JPH0713215Y2 - 半導体のレジストアッシング装置 - Google Patents

半導体のレジストアッシング装置

Info

Publication number
JPH0713215Y2
JPH0713215Y2 JP1988004781U JP478188U JPH0713215Y2 JP H0713215 Y2 JPH0713215 Y2 JP H0713215Y2 JP 1988004781 U JP1988004781 U JP 1988004781U JP 478188 U JP478188 U JP 478188U JP H0713215 Y2 JPH0713215 Y2 JP H0713215Y2
Authority
JP
Japan
Prior art keywords
ashing
plasma
wafer
frequency power
chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP1988004781U
Other languages
English (en)
Japanese (ja)
Other versions
JPH01110432U (de
Inventor
彰 福泉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP1988004781U priority Critical patent/JPH0713215Y2/ja
Publication of JPH01110432U publication Critical patent/JPH01110432U/ja
Application granted granted Critical
Publication of JPH0713215Y2 publication Critical patent/JPH0713215Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
JP1988004781U 1988-01-19 1988-01-19 半導体のレジストアッシング装置 Expired - Lifetime JPH0713215Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1988004781U JPH0713215Y2 (ja) 1988-01-19 1988-01-19 半導体のレジストアッシング装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1988004781U JPH0713215Y2 (ja) 1988-01-19 1988-01-19 半導体のレジストアッシング装置

Publications (2)

Publication Number Publication Date
JPH01110432U JPH01110432U (de) 1989-07-26
JPH0713215Y2 true JPH0713215Y2 (ja) 1995-03-29

Family

ID=31207597

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1988004781U Expired - Lifetime JPH0713215Y2 (ja) 1988-01-19 1988-01-19 半導体のレジストアッシング装置

Country Status (1)

Country Link
JP (1) JPH0713215Y2 (de)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3910084B2 (ja) * 2002-03-15 2007-04-25 松下電器産業株式会社 プラズマ処理装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3624384A1 (de) * 1985-07-19 1987-01-29 Fusion Systems Corp Vorrichtung zum entfernen einer photoresistschicht von einem substrat
JPS6221225A (ja) * 1985-07-22 1987-01-29 Fujitsu Ltd レジストのアツシング方法
JPS62245634A (ja) * 1986-04-17 1987-10-26 Fujitsu Ltd ポジ型レジスト膜の除去方法とその装置

Also Published As

Publication number Publication date
JPH01110432U (de) 1989-07-26

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