JPH10107011A5 - - Google Patents

Info

Publication number
JPH10107011A5
JPH10107011A5 JP1996275392A JP27539296A JPH10107011A5 JP H10107011 A5 JPH10107011 A5 JP H10107011A5 JP 1996275392 A JP1996275392 A JP 1996275392A JP 27539296 A JP27539296 A JP 27539296A JP H10107011 A5 JPH10107011 A5 JP H10107011A5
Authority
JP
Japan
Prior art keywords
plasma processing
mode
processing apparatus
microwaves
waveguide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1996275392A
Other languages
English (en)
Japanese (ja)
Other versions
JPH10107011A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP8275392A priority Critical patent/JPH10107011A/ja
Priority claimed from JP8275392A external-priority patent/JPH10107011A/ja
Priority to US08/936,820 priority patent/US5874706A/en
Priority to KR1019970048683A priority patent/KR100405932B1/ko
Priority to TW086113974A priority patent/TW362238B/zh
Publication of JPH10107011A publication Critical patent/JPH10107011A/ja
Publication of JPH10107011A5 publication Critical patent/JPH10107011A5/ja
Pending legal-status Critical Current

Links

JP8275392A 1996-09-26 1996-09-26 プラズマ処理装置 Pending JPH10107011A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP8275392A JPH10107011A (ja) 1996-09-26 1996-09-26 プラズマ処理装置
US08/936,820 US5874706A (en) 1996-09-26 1997-09-24 Microwave plasma processing apparatus using a hybrid microwave having two different modes of oscillation or branched microwaves forming a concentric electric field
KR1019970048683A KR100405932B1 (ko) 1996-09-26 1997-09-25 마이크로파플라즈마처리장치
TW086113974A TW362238B (en) 1996-09-26 1997-09-25 Microwave plasma processing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8275392A JPH10107011A (ja) 1996-09-26 1996-09-26 プラズマ処理装置

Publications (2)

Publication Number Publication Date
JPH10107011A JPH10107011A (ja) 1998-04-24
JPH10107011A5 true JPH10107011A5 (2) 2004-09-30

Family

ID=17554865

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8275392A Pending JPH10107011A (ja) 1996-09-26 1996-09-26 プラズマ処理装置

Country Status (1)

Country Link
JP (1) JPH10107011A (2)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4523118B2 (ja) * 2000-06-14 2010-08-11 東京エレクトロン株式会社 プラズマ処理装置
CN1293789C (zh) * 2001-01-18 2007-01-03 东京毅力科创株式会社 等离子体装置及等离子体生成方法
JP3625197B2 (ja) 2001-01-18 2005-03-02 東京エレクトロン株式会社 プラズマ装置およびプラズマ生成方法
JP2010050046A (ja) 2008-08-25 2010-03-04 Hitachi High-Technologies Corp プラズマ処理装置

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