JPH0772798B2 - 基板上のパターン形成方法 - Google Patents

基板上のパターン形成方法

Info

Publication number
JPH0772798B2
JPH0772798B2 JP63034872A JP3487288A JPH0772798B2 JP H0772798 B2 JPH0772798 B2 JP H0772798B2 JP 63034872 A JP63034872 A JP 63034872A JP 3487288 A JP3487288 A JP 3487288A JP H0772798 B2 JPH0772798 B2 JP H0772798B2
Authority
JP
Japan
Prior art keywords
substrate
molecular weight
film
average molecular
irradiation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP63034872A
Other languages
English (en)
Japanese (ja)
Other versions
JPH01211255A (ja
Inventor
正隆 村原
猛 下村
徹 高橋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Terumo Corp
Original Assignee
Terumo Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Terumo Corp filed Critical Terumo Corp
Priority to JP63034872A priority Critical patent/JPH0772798B2/ja
Priority to PCT/JP1989/000152 priority patent/WO1989007787A1/fr
Priority to AU30635/89A priority patent/AU3063589A/en
Publication of JPH01211255A publication Critical patent/JPH01211255A/ja
Publication of JPH0772798B2 publication Critical patent/JPH0772798B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing Optical Record Carriers (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP63034872A 1988-02-17 1988-02-17 基板上のパターン形成方法 Expired - Fee Related JPH0772798B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP63034872A JPH0772798B2 (ja) 1988-02-17 1988-02-17 基板上のパターン形成方法
PCT/JP1989/000152 WO1989007787A1 (fr) 1988-02-17 1989-02-15 Procede de preparation d'un substrat comportant des motifs
AU30635/89A AU3063589A (en) 1988-02-17 1989-02-15 Method of preparing substrate having pattern formed thereon

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63034872A JPH0772798B2 (ja) 1988-02-17 1988-02-17 基板上のパターン形成方法

Publications (2)

Publication Number Publication Date
JPH01211255A JPH01211255A (ja) 1989-08-24
JPH0772798B2 true JPH0772798B2 (ja) 1995-08-02

Family

ID=12426243

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63034872A Expired - Fee Related JPH0772798B2 (ja) 1988-02-17 1988-02-17 基板上のパターン形成方法

Country Status (3)

Country Link
JP (1) JPH0772798B2 (fr)
AU (1) AU3063589A (fr)
WO (1) WO1989007787A1 (fr)

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5734550A (en) * 1980-08-11 1982-02-24 Fujitsu Ltd Formation of pattern
JPS58189627A (ja) * 1982-04-30 1983-11-05 Japan Synthetic Rubber Co Ltd 感光材料
JPS5992532A (ja) * 1982-11-18 1984-05-28 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション ポジテイブ型レジストの製造方法
JPS61209442A (ja) * 1985-03-13 1986-09-17 Matsushita Electronics Corp パタ−ン形成方法
US4601969A (en) * 1985-03-28 1986-07-22 International Business Machines Corporation High contrast, high resolution deep ultraviolet lithographic resist composition with diazo carbonyl compound having alpha phosphoryl substitution

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
半導体・集積回路技術第３２回シンポジウム講演論文集（１９８７年６月）第４９頁〜第５５頁

Also Published As

Publication number Publication date
WO1989007787A1 (fr) 1989-08-24
AU3063589A (en) 1989-09-06
JPH01211255A (ja) 1989-08-24

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees