JPS5620162A - Vapor depositing method - Google Patents

Vapor depositing method

Info

Publication number
JPS5620162A
JPS5620162A JP9533779A JP9533779A JPS5620162A JP S5620162 A JPS5620162 A JP S5620162A JP 9533779 A JP9533779 A JP 9533779A JP 9533779 A JP9533779 A JP 9533779A JP S5620162 A JPS5620162 A JP S5620162A
Authority
JP
Japan
Prior art keywords
deposited
evaporating
speed
rotated
stand
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9533779A
Other languages
Japanese (ja)
Inventor
Naoki Yokoyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP9533779A priority Critical patent/JPS5620162A/en
Publication of JPS5620162A publication Critical patent/JPS5620162A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C23C14/505—Substrate holders for rotation of the substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To form vapor deposited layer as thin as monomolecular layer or monoatomic layer, by varying the evaporation and flying speed of evaporating material relatively with the moving speed of the material to be deposited. CONSTITUTION:When the holding stand 1 is rotated in the direction of A at a speed the same as, or higher than, the evaporating and flying speed of evaporating material 12, the evaporating material 12 hardly deposits on the material to be deposited 11, however when the holding stand 1 is rotated at a lower speed than the evaporating and flying speed, the evaporating material 12 deposits on the material 11 to be deposited. Becauses the stand 1 is rotated at ultra-high speed, very small amount of the material 12 is deposited to form extremely thin vapor deposited film. In contrary, when the stand 1 is rotated in the direction of B, the material having hardly vapor deposited formerly deposits to form thick vapor deposited film because the evaporated material 12 colides with the surface of the material 11 to be deposited at a ultra-high speed.
JP9533779A 1979-07-26 1979-07-26 Vapor depositing method Pending JPS5620162A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9533779A JPS5620162A (en) 1979-07-26 1979-07-26 Vapor depositing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9533779A JPS5620162A (en) 1979-07-26 1979-07-26 Vapor depositing method

Publications (1)

Publication Number Publication Date
JPS5620162A true JPS5620162A (en) 1981-02-25

Family

ID=14134885

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9533779A Pending JPS5620162A (en) 1979-07-26 1979-07-26 Vapor depositing method

Country Status (1)

Country Link
JP (1) JPS5620162A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5176377A (en) * 1974-09-18 1976-07-01 Goodrich Co B F Jugotaifuchakuno haijohoho
EP2072632A1 (en) * 2007-12-19 2009-06-24 Kojima Press Industry Co., Ltd. Sputtering apparatus and method for forling coating film sputtering
WO2010078914A1 (en) * 2009-01-09 2010-07-15 Bayerische Motoren Werke Aktiengesellschaft Method and device for coating functional surfaces

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5176377A (en) * 1974-09-18 1976-07-01 Goodrich Co B F Jugotaifuchakuno haijohoho
EP2072632A1 (en) * 2007-12-19 2009-06-24 Kojima Press Industry Co., Ltd. Sputtering apparatus and method for forling coating film sputtering
WO2010078914A1 (en) * 2009-01-09 2010-07-15 Bayerische Motoren Werke Aktiengesellschaft Method and device for coating functional surfaces

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