JPH1062942A - Photosensitive material processing equipment - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a photosensitive material processing apparatus capable of preventing the occurrence of processing unevenness by preventing the temperature of a photosensitive material in a space developing section and a processing solution applied thereto from lowering. The purpose is to: SOLUTION: When a hot air guide plate 160 is at an open position, one end of a buffer section 26 is opened and a buffer section 2 is opened.
In 6, two openings including a ventilation hole 162 are formed. In this state, the fan 105 and the heater 1
A part of the warm air generated by 06 circulates along a circulation path returning from the drying unit 34 to the drying unit 34 through the stabilizing unit 33, the developing unit 32, and the buffer unit 26, as indicated by an arrow B2.
For this reason, a pair of squeeze rollers 4
The space developing sections reaching to 4 and 45 are also heated by the warm air circulating in the circulation path.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a photosensitive material processing apparatus for processing a photosensitive material with a processing solution.

[0002]

2. Description of the Related Art Photosensitive materials such as films, photographic papers, printing plates and the like are processed with a processing solution such as a developing solution, a fixing solution, a stabilizing solution, and washing water after an image is recorded. As a photosensitive material processing apparatus for performing such processing, a photosensitive material is transported into a processing tank storing a processing liquid by a transporting unit including a plurality of transport roller pairs or the like, and the photosensitive material is immersed in the processing liquid. An immersion-type processing apparatus that performs processing by such a method is known.

In such an immersion type processing apparatus,
Since the processing solution deteriorates due to processing fatigue accompanying the processing of the photosensitive material or temporal fatigue due to carbon dioxide or oxygen in the atmosphere, the deterioration of the processing solution is recovered by replenishing the processing solution with a replenisher. Therefore, the components of the processing liquid at the start of the processing are different from the components of the processing liquid when the processing is continued thereafter, and it is impossible to perform strictly uniform processing. In addition, such an immersion type processing apparatus has a problem that the amount of waste liquid of the processing liquid is large and the maintainability of the apparatus is poor.

As a photosensitive material processing apparatus for solving such problems, instead of immersing the photosensitive material in the processing solution, an amount of the processing solution required for processing the photosensitive material is applied to the photosensitive surface of the photosensitive material. There is also used a coating type processing apparatus for performing the processing. For example, in Japanese Patent Publication No. 6-7257, as a processing apparatus of such a coating method, a wire bar formed by spirally winding a wire around a shaft around a photosensitive surface of a photosensitive material after supplying a processing liquid is used. There is disclosed a processing apparatus in which an amount of a processing liquid applied to a photosensitive material is measured by bringing the photosensitive material into contact with the photosensitive material so that only a necessary amount of the processing liquid is applied to the photosensitive material.

In such a coating type processing apparatus, while the photosensitive material coated with the processing solution is transported in an area called a space developing section, the photosensitive surface of the photosensitive material is developed. . The area referred to as the space developing section is an area where the photosensitive material coated with the processing liquid is conveyed without contacting the photosensitive surface with anything.

In the above-described processing apparatus, the processing solution is usually heated to a predetermined temperature. However, since the amount of the processing solution applied to the photosensitive material is small, the processing solution is applied when the photosensitive material is applied. , The temperature of the processing liquid decreases. For this reason, in the processing apparatus described in Japanese Patent Publication No. 6-7257, a heater is provided inside the photosensitive material before the processing liquid is applied, and the photosensitive material rotates in synchronization with the photosensitive material. Heating is performed in advance by a heating roller.

[0007]

In the case of using the above-mentioned coating type processing apparatus in winter or in a cold region, the processing of the photosensitive material is performed in a state where the processing apparatus is installed in a low-temperature atmosphere. In some cases, since the space developing unit is also at a low temperature, even when the photosensitive material is heated in advance by the heating roller, the photosensitive material and the photosensitive material are applied to the photosensitive material while being transported through the space developing unit. A phenomenon occurs in which the temperature of the treated liquid drops. When the temperature of the photosensitive material and the temperature of the processing solution applied thereto decrease after the processing solution is applied to the photosensitive material and before the processing is completed, there is a problem that uneven processing occurs in the photosensitive material.

Further, when a lithographic printing plate utilizing a silver complex salt diffusion transfer method (DTR method), in which development proceeds rapidly, is used as a photosensitive material, not only the above problem becomes particularly remarkable, but also lithographic printing. There is a problem that printing performance, particularly printing durability, which is a problem unique to the plate, is reduced.

SUMMARY OF THE INVENTION The present invention has been made to solve the above problems, and prevents the occurrence of processing unevenness by preventing the temperature of a photosensitive material in a space developing section and a processing solution applied thereto from lowering. It is an object of the present invention to provide a photosensitive material processing apparatus that can perform the processing.

[0010]

According to the present invention, there is provided a processing liquid application section for applying a processing liquid to a photosensitive material conveyed by a conveying means, and the photosensitive material coated with the processing liquid is conveyed by conveying the photosensitive material. A space developing section for developing processing, a drying section having a heater and a fan and drying the photosensitive material with hot air, and a drying section by forming a circulation path of hot air from the drying section to the space developing section. Hot air guide means for switching between a position for guiding the hot air generated in the above to the space developing unit and a position for restricting the entry of the warm air to the space developing unit by blocking the circulation path. It is characterized by having.

[0011]

Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is a schematic diagram of a lithographic printing plate making apparatus provided with a photosensitive material processing apparatus according to the present invention.

This plate-making apparatus uses a lithographic printing plate M using a silver complex salt diffusion transfer method (DTR method) as a photosensitive material.
The lithographic printing plate M is subjected to image exposure and development processing. The exposure apparatus 2 performs exposure to the lithographic printing plate M, and performs the development processing to the exposed lithographic printing plate M. And a development processing device 3.

A lithographic printing plate using a silver complex salt diffusion transfer method (DTR method), particularly a lithographic printing plate having a physical development nucleus layer on a silver halide emulsion layer, is disclosed, for example, in US Pat. No. 3,728. No. 4,114,769, No.4,160,670, No.4,336,321, No.4,501,811, No.4,510,228, No.4,621,041 The exposed silver halide is subjected to chemical development by DTR development to become black silver to form a hydrophilic non-image area, while the unexposed silver halide crystal is The silver salt complexing agent in the developer forms a silver complex and diffuses to the physical development nucleus layer on the surface. Form.

First, the configuration of the exposure apparatus 2 will be described. The exposure device 2 exposes the image of the original to the lithographic printing plate M by projecting the reflected light from the original mounted on the original holder 12 onto the surface of the lithographic printing plate M by the projection optical system 13. is there.

The document holder 12 has a light-transmitting plate 14 on which a document is placed, and an upper lid 15 that can be opened and closed with respect to the light-transmitting plate 14. 1, it is configured to be reciprocally movable in the left-right direction between a position indicated by a solid line and a position indicated by a two-dot chain line. Further, the projection optical system 13 is fixed below the reciprocating movement path of the original holder 12, and a rod-shaped light source 17 for irradiating illumination light to the surface of the original horizontally moved while being held by the original holder 12; The apparatus includes a plurality of folding mirrors 18 for guiding light reflected from a document by the light source 17 and a projection lens 19 for projecting the reflected light guided by the plurality of folding mirrors 18 onto a lithographic printing plate M.

When exposing an image of a document on the planographic printing plate M by the exposure device 2, the document holder 12 is arranged at a position shown by a solid line in FIG. The original is mounted on the original holder 12 by closing the upper cover 15 after placing the original. Then, with the light source 17 turned on, the document holder 12 is moved to the left in FIG. In synchronization with this, the leading end of the lithographic printing plate M wound in a roll by the plurality of transport rollers 22 and the guide member 23 is moved to the original holder 1.
2 is conveyed at the same speed as the moving speed. As a result, the document held in the document holder 12 is sequentially irradiated with light from the light source 17. Then, the reflected light from the original is irradiated onto the surface of the lithographic printing plate M moving at the same speed as the original holder 12 via the plurality of folding mirrors 18 and the projection lens 19, and the image of the original is printed on the lithographic printing plate M. Exposed.

The lithographic printing plate M to which the image has been exposed is sequentially conveyed from the exposing device 2 to the subsequent developing device 3 for processing. Further, a cutting device 25 having a cutter 24 that moves in a direction perpendicular to the transport direction of the lithographic printing plate M is disposed on the exit side of the exposure device 2. Cut at the rear end of the exposed part.

Since the transport speed of the lithographic printing plate M in the exposure device 2 is lower than the transport speed of the lithographic printing plate M in the developing device 3, the lithographic printing plate M is simply transferred to the exposure device 2 and the developing device 3. Cannot be conveyed. When the lithographic printing plate M is cut by the cutting device 25, it is necessary to stop the transport of the lithographic printing plate M. For this reason, a buffer unit 26 for the lithographic printing plate M is provided at the boundary between the developing device 3 and the exposure device 2. 26, a pair of rollers 27, 2
By stopping the rotation of the lithographic printing plate M
Is stored in the buffer unit 26 for a fixed length, and then is conveyed to the developing device 3.

At one end of the buffer section 26 of the developing device 3, a hot air guide plate movable about a shaft 161 between a position shown by a solid line and a position shown by a two-dot chain line in FIG. 160 are provided. The configuration of the hot air guide plate 160 will be described later in detail.

Next, the structure of the developing apparatus 3 according to the present invention will be described. FIG. 2 is an enlarged schematic view showing the developing device 3 in FIG. 1, and FIG. 3 is an outline diagram showing a piping system thereof.

The developing unit 3 includes a developing unit 32 for applying a developing solution (activator) to the exposed lithographic printing plate M and performing a developing process, and a stabilizing solution (stabilizer) for the lithographic printing plate M after the developing process. Stabilizer 33 for applying and stabilizing
And a drying unit 34 for drying the lithographic printing plate M after the stabilization process.

The developing section 32 includes a roller 2 of the buffer section 26.
Lithographic printing plate M conveyed to developing section 32 by 7, 28
A pair of introduction rollers 41 and 42 for nipping and transporting the developer, and a developer application for measuring and applying a fixed amount of the developer to the photosensitive surface of the lithographic printing plate M transported by the pair of introduction rollers 41 and 42 A mechanism 43 and a pair of squeezing rollers 4 for removing the developer supplied to the developing process from the lithographic printing plate M;
4, 45, and a plurality of guide members 46, 47, 48, 49, 50 for guiding the lithographic printing plate M.

The lower roller 41 of the pair of introduction rollers 41, 42 is a heating roller having a built-in heater for heating the lithographic printing plate M passing therethrough.
The upper roller 42 is a pressing roller that presses the planographic printing plate M against the heating roller 41. The lithographic printing plate M is heated in advance prior to the development process because a small amount of a temperature-controlled developer is applied to the lithographic printing plate M and the lithographic printing plate M is heated by the heat capacity of the lithographic printing plate M when developing. This is to prevent the temperature of the developer contacting the plate M from decreasing.

As shown in FIG. 3, the developing solution application mechanism 43 is connected to a developing solution tank 52 for storing a developing solution via a pump 53. A collection tray 54 is provided below the developer application mechanism 43. The developing solution in a developing solution tank 52 is pumped by a pump 53 to a developing solution application mechanism 43.
And supplied onto the lithographic printing plate M. Then, the developer not applied to the lithographic printing plate M, such as the developing solution flowing out from both ends and the rear end of the lithographic printing plate M, is collected on a collecting tray 5.
4. Drop on top. Further, since this developer can be reused, the collection tube 5 provided at the lower end of the collection tray 54 is provided.
5, the liquid is dropped into the liquid receiving portion 56 of the developer tank 52 and collected in the developer tank 52. The developer tank 52 has a built-in panel heater 57 and is configured to maintain the developer circulating in the developer circulation path from the developer tank 52 to the developer application mechanism 43 at a predetermined temperature. ing.

A collection tray 58 is provided below the pair of squeezing rollers 44 and 45. The fatigue developing solution removed from the lithographic printing plate M by the pair of squeezing rollers 44, 45 passes through the collecting hole 63 of the liquid receiving member 62 provided below the pair of squeezing rollers 44, 45, and the collection tray 5
8 is dropped. Further, since this developer cannot be reused, it is discharged to the drainage tank 64 via the collection pipe 59 provided at the lower end of the collection tray 58.

As shown in FIG. 4, the developing solution application mechanism 43 has a developing solution supply pipe 122 having a plurality of discharge holes 121 formed thereunder, and a plurality of developing solution supply pipes 122 for flowing the developing solution to a lower end thereof. Developer receiving portion 124 having opening 123
A coating roller 125 having a plurality of grooves on its surface and rotating in contact with the lithographic printing plate M; and a diffusion for guiding the developer flowing down from the opening 123 of the developer receiving portion 124 to the coating roller 125. The film 126 and the developer receiving section 12
4 has a backflow prevention film 127 for preventing backflow of the developer flowing down from the opening 123, and a backup roller 128 abutting on the application roller 125. In addition,
Arrows in FIG. 4 indicate the transport direction of the lithographic printing plate M.

The developing solution supply pipe 122 is connected to the developing solution tank 52 via a pump 53, and the developing solution is discharged from the plurality of discharge holes 121 by driving the pump 53. After the developer is once received by the developer receiving section 124, the diffusion film 12
Flow down to 6. Opening 12 of developer receiving section 124
The developer flowing down from 3 is temporarily stored in the contact portion between the application roller 125 and the diffusion film 126 and is diffused in a direction orthogonal to the transport direction of the lithographic printing plate M. Then, with the rotation of the application roller 125, the developer passes through the opening formed by the groove of the application roller 125 and passes through the application roller 125.
Move in the direction of the contact portion between
A reservoir is formed there.

When the lithographic printing plate M passes through the liquid reservoir, a developing solution is applied to the photosensitive surface of the lithographic printing plate M. At this time, since the photosensitive surface of the lithographic printing plate M is pressed against the surface of the application roller 125 by the backup roller 128, the developer applied to the photosensitive surface of the lithographic printing plate M is opened by the groove of the application roller 125. It is weighed to a certain amount by the part. Therefore, the backup roller 128
Printing plate M that has passed the contact portion between
A constant amount of developer required for development is always applied to the photosensitive surface.

The stabilizing section 33 is provided with a stabilizing liquid applying mechanism 73 for measuring and applying a constant amount of a stabilizing liquid to the photosensitive surface of the lithographic printing plate M conveyed from the developing section 32 and a stabilizing process. The lithographic printing plate M includes a pair of squeezing rollers 74 and 75 for removing the stabilizing liquid from the lithographic printing plate M, and a plurality of guide members 76, 77 and 78 for guiding the lithographic printing plate M.

As shown in FIG. 3, the stabilizing solution application mechanism 73 is connected to a stabilizing solution tank 82 for storing a stabilizing solution via a pump 83. A collection tray 84 is provided below the stable liquid application mechanism 73. The stable liquid in the stable liquid tank 82 is supplied to the stable liquid applying mechanism 73 by the pump 83.
And supplied onto the lithographic printing plate M. Then, the stabilizing liquid not applied to the lithographic printing plate M, such as the stabilizing liquid flowing out from both ends and the rear end of the lithographic printing plate M, is dropped on the collection tray 84 because it can be reused. Further, the stable liquid drops into the liquid receiving section 86 of the stable liquid tank 82 via the recovery pipe 85 provided at the lower end of the recovery tray 84, and is collected in the stable liquid tank 82.

A collection tray 88 is provided below the pair of squeezing rollers 74 and 75. The stable liquid removed from the lithographic printing plate M by the pair of squeezing rollers 74 and 75 is dropped onto the collection tray 88 via the collection holes 93 of the liquid receiving member 92 provided below the pair of squeezing rollers 74 and 75. I do. Further, since this stable liquid cannot be reused, it is discharged to the drainage tank 64 via a collecting pipe 89 provided at the lower end of the collecting tray 88.

As shown in FIG. 5, the stabilizing liquid application mechanism 73 includes a stabilizing liquid supply pipe 132 having a plurality of discharge holes 131 formed below the stabilizing liquid supply pipe 132, and a plurality of stabilizing liquid supply pipes 132 for flowing down the stabilizing liquid at the lower end thereof. A stable liquid receiving portion 134 having an opening 133 formed therein.
A coating roller 135 whose surface is formed of a single-cell sponge and rotates in contact with the lithographic printing plate M; and an opening 133 of the stable liquid receiving portion 134 whose surface is formed in an uneven shape.
Film 136 for guiding the stable liquid flowing down from the coating roller 135 to the coating roller 135 and the lithographic printing plate M with the coating roller 1
And a leaf spring 138 that urges the plate spring 335. In addition,
Arrows in FIG. 4 indicate the transport direction of the lithographic printing plate M.

The stable liquid supply pipe 132 is connected to the above-mentioned stable liquid tank 82 via a pump 83, and the stable liquid is discharged from the plurality of discharge holes 131 by driving the pump 83. After the stable liquid is once received by the stable liquid receiving section 134, the diffusion film 13 passes through the plurality of openings 133.
Flow down to 6. Opening 13 of stable liquid receiving portion 134
The stable liquid flowing down from 3 is temporarily stored in a contact portion between the application roller 135 and the diffusion film 136, and is diffused in a direction orthogonal to the transport direction of the lithographic printing plate M. Then, with the rotation of the application roller 135, the stable liquid passes through the opening formed by the unevenness on the surface of the diffusion film 136, moves toward the contact portion between the application roller 135 and the leaf spring 138, and stores the liquid therein. Form.

When the lithographic printing plate M passes through the liquid reservoir, a stabilizing solution is applied to the photosensitive surface of the lithographic printing plate M. At this time, since the photosensitive surface of the lithographic printing plate M is pressed against the surface of the application roller 135 by the leaf spring 138, the stable liquid applied to the photosensitive surface of the lithographic printing plate M is a single bubble on the surface of the application roller 135. It is metered to a constant volume by a number of holes with a sponge. Therefore, a constant amount of the stabilizing liquid required for stabilization is always applied to the photosensitive surface of the lithographic printing plate M that has passed through the contact portion between the leaf spring 138 and the application roller 135.

The leaf spring 138 has an overflow hole 137 for storing a stable liquid more than necessary at a contact portion between the leaf spring 138 and the application roller 135 to prevent the liquid reservoir from becoming excessively large. Is provided.

The drying unit 34 includes a rubber roller 102 that supports and transports the lithographic printing plate M transported from the stabilizing unit 33,
A mirror roller 103 for preventing uneven drying of the lithographic printing plate M by contacting the rubber roller 102 with a predetermined pressure;
Cleaning liquid reservoir 104 for supplying the cleaning liquid via
A drying mechanism 107 having a fan 105 and a heater 106 for blowing hot air onto the lithographic printing plate M to dry it, and a plurality of transport rollers 108 for transporting the lithographic printing plate M;
09 and 110. The cleaning liquid storage unit 104 is provided as shown in FIG.
As shown in FIG.
The cleaning liquid supply pipe 105 for supplying the cleaning liquid to the cleaning liquid 4 and 45 is connected to the cleaning liquid supply pipe 105 via a pump 106.

The development processing of the lithographic printing plate M by the development processing device 3 is performed as follows.

That is, the lithographic printing plate M, on which an image has been recorded by the exposure device 2 at the preceding stage, is transferred to the pair of introduction rollers 41, 4
The developing solution is applied by the developer application mechanism 43 to apply an amount of the developing solution necessary for developing the lithographic printing plate M.
The lithographic printing plate M to which only the developing solution necessary for the developing process is applied is supplied from the developing solution applying mechanism 43 to the pair of squeezing rollers 4.
The developing process is completed on the photosensitive surface while being transported through the space developing section reaching to 4, 45. And the lithographic printing plate M
The developing solution adhered to the developing process and removed by the pair of squeezing rollers 44 and 45 is removed. Subsequently, the lithographic printing plate M is applied with a stabilizing solution application mechanism 73 with an amount of stabilizing solution necessary for stabilizing the lithographic printing plate M. The lithographic printing plate M to which only the necessary amount of the stabilizing liquid for the stabilizing process is applied is stabilized while being conveyed to the pair of squeezing rollers 74 and 75, and the stabilizing process attached to the lithographic printing plate M is performed. Is removed by the pair of squeezing rollers 74 and 75. Then, the lithographic printing plate M for which the stabilization process has been completed.
After the unevenness of drying is prevented by being pressed by the mirror surface roller 103, the drying is performed by the drying mechanism 107 and discharged onto the discharge tray 29 shown in FIG.

In the developing apparatus 3, since only the developing solution required for the developing process is applied to the lithographic printing plate M and the developing process is performed, the amount of the developing solution required for the process can be reduced. It becomes possible. Further, since a substantially unused processing liquid is supplied to the lithographic printing plate M, the lithographic printing plate M can always be uniformly processed.

In the developing device 3 described above, the lithographic printing plate M to which only the developing solution required for the developing process is applied.
From the developer application mechanism 43 to the pair of squeezing rollers 44, 4
When the temperature of the lithographic printing plate M and the developing solution applied to the lithographic printing plate M is lowered while the lithographic printing plate M is transported through the space developing section 5, uneven processing occurs in the lithographic printing plate M or lithographic printing after the processing. The phenomenon that the printing performance of the plate M is reduced occurs.
For this reason, in the developing device 3, when the processing device is installed in a low-temperature atmosphere, the hot air guide plate 160 described above is used to guide the hot air generated in the drying unit 34 to the space developing unit. It is arranged.

As described above, the hot air guide plate 160 is movable between a closed position indicated by a solid line and an open position indicated by a two-dot chain line in FIG. 1 around the shaft 161 connected to a handle (not shown). Is configured.

FIG. 6 is a partially enlarged schematic view of the developing device 3 showing a state in which the hot air guide plate 160 is in the closed position, and FIG. 7 is a development diagram showing a state in which the hot air guide plate 160 is in the open position. FIG. 3 is a partially enlarged schematic view of a processing device 3.

When the hot air guide plate 160 is in the closed position, one end of the buffer section 26 is closed by the hot air guide plate 160 as shown in FIG.
Except for the vent hole 162 provided at the other end, the circulation path is shut off. In this state, fan 1
The hot air generated by the heater 05 and the heater 106 circulates in the drying unit 34 as shown by arrows A1 and A2 in FIG.

On the other hand, when the hot air guide plate 160 is at the open position, the hot air guide plate 160 moves to open one end of the buffer 26 as shown in FIG.
Are formed with two openings including the vent hole 162. In this state, the fan 105 and the heater 1
As shown by an arrow B1 in FIG. 7, a part of the warm air generated by the air circulation 06 circulates in the drying unit 34, but a part of the warm air flows from the drying unit 34 to the stable unit 33 as shown by an arrow B2.
The circulation path returns to the drying section 34 through the developing section 32 and the buffer section 26. For this reason, the space developing section from the developer application mechanism 43 to the pair of squeezing rollers 44 and 45 is also heated by the warm air circulating in the circulation path.

Therefore, when the developing apparatus 3 of such a coating system is used in winter or in a cold region, the lithographic printing plate M is kept in a low-temperature atmosphere. When the developing process is performed, the operator operates a handle (not shown) to operate the hot air guide plate 16.
0 is moved to the open position shown in FIG. Thereby, the warm air generated by the fan 105 and the heater 106 of the drying unit 34 circulates in the circulation path including the space developing unit from the developer application mechanism 43 to the pair of squeezing rollers 44 and 45. For this reason, the lithographic printing plate M heated by the heating roller 41 and coated with only the necessary amount of the developing solution by the developing solution coating mechanism 43 is heated by the hot air so that the temperature does not decrease. It is transported inside. Therefore, it is possible to prevent the occurrence of processing unevenness due to a decrease in the temperature of the lithographic printing plate M, and the like.

On the other hand, when the development processing apparatus 3 is installed in a non-low temperature atmosphere to perform development processing of the lithographic printing plate M, the operator operates a handle (not shown) to move the hot air guide plate 160 as shown in FIG. Move to the indicated closed position. As a result, the circulation path from the drying section 34 to the drying section 34 through the stabilizing section 33, the developing section 32, and the buffer section 26 is closed at the end of the buffer section 26.
The entry of warm air from the developer application mechanism 43 to the space developing section from the pair of squeezing rollers 44 and 45 is restricted. For this reason, it is possible to prevent the lithographic printing plate M from being excessively heated in the space developing section.

Next, another embodiment of the present invention will be described.
A description will be given based on FIGS. 8 and 9. FIG. 8 is a partially enlarged schematic view of the developing device 3 in a state where the hot air guide plate 160 is in the closed position, and FIG. 9 is a schematic diagram of the developing device 3 in a state where the hot air guide plate 160 is in the open position. FIG.

In the above-described embodiment, the configuration is such that the hot air guide plate 160 moves between the position where one end of the buffer 26 is closed and the position where it is opened. , Hot air guide plate 160 is drying mechanism 1
It is configured to move between a position where the passage of hot air from 07 through the stabilizing portion 33 to the developing portion 32 is blocked and opened.

When the hot air guide plate 160 is in the closed position, as shown in FIG.
The passage of the warm air to the developing unit 32 through the path is blocked.
In this state, the fan 105 and the heater 106
8 circulates in the drying unit 34 as shown by arrows A1 and A2 in FIG.

On the other hand, when the hot air guide plate 160 is at the open position, as shown in FIG. 9, the hot air passage from the drying mechanism 107 to the developing section 32 via the stabilizing section 33 is opened.
In this state, the fan 105 and the heater 106
As shown by an arrow B1 in FIG. 9, a part of the hot air generated by the
As shown by, a part circulates through a circulation path returning from the drying unit 34 to the drying unit 34 through the stabilizing unit 33, the developing unit 32, and the buffer unit 26. For this reason, the space developing section from the developer application mechanism 43 to the pair of squeezing rollers 44 and 45 is also heated by the warm air circulating in the circulation path.

It should be noted that the hot air guide plate 160 is
7, the hot air guide plate 1 is in a closed position where the passage of the hot air from the stabilizing section 33 to the developing section 32 is shut off.
A gap through which warm air can pass is formed in the leading end portion of the plate 60, the transport path of the lithographic printing plate M, and the like. Most of the warm air blown out from the drying mechanism 107 is, as shown by an arrow A2 in FIG. Circulates in the drying section 34. The term “blocking” described in this specification is a concept including not only a case where the circulation path of the hot air is completely closed, but also a case where many parts of the passage of the hot air are closed as described above.

In the above-described embodiment, the warm air guide plate 160 is moved by the operator operating a handle (not shown), but the warm air guide plate 160 is moved by driving a motor or the like. Is also good. Further, a temperature sensor for detecting the outside air temperature or the temperature of the space developing section is attached to the developing device 3 and the hot air guide plate 160 is automatically moved to the open position or the closed position based on the measured value of the temperature sensor. It may be.

Further, in the above-described embodiment, the case where the lithographic printing plate M using the silver complex salt diffusion transfer method (DTR method) is used as the photosensitive material has been described. The present invention can also be applied to a photosensitive material processing apparatus using a material.

[0054]

According to the photosensitive material processing apparatus of the present invention, a position for guiding the warm air generated in the drying section to the space developing section by forming a circulation path of the warm air from the drying section to the space developing section. And a hot air guide means capable of switching between a position for restricting the entry of warm air into the space developing section by blocking the circulation path, so that hot air can be circulated to the space developing section as necessary. It is possible to prevent the temperature of the photosensitive material conveyed through the space developing section and the processing liquid applied thereto from decreasing, thereby preventing the photosensitive material from being processed unevenly. Become.

At this time, it is not necessary to provide a special heater or the like for heating the space developing section, so that the apparatus can be simplified.

[Brief description of the drawings]

FIG. 1 is a schematic diagram of a lithographic printing plate making apparatus.

FIG. 2 is a schematic diagram of a developing device 3;

FIG. 3 is a schematic diagram showing a piping system of the developing device 3;

FIG. 4 is a schematic view showing a developer application mechanism 43.

FIG. 5 is a schematic view showing a stable liquid application mechanism 73.

FIG. 6 is a schematic diagram showing a state in which the hot air guide plate 160 is in a closed position.

FIG. 7 is a schematic diagram showing a state where the hot air guide plate 160 is at an open position.

FIG. 8 is a schematic diagram showing a state in which the hot air guide plate 160 is at a closed position.

FIG. 9 is a schematic diagram showing a state where the hot air guide plate 160 is at an open position.

[Explanation of symbols]

 2 Exposure device 3 Developing device 32 Developing unit 33 Stabilizing unit 34 Drying unit 41 Heating roller 42 Pressing roller 43 Developing solution applying mechanism 122 Developing solution supply pipe 125 Applying roller 128 Backup roller 160 Hot air guide plate 161 Shaft 162 Vent hole

 ──────────────────────────────────────────────────続 き Continuing on the front page (72) Inventor Yasuhiro Kawaguchi 480-1, Takamiyacho, Hikone City, Shiga Prefecture Dainippon Screen Mfg. Co., Ltd. Hikone District Office (72) Inventor Fumito Fukuhara 480, Takamiyacho, Hikone City, Shiga Prefecture 1 Dainippon Screen Mfg. Co., Ltd. in Hikone district office

Claims (1)

[Claims] A processing liquid application unit for applying a processing liquid to a photosensitive material conveyed by a conveyance unit; a space developing unit for developing the photosensitive material by conveying the photosensitive material coated with the processing liquid; A drying unit having a heater and a fan for drying the photosensitive material with hot air; and forming a circulation path of the hot air from the drying unit to the space developing unit to generate hot air generated in the drying unit in the space. A hot air guide means capable of switching between a position for guiding to the developing unit and a position for restricting the entry of warm air into the space developing unit by blocking the circulation path. Material processing equipment.