JPS55150222A - Method of processing signal for photomask pattern inspection - Google Patents

Method of processing signal for photomask pattern inspection

Info

Publication number
JPS55150222A
JPS55150222A JP5689879A JP5689879A JPS55150222A JP S55150222 A JPS55150222 A JP S55150222A JP 5689879 A JP5689879 A JP 5689879A JP 5689879 A JP5689879 A JP 5689879A JP S55150222 A JPS55150222 A JP S55150222A
Authority
JP
Japan
Prior art keywords
outputs
multivibrators
flip
detector
signal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5689879A
Other languages
English (en)
Other versions
JPS635895B2 (ja
Inventor
Yoshimitsu Majima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP5689879A priority Critical patent/JPS55150222A/ja
Publication of JPS55150222A publication Critical patent/JPS55150222A/ja
Publication of JPS635895B2 publication Critical patent/JPS635895B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP5689879A 1979-05-11 1979-05-11 Method of processing signal for photomask pattern inspection Granted JPS55150222A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5689879A JPS55150222A (en) 1979-05-11 1979-05-11 Method of processing signal for photomask pattern inspection

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5689879A JPS55150222A (en) 1979-05-11 1979-05-11 Method of processing signal for photomask pattern inspection

Publications (2)

Publication Number Publication Date
JPS55150222A true JPS55150222A (en) 1980-11-22
JPS635895B2 JPS635895B2 (ja) 1988-02-05

Family

ID=13040258

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5689879A Granted JPS55150222A (en) 1979-05-11 1979-05-11 Method of processing signal for photomask pattern inspection

Country Status (1)

Country Link
JP (1) JPS55150222A (ja)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53117978A (en) * 1977-03-25 1978-10-14 Hitachi Ltd Automatic mask appearance inspection apparatus

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53117978A (en) * 1977-03-25 1978-10-14 Hitachi Ltd Automatic mask appearance inspection apparatus

Also Published As

Publication number Publication date
JPS635895B2 (ja) 1988-02-05

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