JPH11512847A - ホログラフィ媒体およびプロセス - Google Patents
ホログラフィ媒体およびプロセスInfo
- Publication number
- JPH11512847A JPH11512847A JP9514338A JP51433897A JPH11512847A JP H11512847 A JPH11512847 A JP H11512847A JP 9514338 A JP9514338 A JP 9514338A JP 51433897 A JP51433897 A JP 51433897A JP H11512847 A JPH11512847 A JP H11512847A
- Authority
- JP
- Japan
- Prior art keywords
- acid
- medium
- monomer
- exposure
- holographic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
- C08G59/22—Di-epoxy compounds
- C08G59/30—Di-epoxy compounds containing atoms other than carbon, hydrogen, oxygen and nitrogen
- C08G59/306—Di-epoxy compounds containing atoms other than carbon, hydrogen, oxygen and nitrogen containing silicon
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/001—Phase modulating patterns, e.g. refractive index patterns
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0755—Non-macromolecular compounds containing Si-O, Si-C or Si-N bonds
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
- G03H2001/026—Recording materials or recording processes
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H2260/00—Recording materials or recording processes
- G03H2260/12—Photopolymer
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Holo Graphy (AREA)
- Epoxy Resins (AREA)
Abstract
Description
Claims (1)
- 【特許請求の範囲】 1.体積型ホログラムを調製するプロセスであって: 化学線照射に対する露光に際して酸を生成することが可能な酸発生剤;結合剤 ;および該酸発生剤から生成される該酸により開始されるカチオン重合を受ける ことが可能な少なくとも1つのモノマーまたはオリゴマーを含むホログラフィ記 録媒体を提供する、工程;および 該酸発生剤が感受性であるコヒーレントな化学線照射の参照ビームおよび同一 のコヒーレントな化学線照射の対物ビームを該記録媒体の中へ通し、それにより 該媒体中に干渉パターンを形成する工程、を包含し、 該干渉パターンに対する露光に際して、該媒体が、該干渉パターンの照射され た領域において、該酸発生剤からの酸の放出、および該モノマーまたはオリゴマ ーのカチオン重合を受けて、それにより該媒体がフリーラジカル重合を受けるこ となく該媒体中に体積型ホログラムを形成することを特徴とする、プロセス。 2.前記媒体が、フリーラジカル重合を受けることが可能な物質を本質的に含ま ないことを特徴とする、請求項1に記載のプロセス。 3.前記結合剤が、シロキサンポリマーまたはオリゴマー、あるいはアクリレー トであることを特徴とする、請求項1または2に記載のプロセス。 4.前記酸発生剤が、約0未満のpKaを有する酸を生成することが可能であるか 、またはルイス酸を発生することが可能であることを特徴とする、請求項1〜3 のいずれか1項に記載のプロセス。 5.前記酸発生剤が、ジアリールヨードニウム塩またはフェロセニウム塩を含む ことを特徴とする、請求項4に記載のプロセス。 6.前記酸発生剤が、酸発生成分および増感剤を含み、該増感剤が、該酸発生成 分が該増感剤の非存在下では実質的に感受性でない波長の化学線照射に対して、 該酸発生成分を感受性にすることを特徴とする、請求項1〜5のいずれか1項に 記載のプロセス。 7.前記増感剤が、少なくとも2つのアルキニル基で置換された芳香族炭化水素 を含むことを特徴とする、請求項6に記載のプロセス。 8.前記モノマーまたはオリゴマーが、少なくとも1つのエポキシド基またはビ ニルエーテル基を有することを特徴とする、請求項の1〜7のいずれか1項に記 載のプロセス。 9.請求項8に記載のプロセスであって、前記モノマーが次式: ここで、各Rは独立して約6個を越えない炭素原子を含むアルキル基であるか、 または1,2-エポキシ-1,2,3,4-テトラヒドロナフタレンであることを 特徴とする、プロセス。 10.ホログラフィ露光の後、前記ホログラフィ記録媒体全体が、前記モノマー またはオリゴマーのさらなる重合をもたらすのに効果的な波長の照射に対して露 光されることを特徴とする、請求項1〜9のいずれか1項に記載のプロセス。 11.体積型ホログラムを生成するためのホログラフィ記録媒体であって: 化学線照射に対する露光に際して酸を発生することが可能な酸発生剤; 結合剤;および 該酸発生剤から生成する該酸により開始されるカチオン重合を受けることが可 能な少なくとも1つのモノマーまたはオリゴマー、 を含み、 該媒体が、フリーラジカル重合を受けることが可能な物質を本質的に含まない ことにより特徴付けられ、その結果、該化学線照射の2つビームの間の干渉によ り形成される干渉パターンに対する露光に際して、該媒体中で実質的にフリーラ ジカル重合が起こることなく該媒体が該モノマーまたはオリゴマーのカチオン重 合を受けて、それにより屈折率が異なる領域を形成し、そして体積型ホログラム を生成する、記録媒体。
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US54012595A | 1995-10-06 | 1995-10-06 | |
| US08/540,125 | 1995-10-06 | ||
| PCT/US1996/015600 WO1997013183A1 (en) | 1995-10-06 | 1996-09-30 | Holographic medium and process |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH11512847A true JPH11512847A (ja) | 1999-11-02 |
| JP3604700B2 JP3604700B2 (ja) | 2004-12-22 |
Family
ID=24154115
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP51433897A Expired - Fee Related JP3604700B2 (ja) | 1995-10-06 | 1996-09-30 | ホログラフィ媒体およびプロセス |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US5759721A (ja) |
| EP (1) | EP0853774B1 (ja) |
| JP (1) | JP3604700B2 (ja) |
| DE (1) | DE69616813T2 (ja) |
| WO (1) | WO1997013183A1 (ja) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004526174A (ja) * | 2000-11-10 | 2004-08-26 | デュランド テクノロジー リミテッド | 光学記録材料 |
| JP2005107359A (ja) * | 2003-10-01 | 2005-04-21 | Konica Minolta Medical & Graphic Inc | ホログラフィック記録用組成物、ホログラフィック記録メディア、ホログラフィック記録方法およびホログラフィック情報メディア |
| EP1580597A2 (en) | 2004-03-26 | 2005-09-28 | Fuji Photo Film Co., Ltd. | Hologram recording material, hologram recording method and optical recording medium |
| EP1626309A2 (en) | 2004-03-25 | 2006-02-15 | Fuji Photo Film Co., Ltd. | Hologram recording material, hologram recording method and holographic optical element |
| US7572555B2 (en) | 2004-09-30 | 2009-08-11 | Fujifilm Corporation | Hologram recording material, hologram recording method and optical recording medium |
| US7588863B2 (en) | 2003-08-25 | 2009-09-15 | Fujifilm Corporation | Hologram recording method and hologram recording material |
| US8343691B2 (en) | 2004-05-11 | 2013-01-01 | Tdk Corporation | Hologram recording material and hologram recording medium |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6489065B1 (en) | 1996-05-17 | 2002-12-03 | Polaroid Corporation | Holographic medium and process for use thereof |
| US20030157414A1 (en) * | 1997-11-13 | 2003-08-21 | Pradeep K. Dhal | Holographic medium and process for use thereof |
| US6139147A (en) * | 1998-11-20 | 2000-10-31 | Novartis Ag | Actively controllable multifocal lens |
| US5997140A (en) * | 1997-12-29 | 1999-12-07 | Novartis Ag | Actively controllable multifocal lens |
| US6139146A (en) * | 1997-12-29 | 2000-10-31 | Novartis Ag | Programmable corrective lenses |
| WO1999033642A1 (en) * | 1997-12-29 | 1999-07-08 | Novartis Ag | Holographic ophthalmic lens |
| US6020985A (en) * | 1998-01-30 | 2000-02-01 | Siros Technologies, Inc. | Multilayer reflection microhologram storage in tape media |
| US6212148B1 (en) | 1998-01-30 | 2001-04-03 | Siros Technologies, Inc. | Optical data storage by selective localized alteration of a format hologram |
| US6147782A (en) | 1998-05-01 | 2000-11-14 | Siros Technologies, Inc. | Positive unit magnification reflective optics for holographic storage |
| US6124076A (en) | 1998-07-01 | 2000-09-26 | Lucent Technologies Inc. | Material exhibiting compensation for polymerization-induced shrinkage and recording medium formed therefrom |
| US6322933B1 (en) | 1999-01-12 | 2001-11-27 | Siros Technologies, Inc. | Volumetric track definition for data storage media used to record data by selective alteration of a format hologram |
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| JP4132546B2 (ja) * | 2000-02-29 | 2008-08-13 | 富士フイルム株式会社 | 光拡散板、光拡散板の製造方法および表示装置 |
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| EP1598699A3 (en) | 2000-05-23 | 2009-05-20 | Aprilis, Inc. | Data storage medium comprising colloidal metal and preparation process thereof |
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| ATE433129T1 (de) * | 2000-06-15 | 2009-06-15 | 3M Innovative Properties Co | Mikroherstellungsverfahren für organische optische bauteile |
| WO2001096958A2 (en) * | 2000-06-15 | 2001-12-20 | 3M Innovative Properties Company | Process for producing microfluidic articles |
| JP2004503928A (ja) * | 2000-06-15 | 2004-02-05 | スリーエム イノベイティブ プロパティズ カンパニー | 多方向光反応吸収方法 |
| US7014988B2 (en) * | 2000-06-15 | 2006-03-21 | 3M Innovative Properties Company | Multiphoton curing to provide encapsulated optical elements |
| DE60139620D1 (de) * | 2000-06-15 | 2009-10-01 | 3M Innovative Properties Co | Methode und gerät zur erzielung wiederholter multiphotonabsorption |
| AU2001270320A1 (en) * | 2000-06-15 | 2001-12-24 | 3M Innovative Properties Company | Multicolor imaging using multiphoton photochemical processes |
| US6723491B2 (en) | 2000-07-05 | 2004-04-20 | Kba (Advanced Imaging Technology) (Israel) Limited | Utilizing UV to form and decompose a printing member |
| ATE328939T1 (de) | 2000-08-28 | 2006-06-15 | Aprilis Inc | Holographisches speichermedium, das polyfunktionelle epoxidmonomere enthält, welche zur kationischen polymerisation fähig sind |
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| EP1211529B1 (en) * | 2000-11-30 | 2007-09-19 | Toyoda Gosei Co., Ltd. | Method for manufacturing optical waveguide |
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| JP2004526174A (ja) * | 2000-11-10 | 2004-08-26 | デュランド テクノロジー リミテッド | 光学記録材料 |
| US7588863B2 (en) | 2003-08-25 | 2009-09-15 | Fujifilm Corporation | Hologram recording method and hologram recording material |
| JP2005107359A (ja) * | 2003-10-01 | 2005-04-21 | Konica Minolta Medical & Graphic Inc | ホログラフィック記録用組成物、ホログラフィック記録メディア、ホログラフィック記録方法およびホログラフィック情報メディア |
| EP1626309A2 (en) | 2004-03-25 | 2006-02-15 | Fuji Photo Film Co., Ltd. | Hologram recording material, hologram recording method and holographic optical element |
| EP1580597A2 (en) | 2004-03-26 | 2005-09-28 | Fuji Photo Film Co., Ltd. | Hologram recording material, hologram recording method and optical recording medium |
| US8343691B2 (en) | 2004-05-11 | 2013-01-01 | Tdk Corporation | Hologram recording material and hologram recording medium |
| US7572555B2 (en) | 2004-09-30 | 2009-08-11 | Fujifilm Corporation | Hologram recording material, hologram recording method and optical recording medium |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3604700B2 (ja) | 2004-12-22 |
| EP0853774A1 (en) | 1998-07-22 |
| WO1997013183A1 (en) | 1997-04-10 |
| US5759721A (en) | 1998-06-02 |
| DE69616813T2 (de) | 2002-07-18 |
| DE69616813D1 (de) | 2001-12-13 |
| EP0853774B1 (en) | 2001-11-07 |
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