JPH1051005A - 半導体装置およびその作製方法 - Google Patents

半導体装置およびその作製方法

Info

Publication number
JPH1051005A
JPH1051005A JP21931496A JP21931496A JPH1051005A JP H1051005 A JPH1051005 A JP H1051005A JP 21931496 A JP21931496 A JP 21931496A JP 21931496 A JP21931496 A JP 21931496A JP H1051005 A JPH1051005 A JP H1051005A
Authority
JP
Japan
Prior art keywords
film
active layer
oxide film
thermal oxide
insulating film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP21931496A
Other languages
English (en)
Japanese (ja)
Other versions
JPH1051005A5 (th
Inventor
Kouyuu Chiyou
宏勇 張
Kenji Fukunaga
健司 福永
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Semiconductor Energy Laboratory Co Ltd
Original Assignee
Semiconductor Energy Laboratory Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Semiconductor Energy Laboratory Co Ltd filed Critical Semiconductor Energy Laboratory Co Ltd
Priority to JP21931496A priority Critical patent/JPH1051005A/ja
Publication of JPH1051005A publication Critical patent/JPH1051005A/ja
Publication of JPH1051005A5 publication Critical patent/JPH1051005A5/ja
Withdrawn legal-status Critical Current

Links

Landscapes

  • Thin Film Transistor (AREA)
JP21931496A 1996-08-01 1996-08-01 半導体装置およびその作製方法 Withdrawn JPH1051005A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21931496A JPH1051005A (ja) 1996-08-01 1996-08-01 半導体装置およびその作製方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21931496A JPH1051005A (ja) 1996-08-01 1996-08-01 半導体装置およびその作製方法

Publications (2)

Publication Number Publication Date
JPH1051005A true JPH1051005A (ja) 1998-02-20
JPH1051005A5 JPH1051005A5 (th) 2004-08-12

Family

ID=16733551

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21931496A Withdrawn JPH1051005A (ja) 1996-08-01 1996-08-01 半導体装置およびその作製方法

Country Status (1)

Country Link
JP (1) JPH1051005A (th)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5998838A (en) * 1997-03-03 1999-12-07 Nec Corporation Thin film transistor
US6946330B2 (en) 2001-10-11 2005-09-20 Semiconductor Energy Laboratory Co., Ltd. Designing method and manufacturing method for semiconductor display device
US7371623B2 (en) 1998-07-16 2008-05-13 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device with semiconductor circuit comprising semiconductor units, and method for fabricating it

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5998838A (en) * 1997-03-03 1999-12-07 Nec Corporation Thin film transistor
US6258638B1 (en) 1997-03-03 2001-07-10 Nec Corporation Method of manufacturing thin film transistor
US6444508B1 (en) 1997-03-03 2002-09-03 Nec Corporation Method of manufacturing thin film transistor
US6703267B2 (en) 1997-03-03 2004-03-09 Nec Corporation Method of manufacturing thin film transistor
US7371623B2 (en) 1998-07-16 2008-05-13 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device with semiconductor circuit comprising semiconductor units, and method for fabricating it
US6946330B2 (en) 2001-10-11 2005-09-20 Semiconductor Energy Laboratory Co., Ltd. Designing method and manufacturing method for semiconductor display device
US7498206B2 (en) 2001-10-11 2009-03-03 Semiconductor Energy Laboratory Co., Ltd. Order receiving process for manufacturing a semiconductor display device

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