JPS5210071A - Method for diffusing boron - Google Patents

Method for diffusing boron

Info

Publication number
JPS5210071A
JPS5210071A JP8585575A JP8585575A JPS5210071A JP S5210071 A JPS5210071 A JP S5210071A JP 8585575 A JP8585575 A JP 8585575A JP 8585575 A JP8585575 A JP 8585575A JP S5210071 A JPS5210071 A JP S5210071A
Authority
JP
Japan
Prior art keywords
diffusing boron
diffusion
silicon wafer
boron oxide
boron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8585575A
Other languages
Japanese (ja)
Inventor
Kimihiro Muraoka
Masato Ito
Sozaburo Hotta
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toyo Electric Manufacturing Ltd
Original Assignee
Toyo Electric Manufacturing Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyo Electric Manufacturing Ltd filed Critical Toyo Electric Manufacturing Ltd
Priority to JP8585575A priority Critical patent/JPS5210071A/en
Publication of JPS5210071A publication Critical patent/JPS5210071A/en
Pending legal-status Critical Current

Links

Landscapes

  • Crystals, And After-Treatments Of Crystals (AREA)

Abstract

PURPOSE: To supress warping of a silicon wafer due to diffusion, by controling an amount of spreading of boron oxide, in a diffusion method in that the silicon wafer which the boron oxide is spreaded on the surface is used as a diffusion source.
COPYRIGHT: (C)1977,JPO&Japio
JP8585575A 1975-07-15 1975-07-15 Method for diffusing boron Pending JPS5210071A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8585575A JPS5210071A (en) 1975-07-15 1975-07-15 Method for diffusing boron

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8585575A JPS5210071A (en) 1975-07-15 1975-07-15 Method for diffusing boron

Publications (1)

Publication Number Publication Date
JPS5210071A true JPS5210071A (en) 1977-01-26

Family

ID=13870481

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8585575A Pending JPS5210071A (en) 1975-07-15 1975-07-15 Method for diffusing boron

Country Status (1)

Country Link
JP (1) JPS5210071A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4636466A (en) * 1983-10-31 1987-01-13 Genex Corporation Phenylalanine ammonia lyase-producing microbial cells

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4945622A (en) * 1972-09-04 1974-05-01

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4945622A (en) * 1972-09-04 1974-05-01

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4636466A (en) * 1983-10-31 1987-01-13 Genex Corporation Phenylalanine ammonia lyase-producing microbial cells

Similar Documents

Publication Publication Date Title
JPS5224478A (en) Semiconductor device manufacturing process
JPS5277590A (en) Semiconductor producing device
JPS5210071A (en) Method for diffusing boron
JPS538073A (en) Mis type semiconductor device
JPS51151081A (en) Mos type semiconductor apparatus and that manufacturing method
JPS533171A (en) Impurity diffusion method
JPS5242365A (en) Tool for semiconductors
JPS525700A (en) The process for production of silicon nitride
JPS51142795A (en) Grinding device
JPS5234482A (en) Cutting tool
JPS51132762A (en) Heat-treatment method of semiconductor device
JPS5225567A (en) Semiconductor manufacturing apparatus
JPS5378780A (en) Preparation for semiconductor device
JPS5227276A (en) Glass mask holder
JPS5277584A (en) Growing crystal
JPS5415672A (en) Manufacture of semiconductor device
JPS5270777A (en) Manufacture of semiconductor device
JPS5240967A (en) Method of diffusing impurities in compund semiconductor
JPS5231256A (en) Clutch device
JPS5242366A (en) Method of preventing occurence of crystal defects of silicon wafers
JPS51114794A (en) Travelling grinding machine
JPS5231690A (en) Productin method of semiconductor device
JPS5224462A (en) Surface treatment of silicone wafer
JPS5234666A (en) Semi-conductor wafer processing
JPS5217767A (en) Method for arsenic diffusion using porous material