JPS551152A - Method of fabricating photoconducting element - Google Patents
Method of fabricating photoconducting elementInfo
- Publication number
- JPS551152A JPS551152A JP7444678A JP7444678A JPS551152A JP S551152 A JPS551152 A JP S551152A JP 7444678 A JP7444678 A JP 7444678A JP 7444678 A JP7444678 A JP 7444678A JP S551152 A JPS551152 A JP S551152A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- electrode
- substrate
- sputtering method
- transparent electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Solid State Image Pick-Up Elements (AREA)
Abstract
PURPOSE: To provide the subject method comprising the steps of ; growing a layer of (Zn1-xCdxTe)1-y (In2Te3)y, and causing a transparent electrode on the layer by sputtering method thereby to enhance the sensitivity of the element and to decrease the dark current.
CONSTITUTION: N+ type regions 11 and 12 are diffusion-formed on a P type Si substrate 10, and in insulating film 14 including a gate electrode 13 made of a polycrystal of Si at a position corresponding to the region 12 is formed on the whole surface of the substrate 10. Then, on the region 11 there is formed a contact hole in the film 14, and an electrode 15 is caused to adhere onto the film 14 including the hole made of Mo, W or the like by sputtering method. Thereafter, a positive hole blocking layer 16 made of ZnSe or the like and a layer 17 of (Zn0.7 Cd0.3 Te)0.95 (In2 Te3)0.05 are laminated thereon, and a transparent electrode 18 made of Au, Pt, In2O3, SnO2 or the like, having a work function of more than 4.5 eV is covered thereon similarly by sputtering method, and a power source is connected between said transparent electrode 18 and the back surface of the substrate 10. By constituting the element as described above, light 19 is incident on the electrode 18 side, and the sensitivity of the element is high all over the full visible light area.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7444678A JPS551152A (en) | 1978-06-19 | 1978-06-19 | Method of fabricating photoconducting element |
| US06/006,129 US4236829A (en) | 1978-01-31 | 1979-01-24 | Solid-state image sensor |
| GB7903077A GB2014783B (en) | 1978-01-31 | 1979-01-29 | Solid-state image sensor |
| FR7902477A FR2416554A1 (en) | 1978-01-31 | 1979-01-31 | SOLID STATE SHOOTING DEVICE |
| DE2903651A DE2903651C2 (en) | 1978-01-31 | 1979-01-31 | Solid state image sensing device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7444678A JPS551152A (en) | 1978-06-19 | 1978-06-19 | Method of fabricating photoconducting element |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS551152A true JPS551152A (en) | 1980-01-07 |
Family
ID=13547462
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7444678A Pending JPS551152A (en) | 1978-01-31 | 1978-06-19 | Method of fabricating photoconducting element |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS551152A (en) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5110715A (en) * | 1974-07-05 | 1976-01-28 | Hitachi Ltd | |
| JPS5350614A (en) * | 1976-10-19 | 1978-05-09 | Matsushita Electric Ind Co Ltd | Pick up tube target |
-
1978
- 1978-06-19 JP JP7444678A patent/JPS551152A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5110715A (en) * | 1974-07-05 | 1976-01-28 | Hitachi Ltd | |
| JPS5350614A (en) * | 1976-10-19 | 1978-05-09 | Matsushita Electric Ind Co Ltd | Pick up tube target |
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