JPH0612801Y2 - 気相表面処理装置 - Google Patents

気相表面処理装置

Info

Publication number
JPH0612801Y2
JPH0612801Y2 JP1989152529U JP15252989U JPH0612801Y2 JP H0612801 Y2 JPH0612801 Y2 JP H0612801Y2 JP 1989152529 U JP1989152529 U JP 1989152529U JP 15252989 U JP15252989 U JP 15252989U JP H0612801 Y2 JPH0612801 Y2 JP H0612801Y2
Authority
JP
Japan
Prior art keywords
chemical liquid
chemical
supply pipe
vaporizer
liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP1989152529U
Other languages
English (en)
Japanese (ja)
Other versions
JPH0390429U (th
Inventor
出 井関
博司 松井
勝 北川
勉 武内
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dainippon Screen Manufacturing Co Ltd
Original Assignee
Dainippon Screen Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dainippon Screen Manufacturing Co Ltd filed Critical Dainippon Screen Manufacturing Co Ltd
Priority to JP1989152529U priority Critical patent/JPH0612801Y2/ja
Publication of JPH0390429U publication Critical patent/JPH0390429U/ja
Application granted granted Critical
Publication of JPH0612801Y2 publication Critical patent/JPH0612801Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Pipeline Systems (AREA)
  • Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
  • Coating Apparatus (AREA)
JP1989152529U 1989-12-28 1989-12-28 気相表面処理装置 Expired - Lifetime JPH0612801Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1989152529U JPH0612801Y2 (ja) 1989-12-28 1989-12-28 気相表面処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1989152529U JPH0612801Y2 (ja) 1989-12-28 1989-12-28 気相表面処理装置

Publications (2)

Publication Number Publication Date
JPH0390429U JPH0390429U (th) 1991-09-13
JPH0612801Y2 true JPH0612801Y2 (ja) 1994-04-06

Family

ID=31698785

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1989152529U Expired - Lifetime JPH0612801Y2 (ja) 1989-12-28 1989-12-28 気相表面処理装置

Country Status (1)

Country Link
JP (1) JPH0612801Y2 (th)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013542591A (ja) * 2010-09-08 2013-11-21 モレキュラー・インプリンツ・インコーポレーテッド インプリント・リソフラフィで用いる蒸気供給システム

Also Published As

Publication number Publication date
JPH0390429U (th) 1991-09-13

Similar Documents

Publication Publication Date Title
JP2906006B2 (ja) 処理方法及びその装置
EP0875595B1 (en) Process-gas supply apparatus
KR0156237B1 (ko) 처리액 공급 장치
TW434732B (en) Method and installation for etching a substrate
US6019116A (en) Liquid transfer system
KR100863782B1 (ko) 기판처리장치 및 기판처리방법
KR100230693B1 (ko) 처리장치및처리방법
TW326548B (en) Substrate drying apparatus and method for drying a substrate
JP2010516901A (ja) 試薬分配装置及び運搬方法
US7637029B2 (en) Vapor drying method, apparatus and recording medium for use in the method
JPH0726365Y2 (ja) 気相表面処理装置用の薬液気化装置
JP3883150B2 (ja) 基板処理装置
JPH02276243A (ja) プラズマエッチング装置
JP4052506B2 (ja) 基板処理装置
JPH065505A (ja) フォトレジスト塗布前処理装置
JP3259940B2 (ja) 処理ガスの供給装置
JPH0536268Y2 (th)
JP2876072B2 (ja) 処理装置
JPH0390429U (th)
KR970023610A (ko) 반도체소자 제조용 화학용액의 공급장치
JPH02214536A (ja) 液体原料気化装置
JPH0742481Y2 (ja) 蒸発器
JPH09111456A (ja) 液体原料の供給方法及び供給装置
JPH1119570A (ja) 液供給機構
JPH10161751A (ja) 液体の流量制御方法、及び液体の流量制御装置