JPS6345412B2 - - Google Patents
Info
- Publication number
- JPS6345412B2 JPS6345412B2 JP53119218A JP11921878A JPS6345412B2 JP S6345412 B2 JPS6345412 B2 JP S6345412B2 JP 53119218 A JP53119218 A JP 53119218A JP 11921878 A JP11921878 A JP 11921878A JP S6345412 B2 JPS6345412 B2 JP S6345412B2
- Authority
- JP
- Japan
- Prior art keywords
- photosensitive
- group
- formula
- diamine compound
- diamine
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Polyamides (AREA)
- Polymerisation Methods In General (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11921878A JPS5545747A (en) | 1978-09-29 | 1978-09-29 | Photosensitive polymer and its production |
| PCT/JP1979/000246 WO1980000706A1 (fr) | 1978-09-29 | 1979-09-26 | Composition polymere sensible a la lumiere |
| DE7979901257T DE2967162D1 (en) | 1978-09-29 | 1979-09-26 | Light-sensitive polymer composition |
| EP79901257A EP0020773B1 (fr) | 1978-09-29 | 1980-04-22 | Composition polymere sensible a la lumiere |
| US06/198,952 US4321319A (en) | 1978-09-29 | 1980-05-22 | Photosensitive compositions containing polyamides acid with photosensitive groups |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11921878A JPS5545747A (en) | 1978-09-29 | 1978-09-29 | Photosensitive polymer and its production |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5545747A JPS5545747A (en) | 1980-03-31 |
| JPS6345412B2 true JPS6345412B2 (fr) | 1988-09-09 |
Family
ID=14755871
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11921878A Granted JPS5545747A (en) | 1978-09-29 | 1978-09-29 | Photosensitive polymer and its production |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5545747A (fr) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59220729A (ja) * | 1983-05-30 | 1984-12-12 | Ube Ind Ltd | 有機溶媒可溶性の感光性ポリイミド |
| JPS59220730A (ja) * | 1983-05-30 | 1984-12-12 | Ube Ind Ltd | 溶媒可溶性の感光性ポリイミド |
| JPS6159334A (ja) * | 1984-08-30 | 1986-03-26 | Ube Ind Ltd | 有機溶媒可溶性の感光性ポリイミド組成物 |
| JP4544432B2 (ja) * | 2007-02-21 | 2010-09-15 | Jsr株式会社 | シンナモイル基を持つジアミン化合物の製造法 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL177718C (nl) * | 1973-02-22 | 1985-11-01 | Siemens Ag | Werkwijze ter vervaardiging van reliefstructuren uit warmte-bestendige polymeren. |
| AT341792B (de) * | 1974-08-02 | 1978-02-27 | Siemens Ag | Verfahren zur herstellung von schichtstrukturen |
-
1978
- 1978-09-29 JP JP11921878A patent/JPS5545747A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5545747A (en) | 1980-03-31 |
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