JPS56122029A - Photosensitive resin composition developable with aqueous alkali solution - Google Patents
Photosensitive resin composition developable with aqueous alkali solutionInfo
- Publication number
- JPS56122029A JPS56122029A JP2475680A JP2475680A JPS56122029A JP S56122029 A JPS56122029 A JP S56122029A JP 2475680 A JP2475680 A JP 2475680A JP 2475680 A JP2475680 A JP 2475680A JP S56122029 A JPS56122029 A JP S56122029A
- Authority
- JP
- Japan
- Prior art keywords
- alkali
- resin composition
- soluble
- acid
- photosensitive resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000011342 resin composition Substances 0.000 title abstract 3
- 239000003513 alkali Substances 0.000 title abstract 2
- -1 ester compound Chemical class 0.000 abstract 4
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 abstract 3
- 150000001875 compounds Chemical class 0.000 abstract 3
- 230000032050 esterification Effects 0.000 abstract 2
- 238000005886 esterification reaction Methods 0.000 abstract 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 abstract 2
- 229920000642 polymer Polymers 0.000 abstract 2
- FEIQOMCWGDNMHM-KBXRYBNXSA-N (2e,4e)-5-phenylpenta-2,4-dienoic acid Chemical compound OC(=O)\C=C\C=C\C1=CC=CC=C1 FEIQOMCWGDNMHM-KBXRYBNXSA-N 0.000 abstract 1
- WBYWAXJHAXSJNI-VOTSOKGWSA-M .beta-Phenylacrylic acid Natural products [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 abstract 1
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 abstract 1
- FUGYGGDSWSUORM-UHFFFAOYSA-N 4-hydroxystyrene Chemical compound OC1=CC=C(C=C)C=C1 FUGYGGDSWSUORM-UHFFFAOYSA-N 0.000 abstract 1
- WBYWAXJHAXSJNI-SREVYHEPSA-N Cinnamic acid Chemical compound OC(=O)\C=C/C1=CC=CC=C1 WBYWAXJHAXSJNI-SREVYHEPSA-N 0.000 abstract 1
- 239000002253 acid Substances 0.000 abstract 1
- 239000003377 acid catalyst Substances 0.000 abstract 1
- 229930016911 cinnamic acid Natural products 0.000 abstract 1
- 235000013985 cinnamic acid Nutrition 0.000 abstract 1
- FEIQOMCWGDNMHM-UHFFFAOYSA-N cinnamylideneacetic acid Natural products OC(=O)C=CC=CC1=CC=CC=C1 FEIQOMCWGDNMHM-UHFFFAOYSA-N 0.000 abstract 1
- WBYWAXJHAXSJNI-UHFFFAOYSA-N methyl p-hydroxycinnamate Natural products OC(=O)C=CC1=CC=CC=C1 WBYWAXJHAXSJNI-UHFFFAOYSA-N 0.000 abstract 1
- 239000000203 mixture Substances 0.000 abstract 1
- 229920003986 novolac Polymers 0.000 abstract 1
- 229920001568 phenolic resin Polymers 0.000 abstract 1
- 239000005011 phenolic resin Substances 0.000 abstract 1
- 150000002989 phenols Chemical class 0.000 abstract 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 abstract 1
- 239000002904 solvent Substances 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Phenolic Resins Or Amino Resins (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2475680A JPS56122029A (en) | 1980-02-29 | 1980-02-29 | Photosensitive resin composition developable with aqueous alkali solution |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2475680A JPS56122029A (en) | 1980-02-29 | 1980-02-29 | Photosensitive resin composition developable with aqueous alkali solution |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS56122029A true JPS56122029A (en) | 1981-09-25 |
| JPH0120732B2 JPH0120732B2 (da) | 1989-04-18 |
Family
ID=12146984
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2475680A Granted JPS56122029A (en) | 1980-02-29 | 1980-02-29 | Photosensitive resin composition developable with aqueous alkali solution |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS56122029A (da) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5821735A (ja) * | 1981-07-31 | 1983-02-08 | Daicel Chem Ind Ltd | アルカリ現像可能な感光性樹脂組成物 |
| US5712022A (en) * | 1992-09-14 | 1998-01-27 | Yoshino Kogyosho Co., Ltd. | Printed thermoplastic resin products and method for printing such products |
-
1980
- 1980-02-29 JP JP2475680A patent/JPS56122029A/ja active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5821735A (ja) * | 1981-07-31 | 1983-02-08 | Daicel Chem Ind Ltd | アルカリ現像可能な感光性樹脂組成物 |
| US5712022A (en) * | 1992-09-14 | 1998-01-27 | Yoshino Kogyosho Co., Ltd. | Printed thermoplastic resin products and method for printing such products |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0120732B2 (da) | 1989-04-18 |
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