JPS5384478A - Forming method for micropattern - Google Patents

Forming method for micropattern

Info

Publication number
JPS5384478A
JPS5384478A JP16024876A JP16024876A JPS5384478A JP S5384478 A JPS5384478 A JP S5384478A JP 16024876 A JP16024876 A JP 16024876A JP 16024876 A JP16024876 A JP 16024876A JP S5384478 A JPS5384478 A JP S5384478A
Authority
JP
Japan
Prior art keywords
micropattern
forming method
irrdiating
substrate
layer formed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16024876A
Other languages
Japanese (ja)
Inventor
Takeari Uema
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP16024876A priority Critical patent/JPS5384478A/en
Publication of JPS5384478A publication Critical patent/JPS5384478A/en
Pending legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE: To obtain a micropattern through an exposure process by irrdiating the proton beam to the prescribed pattern of the resist layer formed on the substrate.
COPYRIGHT: (C)1978,JPO&Japio
JP16024876A 1976-12-29 1976-12-29 Forming method for micropattern Pending JPS5384478A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16024876A JPS5384478A (en) 1976-12-29 1976-12-29 Forming method for micropattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16024876A JPS5384478A (en) 1976-12-29 1976-12-29 Forming method for micropattern

Publications (1)

Publication Number Publication Date
JPS5384478A true JPS5384478A (en) 1978-07-25

Family

ID=15710891

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16024876A Pending JPS5384478A (en) 1976-12-29 1976-12-29 Forming method for micropattern

Country Status (1)

Country Link
JP (1) JPS5384478A (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51142276A (en) * 1975-06-03 1976-12-07 Fujitsu Ltd Method of exposing photo-resist

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51142276A (en) * 1975-06-03 1976-12-07 Fujitsu Ltd Method of exposing photo-resist

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