JPS5263685A - Production of semiconductor device - Google Patents
Production of semiconductor deviceInfo
- Publication number
- JPS5263685A JPS5263685A JP50139846A JP13984675A JPS5263685A JP S5263685 A JPS5263685 A JP S5263685A JP 50139846 A JP50139846 A JP 50139846A JP 13984675 A JP13984675 A JP 13984675A JP S5263685 A JPS5263685 A JP S5263685A
- Authority
- JP
- Japan
- Prior art keywords
- production
- semiconductor device
- substrate
- sensitive resin
- photo sensitive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Element Separation (AREA)
- Weting (AREA)
Abstract
PURPOSE: To increase the dielectric strength between drain and substrate by removing the insulating film on a semiconductor substrate with the photo sensitive resin selectively formed thereon as a mask and covering the surroundings of the exposed surface of the exposed substrate with a photo sensitive resin, then diffusing an impurity.
COPYRIGHT: (C)1977,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP50139846A JPS5263685A (en) | 1975-11-20 | 1975-11-20 | Production of semiconductor device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP50139846A JPS5263685A (en) | 1975-11-20 | 1975-11-20 | Production of semiconductor device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5263685A true JPS5263685A (en) | 1977-05-26 |
Family
ID=15254875
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP50139846A Pending JPS5263685A (en) | 1975-11-20 | 1975-11-20 | Production of semiconductor device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5263685A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59172739A (en) * | 1983-03-22 | 1984-09-29 | Toko Inc | Semiconductor integrated circuit device and manufacture thereof |
| JPS61180449A (en) * | 1985-02-05 | 1986-08-13 | Toko Inc | Dielectric-isolated semiconductor integrated circuit substrate and manufacture thereof |
| WO2004088375A1 (en) * | 2003-03-31 | 2004-10-14 | Hamamatsu Photonics K.K. | Silicon substrate and method of forming the same |
-
1975
- 1975-11-20 JP JP50139846A patent/JPS5263685A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59172739A (en) * | 1983-03-22 | 1984-09-29 | Toko Inc | Semiconductor integrated circuit device and manufacture thereof |
| JPS61180449A (en) * | 1985-02-05 | 1986-08-13 | Toko Inc | Dielectric-isolated semiconductor integrated circuit substrate and manufacture thereof |
| WO2004088375A1 (en) * | 2003-03-31 | 2004-10-14 | Hamamatsu Photonics K.K. | Silicon substrate and method of forming the same |
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