ
とができるので、下面にコーテイング等の処理を
施すとき疵や汚れを生じることがない。 As shown in FIG. 1, guide rolls 7a and 7b are provided at the front and rear ends of the upper plate 5 in the conveying direction of the plate material S, protruding downward from the lower surface of the upper plate 5.
The plate material S is conveyed by a transport means (not shown) such as front and rear reels so that its upper surface is in contact with the guide rolls 7a and 7b, so that a gap is maintained between the plate material S and the upper plate 5 and the lower plate 6. It will be done. Therefore, the lower surface of the plate material S can be transported without contact, so that no scratches or stains will occur when the lower surface is coated or otherwise treated.
なお、板材Ｓの上面をガイドロール７ａ，７ｂ
に接触させる手段としては、板材Ｓが磁性体の場
合はガイドロール７ａ，７ｂを磁石とすることも
できる。 Note that the upper surface of the plate S is covered with guide rolls 7a and 7b.
When the plate material S is a magnetic material, the guide rolls 7a and 7b may be magnets.
また、Ａ、B2室間の通気抵抗をさらに大きく
するため、第２図に示す上プレート５とガイドロ
ール７ａ，７ｂの間の隙間を覆うカバーを設ける
こともできる。 Further, in order to further increase the ventilation resistance between the A and B2 chambers, a cover may be provided to cover the gap between the upper plate 5 and the guide rolls 7a and 7b shown in FIG. 2.
本例においては板材Ｓの搬送方向が上隔壁１お
よび下隔壁２と垂直になつているので、上プレー
ト５は上フレーム３に、下プレート６は下フレー
ム４にそれぞれ垂直に固設されているが、板材Ｓ
の搬送方向が変化する場合は、上プレート５およ
び下プレート６が板材Ｓと平行になるように、上
プレート５は上フレーム３に対し、下プレート６
は下フレーム４に対しそれぞれ取り付け角度を調
整できる機構にすることが好ましい。 In this example, since the conveyance direction of the plate material S is perpendicular to the upper partition wall 1 and the lower partition wall 2, the upper plate 5 is fixed perpendicularly to the upper frame 3, and the lower plate 6 is fixed perpendicularly to the lower frame 4. However, plate material S
When the conveyance direction of
It is preferable to use a mechanism in which the mounting angles can be adjusted with respect to the lower frame 4.
［実施例］
第４図に示すように、２基の巻出巻取装置１５
ａ，１５ｂの間に低圧真空処理室１６と高圧真空
処理室１７を配置し、両真空処理室の間に本発明
の差圧シール装置Ｄを４個直列に設け、帯板２０
を張力を付加しつつ搬送して、両真空処理室にて
異種のコーテイングをした。１８ａ，１８ｂ，１
８ｃは差圧真空室、１９ａ，１９ｂ，１９ｃ，１
９ｄ，１９ｅは排気ポンプである。[Example] As shown in FIG. 4, two unwinding and winding devices 15
A low pressure vacuum processing chamber 16 and a high pressure vacuum processing chamber 17 are arranged between a and 15b, and four differential pressure sealing devices D of the present invention are provided in series between the two vacuum processing chambers.
was transported under tension and coated with different types in both vacuum processing chambers. 18a, 18b, 1
8c is a differential pressure vacuum chamber, 19a, 19b, 19c, 1
9d and 19e are exhaust pumps.
各差圧シール装置D1，D2，D3，D4において、
上プレート５および下プレート６の長さは200mm、
上プレート６と下プレート６の間隙は５mm、ガイ
ドロール７ａ，７ｂの直径は40mmとし、帯板の幅
は370mm、厚さは0.1〜0.5mmとした。 In each differential pressure seal device D 1 , D 2 , D 3 , D 4 ,
The length of the upper plate 5 and lower plate 6 is 200 mm,
The gap between the upper plate 6 and the lower plate 6 was 5 mm, the diameter of the guide rolls 7a and 7b was 40 mm, the width of the strip was 370 mm, and the thickness was 0.1 to 0.5 mm.
低圧真空処理室１６の圧力を0.001Torr、高圧
真空処理室１７の圧力を0.2Torrとし、差圧真空
室１８ａ，１８ｂ，１８ｃの圧力が、それぞれ約
0.005Torr、0.01Torr、0.1Torrとなるように排
気しつつ、帯板２０を右方向および左方向に搬送
した結果、何れの板厚、方向においても各室の圧
力は前記真空度に維持された。また、帯板２０の
下面には疵が発生しなかつた。 The pressure in the low-pressure vacuum processing chamber 16 is 0.001 Torr, the pressure in the high-pressure vacuum processing chamber 17 is 0.2 Torr, and the pressure in the differential pressure vacuum chambers 18a, 18b, and 18c is approximately
As a result of transporting the strip plate 20 to the right and to the left while evacuating to 0.005 Torr, 0.01 Torr, and 0.1 Torr, the pressure in each chamber was maintained at the above vacuum level regardless of the plate thickness and direction. . Moreover, no flaws were generated on the lower surface of the strip plate 20.
尚、本実施例において、帯板２０の厚さが厚く
なると帯板のパスラインがラインの中央部では低
くなるので、各差圧シール装置D1，D2，D3，D4
の何れも、上プレート５および下プレート６の取
り付け位置と取り付け角度を板厚毎に調整した。 In this embodiment, as the thickness of the strip plate 20 increases, the pass line of the strip plate becomes lower at the center of the line .
In both cases, the mounting positions and mounting angles of the upper plate 5 and lower plate 6 were adjusted for each plate thickness.
［発明の効果］
帯板等の板材を真空度の異なる複数の真空室に
連続的に通過させて複数のコーテイング等の処理
を行うに際し、本発明の差圧シール装置を使用す
ることにより、各真空室の真空度が確実に維持さ
れ、処理面に疵や汚れを発生させることなく処理
することができる。また、一つの真空室で処理す
る際にも、本発明装置を多段に設けるかあるいは
他のシール装置と併用して板材を大気中から真空
室に搬入することにより、同様の効果が得られ
る。[Effects of the Invention] By using the differential pressure sealing device of the present invention, when a plate material such as a strip plate is passed continuously through a plurality of vacuum chambers with different degrees of vacuum to perform a plurality of coatings, etc., each The degree of vacuum in the vacuum chamber is reliably maintained, and processing can be performed without causing scratches or stains on the processing surface. Furthermore, even when processing is performed in one vacuum chamber, the same effect can be obtained by providing the apparatus of the present invention in multiple stages or by using in combination with another sealing apparatus to transport the plate material from the atmosphere into the vacuum chamber.
第１図は本発明装置の具体例を示す側面図、第
２図は同じく平面図、第３図は同じく正面図、第
４図は本発明装置の適用例を示す図である。
１……上隔壁、２……下隔壁、３……上フレー
ム、４……下フレーム、５……上プレート、６…
…下プレート、７……ガイドロール、８……シー
ルプレート、９……側壁、１０……軸受ブロツ
ク、１１，１２……ネジ、１３，１４……長穴、
１５……巻出巻取装置、１６……低圧真空処理
室、１７……高圧真空処理室、１８……差圧真空
室、１９……排気ポンプ、２０……帯板、Ｄ……
差圧シール装置、Ｓ……板材。
FIG. 1 is a side view showing a specific example of the device of the present invention, FIG. 2 is a plan view, FIG. 3 is a front view, and FIG. 4 is a diagram showing an example of application of the device of the present invention. 1... Upper bulkhead, 2... Lower bulkhead, 3... Upper frame, 4... Lower frame, 5... Upper plate, 6...
... lower plate, 7 ... guide roll, 8 ... seal plate, 9 ... side wall, 10 ... bearing block, 11, 12 ... screw, 13, 14 ... oblong hole,
15... Unwinding and winding device, 16... Low pressure vacuum processing chamber, 17... High pressure vacuum processing chamber, 18... Differential pressure vacuum chamber, 19... Exhaust pump, 20... Band plate, D...
Differential pressure sealing device, S...Plate material.
Claims (1)
を行う処理ラインにおいて圧力の異なる２室の境
界をなす装置であつて、上隔壁１、下隔壁２、上
フレーム３、下フレーム４、上プレート５、下プ
レート６、ガイドロール７、シールプレート８を
有し、上隔壁１の下端と下隔壁２の上端の間には
板材Ｓが通過する間隙が設けられ、上フレーム３
は上隔壁１の下端から下方に突出して上下位置調
整可能に設けられ、下フレーム４は下隔壁２の上
端から上方に突出して上下位置調整可能に設けら
れ、上プレート５は上フレーム３の下端に板材Ｓ
と平行に設けられ、下プレート６は下フレーム４
の上端に板材Ｓと平行に設けられ、ガイドロール
７は軸を板材Ｓの表面と平行にかつ板材Ｓの搬送
方向と直角にして上プレート５の板材Ｓ搬送方向
前後端に上プレート５の下面より下方に突出しか
つ下プレート６との間に間隙をもつて設けられ、
シールプレート８は上プレート５および下プレー
ト６の板材Ｓ搬送方向両側端部にて両プレート５
および６の間隙を埋めかつ前記２室の側壁９と密
着して設けられていることを特徴とする差圧シー
ル装置。1 A device that forms a boundary between two chambers with different pressures in a processing line that processes the lower surface of a plate material S that is transported in a substantially horizontal direction, and includes an upper partition wall 1, a lower partition wall 2, an upper frame 3, a lower frame 4, an upper It has a plate 5, a lower plate 6, a guide roll 7, and a seal plate 8. A gap is provided between the lower end of the upper bulkhead 1 and the upper end of the lower bulkhead 2 through which the plate material S passes, and the upper frame 3
is provided so as to protrude downward from the lower end of the upper bulkhead 1 and can be adjusted vertically, the lower frame 4 is provided to protrude upwardly from the upper end of the lower bulkhead 2 and can be adjusted vertically, and the upper plate 5 is provided at the lower end of the upper frame 3. plate material S
The lower plate 6 is provided parallel to the lower frame 4.
The guide roll 7 is provided at the upper end in parallel with the plate material S, and the guide roll 7 has its axis parallel to the surface of the plate material S and perpendicular to the conveying direction of the plate material S, and is placed at the front and rear ends of the upper plate 5 in the conveying direction of the plate material S on the lower surface of the upper plate 5. protrudes further downward and is provided with a gap between it and the lower plate 6,
The seal plate 8 is attached to both plates 5 at both ends of the upper plate 5 and lower plate 6 in the direction of conveyance of the plate material S.
and 6, and is provided in close contact with the side wall 9 of the two chambers.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18836888A JPH0240231A (en) | 1988-07-29 | 1988-07-29 | Pressure difference sealing equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18836888A JPH0240231A (en) | 1988-07-29 | 1988-07-29 | Pressure difference sealing equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0240231A JPH0240231A (en) | 1990-02-09 |
| JPH0592B2 true JPH0592B2 (en) | 1993-01-05 |
Family
ID=16222390
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18836888A Granted JPH0240231A (en) | 1988-07-29 | 1988-07-29 | Pressure difference sealing equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0240231A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5325031B2 (en) * | 2009-06-25 | 2013-10-23 | 日立造船株式会社 | Vacuum film forming apparatus and vacuum film forming method |
-
1988
- 1988-07-29 JP JP18836888A patent/JPH0240231A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0240231A (en) | 1990-02-09 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| DE102014116696B4 (en) | Vacuum chamber and method for operating a vacuum processing plant | |
| JP2016519213A5 (en) | ||
| US5773088A (en) | Treatment system including vacuum isolated sources and method | |
| MX2013004489A (en) | SEPARATION OF MODULAR COATING MACHINE. | |
| KR970027359A (en) | Vacuum coating device | |
| TWI647743B (en) | Apparatus for processing a film on a substrate, and method for providing a gas-tight process separation wall | |
| JPH0592B2 (en) | ||
| WO2016184487A1 (en) | Load lock chamber, vacuum processing system with load lock chamber and method for evacuating a load lock chamber | |
| JPS61170568A (en) | Continuous vacuum treatment device | |
| JPH0735579B2 (en) | Band-shaped airlock | |
| JPH0243364A (en) | Strip holder | |
| JPS624866A (en) | Sealing device for vacuum processing equipment | |
| JP2009179446A (en) | Winding device and manufacturing method of winding member | |
| US3505974A (en) | Vacuum deposition apparatus | |
| JPH044032A (en) | Sealing device for continuous vacuum treating device | |
| JP2024027550A (en) | Sputtering equipment and film formation method | |
| JPH0735580B2 (en) | Airlock device for band | |
| DE102015116781A1 (en) | Transport system arrangement and processing plant | |
| JPS5939649A (en) | Film band continuous type processing device | |
| WO2020151810A1 (en) | Deposition apparatus and method of operating a deposition apparatus | |
| JP7837094B1 (en) | Differential exhaust system | |
| JPH06159523A (en) | Gas diffusion prevention gate and film forming apparatus equipped with the gas diffusion prevention gate | |
| GB2601831A (en) | Conductance seal | |
| JP3200919B2 (en) | Vacuum differential pressure sealing device | |
| JPH03240955A (en) | Vacuum sealing equipment for continuous metal plate processing line |