JPH0675663B2 - Solvent Recycle Circulation Method in Solvent Vapor Cleaning Equipment - Google Patents
Solvent Recycle Circulation Method in Solvent Vapor Cleaning EquipmentInfo
- Publication number
- JPH0675663B2 JPH0675663B2 JP63288865A JP28886588A JPH0675663B2 JP H0675663 B2 JPH0675663 B2 JP H0675663B2 JP 63288865 A JP63288865 A JP 63288865A JP 28886588 A JP28886588 A JP 28886588A JP H0675663 B2 JPH0675663 B2 JP H0675663B2
- Authority
- JP
- Japan
- Prior art keywords
- solvent
- cleaning
- tank
- cleaning tank
- vapor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000002904 solvent Substances 0.000 title claims description 101
- 238000004140 cleaning Methods 0.000 title claims description 69
- 238000000034 method Methods 0.000 title claims description 6
- 230000008929 regeneration Effects 0.000 claims description 28
- 238000011069 regeneration method Methods 0.000 claims description 28
- 238000004821 distillation Methods 0.000 claims description 16
- 238000004064 recycling Methods 0.000 claims description 4
- 238000001704 evaporation Methods 0.000 claims 1
- 230000008020 evaporation Effects 0.000 claims 1
- 238000013020 steam cleaning Methods 0.000 description 15
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- 239000007788 liquid Substances 0.000 description 5
- 238000001816 cooling Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 238000007654 immersion Methods 0.000 description 3
- 230000002411 adverse Effects 0.000 description 2
- 239000000356 contaminant Substances 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 238000010533 azeotropic distillation Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
Landscapes
- Treating Waste Gases (AREA)
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は有機溶剤等を用いて蒸気洗浄を行う洗浄装置の
溶剤再生循環方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Industrial field of application] The present invention relates to a method for solvent recycling and circulation in a cleaning apparatus for performing steam cleaning using an organic solvent or the like.
従来の溶剤再生循環方法について第２図を用いて説明す
る。A conventional solvent regeneration / circulation method will be described with reference to FIG.
１は蒸気洗浄の前に溶剤液に浸漬して洗浄する液洗浄を
行うようになっている溶剤蒸気洗浄装置（以下洗浄装置
と略）で、２は第１洗浄槽、３は第２洗浄槽、４は蒸気
洗浄槽である。洗浄装置１は冷却コイル５、集液樋６及
び水分離器７からなる溶剤蒸気分離回収部を備えてい
る。８は洗浄装置１に併設した溶剤蒸溜再生装置（以下
再生装置と略）で、９は槽底部にヒータを備え槽上部に
冷却コイル，集液樋及び空気抜き穴を備えた密閉の溶剤
蒸溜再生槽（以下再生槽の略）、10は水分離器である。1 is a solvent vapor cleaning device (hereinafter abbreviated as cleaning device) adapted to perform liquid cleaning by dipping in a solvent liquid before vapor cleaning, 2 is a first cleaning tank, 3 is a second cleaning tank 4 is a steam cleaning tank. The cleaning device 1 is equipped with a solvent vapor separation / collection unit including a cooling coil 5, a liquid collecting trough 6, and a water separator 7. 8 is a solvent distillation regenerator (hereinafter referred to as a regenerator) attached to the cleaning device 1, and 9 is a closed solvent distillation regenerator with a heater at the bottom of the tank and a cooling coil, a collecting trough and an air vent hole at the top of the tank. (Hereinafter, it is an abbreviation of a regeneration tank.) 10 is a water separator.
そして、再生装置８で再生された清浄溶剤13は洗浄装置
１の溶剤蒸気分離回収部で回収された清浄溶剤14ととも
に第２洗浄槽３に供給され、第２洗浄槽３→第１洗浄槽
２→蒸気洗浄槽４→再生層９と順にオーバーフローし、
段々に汚れを増しながら再生槽９に返戻されている。Then, the clean solvent 13 regenerated by the regenerator 8 is supplied to the second cleaning tank 3 together with the clean solvent 14 recovered by the solvent vapor separation and recovery section of the cleaning apparatus 1, and the second cleaning tank 3 → first cleaning tank 2 → Steam cleaning tank 4 → Regeneration layer 9 overflows in order,
It is returned to the regeneration tank 9 while gradually becoming dirty.
このように蒸気洗浄槽４には第１洗浄槽２からの既に汚
れた溶剤が供給されるばかりか蒸気洗浄槽４で被洗浄物
から落とされた汚れも滴下するので、蒸気洗浄槽４の溶
剤は極めて汚れている。この汚れ成分濃度の高い溶剤を
加熱して沸騰させると溶剤とともに汚れ成分も多量に蒸
発するのでこれで被洗浄物の最終洗浄である蒸気洗浄を
行うと洗浄された被洗浄物に蒸発した汚れ成分が再び付
着しシミとなることがあった。Thus, not only the already dirty solvent from the first cleaning tank 2 is supplied to the steam cleaning tank 4 but also the dirt dropped from the object to be cleaned in the steam cleaning tank 4 is dropped, so that the solvent in the steam cleaning tank 4 is removed. Is extremely dirty. When this solvent with a high concentration of dirt components is heated and boiled, a large amount of dirt components evaporate together with the solvent. Therefore, when steam cleaning, which is the final cleaning of the object to be cleaned, is carried out, the dirt components evaporated on the cleaned object are cleaned. May adhere again and cause stains.
本発明は上述の従来の問題点を解決しようとするもの
で、被洗浄物をより高度に清浄化することができる溶剤
再生循環方法を提供することを目的とするものである。The present invention is intended to solve the above-mentioned conventional problems, and an object of the present invention is to provide a solvent regeneration circulation method capable of cleaning an object to be cleaned to a higher degree.
本発明は、溶剤蒸溜再生槽９と、溶剤洗浄槽2,3と、溶
剤蒸気洗浄槽４とを備えた溶剤蒸気洗浄装置において、 前記溶剤蒸溜再生槽９で再生された溶剤を前記溶剤蒸気
洗浄槽４に導入し、前記溶剤蒸気洗浄槽４で蒸発洗浄さ
れる被洗浄物から滴下する汚染溶剤を捕集し、該被洗浄
物から滴下する汚染溶剤を前記溶剤蒸溜再生槽９に返戻
するとともに、前記各洗浄槽2,3,4から蒸発する溶剤蒸
気を液化し、これを前記溶剤洗浄槽２、３に導入し、該
溶剤洗浄槽2,3の汚染溶剤を前記溶剤蒸溜再生槽９に返
戻するようにしたことを特徴とする溶剤蒸気洗浄装置に
おける溶剤再生循環方法である。The present invention relates to a solvent vapor cleaning apparatus equipped with a solvent distillation regeneration tank 9, solvent cleaning tanks 2 and 3, and a solvent vapor cleaning tank 4, in which the solvent regenerated in the solvent distillation regeneration tank 9 is subjected to the solvent vapor cleaning. The contaminated solvent that is introduced into the tank 4 and that is evaporated and cleaned in the solvent vapor cleaning tank 4 is collected, and the contaminated solvent that is dripped from the cleaned object is returned to the solvent distillation regeneration tank 9. , Liquefy the solvent vapor evaporated from each of the cleaning tanks 2, 3 and 4 and introduce it into the solvent cleaning tanks 2 and 3 to transfer the contaminated solvent in the solvent cleaning tanks 2 and 3 to the solvent distillation regeneration tank 9. It is a method for recycling and recycling a solvent in a solvent vapor cleaning apparatus, which is characterized in that it is returned.
本発明は、溶剤蒸溜再生槽で蒸発させた溶剤蒸気を凝縮
液化して溶剤蒸気洗浄槽に導入し、溶剤洗浄槽の汚染溶
剤を前記溶剤蒸溜再生槽に返戻するようにすると共に、
前記溶剤蒸気洗浄槽の上方で被洗浄物の汚れを溶かし込
んで液化し滴下する汚染溶剤を捕集し、これを前記溶剤
蒸溜再生槽に返戻する。すなわち、溶剤蒸気洗浄槽４で
被洗浄物から滴下する汚染溶剤と溶剤洗浄槽2,3の汚染
溶剤とを、換言すれば、汚染された溶剤のみを選択的に
再生槽９に導き、再生槽９で再生された清浄な溶剤を蒸
気洗浄槽４に導き、各槽2,3,4から蒸発した蒸気を液化
して得られる比較的汚れの少ない溶剤を溶剤洗浄槽2,3
に導く。このため、溶剤蒸気洗浄槽４に汚染溶剤が流入
すること無く、溶剤蒸気洗浄槽４の溶剤が清浄に保た
れ、蒸気洗浄の際に汚れ成分の共沸による悪影響が生じ
ることがない。The present invention, the solvent vapor evaporated in the solvent distillation regeneration tank is condensed and introduced into the solvent vapor cleaning tank, and the contaminated solvent of the solvent cleaning tank is returned to the solvent distillation regeneration tank,
Above the solvent vapor cleaning tank, the contaminants to be cleaned are melted, liquefied and the contaminated solvent dropped is collected and returned to the solvent distillation regeneration tank. That is, the contaminated solvent dropped from the object to be cleaned in the solvent vapor cleaning tank 4 and the contaminated solvent in the solvent cleaning tanks 2 and 3, in other words, only the contaminated solvent is selectively guided to the regeneration tank 9, and the regeneration tank The clean solvent regenerated in 9 is introduced to the steam cleaning tank 4, and the solvent with relatively little dirt obtained by liquefying the vapor evaporated from each tank 2, 3, 4 is used as the solvent cleaning tank 2, 3.
Lead to. For this reason, the contaminated solvent does not flow into the solvent vapor cleaning tank 4, the solvent in the solvent vapor cleaning tank 4 is kept clean, and the adverse effect due to azeotropy of the dirt component does not occur during the vapor cleaning.
本発明の実施例を第１図を用いて説明する。 An embodiment of the present invention will be described with reference to FIG.
第１図において符号１〜10は上述の第２図に示したもの
と同じであり、蒸気洗浄槽４の被洗浄物11の懸吊空間と
液面との間に被洗浄物11から滴下する汚染溶剤を捕集す
る受皿12を設け受皿12の排出管を再生槽９のオーバーフ
ロー管に接続して汚染溶剤を再生槽９に返戻することが
できる構造としてある点が装置構造的に異なっている。In FIG. 1, reference numerals 1 to 10 are the same as those shown in FIG. 2 described above, and are dropped from the object to be cleaned 11 between the suspension space of the object to be cleaned 11 in the steam cleaning tank 4 and the liquid surface. The structure of the apparatus is different in that a tray 12 for collecting the contaminated solvent is provided and the discharge pipe of the tray 12 is connected to the overflow pipe of the regeneration tank 9 to return the contaminated solvent to the regeneration tank 9. .
しかして、再生槽９で蒸発させた溶剤蒸気を凝縮液化
し、水分離器10で水を分離された清浄溶剤13は蒸気洗浄
槽４に導入され、洗浄装置１で分離回収された清浄溶剤
14は第２洗浄槽３に導入される。第２洗浄槽３で被洗浄
物11の第２浸漬洗浄に供され汚れた溶剤は第１洗浄槽２
にオーバーフローし、第１洗浄槽２で第１浸漬洗浄に供
される。第１洗浄槽２の汚染溶剤15はオーバーフローし
て再生槽９に返戻される。蒸気洗浄槽４で蒸発した溶剤
は受皿12上方に懸吊された第1,2浸漬洗浄を終了した被
洗浄物11の表面で凝縮し、残っている汚れを溶かし込ん
で滴下し、受皿12で捕集される。この汚染溶剤16も再生
槽９に返戻される。凝縮しなかった溶剤蒸気は冷却コイ
ル５で冷却されて液化し、水分離器７で水を分離され、
清浄溶剤14となって上述のように第２洗浄槽３に導入さ
れる。Then, the clean solvent 13 which has condensed and liquefied the solvent vapor evaporated in the regeneration tank 9 and separated water in the water separator 10 is introduced into the steam cleaning tank 4 and separated and recovered in the cleaning device 1.
14 is introduced into the second cleaning tank 3. The contaminated solvent used for the second immersion cleaning of the object 11 to be cleaned in the second cleaning tank 3 is the first cleaning tank 2
Overflows and is subjected to the first immersion cleaning in the first cleaning tank 2. The contaminated solvent 15 in the first cleaning tank 2 overflows and is returned to the regeneration tank 9. The solvent evaporated in the steam cleaning tank 4 condenses on the surface of the object 11 to be cleaned which has been suspended above the saucer 12 and which has undergone the first and second immersion cleaning, dissolves the remaining dirt and drops it, and in the saucer 12. To be collected. This contaminated solvent 16 is also returned to the regeneration tank 9. The solvent vapor that has not condensed is cooled by the cooling coil 5 and liquefied, and water is separated by the water separator 7,
The cleaning solvent 14 is introduced into the second cleaning tank 3 as described above.
従って、蒸気洗浄槽４では清浄溶剤13のみが加熱され沸
騰するので、即ち蒸気洗浄槽４の溶剤蒸気は再生槽９で
一度蒸発して液化して清浄溶剤13をさらにもう一度蒸発
せしめた蒸気なので、汚れ成分の共沸はほとんどなく、
蒸気洗浄後の被洗浄物11に蒸発した汚れ成分による再汚
染が生じることがない。Therefore, since only the cleaning solvent 13 is heated and boiled in the steam cleaning tank 4, that is, the solvent steam in the steam cleaning tank 4 is the vapor which is once evaporated and liquefied in the regeneration tank 9 to further evaporate the cleaning solvent 13 again. There is almost no azeotrope of dirt components,
Re-contamination due to the vaporized dirt component does not occur on the object 11 to be cleaned after steam cleaning.
本発明は、溶剤蒸溜再生槽で蒸発させた溶剤蒸気を凝縮
液化して溶剤蒸気洗浄槽に導入し、溶剤洗浄槽の汚染溶
剤を前記溶剤蒸溜再生槽に返戻するようにすると共に、
前記溶剤蒸気洗浄槽の上方で被洗浄物の汚れを溶かし込
んで液化し滴下する汚染溶剤を捕集し、これを前記溶剤
蒸溜再生槽に返戻し、かつ、溶剤洗浄槽および蒸気洗浄
槽から蒸発する溶剤を液化して溶剤洗浄槽に導くように
したので、溶剤蒸気洗浄槽中の溶剤は清浄状態に保たれ
る。従って溶剤蒸気洗浄槽からの汚れ成分の共沸による
悪影響が生じることがない。The present invention, the solvent vapor evaporated in the solvent distillation regeneration tank is condensed and introduced into the solvent vapor cleaning tank, and the contaminated solvent of the solvent cleaning tank is returned to the solvent distillation regeneration tank,
Above the solvent vapor cleaning tank, the contaminants to be cleaned are melted and liquefied, and the dripping contaminated solvent is collected, returned to the solvent distillation regeneration tank, and evaporated from the solvent cleaning tank and the vapor cleaning tank. The solvent in the solvent vapor cleaning tank is kept clean because it is liquefied and introduced into the solvent cleaning tank. Therefore, adverse effects due to azeotropic distillation of the dirt component from the solvent vapor cleaning tank do not occur.
第１図は本発明の実施例のフロー図、第２図は従来例の
フロー図である。 １……洗浄装置、２……第１洗浄槽、３……第２洗浄
槽、４……蒸気洗浄槽、５……冷却コイル、６……集液
樋、７……水分離器、８……再生装置、９……再生槽、
10……水分離器、11……被洗浄物、12……受皿、13,14
……清浄溶剤、15,16……汚染溶剤。FIG. 1 is a flow chart of an embodiment of the present invention, and FIG. 2 is a flow chart of a conventional example. 1 ... Cleaning device, 2 ... First cleaning tank, 3 ... Second cleaning tank, 4 ... Steam cleaning tank, 5 ... Cooling coil, 6 ... Liquid collecting gutter, 7 ... Water separator, 8 …… Regeneration device, 9 …… Regeneration tank,
10 …… Water separator, 11 …… Cleaning object, 12 …… Saucepan, 13,14
... cleaning solvent, 15,16 ... contaminating solvent.
Claims (1)
溶剤蒸気洗浄槽４とを備えた溶剤蒸気洗浄装置におい
て、 前記溶剤蒸溜再生槽９で再生された溶剤を前記溶剤蒸気
洗浄槽４に導入し、前記溶剤蒸気洗浄槽４で蒸発洗浄さ
れる被洗浄物から滴下する汚染溶剤を捕集し、該被洗浄
物から滴下する汚染溶剤を前記溶剤蒸溜再生槽９に返戻
するとともに、前記各洗浄槽2,3,4から蒸発する溶剤蒸
気を液化し、これを前記溶剤洗浄槽２、３に導入し、該
溶剤洗浄槽2,3の汚染溶剤を前記溶剤蒸溜再生槽９に返
戻するようにしたことを特徴とする溶剤蒸気洗浄装置に
おける溶剤再生循環方法。1. A solvent distillation regeneration tank 9 and solvent cleaning tanks 2, 3;
In a solvent vapor cleaning apparatus equipped with a solvent vapor cleaning tank 4, a solvent regenerated in the solvent distillation regeneration tank 9 is introduced into the solvent vapor cleaning tank 4 and is cleaned by evaporation in the solvent vapor cleaning tank 4. The contaminated solvent dropped from the object is collected, the contaminated solvent dropped from the object to be cleaned is returned to the solvent distillation regeneration tank 9, and the solvent vapor evaporated from each of the cleaning tanks 2, 3 and 4 is liquefied, This method is introduced into the solvent cleaning tanks 2 and 3, and the contaminated solvent in the solvent cleaning tanks 2 and 3 is returned to the solvent distillation recycling tank 9. .
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63288865A JPH0675663B2 (en) | 1988-11-17 | 1988-11-17 | Solvent Recycle Circulation Method in Solvent Vapor Cleaning Equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63288865A JPH0675663B2 (en) | 1988-11-17 | 1988-11-17 | Solvent Recycle Circulation Method in Solvent Vapor Cleaning Equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH02135124A JPH02135124A (en) | 1990-05-24 |
| JPH0675663B2 true JPH0675663B2 (en) | 1994-09-28 |
Family
ID=17735753
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63288865A Expired - Lifetime JPH0675663B2 (en) | 1988-11-17 | 1988-11-17 | Solvent Recycle Circulation Method in Solvent Vapor Cleaning Equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0675663B2 (en) |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6214901A (en) * | 1985-07-15 | 1987-01-23 | Sony Corp | Flon steam cleaner |
-
1988
- 1988-11-17 JP JP63288865A patent/JPH0675663B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH02135124A (en) | 1990-05-24 |
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