JPS51139265A - Method of selective etching of semi-conductor substrate - Google Patents
Method of selective etching of semi-conductor substrateInfo
- Publication number
- JPS51139265A JPS51139265A JP6286375A JP6286375A JPS51139265A JP S51139265 A JPS51139265 A JP S51139265A JP 6286375 A JP6286375 A JP 6286375A JP 6286375 A JP6286375 A JP 6286375A JP S51139265 A JPS51139265 A JP S51139265A
- Authority
- JP
- Japan
- Prior art keywords
- semi
- selective etching
- conductor substrate
- isolation
- ions
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005530 etching Methods 0.000 title abstract 2
- 239000004065 semiconductor Substances 0.000 title abstract 2
- 239000000758 substrate Substances 0.000 title abstract 2
- 238000000034 method Methods 0.000 title 1
- 238000002955 isolation Methods 0.000 abstract 2
- 230000010354 integration Effects 0.000 abstract 1
- 150000002500 ions Chemical class 0.000 abstract 1
- 150000004767 nitrides Chemical class 0.000 abstract 1
- 229910052757 nitrogen Inorganic materials 0.000 abstract 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Substances N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 abstract 1
- -1 nitrogen ions Chemical class 0.000 abstract 1
- 238000007669 thermal treatment Methods 0.000 abstract 1
Landscapes
- Weting (AREA)
Abstract
PURPOSE: To reduce the width of isolation and improve the degree of integration by implanting nitrogen ions in a semi-conductor substrate in regions thereof for isolation, converting these ions into a nitrode through a thermal treatment and removing the nitride through selective etching.
COPYRIGHT: (C)1976,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6286375A JPS51139265A (en) | 1975-05-28 | 1975-05-28 | Method of selective etching of semi-conductor substrate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6286375A JPS51139265A (en) | 1975-05-28 | 1975-05-28 | Method of selective etching of semi-conductor substrate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS51139265A true JPS51139265A (en) | 1976-12-01 |
Family
ID=13212544
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6286375A Pending JPS51139265A (en) | 1975-05-28 | 1975-05-28 | Method of selective etching of semi-conductor substrate |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS51139265A (en) |
-
1975
- 1975-05-28 JP JP6286375A patent/JPS51139265A/en active Pending
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