JPH1097046A - Processing liquid supply device for photosensitive material processing equipment - Google Patents

Abstract

(57) Abstract: An object of the present invention is to provide a processing liquid supply apparatus for a photosensitive material processing apparatus capable of uniformly supplying a fixed amount of processing liquid while circulating the processing liquid. SOLUTION: One end of a developing solution supply pipe 122 provided with a developing solution discharge hole 121 is connected to a pump 53 for pumping the developing solution from a developing solution tank 52 through a developing solution supply path 161. The other end of the developer supply pipe 122 is connected to the developer tank 52 via a developer recovery path 162. The developing solution recovery passage 162 is provided with a resistance portion 163 for applying a pressure loss to the developing solution passing therethrough. The resistance portion 163 is a portion where the pressure loss is the largest in the circulation path of the developer from the pump 53 to the developer tank 52 via the developer supply path 161, the developer supply pipe 122, and the developer recovery path 162. ing.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a photosensitive material processing apparatus for processing a photosensitive material with a processing liquid, and more particularly to a processing liquid supply apparatus for supplying a processing liquid to the photosensitive material.

[0002]

2. Description of the Related Art Photosensitive materials such as films, photographic papers, printing plates and the like are processed with a processing solution such as a developing solution, a fixing solution, a stabilizing solution, and washing water after an image is recorded. As a photosensitive material processing apparatus for performing such processing, a photosensitive material is transported into a processing tank storing a processing liquid by a transporting unit including a plurality of transport roller pairs or the like, and the photosensitive material is immersed in the processing liquid. An immersion-type processing apparatus that performs processing by such a method is known.

In such an immersion type processing apparatus,
Since the processing solution deteriorates due to processing fatigue accompanying the processing of the photosensitive material or temporal fatigue due to carbon dioxide or oxygen in the atmosphere, the deterioration of the processing solution is recovered by replenishing the processing solution with a replenisher. Therefore, the components of the processing liquid at the start of the processing are different from the components of the processing liquid when the processing is continued thereafter, and it is impossible to perform strictly uniform processing. In addition, such an immersion type processing apparatus has a problem that the amount of waste liquid of the processing liquid is large and the maintainability of the apparatus is poor.

As a photosensitive material processing apparatus for solving such problems, instead of immersing the photosensitive material in the processing solution, an amount of the processing solution required for processing the photosensitive material is applied to the photosensitive surface of the photosensitive material. There is also used a coating type processing apparatus for performing the processing. For example, in Japanese Patent Application Laid-Open No. Sho 62-237455, such a coating type processing apparatus has a processing liquid supply nozzle having a plurality of processing liquid discharge holes, and the surface thereof is formed by forming a groove on the surface. The processing liquid is discharged onto a roughened roller (hereinafter, referred to as a "roughening roller"), and the roughening roller is brought into contact with the photosensitive material and rotated, so that the roughening roller is rotated through the roughening roller. A processing apparatus for applying a processing liquid to a photosensitive material is disclosed.

In this processing apparatus, a pipe having one end closed and a plurality of discharge holes for processing liquid is used as a processing liquid supply nozzle, and the processing liquid is supplied from a processing liquid tank to a processing liquid supply nozzle by a pump. The pressure-fed processing liquid is discharged from a plurality of processing liquid discharge holes.

[0006]

In the above-described conventional processing apparatus, the processing liquid is sent from the processing liquid tank to the processing liquid supply nozzle under pressure and supplied to the photosensitive material. Therefore, the processing liquid is stored in the processing liquid tank. The processing solution is not circulated. When the processing liquid is not circulated, it is difficult to always keep the components of the processing liquid uniform, and it is also difficult to uniformly control the temperature of the entire processing liquid.

In particular, in the above-described coating type photosensitive material processing apparatus, since only the processing liquid in an amount necessary for processing the photosensitive material is applied, the processing liquid not applied to the photosensitive material is removed. It is collected and stored again in the processing liquid tank. In such a configuration, the components of the processing liquid tend to be non-uniform unless the processing liquid is constantly circulated.

For this reason, in the above-mentioned conventional processing apparatus, instead of closing one end of the processing liquid supply nozzle, a processing liquid recovery path connecting this one end to the processing liquid tank is provided.
It is also conceivable to adopt a configuration in which the processing liquid that has been supplied from the processing liquid tank to the processing liquid supply nozzle and has not been discharged from the processing liquid discharge hole is again collected in the processing liquid tank via this recovery path.

However, in such a configuration, a large amount of the processing liquid is discharged from the processing liquid discharge holes on the upstream side of the processing liquid supply nozzle, while almost no processing liquid is discharged from the discharge holes on the downstream side. No phenomenon occurs. For this reason, there is a problem that the supply amount of the processing liquid in the width direction of the photosensitive material (the direction orthogonal to the transport direction) is not uniform.

In particular, for the purpose of equalizing the components and temperature of the processing solution and for the purpose of using the rotation speed of the pump for circulation within an appropriate range, it is necessary to circulate the processing solution at a rate of several liters per minute. In some cases, it is difficult to uniformly remove a small amount of processing liquid of several milliliters per minute from the processing liquid circulating in such a large amount in the width direction of the photosensitive material.

In such a configuration, the amount of the processing liquid discharged from each processing liquid discharge hole changes due to a change in pressure loss in the recovery path of the processing liquid. There is also a problem that the supply amount of is unstable.

SUMMARY OF THE INVENTION The present invention has been made to solve the above problems, and provides a processing liquid supply apparatus for a photosensitive material processing apparatus capable of uniformly supplying a constant amount of processing liquid while circulating the processing liquid. The purpose is to do.

[0013]

According to a first aspect of the present invention, there is provided a processing liquid supply apparatus for a photosensitive material processing apparatus for supplying a processing liquid to a photosensitive material by discharging the processing liquid from a plurality of processing liquid discharge holes. A processing liquid supply pipe having a plurality of processing liquid discharge holes, a processing liquid supply path connecting a processing liquid tank storing the processing liquid and one end of the processing liquid supply pipe,
A processing liquid recovery path connecting the other end of the processing liquid supply pipe and the processing liquid tank, and a processing liquid disposed in the supply path and directing the processing liquid in the processing liquid tank toward the processing liquid supply pipe. A pump for pumping and the circulation path disposed downstream of the processing liquid discharge hole in a processing liquid circulation path from the pump to the processing liquid tank via the supply path, the processing liquid supply pipe, and the recovery path. And a resistance portion having the largest pressure loss therein.

According to a second aspect of the present invention, in the first aspect of the present invention, a hole is formed in an outer peripheral portion of the inner pipe connected to the supply path, and the plurality of processing pipes are formed in the outer peripheral portion. The processing liquid supply pipe is constituted by a double pipe having a liquid discharge hole and an outer pipe connected to the recovery path.

[0015]

Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is a schematic diagram of a lithographic printing plate making apparatus provided with a photosensitive material processing apparatus to which the present invention is applied.

This plate making apparatus uses a lithographic printing plate M using a silver complex salt diffusion transfer method (DTR method) as a photosensitive material.
The lithographic printing plate M is subjected to image exposure and development processing. The exposure apparatus 2 performs exposure to the lithographic printing plate M, and performs the development processing to the exposed lithographic printing plate M. And a development processing device 3.

A lithographic printing plate using a silver complex salt diffusion transfer method (DTR method), particularly a lithographic printing plate having a physical development nucleus layer on a silver halide emulsion layer is disclosed in, for example, US Pat. No. 3,728. No. 4,114,769, No.4,160,670, No.4,336,321, No.4,501,811, No.4,510,228, No.4,621,041 The exposed silver halide is subjected to chemical development by DTR development to become black silver to form a hydrophilic non-image area, while the unexposed silver halide crystal is The silver salt complexing agent in the developer forms a silver complex and diffuses to the physical development nucleus layer on the surface. Form.

First, the configuration of the exposure apparatus 2 will be described. The exposure device 2 exposes the image of the original to the lithographic printing plate M by projecting the reflected light from the original mounted on the original holder 12 onto the surface of the lithographic printing plate M by the projection optical system 13. is there.

The original holder 12 has a light-transmitting plate 14 on which an original is placed, and an upper lid 15 that can be opened and closed with respect to the light-transmitting plate 14. 1, it is configured to be reciprocally movable in the left-right direction between a position indicated by a solid line and a position indicated by a two-dot chain line. Further, the projection optical system 13 is fixed below the reciprocating movement path of the original holder 12, and a rod-shaped light source 17 for irradiating illumination light to the surface of the original horizontally moved while being held by the original holder 12; The apparatus includes a plurality of folding mirrors 18 for guiding light reflected from a document by the light source 17 and a projection lens 19 for projecting the reflected light guided by the plurality of folding mirrors 18 onto a lithographic printing plate M.

When exposing an image of a document on the planographic printing plate M by the exposure device 2, the document holder 12 is arranged at a position shown by a solid line in FIG. The original is mounted on the original holder 12 by closing the upper cover 15 after placing the original. Then, with the light source 17 turned on, the document holder 12 is moved to the left in FIG. In synchronization with this, the leading end of the lithographic printing plate M wound in a roll by the plurality of transport rollers 22 and the guide member 23 is moved to the original holder 1.
2 is conveyed at the same speed as the moving speed. As a result, the document held in the document holder 12 is sequentially irradiated with light from the light source 17. Then, the reflected light from the original is irradiated onto the surface of the lithographic printing plate M moving at the same speed as the original holder 12 via the plurality of folding mirrors 18 and the projection lens 19, and the image of the original is printed on the lithographic printing plate M. Exposed.

The lithographic printing plate M on which the image has been exposed is sequentially transported from the exposure device 2 to the subsequent developing device 3 for processing. Further, a cutting device 25 having a cutter 24 that moves in a direction perpendicular to the transport direction of the lithographic printing plate M is disposed on the exit side of the exposure device 2. Cut at the rear end of the exposed part.

Since the transport speed of the lithographic printing plate M in the exposure device 2 is lower than the transport speed of the lithographic printing plate M in the developing device 3, the lithographic printing plate M is simply transferred to the exposure device 2 and the developing device 3. Cannot be conveyed. When the lithographic printing plate M is cut by the cutting device 25, it is necessary to stop the transport of the lithographic printing plate M. For this reason, a lithographic printing plate M buffer unit 26 is provided between the exposure device 2 and the development processing device 3, and when the lithographic printing plate M that has been exposed in the exposure device 2 is transported, the buffer unit 26 By stopping the rotation of the pair of rollers 27 and 28 disposed for a certain period of time, the lithographic printing plate M is stored in the buffer unit 26 for a certain length, and then conveyed to the developing device 3. ing.

Next, the configuration of the developing apparatus 3 according to the present invention will be described. FIG. 2 is an enlarged schematic view showing the developing device 3 in FIG. 1, and FIG. 3 is an outline diagram showing a piping system thereof.

The developing unit 3 applies a developing solution (activator) to the exposed lithographic printing plate M and performs a developing process, and a developing solution (stabilizer) to the lithographic printing plate M after the developing process. Stabilizer 33 for applying and stabilizing
And a drying unit 34 for drying the lithographic printing plate M after the stabilization process.

The developing section 32 includes a roller 2 of the buffer section 26.
Lithographic printing plate M conveyed to developing section 32 by 7, 28
A pair of introduction rollers 41 and 42 for nipping and transporting the developer, and a developer application for measuring and applying a fixed amount of the developer to the photosensitive surface of the lithographic printing plate M transported by the pair of introduction rollers 41 and 42 A mechanism 43 and a pair of squeezing rollers 4 for removing the developer supplied to the developing process from the lithographic printing plate M;
4, 45, and a plurality of guide members 46, 47, 48, 49, 50 for guiding the lithographic printing plate M.

The lower roller 41 of the pair of introduction rollers 41, 42 is a heat roller having a built-in heater for heating the lithographic printing plate M passing therethrough. The lithographic printing plate M is heated in advance prior to the development process because a small amount of a temperature-controlled developer is applied to the lithographic printing plate M and the lithographic printing plate M is heated by the heat capacity of the lithographic printing plate M when developing. This is to prevent the temperature of the developer that has come into contact with the developer from decreasing.

As shown in FIG. 3, the developing solution applying mechanism 43 is connected to a developing solution tank 52 for storing a developing solution via a pump 53. A collection tray 54 is provided below the developer application mechanism 43. The developing solution in a developing solution tank 52 is pumped by a pump 53 to a developing solution application mechanism 43.
And supplied onto the lithographic printing plate M. Then, the developer not applied to the lithographic printing plate M, such as the developing solution flowing out from both ends and the rear end of the lithographic printing plate M, is collected on a collecting tray 5.
4. Drop on top. Further, since this developer can be reused, the collection tube 5 provided at the lower end of the collection tray 54 is provided.
5, the liquid is dropped into the liquid receiving portion 56 of the developer tank 52 and collected in the developer tank 52. The developer tank 52 has a built-in panel heater 57 and is configured to maintain the developer circulating in the developer circulation path from the developer tank 52 to the developer application mechanism 43 at a predetermined temperature. ing.

A collection tray 58 is provided below the pair of squeezing rollers 44 and 45. The fatigue developer removed from the lithographic printing plate M by the pair of squeezing rollers 44 and 45 cannot be reused.
Recovery hole 6 of liquid receiving member 62 provided below 4, 45
3 and is dropped onto the collection tray 58. Then, the developer is discharged to a drain tank 64 via a collection pipe 59 provided at a lower end of the collection tray 58.

As shown in FIG. 4, the developing solution applying mechanism 43 has a developing solution supply pipe 122 having a plurality of discharge holes 121 formed thereunder, and a plurality of developing solution supply pipes 122 for flowing the developing solution to the lower end thereof. Developer receiving portion 124 having opening 123
A coating roller 125 having a plurality of grooves on its surface and rotating in contact with the lithographic printing plate M; and a diffusion for guiding the developer flowing down from the opening 123 of the developer receiving portion 124 to the coating roller 125. The film 126 and the developer receiving section 12
4 has a backflow prevention film 127 for preventing backflow of the developer flowing down from the opening 123, and a backup roller 128 abutting on the application roller 125. In addition,
Arrows in FIG. 4 indicate the transport direction of the lithographic printing plate M.

As will be described later, the developer supply pipe 122
The developing solution is connected to the developing solution tank 52 via a pump 53, and the developing solution is discharged from the plurality of discharge holes 121 by driving the pump 53. Also, the developer supply pipe 122
Is connected to the developer tank 52 via a developer recovery path not shown in FIG. After the developer discharged from the discharge holes 121 is once received by the developer receiving portion 124, the developing film 12
Flow down to 6. Opening 12 of developer receiving section 124
The developer flowing down from 3 is temporarily stored in the contact portion between the application roller 125 and the diffusion film 126 and is diffused in a direction orthogonal to the transport direction of the lithographic printing plate M. Then, with the rotation of the application roller 125, the developer passes through the opening formed by the groove of the application roller 125 and passes through the application roller 125.
Move in the direction of the contact portion between
A reservoir is formed there.

When the lithographic printing plate M passes through the liquid reservoir, a developing solution is applied to the photosensitive surface of the lithographic printing plate M. At this time, since the photosensitive surface of the lithographic printing plate M is pressed against the surface of the application roller 125 by the backup roller 128, the developer applied to the photosensitive surface of the lithographic printing plate M is opened by the groove of the application roller 125. It is weighed to a certain amount by the part. Therefore, the backup roller 128
Printing plate M that has passed the contact portion between
A constant amount of developer required for development is always applied to the photosensitive surface.

The connection relationship between the developing solution supply pipe 122 and the developing solution tank 52 and the pump 53 will be described later in detail.

The stabilizing section 33 is provided with a stabilizing liquid applying mechanism 73 for measuring and applying a fixed amount of a stabilizing liquid to the photosensitive surface of the lithographic printing plate M conveyed from the developing section 32 and a stabilizing process. The lithographic printing plate M includes a pair of squeezing rollers 74 and 75 for removing the stabilizing liquid from the lithographic printing plate M, and a plurality of guide members 76, 77 and 78 for guiding the lithographic printing plate M.

As shown in FIG. 3, the stabilizing solution applying mechanism 73 is connected to a stabilizing solution tank 82 for storing a stabilizing solution via a pump 83. A collection tray 84 is provided below the stable liquid application mechanism 73. The stable liquid in the stable liquid tank 82 is supplied to the stable liquid applying mechanism 73 by the pump 83.
And supplied onto the lithographic printing plate M. Then, the stabilizing liquid not applied to the lithographic printing plate M, such as the stabilizing liquid flowing out from both ends and the rear end of the lithographic printing plate M, is dropped on the collection tray 84 because it can be reused. Further, the stable liquid drops into the liquid receiving section 86 of the stable liquid tank 82 via the recovery pipe 85 provided at the lower end of the recovery tray 84, and is collected in the stable liquid tank 82.

A collecting tray 88 is provided below the pair of squeezing rollers 74 and 75. The stable liquid removed from the lithographic printing plate M by the pair of squeezing rollers 74 and 75 is dropped onto the collection tray 88 via the collection holes 93 of the liquid receiving member 92 provided below the pair of squeezing rollers 74 and 75. I do. Further, since this stable liquid cannot be reused, it is discharged to the drainage tank 64 via a collecting pipe 89 provided at the lower end of the collecting tray 88.

As shown in FIG. 5, the stabilizing liquid application mechanism 73 includes a stabilizing liquid supply pipe 132 having a plurality of discharge holes 131 formed below the stabilizing liquid supply pipe 132, and a plurality of stabilizing liquid supply pipes 132 for flowing the stabilizing liquid downward. A stable liquid receiving portion 134 having an opening 133 formed therein.
A coating roller 135 whose surface is formed of a single-cell sponge and rotates in contact with the lithographic printing plate M; and an opening 133 of the stable liquid receiving portion 134 whose surface is formed in an uneven shape.
Film 136 for guiding the stable liquid flowing down from the coating roller 135 to the coating roller 135 and the lithographic printing plate M with the coating roller 1
And a leaf spring 138 that urges the plate spring 335. In addition,
Arrows in FIG. 4 indicate the transport direction of the lithographic printing plate M.

The stable liquid supply pipe 132 is connected to the aforementioned stable liquid tank 82 via a pump 83, and the stable liquid is discharged from the plurality of discharge holes 131 by driving the pump 83. After the stable liquid is once received by the stable liquid receiving section 134, the diffusion film 13 passes through the plurality of openings 133.
Flow down to 6. Opening 13 of stable liquid receiving portion 134
The stable liquid flowing down from 3 is temporarily stored in a contact portion between the application roller 135 and the diffusion film 136, and is diffused in a direction orthogonal to the transport direction of the lithographic printing plate M. Then, with the rotation of the application roller 135, the stable liquid passes through the opening formed by the unevenness on the surface of the diffusion film 136, moves toward the contact portion between the application roller 135 and the leaf spring 138, and stores the liquid therein. Form.

When the lithographic printing plate M passes through the liquid reservoir, a stable liquid is applied to the photosensitive surface of the lithographic printing plate M. At this time, since the photosensitive surface of the lithographic printing plate M is pressed against the surface of the application roller 135 by the leaf spring 138, the stable liquid applied to the photosensitive surface of the lithographic printing plate M is a single bubble on the surface of the application roller 135. It is metered to a fixed volume by a number of holes made by a sponge. Therefore, a constant amount of the stabilizing liquid required for stabilization is always applied to the photosensitive surface of the lithographic printing plate M that has passed through the contact portion between the leaf spring 138 and the application roller 135.

The leaf spring 138 has an overflow hole 137 for storing a stable liquid more than necessary at a contact portion between the leaf spring 138 and the application roller 135 and for preventing the liquid reservoir from becoming excessively large. Is provided.

The drying unit 34 includes a rubber roller 102 that supports and transports the lithographic printing plate M transported from the stabilizing unit 33,
A mirror roller 103 for preventing uneven drying of the lithographic printing plate M by contacting the rubber roller 102 with a predetermined pressure;
Cleaning liquid reservoir 104 for supplying the cleaning liquid via
A drying mechanism 107 having a fan 105 and a heater 106 for blowing hot air onto the lithographic printing plate M to dry it, and a plurality of transport rollers 108 for transporting the lithographic printing plate M;
09 and 110. The cleaning liquid storage unit 104 is provided as shown in FIG.
As shown in FIG.
The cleaning liquid supply pipe 105 for supplying the cleaning liquid to the cleaning liquid 4 and 45 is connected to the cleaning liquid supply pipe 105 via a pump 106.

The development processing of the lithographic printing plate M by the development processing device 3 is performed as follows.

That is, the lithographic printing plate M, on which an image is recorded by the exposure device 2 at the preceding stage, is transferred to the pair of introduction rollers 41, 4
The developing solution is applied by the developer application mechanism 43 to apply an amount of the developing solution necessary for developing the lithographic printing plate M.
The lithographic printing plate M to which only the developing solution necessary for the developing process is applied is supplied from the developing solution applying mechanism 43 to the pair of squeezing rollers 4.
The developing process is completed on the photosensitive surface while being transported through the space developing section reaching to 4, 45. And the lithographic printing plate M
The developing solution adhered to the developing process and removed by the pair of squeezing rollers 44 and 45 is removed. Subsequently, the lithographic printing plate M is applied with a stabilizing solution application mechanism 73 with an amount of stabilizing solution necessary for stabilizing the lithographic printing plate M. The lithographic printing plate M to which only the necessary amount of the stabilizing liquid for the stabilizing process is applied is stabilized while being conveyed to the pair of squeezing rollers 74 and 75, and the stabilizing process attached to the lithographic printing plate M is performed. Is removed by the pair of squeezing rollers 74 and 75. Then, the lithographic printing plate M for which the stabilization process has been completed.
After the unevenness of drying is prevented by being pressed by the mirror surface roller 103, the drying is performed by the drying mechanism 107 and discharged onto the discharge tray 29 shown in FIG.

In the developing apparatus 3, since only the necessary amount of the developing solution is applied to the lithographic printing plate M and the developing process is performed, the amount of the developing solution required for the process can be reduced. It becomes possible. Further, since a substantially unused processing liquid is supplied to the lithographic printing plate M, the lithographic printing plate M can always be uniformly processed.

Next, the configurations of the developing solution supply device and the stabilizing solution supply device, which are characteristic portions of the present invention, will be described.
FIG. 6 is a schematic diagram showing a connection state between the developer supply pipe 122 and the developer tank 52 and the pump 53 of the developer supply device according to the first embodiment.

As shown in this figure, one end of the developer supply pipe 122 in the above-described developer application mechanism 43 is connected to a pump 53 for pumping the developer from a developer tank 52 through a developer supply path 161. ing. The other end of the developer supply pipe 122 is connected to the developer tank 52 via a developer recovery path 162. Then, the developer recovery path 1
62 is provided with a resistance portion 163 for applying a pressure loss to the developer passing therethrough.

More specifically, the developer supply path 161
The developer recovery passage 162 is formed of a rubber tube made of soft silicon or the like, and the resistance portion 163 is formed of vinyl chloride. The outer diameter of the resistance part 163 is slightly larger than the inner diameter of the developer recovery path 162, and the resistance part 163 is fixed in the developer recovery path 162 by being inserted into the developer recovery path 162. The resistance portion 163 has a developer passage hole 164 having a diameter of 1 mm.
Is provided. The inner diameters of the developer supply path 161, the developer recovery path 162, and the developer supply pipe 122 are 4 mm.
The diameter of each discharge hole 121 is 1 mm. Therefore, the resistance portion 163 has the largest pressure loss in the developer circulation path from the pump 53 to the developer tank 52 through the developer supply path 161, the developer supply pipe 122, and the developer recovery path 162. The developing solution passing through the developing solution collecting passage 162 receives a large resistance by the resistance portion 163, and generates a large pressure loss.

In such a configuration, when the pump 53 is driven to feed the developing solution from the developing solution tank 52 to the developing solution supply pipe 122, the developer in the developing solution supply pipe 122 is actuated by the resistance section 163. Pressure rises.
Therefore, the developer is almost uniformly discharged from each discharge hole 121. Therefore, it is possible to supply the developer uniformly to the developer receiving portion 124 of the developer application mechanism 43 in a direction orthogonal to the transport direction of the lithographic printing plate M while circulating the developer.

In the above-described configuration, the resistance unit 1
By the operation of 63, the amount of the developer discharged from each discharge hole 121 can be maintained at a constant amount.

In other words, when the resistance portion 163 is not provided, when the pipeline resistance changes due to, for example, the curvedness of the developer recovery passage 162 made of a soft material, the discharge holes 121 The amount of developer discharged also changes. However, in the above-described configuration, the developer supply path 161, the developer supply pipe 122, and the developer recovery path 1
Since the resistance portion 163 having the largest pressure loss is provided in the circulation path of the developer reaching the developer tank 52 via the nozzle 62, the amount of the developer discharged from each of the discharge holes 121 is determined as follows. It is determined by the flow path resistance when passing through each ejection hole 121 and the flow path resistance when passing through the resistance portion 163, and is not affected by the pipe resistance of the developer recovery path 162 or the like. Therefore, by disposing the above-described resistance portion 163, the amount of the developer discharged from each discharge hole 121 can be maintained constant.

The stable liquid supply pipe 132 and the like in the stable liquid supply section 73 also have the same structure as the above-mentioned developer supply pipe 122 and the like. Stabilized liquid supply pipe 132 by driving
And discharge from each of the discharge holes 131.

Next, another embodiment of the present invention will be described. FIG. 7 shows a developer supply pipe 222, a developer tank 52, and a pump 5 of the developer supply device according to the second embodiment.
FIG. 4 is a schematic diagram showing a connection state with the device 3; The same members as those in the first embodiment shown in FIG. 6 are denoted by the same reference numerals, and detailed description is omitted.

In this developing solution supply device, a double tube consisting of an inner tube 224 and an outer tube 223 is employed as the developing solution supply tube 222. The inner tube 224 has two upwardly directed holes 225 and is connected to the developer supply path 161. The outer tube 223 has three downwardly directed discharge holes 121 like the developer supply tube 122 shown in FIG.
It is connected to the developer recovery path 162.

In such a configuration, when the pump 53 is driven to feed the developing solution from the developing solution tank 52 to the developing solution supply pipe 222, similarly to the embodiment shown in FIG. The pressure of the developing solution in the developing solution supply pipe 222 rises due to the action of. Therefore, the developer is almost uniformly discharged from each discharge hole 121. At this time, since the developer supply pipe 222 has a double pipe structure including the inner pipe 224 and the outer pipe 223, the developer discharged into the outer pipe 223 from the hole 225 of the inner pipe 224 is After being diffused in the longitudinal direction of the tube 223 (the width direction of the planographic printing plate M), it is discharged from the discharge holes 121 of the outer tube 223. Therefore, the amount of the developer discharged from each of the discharge holes 121 can be further equalized, and the lithographic printing plate M is supplied to the developer receiving portion 124 of the developer application mechanism 43.
The developer can be uniformly supplied in a direction orthogonal to the transport direction of the developer.

Also in this embodiment, as in the case of the embodiment shown in FIG. 6, the pump 53 supplies the developer supply path 161, the developer supply pipe 122 and the developer recovery path 162.
The resistance part 163 having the largest pressure loss in the circulation path of the developing solution reaching the developing solution tank 52 through the discharge hole 121
Is arranged on the downstream side, the amount of the developer discharged from each discharge hole 121 can be maintained at a constant amount.

In each of the above-described embodiments, the case where the resistance portion 163 is disposed in the developer recovery passage 162 has been described. However, the resistance portion 163 is connected to the developer supply pipes 122 and 222 for supplying the developer. It may be provided at the end on the exit side or the like. In short, the resistance portion 163 can be provided at any position on the downstream side of the discharge hole 121 in the circulation path of the developer. However, in order to effectively increase the pressure of the developer in the developer supply pipes 122 and 222, it is preferable to dispose them near the developer supply pipes 122 and 222.

In each of the above-described embodiments, the discharge holes 1 in the developer supply pipes 122 and 222 are all provided.
The developer discharged from 21 is supplied to the application roller 125 via the developer receiving portion 124 of the developer application mechanism 43, and the developer is directly discharged from each discharge hole 121 to the application roller 125. You may do so.

Further, in the above-described embodiment,
A lithographic printing plate M using a silver complex salt diffusion transfer method (DTR method) as a photosensitive material, and a developing processing device 3 for applying only a developing solution necessary for development to the lithographic printing plate M and performing a developing process. Although the present invention has been described with reference to the case where the present invention is applied, the present invention can also be applied to other various kinds of photosensitive material processing apparatuses.

[0058]

According to the first aspect of the present invention, a processing solution constantly circulating in the circulation path can be supplied to the photosensitive material. In addition, a resistance portion having the largest pressure loss in the circulation path of the processing liquid from the pump to the processing liquid tank via the supply path, the processing liquid supply pipe, and the recovery path is disposed downstream of the processing liquid discharge hole. Therefore, the amount of the processing liquid discharged from the plurality of discharge holes can be made uniform, and further, the amount of the processing liquid discharged from each discharge hole can be always constant.

According to the second aspect of the present invention, the inner pipe has a hole formed in the outer peripheral portion thereof and is connected to the supply passage, and the recovery passage has a plurality of processing liquid discharge holes formed in the outer peripheral portion thereof. Since the processing liquid supply pipe is constituted by the double pipe having the outer pipe connected to the processing liquid, the amount of the processing liquid discharged from the plurality of discharge holes can be made more uniform.

[Brief description of the drawings]

FIG. 1 is a schematic diagram of a lithographic printing plate making apparatus.

FIG. 2 is a schematic diagram of a developing device 3;

FIG. 3 is a schematic diagram showing a piping system of the developing device 3;

FIG. 4 is a schematic view showing a developer application mechanism 43.

FIG. 5 is a schematic view showing a stable liquid application mechanism 73.

FIG. 6 is a schematic diagram illustrating a developer supply pipe 122 and the like according to the first embodiment.

FIG. 7 is a schematic diagram illustrating a developer supply pipe 222 and the like according to a second embodiment.

[Explanation of symbols]

 2 Exposure device 3 Developing device 32 Developing unit 33 Stabilizing unit 34 Drying unit 43 Developing solution applying mechanism 52 Developing solution tank 53 Pump 73 Stabilizing solution applying mechanism 82 Stabilizing solution tank 83 Pump 121 Discharge hole 122 Developing solution supply pipe 125 Applying roller 131 Discharge hole 132 Stabilizing liquid supply pipe 135 Coating roller 161 Developing liquid supply path 162 Developing liquid recovery path 163 Resistance section 164 Developing liquid passage hole 222 Developing liquid supply pipe 223 Outer pipe 224 Inner pipe 225 Hole M Planographic printing plate

 ──────────────────────────────────────────────────続 き Continued on the front page (72) Inventor Masaharu Kimura One of 480 Takamiya-cho, Hikone City, Shiga Prefecture Dainippon Screen Mfg. Co., Ltd. Hikone District Office (72) Inventor Yasuhiro Kawaguchi 480 Takamiya-cho, Hikone City, Shiga Prefecture 1 Dainippon Screen Mfg. Co., Ltd. in Hikone district office

Claims (2)

[Claims] 1. A processing liquid supply device for a photosensitive material processing apparatus for supplying a processing liquid to a photosensitive material by discharging the processing liquid from a plurality of processing liquid discharge holes, wherein the plurality of processing liquid discharge holes are provided. A processing liquid supply pipe, a processing liquid supply path that connects a processing liquid tank that stores the processing liquid, and one end of the processing liquid supply pipe, and a second end of the processing liquid supply pipe and the processing liquid tank. A recovery liquid path to be connected, a pump disposed in the supply path, for pumping the processing liquid in the processing liquid tank toward the processing liquid supply pipe, and the supply path and the processing liquid supply from the pump. A resistance portion having the largest pressure loss in the circulation path disposed downstream of the treatment liquid discharge hole in the circulation path of the treatment liquid that reaches the treatment liquid tank via a pipe and a recovery path. Processing liquid supply for photosensitive material processing equipment apparatus. 2. An inner pipe having a hole formed in the outer periphery thereof and connected to the supply path, and an outer pipe having a plurality of processing liquid discharge holes formed in the outer circumference thereof and connected to the recovery path. The processing liquid supply device of a photosensitive material processing apparatus according to claim 1, wherein the processing liquid supply pipe is constituted by a double pipe having the following.