JPS546457A - Ion-injecting method - Google Patents

Ion-injecting method

Info

Publication number
JPS546457A
JPS546457A JP7259477A JP7259477A JPS546457A JP S546457 A JPS546457 A JP S546457A JP 7259477 A JP7259477 A JP 7259477A JP 7259477 A JP7259477 A JP 7259477A JP S546457 A JPS546457 A JP S546457A
Authority
JP
Japan
Prior art keywords
ion
injecting method
recoiled
knock
deteriorating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7259477A
Other languages
Japanese (ja)
Inventor
Kiyoshi Yoneda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sanyo Electric Co Ltd
Original Assignee
Sanyo Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Electric Co Ltd filed Critical Sanyo Electric Co Ltd
Priority to JP7259477A priority Critical patent/JPS546457A/en
Publication of JPS546457A publication Critical patent/JPS546457A/en
Pending legal-status Critical Current

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  • Electrodes Of Semiconductors (AREA)

Abstract

PURPOSE: To prevent characteristics from deteriorating, by injecting ions into a SiO2 film formed thinner than the film thickness at the time when the supply density of O2 recoiled through a knock-on phenomenon to a substrate is at its maximum.
COPYRIGHT: (C)1979,JPO&Japio
JP7259477A 1977-06-16 1977-06-16 Ion-injecting method Pending JPS546457A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7259477A JPS546457A (en) 1977-06-16 1977-06-16 Ion-injecting method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7259477A JPS546457A (en) 1977-06-16 1977-06-16 Ion-injecting method

Publications (1)

Publication Number Publication Date
JPS546457A true JPS546457A (en) 1979-01-18

Family

ID=13493868

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7259477A Pending JPS546457A (en) 1977-06-16 1977-06-16 Ion-injecting method

Country Status (1)

Country Link
JP (1) JPS546457A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5918633A (en) * 1982-07-22 1984-01-31 Toshiba Corp Resist applying apparatus
JPS6410675A (en) * 1987-07-03 1989-01-13 Nec Corp Manufacture of semiconductor photodetector
JPH0196955A (en) * 1987-10-09 1989-04-14 Hitachi Ltd Semiconductor device and manufacture thereof

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS505024A (en) * 1973-03-22 1975-01-20

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS505024A (en) * 1973-03-22 1975-01-20

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5918633A (en) * 1982-07-22 1984-01-31 Toshiba Corp Resist applying apparatus
JPS6410675A (en) * 1987-07-03 1989-01-13 Nec Corp Manufacture of semiconductor photodetector
JPH0196955A (en) * 1987-10-09 1989-04-14 Hitachi Ltd Semiconductor device and manufacture thereof

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