JPH06390B2 - Metal base laminated board - Google Patents
Metal base laminated boardInfo
- Publication number
- JPH06390B2 JPH06390B2 JP61109875A JP10987586A JPH06390B2 JP H06390 B2 JPH06390 B2 JP H06390B2 JP 61109875 A JP61109875 A JP 61109875A JP 10987586 A JP10987586 A JP 10987586A JP H06390 B2 JPH06390 B2 JP H06390B2
- Authority
- JP
- Japan
- Prior art keywords
- resin
- metal
- insulating layer
- base material
- metal plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 229910052751 metal Inorganic materials 0.000 title claims description 50
- 239000002184 metal Substances 0.000 title claims description 50
- 229920005989 resin Polymers 0.000 claims description 21
- 239000011347 resin Substances 0.000 claims description 21
- 239000000463 material Substances 0.000 claims description 20
- 239000011256 inorganic filler Substances 0.000 claims description 16
- 229910003475 inorganic filler Inorganic materials 0.000 claims description 16
- 239000011888 foil Substances 0.000 claims description 12
- 239000003822 epoxy resin Substances 0.000 description 6
- 229920000647 polyepoxide Polymers 0.000 description 6
- 238000010521 absorption reaction Methods 0.000 description 5
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- 230000006866 deterioration Effects 0.000 description 3
- 238000009413 insulation Methods 0.000 description 3
- 229920001721 polyimide Polymers 0.000 description 3
- 229910001369 Brass Inorganic materials 0.000 description 2
- 229910000976 Electrical steel Inorganic materials 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 239000010951 brass Substances 0.000 description 2
- 229920006026 co-polymeric resin Polymers 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- 239000000155 melt Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000009719 polyimide resin Substances 0.000 description 2
- 229910000679 solder Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 229920001187 thermosetting polymer Polymers 0.000 description 2
- 239000011800 void material Substances 0.000 description 2
- PEVRKKOYEFPFMN-UHFFFAOYSA-N 1,1,2,3,3,3-hexafluoroprop-1-ene;1,1,2,2-tetrafluoroethene Chemical group FC(F)=C(F)F.FC(F)=C(F)C(F)(F)F PEVRKKOYEFPFMN-UHFFFAOYSA-N 0.000 description 1
- 229910052582 BN Inorganic materials 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- 229910000737 Duralumin Inorganic materials 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 229920000265 Polyparaphenylene Polymers 0.000 description 1
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical compound C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 229910000611 Zinc aluminium Inorganic materials 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- HXFVOUUOTHJFPX-UHFFFAOYSA-N alumane;zinc Chemical compound [AlH3].[Zn] HXFVOUUOTHJFPX-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 239000010425 asbestos Substances 0.000 description 1
- 239000010953 base metal Substances 0.000 description 1
- UUAGAQFQZIEFAH-UHFFFAOYSA-N chlorotrifluoroethylene Chemical group FC(F)=C(F)Cl UUAGAQFQZIEFAH-UHFFFAOYSA-N 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000011889 copper foil Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 150000007529 inorganic bases Chemical class 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 150000007530 organic bases Chemical class 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- -1 polyphenylene Polymers 0.000 description 1
- 229920001021 polysulfide Polymers 0.000 description 1
- 239000005077 polysulfide Substances 0.000 description 1
- 150000008117 polysulfides Polymers 0.000 description 1
- 229910052895 riebeckite Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 229920006337 unsaturated polyester resin Polymers 0.000 description 1
- 239000002966 varnish Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000002759 woven fabric Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Landscapes
- Laminated Bodies (AREA)
- Insulated Metal Substrates For Printed Circuits (AREA)
Description
【発明の詳細な説明】 [技術分野] 本発明は耐湿性、耐熱性に優れた金属ベース積層板に関
する。Description: TECHNICAL FIELD The present invention relates to a metal base laminate having excellent moisture resistance and heat resistance.
[背景技術] 従来より、金属板にエポキシ樹脂のような絶縁層を介し
て金属箔が貼着されて金属ベース積層板が形成されてい
るが、金属板と絶縁層の熱膨張の差により、特に吸湿の
後の耐熱性が悪く、又電触試験での絶縁劣化が著しく、
しかも絶縁層にボイドが発生し、絶縁層の厚みのばらつ
きも大きくなってしまっていた。絶縁層のボイドの発生
及び厚みのばらつきを防止するために、絶縁層にガラス
基材のような基材が介装されているが、このものにあっ
ては絶縁層と金属板との、特に吸湿後の密着性が悪く、
又吸湿後の耐熱性にも劣ってみるものである。BACKGROUND ART Conventionally, a metal base laminate is formed by attaching a metal foil to a metal plate via an insulating layer such as an epoxy resin, but due to the difference in thermal expansion between the metal plate and the insulating layer, In particular, the heat resistance after moisture absorption is poor, and the insulation deterioration in the electrical contact test is remarkable,
Moreover, voids were generated in the insulating layer, and variations in the thickness of the insulating layer were also large. In order to prevent the occurrence of voids and variations in thickness of the insulating layer, a base material such as a glass base material is interposed in the insulating layer. In this case, the insulating layer and the metal plate, Poor adhesion after absorbing moisture,
Moreover, the heat resistance after moisture absorption is also inferior.
[発明の目的] 本発明は上記事情に鑑みて為されたものであり、その目
的とするところは、耐湿性、耐熱性に優れ、絶縁層と金
属板との密着性も高く、しかも絶縁層にボイドが発生す
ることがなく厚みのばらつきも小さい金属ベース積層板
を提供することにある。[Object of the Invention] The present invention has been made in view of the above circumstances, and an object of the present invention is to provide excellent moisture resistance and heat resistance, a high adhesion between an insulating layer and a metal plate, and an insulating layer. It is an object to provide a metal base laminated plate which does not generate voids and has a small variation in thickness.
[発明の開示] 本発明の金属ベース積層板は、金属板1に絶縁層2を介
して金属箔3を貼着してなる金属ベース積層板であっ
て、絶縁層2の金属箔3側を樹脂含浸基材4で形成する
と共に金属板1側を無機フィラー含有樹脂層5で形成し
て成るものであり、この構成により上記目的を達成でき
たものである。即ち、無機フィラー含有樹脂層5の無機
フィラーにより吸湿した水分が絶縁層2へ拡散しにくく
なり、耐湿性、電触後の劣化特性が良好となり、しかも
無機フィラー含有樹脂層5の熱膨張係数が金属板1に近
付くため熱膨張の差による接着破壊が緩和され耐熱性が
向上し、しかも、無機フィラー含有樹脂層5により樹脂
含浸基材4と金属板1の熱膨張の差による熱的接着破壊
を緩和して、耐熱性をより向上させることができ、更に
絶縁層2の溶融粘度が高くなって均一な厚みが得られ、
又基材6を介装させているのでボイドの発生もないもの
である。DISCLOSURE OF THE INVENTION The metal base laminated plate of the present invention is a metal base laminated plate obtained by adhering a metal foil 3 to a metal plate 1 with an insulating layer 2 interposed therebetween. It is formed of the resin-impregnated base material 4 and the metal plate 1 side is formed of the inorganic filler-containing resin layer 5, and the above-mentioned object can be achieved by this configuration. That is, moisture absorbed by the inorganic filler-containing resin layer 5 is less likely to diffuse into the insulating layer 2, moisture resistance and deterioration characteristics after contact with electricity are improved, and the thermal expansion coefficient of the inorganic filler-containing resin layer 5 is improved. Adhesion failure due to the difference in thermal expansion is mitigated by approaching the metal plate 1, heat resistance is improved, and thermal adhesion failure due to the difference in thermal expansion between the resin-impregnated base material 4 and the metal plate 1 due to the inorganic filler-containing resin layer 5. And the heat resistance can be further improved, and the melt viscosity of the insulating layer 2 can be increased to obtain a uniform thickness.
Further, since the base material 6 is interposed, no void is generated.
以下、本発明を添付の図面に基づいて説明する。金属板
1としては、銅板、アルミニウム板、鉄板、ニッケル板
又はステンレス鋼板、真ちゅう板、ケイ素鋼板、ジュラ
ルミン等の合金などいずれをも採用でき、通常、厚み0.
1〜2.0mmの範囲のものを用いる。これら金属板1には亜
鉛めっき、アルミニウムめっき、亜鉛−アルミニウムめ
っきを施しておいてもよい。又、金属板1には予めガイ
ド孔又はパイロット孔用の打ち抜き孔、その他スルーホ
ール用の貫通孔を穿孔しておいてもよい。本発明の金属
ベース積層板Aは、このベース金属板1上に無機フィラ
ー含有樹脂層5、樹脂含浸基材4及び金属箔3を配置
し、このものを一組みとして成形プレートを介して複数
組み熱盤間に配置し、例えば、150〜170℃、20〜150kg/
cm2、40〜100分で加熱加圧して積層一体化させて得られ
る。樹脂含浸基材4は紙、ガラス布、合織、アスベスト
等の有機、無機基材6にエポキシ樹脂、ポリイミド樹
脂、ポリイミドアミド樹脂のような熱硬化性樹脂あるい
は熱可塑性樹脂ワニスを含浸乾燥させて形成され、厚み
が5〜100μである。無機フィラー含有樹脂層5は厚みが
0.05〜1mmで、フェノール樹脂、エポキシ樹脂、不飽和
ポリエステル樹脂、三フッ化塩化エチレン樹脂、四フッ
化エチレン樹脂、四フッ化エチレン−六フッ化プロピレ
ン共重合体樹脂、四フッ化エチレン−パーフルオロビニ
ルエーテル共重合体樹脂などのフッ素系樹脂等の熱硬化
性樹脂とかポリイミド樹脂、ポリフェニレンポリサルフ
ァイド樹脂、ポリアミド樹脂などの樹脂に無機フィラー
を含有させて形成される。無機フィラーとしては、アル
ミナ、酸化マグネシウム、窒化ホウ素等の熱伝導性が良
好なものが好ましい。この無機フィラーの配合割合は樹
脂固形分に対して7〜60容量%、好ましくは10〜55容量
%である。7容量%未満であると効果的でなく、逆に60
容量%を超えると金属板1との密着性が低下したり、含
浸量の均一性が低下してしまう。金属箔3としては金属
板1と同じ材質を用いることができ、銅箔、アルミニウ
ム箔、真ちゅう箔、鉄箔、ステンレス鋼箔、ニッケル
箔、ケイ素鋼箔などいずれをも採用でき、厚み18〜70μ
の範囲で用いる。金属ベース積層板Aから金属ベースプ
リント配線板の製造は周知の工程が採用される。たとえ
ば、金属ベース銅張積層板に順次、孔明け、無電解めっ
き、パターン形成、パターンめっき、レジストめっき、
レジスト除去、エッチング、外形仕上げ、シンボルマー
ク印刷といった工程でスルーホールめっき金属ベースプ
リント配線板は製造される。Hereinafter, the present invention will be described with reference to the accompanying drawings. The metal plate 1 may be a copper plate, an aluminum plate, an iron plate, a nickel plate or a stainless steel plate, a brass plate, a silicon steel plate, an alloy such as duralumin, or the like, and usually has a thickness of 0.
Use one with a range of 1 to 2.0 mm. These metal plates 1 may be plated with zinc, aluminum or zinc-aluminum. Further, the metal plate 1 may be preliminarily formed with punch holes for guide holes or pilot holes, and through holes for other through holes. In the metal base laminated plate A of the present invention, the inorganic filler-containing resin layer 5, the resin-impregnated base material 4 and the metal foil 3 are arranged on the base metal plate 1, and a plurality of sets are formed by using these as one set and forming plates. Placed between hot plates, for example, 150-170 ℃, 20-150kg /
It can be obtained by heating and pressurizing at cm 2 for 40 to 100 minutes to laminate and integrate. The resin-impregnated base material 4 is obtained by impregnating an organic or inorganic base material 6 such as paper, glass cloth, synthetic woven fabric, asbestos or the like with a thermosetting resin or a thermoplastic resin varnish such as an epoxy resin, a polyimide resin or a polyimide amide resin and drying it. It is formed and has a thickness of 5 to 100 μ. The inorganic filler-containing resin layer 5 has a thickness
0.05 ~ 1mm, phenol resin, epoxy resin, unsaturated polyester resin, trifluorochloroethylene resin, tetrafluoroethylene resin, tetrafluoroethylene-hexafluoropropylene copolymer resin, tetrafluoroethylene-perfluoro A thermosetting resin such as a fluororesin such as a vinyl ether copolymer resin, a resin such as a polyimide resin, a polyphenylene polysulfide resin, or a polyamide resin is made to contain an inorganic filler. As the inorganic filler, those having good thermal conductivity such as alumina, magnesium oxide, and boron nitride are preferable. The blending ratio of this inorganic filler is 7 to 60% by volume, preferably 10 to 55% by volume, based on the resin solid content. Less than 7% by volume is not effective, conversely 60
If it exceeds the capacity%, the adhesion to the metal plate 1 will be reduced, and the uniformity of the impregnated amount will be reduced. As the metal foil 3, the same material as the metal plate 1 can be used, and any of copper foil, aluminum foil, brass foil, iron foil, stainless steel foil, nickel foil, silicon steel foil and the like can be adopted, and the thickness is 18 to 70 μm.
Used in the range of. A well-known process is adopted for manufacturing the metal-based printed wiring board from the metal-based laminated board A. For example, metal base copper clad laminates are sequentially drilled, electroless plated, patterned, patterned, resist plated,
Through-hole plated metal-based printed wiring boards are manufactured by processes such as resist removal, etching, external finishing, and symbol mark printing.
次に、本発明の実施例を説明する。Next, examples of the present invention will be described.
(実施例1〜7) 厚み1.0mmのアルミニウム板と、ガラス基材にエポキシ
樹脂を含浸させた厚み100μの樹脂含浸基材と、第1表
に示すようにエポキシ樹脂に種々の無機フィラーを種々
の割合で配合した無機フィラー含有樹脂層とからなる絶
縁層とで、金属ベース積層板を構成し、絶縁層と金属板
との吸湿後の密着性(C-10/85/85)、吸湿後の半田耐熱性
(C-10/85/85)、及びこの金属ベース積層板から金属ベー
スプリント配線板を形成し、その回路と金属板間の電解
試験絶縁性(C-500/85/85)を測定した。結果を第2表に
示す。尚、絶縁層の厚みむらも±10以下と小さく、ボイ
ドは発生しなかった。(Examples 1 to 7) An aluminum plate having a thickness of 1.0 mm, a resin-impregnated base material having a thickness of 100 μ in which a glass base material is impregnated with an epoxy resin, and various inorganic fillers are added to the epoxy resin as shown in Table 1. With an insulating layer consisting of an inorganic filler-containing resin layer blended in the ratio of, a metal base laminate is formed, and the adhesion between the insulating layer and the metal plate after moisture absorption (C-10 / 85/85), after moisture absorption Solder heat resistance
(C-10 / 85/85), and a metal base printed wiring board was formed from this metal base laminate, and the electrolytic test insulation property (C-500 / 85/85) between the circuit and the metal plate was measured. The results are shown in Table 2. The thickness unevenness of the insulating layer was as small as ± 10 or less, and no void was generated.
(比較例) 比較のため絶縁層をガラス基材にエポキシ樹脂を含浸さ
せた厚み100μの樹脂含浸基材で形成した金属ベース積
層板を形成し、実施例と同様の測定を行った。結果を第
2表に示す。尚、絶縁層の厚みむらは±20以上と大き
く、しかもボイドの発生が見られた。(Comparative Example) For comparison, a metal-based laminate having an insulating layer made of a resin-impregnated base material having a thickness of 100 μ, which was obtained by impregnating a glass base material with an epoxy resin, was formed, and the same measurement as that of the example was performed. The results are shown in Table 2. The thickness unevenness of the insulating layer was as large as ± 20 or more, and voids were observed.
本発明の実施例にあっては、金属板と絶縁層との吸湿後
の密着性も良好で、半田耐熱性及び電触試験絶縁性も良
好であることが判る。これらは絶縁層に無機フィラー含
浸樹脂層を介装したことによるものと考えられる。 In the examples of the present invention, it can be seen that the adhesion between the metal plate and the insulating layer after moisture absorption is good, and the solder heat resistance and the electric contact test insulation are also good. It is considered that these are due to the inorganic filler-impregnated resin layer interposed in the insulating layer.
[発明の効果] 本発明にあっては、絶縁層の金属箔側を樹脂含浸基材で
形成すると共に金属板側を無機フィラー含有樹脂層で形
成しているので、無機フィラー含有樹脂層中の無機フィ
ラーにより吸湿した水分が絶縁層へ拡散しにくくなり、
耐湿性、電触後の劣化特性が良好となり、又無機フィラ
ー含有樹脂層の熱膨張係数が金属板に近付くため熱膨張
の差による接着破壊が緩和され耐熱性が向上し、しか
も、無機フィラー含有樹脂層により樹脂含浸基材と金属
板の熱膨張の差による熱的接着破壊をその弾性により緩
和して、耐熱性をより向上させることができ、更に絶縁
層の樹脂含浸基材により溶融粘度が高くなって均一な厚
みが得られ、又樹脂含浸基材の基材によりボイドの発生
を抑えることができるものである。[Effect of the Invention] In the present invention, the metal foil side of the insulating layer is formed of the resin-impregnated base material and the metal plate side is formed of the inorganic filler-containing resin layer. Water absorbed by the inorganic filler becomes difficult to diffuse to the insulating layer,
Moisture resistance, deterioration characteristics after contacting with electricity become good, and because the coefficient of thermal expansion of the resin layer containing the inorganic filler approaches that of a metal plate, adhesive failure due to the difference in thermal expansion is mitigated, and heat resistance is improved. The resin layer can relieve thermal adhesive failure due to the difference in thermal expansion between the resin-impregnated base material and the metal plate by its elasticity, and further improve heat resistance. Furthermore, the resin-impregnated base material of the insulating layer can improve the melt viscosity. By increasing the thickness, a uniform thickness can be obtained, and generation of voids can be suppressed by the base material of the resin-impregnated base material.
第1図は本発明の一実施例を示す側断面図であって、A
は金属ベース積層板、1は金属板、2は絶縁層、3は金
属箔、4は樹脂含浸基材、5は無機フィラー含有樹脂層
である。FIG. 1 is a side sectional view showing an embodiment of the present invention.
Is a metal base laminated plate, 1 is a metal plate, 2 is an insulating layer, 3 is a metal foil, 4 is a resin-impregnated base material, and 5 is an inorganic filler-containing resin layer.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 田代 浩 大阪府門真市大字門真1048番地 松下電工 株式会社内 (72)発明者 馬場 大三 大阪府門真市大字門真1048番地 松下電工 株式会社内 (56)参考文献 特開 昭61−69450(JP,A) 特開 昭58−165391(JP,A) 実開 昭61−33466(JP,U) ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Hiroshi Tashiro 1048, Kadoma, Kadoma, Osaka Prefecture Matsushita Electric Works, Ltd. (72) Daizo Baba, 1048, Kadoma, Kadoma, Osaka Prefecture Matsushita Electric Works, Ltd. (56) ) Reference JP-A-61-69450 (JP, A) JP-A-58-165391 (JP, A) Actually developed JP-A-61-33466 (JP, U)
Claims (1)
なる金属ベース積層板であって、絶縁層の金属箔側を樹
脂含浸基材で形成すると共に金属板側を無機フィラー含
有樹脂層で形成して成ることを特徴とする金属ベース積
層板。1. A metal base laminate comprising a metal plate and a metal foil bonded to the metal plate via an insulating layer, wherein the metal foil side of the insulating layer is formed of a resin-impregnated base material and the metal plate side is an inorganic filler. A metal-based laminate, comprising a resin layer containing a metal.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61109875A JPH06390B2 (en) | 1986-05-14 | 1986-05-14 | Metal base laminated board |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61109875A JPH06390B2 (en) | 1986-05-14 | 1986-05-14 | Metal base laminated board |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62264942A JPS62264942A (en) | 1987-11-17 |
| JPH06390B2 true JPH06390B2 (en) | 1994-01-05 |
Family
ID=14521392
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61109875A Expired - Fee Related JPH06390B2 (en) | 1986-05-14 | 1986-05-14 | Metal base laminated board |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH06390B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0239930A (en) * | 1988-07-29 | 1990-02-08 | Shin Kobe Electric Mach Co Ltd | Metal foil-plated laminate with metal core and its manufacture |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58165391A (en) * | 1982-03-26 | 1983-09-30 | 昭和電工株式会社 | Substrate for printed circuit board |
| JPS60107332A (en) * | 1983-11-15 | 1985-06-12 | 松下電工株式会社 | Metallic-base metal lined laminated plate |
| JPS6133466U (en) * | 1984-07-30 | 1986-02-28 | 三菱電線工業株式会社 | Electroplated insulated metal substrate |
| JPS6169450A (en) * | 1984-09-14 | 1986-04-10 | 住友ベークライト株式会社 | Laminated board for metallic-base printed circuit |
-
1986
- 1986-05-14 JP JP61109875A patent/JPH06390B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62264942A (en) | 1987-11-17 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |