JPS51117876A - Semiconductor device manufacturing method - Google Patents

Semiconductor device manufacturing method

Info

Publication number
JPS51117876A
JPS51117876A JP50043116A JP4311675A JPS51117876A JP S51117876 A JPS51117876 A JP S51117876A JP 50043116 A JP50043116 A JP 50043116A JP 4311675 A JP4311675 A JP 4311675A JP S51117876 A JPS51117876 A JP S51117876A
Authority
JP
Japan
Prior art keywords
semiconductor device
device manufacturing
semiconductor
substrate
adhering
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP50043116A
Other languages
Japanese (ja)
Inventor
Masao Kanazawa
Yukihiro Ooyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP50043116A priority Critical patent/JPS51117876A/en
Publication of JPS51117876A publication Critical patent/JPS51117876A/en
Pending legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: Image blur is prevented by structuring grooves on the insulation film covering the surface of a semiconductor substrate where semiconductor devices are not formed and by adhering a mask on it after coating and drying photoresist on the substrate, in the semiconductor photo process.
COPYRIGHT: (C)1976,JPO&Japio
JP50043116A 1975-04-09 1975-04-09 Semiconductor device manufacturing method Pending JPS51117876A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP50043116A JPS51117876A (en) 1975-04-09 1975-04-09 Semiconductor device manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50043116A JPS51117876A (en) 1975-04-09 1975-04-09 Semiconductor device manufacturing method

Publications (1)

Publication Number Publication Date
JPS51117876A true JPS51117876A (en) 1976-10-16

Family

ID=12654855

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50043116A Pending JPS51117876A (en) 1975-04-09 1975-04-09 Semiconductor device manufacturing method

Country Status (1)

Country Link
JP (1) JPS51117876A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS582028A (en) * 1981-06-26 1983-01-07 Seiko Epson Corp Semiconductor device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS582028A (en) * 1981-06-26 1983-01-07 Seiko Epson Corp Semiconductor device

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