JPH10199804A5 - - Google Patents

Info

Publication number
JPH10199804A5
JPH10199804A5 JP1997330863A JP33086397A JPH10199804A5 JP H10199804 A5 JPH10199804 A5 JP H10199804A5 JP 1997330863 A JP1997330863 A JP 1997330863A JP 33086397 A JP33086397 A JP 33086397A JP H10199804 A5 JPH10199804 A5 JP H10199804A5
Authority
JP
Japan
Prior art keywords
substrate
substrate stage
projection
optical system
measurement axis
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1997330863A
Other languages
English (en)
Japanese (ja)
Other versions
JPH10199804A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP9330863A priority Critical patent/JPH10199804A/ja
Priority claimed from JP9330863A external-priority patent/JPH10199804A/ja
Publication of JPH10199804A publication Critical patent/JPH10199804A/ja
Publication of JPH10199804A5 publication Critical patent/JPH10199804A5/ja
Pending legal-status Critical Current

Links

JP9330863A 1996-11-14 1997-11-14 投影露光装置及び投影露光方法並びにデバイス製造方法 Pending JPH10199804A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9330863A JPH10199804A (ja) 1996-11-14 1997-11-14 投影露光装置及び投影露光方法並びにデバイス製造方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP8-318657 1996-11-14
JP31865796 1996-11-14
JP9330863A JPH10199804A (ja) 1996-11-14 1997-11-14 投影露光装置及び投影露光方法並びにデバイス製造方法

Publications (2)

Publication Number Publication Date
JPH10199804A JPH10199804A (ja) 1998-07-31
JPH10199804A5 true JPH10199804A5 (2) 2005-11-04

Family

ID=26569458

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9330863A Pending JPH10199804A (ja) 1996-11-14 1997-11-14 投影露光装置及び投影露光方法並びにデバイス製造方法

Country Status (1)

Country Link
JP (1) JPH10199804A (2)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4731886B2 (ja) * 2004-11-12 2011-07-27 株式会社ブイ・テクノロジー 液晶表示装置用基板の製造方法
TWI649790B (zh) * 2004-11-18 2019-02-01 Nikon Corporation 位置測量方法、位置控制方法、測量方法、裝載方法、曝光方法及曝光裝置、及元件製造方法

Similar Documents

Publication Publication Date Title
JPH10214783A5 (2)
JP3203719B2 (ja) 露光装置、その露光装置により製造されるデバイス、露光方法、およびその露光方法を用いたデバイス製造方法
JPH10163099A5 (2)
JPH11162832A5 (2)
KR100467858B1 (ko) 정렬,노광방법및노광장치
JP3880155B2 (ja) 位置決め方法及び位置決め装置
JP2646412B2 (ja) 露光装置
JPH10223528A (ja) 投影露光装置及び位置合わせ方法
TWI288227B (en) Lithographic apparatus, method of calibration, device manufacturing method, and device manufactured thereby
JPH1050604A (ja) 位置管理方法及び位置合わせ方法
JPH09223650A (ja) 露光装置
US20100261106A1 (en) Measurement apparatus, exposure apparatus, and device fabrication method
JP2002512384A (ja) マスク表面上のパターン構造の位置測定方法
JPH10199804A5 (2)
JPH0581046B2 (2)
TWI282912B (en) Method of preparing a substrate, method of measuring, semiconductor device manufacturing method, lithographic apparatus, computer-readable medium and substrate
JPH08236419A (ja) 位置決め方法
TWI301562B (en) Reticle focus measurement system and method using multiple interferometric beams
EP0474445B1 (en) Autofocusing device and projection exposure apparatus with the same
KR100263323B1 (ko) 반도체 노광장비의 정렬 정밀도 측정방법
JP2004104130A (ja) 多重干渉ビームを使用するレチクル焦点測定システムおよびレチクル焦点測定方法
JP3204253B2 (ja) 露光装置及びその露光装置により製造されたデバイス、並びに露光方法及びその露光方法を用いてデバイスを製造する方法
JP2001203148A (ja) 露光における間隙測定装置および間隙測定方法
JPH09306802A5 (2)
JPH09260252A5 (2)