JPS5545747A - Photosensitive polymer and its production - Google Patents

Photosensitive polymer and its production

Info

Publication number: JPS5545747A
Authority: JP; Japan
Prior art keywords: photosensitive; group; diamine; formula; aromatic residue
Prior art date: 1978-09-29
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Granted

Application number

JP11921878A

Other languages

English (en)

Japanese (ja)

Other versions

JPS6345412B2 (fr

Inventor

Fusaji Shoji

Kazunari Takemoto

Ataru Yokono

Tokio Isogai

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Hitachi Ltd

Original Assignee

Hitachi Ltd

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1978-09-29

Filing date

1978-09-29

Publication date

1980-03-31

1978-09-29 Application filed by Hitachi Ltd filed Critical Hitachi Ltd

1978-09-29 Priority to JP11921878A priority Critical patent/JPS5545747A/ja

1979-09-26 Priority to PCT/JP1979/000246 priority patent/WO1980000706A1/fr

1979-09-26 Priority to DE7979901257T priority patent/DE2967162D1/de

1980-03-31 Publication of JPS5545747A publication Critical patent/JPS5545747A/ja

1980-04-22 Priority to EP79901257A priority patent/EP0020773B1/fr

1980-05-22 Priority to US06/198,952 priority patent/US4321319A/en

1988-09-09 Publication of JPS6345412B2 publication Critical patent/JPS6345412B2/ja

Status Granted legal-status Critical Current

Links

229920000642 polymer Polymers 0.000 title abstract 3
125000003118 aryl group Chemical group 0.000 abstract 2
150000004985 diamines Chemical class 0.000 abstract 2
125000001931 aliphatic group Chemical group 0.000 abstract 1
125000004432 carbon atom Chemical group C* 0.000 abstract 1
125000006297 carbonyl amino group Chemical group [H]N([*:2])C([*:1])=O 0.000 abstract 1
125000001183 hydrocarbyl group Chemical group 0.000 abstract 1
239000000463 material Substances 0.000 abstract 1
239000000203 mixture Substances 0.000 abstract 1
239000002798 polar solvent Substances 0.000 abstract 1
239000003381 stabilizer Substances 0.000 abstract 1
-1 tetracarboxylic acid dianhydride Chemical class 0.000 abstract 1

Landscapes

Polyamides (AREA)
Polymerisation Methods In General (AREA)
Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
Macromonomer-Based Addition Polymer (AREA)

JP11921878A 1978-09-29 1978-09-29 Photosensitive polymer and its production Granted JPS5545747A (en)

Priority Applications (5)

Application Number	Priority Date	Filing Date	Title
JP11921878A JPS5545747A (en)	1978-09-29	1978-09-29	Photosensitive polymer and its production
PCT/JP1979/000246 WO1980000706A1 (fr)	1978-09-29	1979-09-26	Composition polymere sensible a la lumiere
DE7979901257T DE2967162D1 (en)	1978-09-29	1979-09-26	Light-sensitive polymer composition
EP79901257A EP0020773B1 (fr)	1978-09-29	1980-04-22	Composition polymere sensible a la lumiere
US06/198,952 US4321319A (en)	1978-09-29	1980-05-22	Photosensitive compositions containing polyamides acid with photosensitive groups

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
JP11921878A JPS5545747A (en)	1978-09-29	1978-09-29	Photosensitive polymer and its production

Publications (2)

Publication Number	Publication Date
JPS5545747A true JPS5545747A (en)	1980-03-31
JPS6345412B2 JPS6345412B2 (fr)	1988-09-09

Family

ID=14755871

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP11921878A Granted JPS5545747A (en)	1978-09-29	1978-09-29	Photosensitive polymer and its production

Country Status (1)

Country	Link
JP (1)	JPS5545747A (fr)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS59220729A (ja) *	1983-05-30	1984-12-12	Ube Ind Ltd	有機溶媒可溶性の感光性ポリイミド
JPS59220730A (ja) *	1983-05-30	1984-12-12	Ube Ind Ltd	溶媒可溶性の感光性ポリイミド
JPS6159334A (ja) *	1984-08-30	1986-03-26	Ube Ind Ltd	有機溶媒可溶性の感光性ポリイミド組成物
JP2008203641A (ja) *	2007-02-21	2008-09-04	Jsr Corp	シンナモイル基を持つジアミン化合物の製造法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS49115541A (fr) *	1973-02-22	1974-11-05
JPS5140920A (fr) *	1974-08-02	1976-04-06	Siemens Ag

1978
- 1978-09-29 JP JP11921878A patent/JPS5545747A/ja active Granted

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS49115541A (fr) *	1973-02-22	1974-11-05
JPS5140920A (fr) *	1974-08-02	1976-04-06	Siemens Ag

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS59220729A (ja) *	1983-05-30	1984-12-12	Ube Ind Ltd	有機溶媒可溶性の感光性ポリイミド
JPS59220730A (ja) *	1983-05-30	1984-12-12	Ube Ind Ltd	溶媒可溶性の感光性ポリイミド
JPS6159334A (ja) *	1984-08-30	1986-03-26	Ube Ind Ltd	有機溶媒可溶性の感光性ポリイミド組成物
JP2008203641A (ja) *	2007-02-21	2008-09-04	Jsr Corp	シンナモイル基を持つジアミン化合物の製造法

Also Published As

Publication number	Publication date
JPS6345412B2 (fr)	1988-09-09

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