JPS5243369A - Flat etching method for silicon - Google Patents

Flat etching method for silicon

Info

Publication number
JPS5243369A
JPS5243369A JP11773475A JP11773475A JPS5243369A JP S5243369 A JPS5243369 A JP S5243369A JP 11773475 A JP11773475 A JP 11773475A JP 11773475 A JP11773475 A JP 11773475A JP S5243369 A JPS5243369 A JP S5243369A
Authority
JP
Japan
Prior art keywords
silicon
etching method
flat etching
flat
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11773475A
Other languages
Japanese (ja)
Other versions
JPS5530292B2 (en
Inventor
Takashi Yamaguchi
Kaoru Niino
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP11773475A priority Critical patent/JPS5243369A/en
Publication of JPS5243369A publication Critical patent/JPS5243369A/en
Publication of JPS5530292B2 publication Critical patent/JPS5530292B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Element Separation (AREA)
  • Weting (AREA)

Abstract

PURPOSE: To etch an Si wafer and epitaxial layer having (100) crystalline face with an alkali solution, thereby flattening the surface of single crystalline layer.
COPYRIGHT: (C)1977,JPO&Japio
JP11773475A 1975-10-01 1975-10-01 Flat etching method for silicon Granted JPS5243369A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11773475A JPS5243369A (en) 1975-10-01 1975-10-01 Flat etching method for silicon

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11773475A JPS5243369A (en) 1975-10-01 1975-10-01 Flat etching method for silicon

Publications (2)

Publication Number Publication Date
JPS5243369A true JPS5243369A (en) 1977-04-05
JPS5530292B2 JPS5530292B2 (en) 1980-08-09

Family

ID=14718954

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11773475A Granted JPS5243369A (en) 1975-10-01 1975-10-01 Flat etching method for silicon

Country Status (1)

Country Link
JP (1) JPS5243369A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4362599A (en) * 1977-10-17 1982-12-07 Hitachi, Ltd. Method for making semiconductor device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4362599A (en) * 1977-10-17 1982-12-07 Hitachi, Ltd. Method for making semiconductor device

Also Published As

Publication number Publication date
JPS5530292B2 (en) 1980-08-09

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